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Synthetic Resins Or Natural Rubbers -- Part Of The Class 520 Series > Polymer Derived From Nitrile, Conjugated Diene And Aromatic Co-monomers > > Silicon Reactant Contains Two Or More Silicon Atoms Silicon Reactant Contains Two Or More Silicon AtomsSilicon Reactant Contains Two Or More Silicon Atoms patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.11/23/06 - 20060264595 - Siloxane-based resin and a semiconductor interlayer insulating film using the same A siloxane-based resin having a novel structure and a semiconductor interlayer insulating film using the same. The siloxane-based resins have a low dielectric constant in addition to excellent mechanical properties and are useful materials in an insulating film between interconnect layers of a semiconductor device. ... 11/02/06 - 20060247408 - Siloxane monomers and oligomers R2 is substituted alkyl, epoxyalkyl, oxetanylalkyl, substituted oxaalkyl, epoxyoxaalkyl, oxetanyloxaalkyl, alkenyl, alkylalkoxysilyl, substituted alkylaryl, and substituted arylalkyl. ... 05/18/06 - 20060106187 - Poly (cyclosiloxane) composition and method of systhesis thereof A poly(cyclosiloxane) network comprises the hydrosilation reaction product of a cyclosiloxane of the formula (I) wherein R and R2 are the same or different for each siloxane moiety of hydrogen, an alkyl group, an aryl group, and a cycloalkyl group, and wherein n is an integer from 3 to 8, ... 05/11/06 - 20060100410 - Polymer obtained with silsesquioxane derivative The present invention is a polymer obtained by using a silsesquioxane derivative represented by formula (1-0). In the formula R0 each independently represents hydrogen, alkyl, aryl or arylalkyl, and Y each represents a group represented by formula (a) or formula (b). In each of formula (a) and formula (b), at ... 03/16/06 - 20060058487 - Novel polyorganosiloxane dielectric materials R3 is a bridging hydrocarbon group, to form a siloxane material. The invention also concerns methods for producing the thin films. The thin film can be used a low k dielectric in integrated circuit devices. The novel dielectric materials have excellent properties of planarization resulting in good local and global ... 01/12/06 - 20060009604 - Oligomer silasesquioxanes, method for the production thereof, and use of the same The invention is directed to processes that can be used for the production of silasesquioxanes using a base catalyzed reaction of monomeric compounds. ... 07/21/05 - 20050159573 - Silicone-based cyanate-ester cross-linkable die attach adhesive The present invention describes a method including: providing a material A, the material A including a siloxane backbone with a hydride functional group; reacting the material A with a material B in the presence of a catalyst to form a material C, the material B including an alkenyl functional group ... ### FreshPatents.com Support |