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Abrading > Machine > Rotary Tool > Rotary Disk > Work Rotating > Rotary Work Holder > Planar Surface Abrading

Planar Surface Abrading

Planar Surface Abrading patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.

07/20/06 - 20060160479 - Carrier head for thermal drift compensation
Systems and apparatus providing a carrier head for chemical mechanical polishing are described. The carrier head includes a base, a support structure attached to the base, a retaining structure attached to the base, and a connector attached to the base and the retaining structure. The support structure includes a receiving ...

06/15/06 - 20060128286 - Polishing apparatus
A polishing apparatus according to the present invention has a polishing surface (101), a top ring (1) for holding a semiconductor wafer (W), and a top ring shaft (11) for pressing the top ring (1) against the polishing surface (101). The top ring (1) has a retainer ring (3) for ...

05/11/06 - 20060099893 - Retainer and wafer polishing apparatus
When a wafer is pressed on a rotating polishing pad and its surface is polished, a retainer retains the periphery of the wafer to prevent the wafer from being detached from the polishing pad. The retainer includes a first ring which surrounds the wafer and contacts the polishing pad and ...

06/30/05 - 20050142993 - Multi-chamber carrier head with a flexible membrane
A carrier head that has a base assembly and a flexible membrane. The flexible membrane has a generally circular main portion with a lower surface that provides a substrate-mounting surface and a plurality of concentric annular portions extending from the main portion and secured to the base assembly. The volume ...



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