REGISTER now for FREE 
|
FREE patent keyword monitoring and additional FREE benefits. REGISTER now for FREE
|
|
|
Abrading > Flexible-member Tool, Per Se Flexible-member Tool, Per SeFlexible-member Tool, Per Se patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.03/22/07 - 20070066196 - Method of forming a stacked polishing pad using laser ablation The present invention provides a method of manufacturing a polishing pad for chemical mechanical polishing, comprising laminating a top polishing pad to a sub-polishing pad to form a stacked pad and transferring the stacked pad to a laser-ablation station containing a laser. Further the invention provides modulating a laser beam ... 03/22/07 - 20070066195 - Water-based polishing pads having improved adhesion properties and methods of manufacture The present invention provides a chemical mechanical polishing pad comprising, a polymeric matrix having microspheres dispersed therein, the polymeric matrix being formed of a water-based polymer or blends thereof, and wherein the polymeric matrix is applied on a permeable substrate. The present invention provides a water-based polishing pad with reduced ... 01/18/07 - 20070015448 - Polishing pad having edge surface treatment A polishing pad has a sublayer and a polishing layer, wherein the surface of the outer peripheral edge of the sublayer can be at least partially treated to reduce the absorption or permeation of polishing fluid into the sublayer through the outer peripheral edge. The application of the surface treatment ... 10/12/06 - 20060229007 - Conductive pad A method and apparatus for a processing pad assembly for polishing a substrate is disclosed. The processing pad assembly has a conductive processing pad having a plurality of raised features made of a conductive composite disposed on a conductive carrier. The raised features are adapted to polish the feature surface ... 08/24/06 - 20060189269 - Customized polishing pads for cmp and methods of fabrication and use thereof Various examples of customized polishing pads are given, along with methods of making and using such customized polishing pads. The subject customized pads are designed and fabricated so that there is spatial distribution of chemical and physical properties of the pads that are customized for performance suited to a specific ... 08/17/06 - 20060183412 - Polishing pad A polishing pad is described as comprising, (a) particulate polymer which can be chosen from particulate thermoplastic polymer (e.g., particulate thermoplastic polyurethane), particulate crosslinked polymer (e.g., particulate crosslinked polyurethane and/or particulate crosslinked polyepoxide) and mixtures thereof; and (b) organic polymer binder (e.g., polyurethane binder and/or polyepoxide binder), which can bind ... 07/06/06 - 20060148393 - Polishing pad and cushion layer for polishing pad A polishing pad includes a polishing layer having abrasive grains dispersed in a resin and is characterized in that the resin is a resin containing ionic groups in the range of 20 to 1500 eq/ton. ... 07/06/06 - 20060148392 - Method of producing polishing pad A method of producing a polishing pad having a polishing layer is characterized in that the polishing layer is produced by a photolithographic method including: forming a sheet molding from a curing composition containing at least an initiator and an energy ray-reactive compound to be cured with energy rays; exposing ... 07/06/06 - 20060148391 - Polishing pad and cushion layer for polishing pad A polishing pad includes at least a polishing layer and a cushion layer and is characterized in that the difference in hardness in Shore D hardness between the polishing layer and the cushion layer is 3 or more. ... 07/06/06 - 20060148390 - Abrasive article and methods of making same A porous abrasive article that allows air and dust particles to pass through. The abrasive article has a screen abrasive and a porous attachment interface. The screen abrasive has an abrasive layer comprising a plurality of erectly oriented abrasive particles and at least one binder. The porous attachment interface cooperates ... 06/29/06 - 20060141918 - Endless abrasive belt and method of making the same Endless abrasive belt useful for polishing or otherwise abrading surfaces. ... 04/27/06 - 20060089093 - Polyurethane urea polishing pad The present invention relates to an article for altering a surface of a workpiece, or a polishing pad. In particular, the polishing pad includes a polyurethane urea material wherein at least a portion of the polyurethane urea material contains cells which are at least partially filled with gas. The polyurethane ... 02/16/06 - 20060035573 - Polishing pad and method of making same An article or polishing pad for altering a surface of a work piece includes a polymer matrix created by reaction injection molding of size controlled gas bubbles within a polyurethane matrix. The proposed liquid urethane precursor is first injected into an actuated mold and cured. The molded product is then ... 01/26/06 - 20060019587 - Methods for producing in-situ grooves in chemical mechanical planarization (cmp) pads, and novel cmp pad designs Methods for producing in-situ grooves in CMP pads are provided. In general, the methods for producing in-situ grooves comprise the steps of patterning a silicone lining, placing the silicone lining in, or on, a mold, adding CMP pad material to the silicone lining, and allowing the CMP pad to solidify. ... 12/29/05 - 20050287940 - Inlaid polishing pad and method of producing the same A surface treatment or a two-step injection molding is used to make an inlaid polishing pad. A surface of the inlaid polishing pad has areas of different rigidity to control the rigidity and compressibility of the inlaid polishing pad. Furthermore, methods of making such an inlaid polishing pads are also ... 10/13/05 - 20050227599 - Conversion pad with moisture barrier A conversion pad for attaching an abrasive article to a sanding tool includes a supporting layer comprising a backing material and a moisture barrier arranged on at least a portion of the supporting layer, thereby to protect the backing material from moisture, and a layer of attachment material affixed to ... 07/14/05 - 20050153643 - Polyelectrolyte dispensing polishing pad A polyelectrolyte dispensing polishing pad, a process for its production and a method of polishing, e.g., chemical mechanical polishing (CMP), a substrate such as a semiconductor wafer, are provided. The pad is usable for CMP planarization of an oxide or metal layer on the wafer. The pad has a polishing ... 07/14/05 - 20050153642 - Method of producing brush-like grind stone, the brush-like grind stone, and brush for grind machine In the manufacture of a brush-shaped grindstone (3), embedding holes (310) are formed in a grinding element holding surface (311) of a holder (31) in mutually separated positions. A base end side of a plurality of wire-shaped grinding elements (32), formed such that a composite yarn composed of inorganic filaments ... ### FreshPatents.com Support |