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Cleaning Compositions For Solid Surfaces, Auxiliary Compositions Therefor, Or Processes Of Preparing The Compositions > Cleaning Compositions Or Processes Of Preparing (e.g., Sodium Bisulfate Component, Etc.) > For Cleaning A Specific Substrate Or Removing A Specific Contaminant (e.g., For Smoker`s Pipe, Etc.) > For Ink Recording Or Printing Equipment, Or Mold Therefor (e.g., Ink Jet Recorder, Etc.) For Ink Recording Or Printing Equipment, Or Mold Therefor (e.g., Ink Jet Recorder, Etc.)For Ink Recording Or Printing Equipment, Or Mold Therefor (e.g., Ink Jet Recorder, Etc.) patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.10/26/06 - 20060241004 - Use of blended solvents in defectivity prevention The present invention provides a blended solvent for solubilizing an ultraviolet photoresist. The blended solvent comprises a mixture of from about 5 vol % to about 95 vol % of a first solvent, wherein the first solvent comprises a cyclic ester. A balance of the mixture comprises a second solvent, ... 09/14/06 - 20060205622 - Compositions substrate for removing etching residue and use thereof Compositions containing certain organic solvents and a fluorine source are capable of removing photoresist and etching residue. ... 06/15/06 - 20060128582 - Composition and material for cleaning printing machines The invention is a cleaning material for cleaning printing machines. The cleaning material is comprised of a fabric that has been impregnated with a cleaning composition having branched chain monobasic and/or dibasic esters that contain 2-ethyl hexanoate. The cleaning composition can also include additional low volatility solvents and surfactants. A ... 06/15/06 - 20060128581 - Lithographic rinse solution and method for forming patterned resist layer using the same The invention provides a novel rinse solution used in the step of rinse treatment of a patterned photoresist layer developed with an aqueous alkaline developer solution in a photolithographic process for the manufacture of semiconductor devices and liquid crystal display panels. The rinse solution provided by the invention is an ... 11/10/05 - 20050250659 - Composition and material for cleaning printing machines The invention is a cleaning material for cleaning printing machines. The cleaning material is comprised of a fabric that has been impregnated with a cleaning composition having branched chain monobasic and/or dibasic esters that contain 2-ethyl hexanoate. The cleaning composition can also include additional low volatility solvents and surfactants. A ... ### FreshPatents.com Support |