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Compositions: Ceramic > Ceramic Compositions > Glass Compositions, Compositions Containing Glass Other Than Those Wherein Glass Is A Bonding Agent, Or Glass Batch Forming Compositions > Silica Containing > More Than 90 Percent By Weight Silica More Than 90 Percent By Weight SilicaMore Than 90 Percent By Weight Silica patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.03/01/07 - 20070049482 - Synthetic quartz glass substrate for excimer lasers and making method When a synthetic quartz glass substrate is prepared from a synthetic quartz glass block, (I) the block has a hydrogen molecule concentration of 5×1017-1×1019 molecules/cm3, (II) the substrate has a hydrogen molecule concentration of 5×1015-5×1017 molecules/cm3, (III) the substrate has an in-plane variation of its internal transmittance at 193.4 nm ... 02/22/07 - 20070042893 - Silica glass containing tio2 and process for its production A silica glass containing TiO2, which has a TiO2 concentration of from 3 to 10 mass %, a OH group concentration of at most 600 mass ppm and a Ti3+ concentration of at most 70 mass ppm, characterized by having a fictive temperature of at most 1,200° C., a coefficient ... 02/22/07 - 20070042892 - Doped silica glass articles and methods of forming doped silica glass boules and articles The present invention provides doped titania-doped silica glass articles having low thermal expansions and low variations in thermal expansion. According to one embodiment of the invention, a titania-doped silica glass article has a titania content of between about 5 wt % and about 9 wt %; a coefficient of thermal ... 01/18/07 - 20070015652 - Sintered materials Sintered materials, especially sintered glasses, produced from pyrogenically produced silicon dioxide which has been processed to silicon granulates in a compacting step, and the use of such granulates in the production of formed glass bodies. ... 01/04/07 - 20070004579 - Synthetic silica material with low fluence-dependent-transmission and method of making the same Disclosed in the application are a synthetic silica glass having low fluence-dependent transmission, particularly at about 193 nm, and a process for making the same. The glass may desirably exhibit a low level of fluorescence at 290 and 390 nm when activated at about 248 nm. The glass may desirably ... 12/14/06 - 20060281623 - Free-formed quartz glass ingots and method for making the same A method to form quartz glass ingots of ultra low contamination and defect levels by firing a high-purity quartz form as the feedstock, wherein the quartz glass ingot is free-formed on a platen rotating concentrically with the feedstock quartz article. ... 12/07/06 - 20060276323 - Silica glass A silica glass containing from 3 to 10 mass % of TiO2, which has a coefficient of thermal expansion from 0 to 100° C., i.e. CTE0 to 100, of 0±300 ppb/° C. and an internal transmittance per mm in thickness within a wavelength region of from 200 to 700 nm, ... 11/16/06 - 20060258525 - Transparent silica glass luminescent material and process for producing the same It is an object of the present invention to provide a light emitting device of the next generation optical device having a broad emission property that a width at half maximum of an emission spectrum is large in a wavelength range of visible light and capable of recognizing white light ... 10/19/06 - 20060234848 - Optical component of quartz glass, method for producing said component, and method for exposing a substrate To provide an optical component of quartz glass for use in a projection lens system for immersion lithography with an operating wavelength below 250 nm, which is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it ... 08/17/06 - 20060183624 - High-purity quartz powder, process for producing the same, and glass molding The invention provides a quartz powder, preferably a synthetic quartz powder obtained by the sol-gel method, which, upon heating from room temperature to 1,700° C., generates gases in which the amount of CO is 300 nl/g or smaller and the amount of CO2 is 30 nl/g or smaller. ... 08/17/06 - 20060183623 - Synthetic quartz glass for optical member and its production method A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which ... 08/17/06 - 20060183622 - Optical synthetic quartz glass and method for producing the same The present invention provides an optical synthetic quartz glass material which substantially does not cause changes in transmitted wave surface (TWS) by solarization, compaction (TWS delayed), rarefaction (TWS progressed) and photorefractive effect when ArF excimer laser irradiation is applied at a low energy density, e.g. at energy density per pulse ... 12/08/05 - 20050272589 - Optical glass An optical glass comprising SiO2, B2O3 and La2O3 and one or more oxides selected from the group consisting of ZrO2, Nb2O5 and Ta2O5, having a refractive index of 1.83 or over and an Abbe number of 35 or over and being free of F. ... 12/08/05 - 20050272588 - Quartz glass having excellent resistance against plasma corrosion and method for producing the same As a jig material to use under plasma reaction for producing semiconductors the present invention provides a quartz glass having resistance against plasma corrosion, particularly corrosion resistance against fluorine-based plasma gases, and which is usable without causing anomalies to silicon wafers; the present invention furthermore provides a quartz glass jig, ... 11/03/05 - 20050245383 - Silica glass containing tio2 and optical material for euv lithography An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, wherein the TiO2 concentration is at least 1 mass %, and the difference between the maximum value and the minimum value of the TiO2 concentration is at most 0.06 mass % in ... 11/03/05 - 20050245382 - Silica glass containing tio2 and process for its production A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., an OH group concentration of at most 600 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C. ... 10/27/05 - 20050239626 - Synthetic quartz glass optical material for yag laser with higher harmonic It is an object of the present invention to provide synthetic quartz glass optical materials suitable for use in YAG of higher order harmonics. The damage threshold value in J/cm2 (energy density at which cracks occur generated by irradiation) is to be considered when synthetic quartz glass material is irradiated ... 10/13/05 - 20050227849 - Optical element made of fluoride crystal A method for manufacturing fluoride crystal includes the steps of adding scavenger and a material to a crucible, melting the scavenger and material at a temperature higher than a melting point so that a ratio of a thickness of the fluoride crystal that has been melted to an inner diameter ... 09/29/05 - 20050215413 - Sio2-tio2 glass body with improved resistance to radiation The invention discloses an SiO2—TiO2 glass, which is preferably made by flame-hydrolysis and which distinguishes itself by increased resistance to radiation, especially in connection with EUV lithography. By purposefully reducing the hydrogen content, clearly improved resistance to radiation and reduced shrinking is achieved. ... 08/25/05 - 20050187092 - Synthetic silica glass optical material having high resistance to laser induced damage Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633 nm, ... 08/11/05 - 20050176572 - Synthetic quartz glass Disclosed is a synthetic silica glass for use with light having a wavelength of 150 to 200 nm, which has an OH group at a concentration of less than 1 ppm, an oxygen-excess type defect at a concentration of 1×1016 defects/cm3 or less, a hydrogen molecule at a concentration of ... ### FreshPatents.com Support |