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Radiation Imagery Chemistry: Process, Composition, Or Product Thereof > Imaging Affecting Physical Property Of Radiation Sensitive Material, Or Producing Nonplanar Or Printing Surface - Process, Composition, Or Product > Finishing Or Perfecting Composition Or Product Finishing Or Perfecting Composition Or ProductFinishing Or Perfecting Composition Or Product patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.05/24/07 - 20070117051 - Trimming a mems device to fine tune natural frequency A mirror device includes a mirror, an anchor, and a spring coupling the mirror to the anchor. The anchor and/or mirror can define one or more rows of holes adjacent to the coupling location of the spring. The natural frequency of the device can be adjusted by removing material between ... 05/03/07 - 20070099129 - Developing method and developing apparatus A developing method is used for subjecting a light-exposed resist film disposed on a wafer W to a developing process by a developing solution and a rinsing process by a rinsing liquid. In a state where the resist film on the wafer W is wet with the developing solution or ... 03/22/07 - 20070065760 - Substrate processing apparatus and substrate processing method A substrate processing apparatus has at least one of a developing processing apparatus that supplies a developing solution as a processing solution to a non-processed substrate to process and a resist coating processing apparatus that supplies a resist solution as a processing solution to the non-processed substrate. A transfer mechanism ... 03/15/07 - 20070059651 - Yield and line width performance for liquid polymers and other materials Systems and methods are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge ... 03/15/07 - 20070059650 - Method for manufacturing semiconductor device There are provided a developing solution, which can develop a photosensitive composition in a simple manner while maintaining satisfactory sensitivity and resolution, and a method for pattern formation using said developing solution. This developing solution comprises a compound containing a hydrophilic group(s) selected from the group consisting of an amine-N-oxide ... 02/01/07 - 20070026346 - Cleaning solution for lithography Provided is a cleaning solution for lithography comprising (A) from 5 to 100% by mass of a lower alkyl ketone and (B) from 95 to 0% by mass of γ-butyrolactone which is a cleaning solution capable of exhibiting universally good cleaning power to a photoresist of an ArF formulation, for ... 01/11/07 - 20070009841 - Semiconductor fabrication apparatus and pattern formation method using the same The semiconductor fabrication apparatus of this invention includes an exposure section provided within a chamber for exposing a design pattern on a resist film applied on a wafer, and a liquid recycle section for supplying, onto the wafer, a liquid for use in immersion lithography for increasing the numerical aperture ... 11/23/06 - 20060263730 - Surface treatment of a dry-developed hard mask and surface treatment compositions used therefor A surface treatment process includes rinsing a substrate after a dry development process to remove residual resist material prior to patterning a hard mask layer. An amorphous carbon hard mask is dry developed and thereafter, the surface treatment includes an aqueous ammonium hydroxide and hydrogen peroxide composition. While the composition ... 11/16/06 - 20060257798 - Alkaline developer for radiation sensitive compositions The invention relates to an alkaline developer for irradiated radiation sensitive compositions, which developer is based on water, comprises at least one alkaline reacting silicate and has a pH of at least 11, characterized in that the developer comprises at least a non-ionic surfactant, wherein the hydrophobic part is an ... 11/02/06 - 20060246382 - Method for preparing semiconductor device A method for reducing a photoresist pattern wherein, a photoresist film is formed, an aqueous composition comprising water and a surfactant is sprayed, and the pattern is treated by thermal energy to reduce the photoresist pattern uniformly and vertically, thereby improving an etching bias and enhancing process margins. ... 08/31/06 - 20060194154 - Developer composition wherein, p and q are defined as in the description; wherein with respect to 100 parts by weight of water, the aforementioned component (a) is 0.1˜10 parts by weight, the aforementioned component (b) is 0.1˜10 parts by weight, the aforementioned component (c) is 0.1˜20 parts by weight, and the aforementioned ... 07/13/06 - 20060154187 - Development of radiation-sensitive elements An aqueous alkaline developer for use with an imaged lithographic printing precursor comprises an aqueous alkaline medium, sodium metasilicate, a steric or electrosteric stabilizer, and a rinse aid or a phase stabilizer. It is suited for developing a lithographic printing precursor comprising, on a substrate, a coated and dried layer ... 07/13/06 - 20060154186 - Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings An aqueous-based composition and process for removing hardened photoresist and/or bottom anti-reflective coating (BARC) material from a substrate having same thereon. The aqueous-based composition includes at least one chaotropic solute, at least one alkaline base, and deionized water. The composition achieves high-efficiency removal of hardened photoresist and/or BARC material in ... 06/01/06 - 20060115774 - Method for reducing wafer charging during drying A novel method for eliminating or reducing the accumulation of electrostatic charges on semiconductor wafers during spin-rinse-drying of the wafers is disclosed. The method includes rinsing a wafer; applying an ionic solution to the wafer; and spin-drying the wafer. During the spin-drying step, the ionic solution neutralizes electrostatic charges on ... 05/25/06 - 20060110690 - Treating liquid for photoresist removal, and method for treating substrate Disclosed are a treating liquid for photoresist removal, containing (a) an oxidizing agent (e.g., aqueous hydrogen peroxide), (b) at least one selected from alkylene carbonates and their derivatives (e.g., propylene carbonate), and (c) water; and a method for treating with the treating liquid a substrate having a photoresist film deteriorated ... 05/04/06 - 20060093970 - Combinations of preservatives and sequestrants to avoid formation of isonitrile malodor The present invention relates to a developer for photographic materials comprising at least one antioxidant and at least one polyvalent metal ion sequestrant, wherein the developer has reduced malodor. ... 02/16/06 - 20060035176 - Photoresist stripping solution and a method of stripping photoresists using the same A photoresist stripping solution comprising (a) a carboxyl group-containing acidic compound, (b) at least one basic compound (for example, monoethanolamine, tetraalkylammonium) selected from among alkanolamines and specific quaternary ammonium hydroxides, (c) a sulfur-containing corrosion inhibitor and (d) water, and having a pH value of 3.5-5.5; and a method of stripping ... 01/19/06 - 20060014110 - Photoresist stripping solution and a method of stripping photoresists using the same A photoresist stripping solution comprising (a) a specified quaternary ammonium hydroxide, such as tetrabutylammonium hydroxide, tetrapropylammonium hydroxide, methyltributylammonium hydroxide or methyltripropylammonium hydroxide, (b) a water-soluble amine, (c) water, (d) a corrosion inhibitor and (e) a water-soluble organic solvent, the compounding ratio of component (a) to component (b) being in the ... 12/29/05 - 20050287481 - Liquid developer and image forming apparatus using same A liquid developer that comprises a colorant and a liquid for dispersing the colorant and serves to develop the latent image by causing the colorant to adhere to the latent image on the latent image carrier. The liquid comprises a first liquid comprising a photocurable liquid and a second liquid ... 12/29/05 - 20050287480 - Photoresist stripper composition (Problem) It is to provide a stripper having excellent ability to suppress corrosion or damage to the copper wiring or the low-k film, and having excellent photoresist residue removability after ashing. (Solution) The invention provides a photoresist stripper composition characterized in containing salts of at least two different inorganic acids, ... 12/22/05 - 20050282093 - Aqueous edge bead remover The present invention relates to an aqueous based edge bead remover. ... 09/01/05 - 20050191585 - Developer agent for positive type photosensitive compound There is provided a developer agent for a positive type photosensitive compound having a near infrared wave length region laser sensitive characteristic in which a photosensitive portion of the compound exposed and reacted with a laser of the near infrared wavelength region is enabled to be dissolved in the developer ... 07/21/05 - 20050158672 - Pattern formation method In a pattern formation method of this invention, a resist film is formed on a substrate and pattern exposure is performed by selectively irradiating the resist film with exposing light. Subsequently, the resist film is developed after the pattern exposure, and the developed resist film is rinsed with an aqueous ... 07/07/05 - 20050147930 - Substrate developing method, substrate processing method and developing solution supply nozzle According to the present invention, an anti-reflective film formed under a resist film is removed in a photolithography process of a wafer without affecting the resist film. According to the present invention, in a photolithography process of a substrate, an anti-reflective film having solubility in the developing solution is formed ... 06/23/05 - 20050136362 - Method for forming images The present invention provides a method for forming images comprising the steps of imagewise exposing a negative-working image-forming material which comprises a substrate provided thereon with an image-recording layer comprising a photopolymerization initiator system sensitive to light rays whose wavelength falls within the visible to ultraviolet ranges, a polymerizable compound ... ### FreshPatents.com Support |