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Semiconductor Device Manufacturing: Process > Making Device Or Circuit Responsive To Nonelectrical Signal > Responsive To Electromagnetic Radiation > Including Integrally Formed Optical Element (e.g., Reflective Layer, Luminescent Layer, Etc.) > Color Filter Color FilterColor Filter patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.01/11/07 - 20070010042 - Method of manufacturing a cmos image sensor The present invention relates to the method of manufacturing an image sensor, the method comprising providing a semiconductor substrate, which comprises a pixel array area and a logic area, a plurality of the photodiodes are formed on the semiconductor substrate of the pixel array area, a multilevel interconnect process is ... 12/28/06 - 20060292735 - Methods for creating gapless inner microlenses, arrays of microlenses, and imagers having same Methods of fabricating a microlens and/or array of microlenses used to focus light on photosensors, by forming a protective coating over a microlenses precursor material, and etching the protective coating and microlens precursor material to obtain a predetermined shape. ... 12/28/06 - 20060292734 - Method for manufacturing cmos image sensor Disclosed is a CMOS image sensor and a method for manufacturing a CMOS image sensor. The method includes: (a) forming a resist film on a semiconductor substrate comprising a light sensing part, a protecting layer over the light sensing part, and an exposed bonding pad; (b) forming a color filter ... 12/28/06 - 20060292733 - Method of manufacturing cmos image sensor Provided is a manufacturing method of a CMOS image sensor. The method includes forming an interlayer insulating layer, a color filter layer, and a planarizing layer. A first photoresist is applied on the planarizing layer, and patterning of the first photoresist is performed using a first mask to form a ... 12/07/06 - 20060275944 - Cmos image sensor and method for fabricating the same A CMOS image sensor and a method of fabricating the same are provided. The CMOS image sensor can incorporate one or more photodiodes formed on a substrate at a regular interval, an interlayer insulating layer formed on the substrate; one or more trenches in the interlayer insulating layer at predetermined ... 09/21/06 - 20060211164 - Color filter substrate manufacturing method A method of manufacturing a color filter substrate includes providing a base, forming a reflective film over the base, forming a plurality of banks on the reflective film between such that at least one of the banks has a transmissive portion and a non-transmissive portion, and forming a plurality of ... 08/17/06 - 20060183266 - Method of fabricating cmos image sensor A method of fabricating an image sensor includes the steps of sequentially stacking a metal layer and a nitride layer over a semiconductor substrate divided into an active area and a pad area; forming a metal pad on the pad area by selectively patterning the nitride layer and the metal ... 08/10/06 - 20060177959 - Microfeature workpieces having microlenses and methods of forming microlenses on microfeature workpieces Microfeature workpieces having microlenses and methods of forming microlenses on microfeature workpieces are disclosed herein. In one embodiment, a method for forming microlenses includes forming a plurality of shaping members on a microfeature workpiece between adjacent pixels, reflowing the shaping members to form a shaping structure between adjacent pixels, depositing ... 08/03/06 - 20060172452 - Detector A detector includes a CCD arrangement having at least one CCD, and a focusing device. The focusing device focuses spectrally separated light onto the CCD arrangement. The focusing device is located in an optical path before the CCD arrangement, and includes a microlens arrangement having at least one microlens. ... 06/29/06 - 20060141660 - Cmos image sensor and method for fabricating the same A CMOS image sensor and a method for fabricating the same prevent a lifting phenomenon of a microlens. The CMOS image sensor includes a semiconductor substrate structure in which at least one photodiode is disposed, an insulating interlayer formed on the semiconductor substrate structure, a patterned metal layer formed on ... 03/16/06 - 20060057765 - Image sensor including multiple lenses and method of manufacture thereof A device includes an image sensing element. The device also includes a Silicon Dioxide (SiO2) layer, located over the image sensing element, exhibiting a first index of refraction. The device further includes a first lens, located over the SiO2 layer, exhibiting a second index of refraction greater than the first ... 03/16/06 - 20060057764 - Image sensor and fabricating method thereof An image sensor comprising an image sensing device layer, a silicon-on-insulator (SOI) layer, an optical device array and a substrate is provided. The SOI layer has a first surface and a second surface. The image sensing device layer is formed on the first surface of the SOI layer. The optical ... 03/02/06 - 20060046341 - Method for fabricating a cmos image sensor A method for fabricating a complementary metal-oxide semiconductor (CMOS) image sensor is disclosed. An example method forms a metal pad in a pad area of a substrate having an active area and a pad area defined thereon, forms a protective layer on an entire surface of the substrate including the ... 01/26/06 - 20060019426 - Method for manufacturing cmos image sensor having microlens therein with high photosensitivity The method for manufacturing a CMOS image sensor is employed to prevent bridge phenomenon between adjacent microlenses by employing openings between the microlenses. The method includes the steps of: preparing a semiconductor substrate including isolation regions and photodiodes therein obtained by a predetermined process; forming an interlayer dielectric (ILD), metal ... 01/26/06 - 20060019425 - Method for fabricating cmos image sensor A method for fabricating a CMOS image sensor improves the characteristics of device by preventing a pad from being contaminated without damaging a micro-lens. The method includes steps of forming a device protection layer on a semiconductor substrate including at least one photo-sensing device and at least one metal pad ... 09/15/05 - 20050202586 - Production method of microlens array, liquid crystal display device and production method thereof, and projector A method of producing a microlens array includes a patterning step of forming a first optical resin layer having a first refractive index on a transparent substrate and forming a plurality of microlens planes arrayed in a two-dimensional pattern on the front surface of the first optical resin layer; a ... 09/01/05 - 20050191784 - Method of and apparatus for producing micro lens and micro lens The steps of producing a micro lens comprises the steps of forming a resin layer on a substrate in a desired pattern, causing the resin layer to absorb from its surroundings solvent which dissolves the resin so that the resin layer has fluidity and the surface of the resin layer ... ### FreshPatents.com Support |