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Semiconductor Device Manufacturing: Process > Including Control Responsive To Sensed Condition > Optical Characteristic Sensed > Chemical Etching Chemical EtchingChemical Etching patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.02/22/07 - 20070042509 - Detecting endpoint using luminescence in the fabrication of a microelectronics device The present invention provides a method of detecting an endpoint of the removal of a material from a microelectronics substrate. This embodiment includes removing at least a portion of an overlying material 210 located over a luminescent layer 215 that is located over a microelectronics substrate 220 and using luminescence ... 09/21/06 - 20060211158 - Method and apparatus for perforating printed circuit board A method and an apparatus for perforating a printed circuit board are provided so that the processing efficiency and the board densification can be improved. In test processing, a conductor layer 50i is irradiated with a pulsed laser beam 4a whose energy density is set at a value high enough ... 07/06/06 - 20060148110 - Method for forming locos layer in semiconductor device A method for forming a LOCOS layer in a semiconductor device includes steps of oxidizing a high voltage region of the semiconductor device to form a LOCOS layer in the high voltage region; and etching the LOCOS layer according to a pattern. ... 02/02/06 - 20060024848 - Novel ultra-violet assisted anisotropic etching of pet A method for etching a substrate is described wherein a substrate is positioned in a solution of solvent and the substrate is exposed to excitation energy. The method may be applied to the production of thermocouple devices wherein the substrate is poly-ethylene-terephthalate. ... 07/21/05 - 20050158886 - Method for processing semiconductor A method of processing a semiconductor which includes providing a process gas supply unit for supplying a process gas to a sample stand to hold a sample in a process chamber and to the process chamber, successively supplying a plurality of samples of a lot to the process chamber to ... 07/21/05 - 20050158885 - Wet bench wafer floating detection system A method and system for preventing wafer breakage during wet processing is desscribed. A wet processing tank is provided wherein a wafer is to be placed within the wet processing tank. A sensor is provided within the wet processing tank wherein the sensor continuously counts bubbles formed within the wet ... 06/16/05 - 20050130331 - Dual function array feature for cmp process control and inspection CMP process control array groups are fabricated upon the surface of the wafer for viewing through an optical microscope. The array groups include a plurality of test arrays, where each array includes a plurality of projecting test features. Each of the projecting test features are formed with the same projecting ... ### FreshPatents.com Support |