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Radiation Imagery Chemistry: Process, Composition, Or Product Thereof > Effecting Frontal Radiation Modification During Exposure, E,g., Screening, Masking, Stenciling, Etc. Effecting Frontal Radiation Modification During Exposure, E,g., Screening, Masking, Stenciling, Etc.Effecting Frontal Radiation Modification During Exposure, E,g., Screening, Masking, Stenciling, Etc. patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.07/20/06 - 20060160037 - Automated sub-field blading for leveling optimization in lithography exposure tool A method of exposing images on a wafer having varying topography during lithographic production of microelectronic devices. The method initially includes determining topography of a wafer, dividing the wafer into two or more separate regions based on the wafer topography, and determining desired focus distance for exposing a desired image ... 07/20/06 - 20060160036 - Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method Disclosed is a near-field exposure method and apparatus, a near-field exposure mask, and a device manufacturing method, wherein exposure is carried out on the basis of near field light. Specifically, the near-field exposure method disclosed is arranged so that a pressure difference is applied to between a front face and ... 06/08/06 - 20060121396 - Method for exposing a substrate with a beam A method is disclosed in which the speed of the substrate carrier system 50 is changed during exposure depending on the exposure pattern density. The substrate carrier system 50 defines a track curve 60, whereby the exposure pattern is exposed within a band (621, 622, . . . 623) around ... 05/25/06 - 20060110694 - Novel method and systems to print contact hole patterns A method for forming an arbitrary pattern of sub-micron contact holes in a substrate using a combination of interferometric photolithography and optical photolithography with a non-critical mask. The substrate is covered with a photosensitive material and is exposed by a standing wave interference pattern produced by the superposition of two ... 03/02/06 - 20060046213 - Method for optimizing wafer edge patterning A method of printing an image on a wafer. The method includes the steps of printing a main image, wherein the main image includes fields which are fully on the wafer, and printing an alternate image, wherein the alternate image includes fields which are only partially on the wafer. The ... 03/02/06 - 20060046212 - Integrated circuit lithography A method of generating an imaging pattern using a mask having a mathematical (e.g., Fourier-space) representation of an imaging pattern in an imaging plane. In addition to the foregoing, other method aspects are described in the claims, drawings, and text forming a part of the present application. Other methods and ... 12/15/05 - 20050277071 - Method for controlling an intensity of an infrared source used to detect objects adjacent to an interactive display surface In an interactive display table that uses infrared (IR) light to detect an object on an interactive display surface, IR light sources within the table are controlled in response to the level of ambient IR light passing through the interactive display surface. Light from the IR light sources that is ... 10/06/05 - 20050221238 - Use of a reticle absorber material in reducing aberrations A lithographic apparatus comprising a patterning reticle which has an aluminium absorber layer which improves imaging by eliminating or at least minimising the formation of aberrations in a patterned beam. ... 08/18/05 - 20050181314 - System and method for maskless lithography using an array of sources and an array of focusing elements A maskless lithography system is disclosed that includes an array of focusing elements, each of which focuses an energy beam from an array of sources into an array of focal spots in order to create a permanent pattern on an adjacent substrate. ... 08/04/05 - 20050170296 - Lithographic apparatus and device manufacturing method A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second ... ### FreshPatents.com Support |