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Semiconductor Device Manufacturing: Process > Forming Bipolar Transistor By Formation Or Alteration Of Semiconductive Active Regions > Having Heterojunction > Forming Inverted Transistor Structure Forming Inverted Transistor StructureForming Inverted Transistor Structure patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.03/23/06 - 20060063339 - Multi-bit stacked-type non-volatile memory and manufacture method thereof The present invention discloses a multi-bit stacked-type non-volatile memory having a spacer-shaped floating gate and a manufacturing method thereof. The manufacturing method includes forming a patterned dielectric layer containing arsenic on a semiconductor substrate, wherein the patterned dielectric layer defines an opening as an active area. A dielectric spacer is ... 02/23/06 - 20060040455 - Methods of forming integrated circuits, and dram circuitry memory cells This invention includes methods of forming integrated circuits, and includes DRAM circuitry memory cells. In one implementation, a method of forming an integrated circuit includes forming a trench isolation mask over a semiconductor substrate. The trench isolation mask defines an active area region and a trench isolation region. An ion ... 02/23/06 - 20060040454 - Semiconductor devices having dram cells and methods of fabricating the same A semiconductor device comprises bit line landing pads and storage landing pads disposed on both sides of the bit line landing pads overlying a substrate. A bit line interlayer insulating layer overlies the bit line and storage landing pads. A plurality of bit line patterns are disposed on the bit ... ### FreshPatents.com Support |