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Radiation Imagery Chemistry: Process, Composition, Or Product Thereof > Imaging Affecting Physical Property Of Radiation Sensitive Material, Or Producing Nonplanar Or Printing Surface - Process, Composition, Or Product > Electron Beam Imaging Electron Beam ImagingElectron Beam Imaging patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.06/07/07 - 20070128549 - Method of fabricating nanoimprint mold Provided is a method of fabricating a nanoimprint mold which can form sub-100 nm fine pattern structures. The method includes forming patterns on a first substrate using an E-beam lithography (EBL) process, and transferring the patterns formed on the first substrate to a second substrate using a nanoimprint lithography (NIL) ... 03/22/07 - 20070065756 - High sensitivity electron beam resist processing A process for producing a pattern in a radiation sensitive fluoropolymer resist, comprises depositing a layer of the radiation sensitive fluoropolymer resist on a face of a substrate. The radiation sensitive fluoropolymer resist is exposed to an electron beam to define the pattern, the resist then having an exposed fluoropolymer ... 01/04/07 - 20070003874 - Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system Methods to reduce the write time for forming mask patterns having angled and non-angled features using electron beam lithography are disclosed. In one exemplary embodiment, non-angled features of the mask pattern are formed by exposure to an electron beam. The orientation of the substrate and a path of the generally ... 08/10/06 - 20060177770 - Thin film transistor substrate and manufacturing method thereof The present invention relates to a thin film transistor (TFT) substrate and method of making such a TFT substrate. The structure of the TFT substrate helps prevent damage to signal lines in non-display areas. ... 06/29/06 - 20060141396 - Electron beam lithography method using new material An electron beam (EB) lithography method using a new material is provided. The method includes forming a thin layer using a Pb-based material; and patterning the thin layer by partially volatilizing the thin layer by irradiating electron beams. In this method, the thin layer formed of the Pb-based material is ... 05/04/06 - 20060093961 - Method of verifying electron beam data A method of verifying electron beam data used to produce a photomask comprises dividing design data for the photomask into a plurality of repetitive regions, sequentially converting the sequential regions into electron beam data, and determining whether electron beam data corresponding to a current repetitive region is substantially identical to ... 04/06/06 - 20060073416 - Mechanically robust interconnect for low-k dielectric material using post treatment In an embodiment, a trench is formed above a via from a photo resist (PR) trench pattern in a dielectric layer. The trench is defined by two sidewall portions and base portions. The base portions of the sidewalls are locally treated by a post treatment using the PR trench pattern ... 01/26/06 - 20060019199 - Charged particle beam exposure method and charged particle beam exposure device When a space, sandwiched by large patterns having a predetermined size or more, is exposed using a charged particle beam, the space sandwiched by the large patterns is exposed using a common block mask having the space and edge portions of the large patterns on both sides of the space, ... 01/12/06 - 20060008740 - Organic devices, organic electroluminescent devices and organic solar cells An organic device, including an organic compound having charge-transporting ability (i.e., transporting holes and/or electrons) and/or including organic light emissive molecules capable of emitting at least one of fluorescent light or phosphorescent light, has a charge transfer complex-contained layer including a charge transfer complex formed upon contact of an organic ... 10/06/05 - 20050221229 - Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis are provided. One method for measuring a characteristic of a substrate includes removing a portion of a feature on the substrate using an electron beam to expose a cross-sectional profile of a remaining portion ... 09/29/05 - 20050214683 - Method and apparatus for reforming film and controlling slimming amount thereof In a film reforming method for reforming a film layer to be reformed by irradiating electron beams thereon, the electron beams are irradiated in a state where the film layer is cooled. Further, in a slimming amount controlling method for controlling a slimming amount of a resist film layer, the ... 08/25/05 - 20050186509 - Lithographic apparatus and device manufacturing method A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a substrate, and a back-scattered electron detector constructed and arranged to detect electrons back-scattered from the alignment marker. The alignment sensor is ... ### FreshPatents.com Support |