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Heating > Work Chamber Having Heating Means > Work Chamber Having Gaseous Material Supply Or Removal Structure > Having Pump, Jet Or Valve Means Establishing Chamber Pressure Distinct From Ambient Having Pump, Jet Or Valve Means Establishing Chamber Pressure Distinct From AmbientHaving Pump, Jet Or Valve Means Establishing Chamber Pressure Distinct From Ambient patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.04/20/06 - 20060084023 - Method of and auxiliary cleaner for use in cleaning a diffusion furnace of semiconductor manufacturing equipment A diffusion furnace of semiconductor manufacturing equipment is cleaned efficiently with a cleaning gas (ClF3) by using an auxiliary cleaner. The auxiliary cleaner is inserted into an inner tube of the wafer diffusion furnace. The auxiliary cleaner has a cylindrical body that occupies a central region of the interior of ... ### FreshPatents.com Support |