REGISTER now for FREE 
|
FREE patent keyword monitoring and additional FREE benefits. REGISTER now for FREE
|
|
|
Radiation Imagery Chemistry: Process, Composition, Or Product Thereof > Imaging Affecting Physical Property Of Radiation Sensitive Material, Or Producing Nonplanar Or Printing Surface - Process, Composition, Or Product > Forming Nonplanar Surface > Post Image Treatment To Produce Elevated Pattern Post Image Treatment To Produce Elevated PatternPost Image Treatment To Produce Elevated Pattern patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.12/21/06 - 20060286488 - Methods and devices for fabricating three-dimensional nanoscale structures The present invention provides methods and devices for fabricating 3D structures and patterns of 3D structures on substrate surfaces, including symmetrical and asymmetrical patterns of 3D structures. Methods of the present invention provide a means of fabricating 3D structures having accurately selected physical dimensions, including lateral and vertical dimensions ranging ... 04/27/06 - 20060088791 - Apparatus for and method of processing substrate A puddle of developer supplied from a developer discharge nozzle is placed on a substrate held stationary. Next, the substrate is held stationary for a predetermined length of time, with the puddle of developer allowed to remain on the substrate. This causes a development reaction to proceed. Subsequently, deionized water ... 01/05/06 - 20060003270 - Developing method of photoresist and developing device A developing device according to the present invention comprises a turntable, a motor for rotating the turntable and a spraying nozzle for spraying mixture of developer and nitrogen gas onto the turntable in mist form. The turntable is rotated at a rotational speed of 200 rpm by driving the motor, ... ### FreshPatents.com Support |