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Abrading > Accessory > Tool Cleaner Tool CleanerTool Cleaner patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.02/22/07 - 20070042691 - Polishing pad cleaner and chemical mechanical polishing apparatus comprising the same A polishing pad cleaner of a chemical mechanical polishing apparatus throughly and efficiently cleans the polishing pad of the apparatus. The head of the polishing pad cleaner includes a nozzle support plate, a plurality of nozzles mounted to the nozzle support plate, and extending from the bottom of the nozzle ... 01/11/07 - 20070010182 - Belt sander eraser attachment A Belt Sander Eraser Attachment is disclosed. The attachment is configured to be attached to a conventional belt sander such that it provides the operator with the ability to remove built up sawdust and the like from the sanding belt. The device removably replaces the conventional front handle on a ... 10/19/06 - 20060234610 - Apparatus for conditioning chemical-mechanical polishing pads An apparatus for conditioning a polishing pad, or conditioner, includes a supporting substrate and abrasive elements. The abrasive elements of the conditioner are used to condition a polishing pad to be used in abrasive, or at least partially mechanical, semiconductor substrate treatment processes, such as chemical-mechanical polishing or chemical-mechanical planarization ... 09/21/06 - 20060211350 - Truing tool advancer jig A truing tool advancer jig is a unit comprising three parts: a jig body; a feed screw; and a clamping screw. The jig body is mounted on the universal support of a grinder and securely positioned thereon by adjustment of the clamping screw. A truing tool is mounted on the ... 06/15/06 - 20060128288 - Conditioner for chemical mechanical planarization pad The present invention provides a conditioner for CMP pad required for global planarization of wafer to achieve high integration of a semiconductor element. The conditioner for CMP pad includes a metal substrate having abrasive particles fixed thereto, a plurality of abrasive particles fixed to the metal substrate, and a layer ... 04/13/06 - 20060079162 - Cmp conditioner A CMP conditioner is provided in which diamond grit that is adhered to a conditioning surface so as to face and be in contact with a polishing pad of a CMP apparatus is adhered such that 111 surfaces of crystal surfaces of the diamond grit are substantially parallel with the ... 03/02/06 - 20060046624 - Method for manufacturing grindstone corrector and grindstone, and grindstone corrector, and grindstone The present invention is to increase the flatness of the correcting surface of a grindstone corrector and the grinding surface of the grindstone, thereby enabling to give excellent sharpness to a cutting tool or the like. The present invention is characterized in that a plate-glass is used as a base ... 09/29/05 - 20050215188 - Cmp pad conditioner having working surface inclined in radially outer portion A CMP pad conditioner including: (a) a disk-shaped substrate having a working surface which is provided by one of its axially opposite end surfaces and which is to be brought into contact with the CMP pad; and (b) abrasive grains which are fixed to the working surface. The substrate includes ... ### FreshPatents.com Support |