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Semiconductor Device Manufacturing: Process > Masking MaskingMasking patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.07/27/06 - 20060166518 - Subtractive-additive edge defined lithography A subtractive-additive, differential lithography technique capable of generating sub-half micron geometries using a larger feature parent mask is described. The basic technique is defect tolerant with respect to electrical shorting, can fabricate T-shaped conductors of optimum geometry to minimize electrical RC time constant, and can be extended to very small, ... ### FreshPatents.com Support |