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Radiation Imagery Chemistry: Process, Composition, Or Product Thereof > Imaging Affecting Physical Property Of Radiation Sensitive Material, Or Producing Nonplanar Or Printing Surface - Process, Composition, Or Product > Radiation Sensitive Composition Or Product Or Process Of Making > Radiation Sensitive Composition Comprising Ethylenically Unsaturated Compound Radiation Sensitive Composition Comprising Ethylenically Unsaturated CompoundRadiation Sensitive Composition Comprising Ethylenically Unsaturated Compound patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.06/07/07 - 20070128548 - Photosensitive composition comprising triazine-based photoactive compound containing oxime ester The present invention relates to a photosensitive composition comprising a triazine-based photoactive compound containing oxime ester. The photosensitive composition according to the present invention has good sensitivity, retention rate, mechanical strength, heat resistance, chemical resistance and developing durability since it contains, as photopolymerization initiator, a compound having an oxime ester ... 06/07/07 - 20070128547 - Positive resist composition A positive resist composition comprising a polymer capable of increasing its solubility in an alkali developer under action of an acid, wherein the resin comprises repeating units containing at least two special types of acetal structures separately, a compound capable of generating an acid upon irradiation with an actinic ray ... 03/01/07 - 20070048666 - Two-photon recording method, two-photon absorption recording material, two-photon absorption recording-reproduction method and optical recoding medium A two-photon recording method is provided and includes: a first step of effecting two-photon absorption to form a latent image in a two-photon absorption recording material; a second step of subjecting the two-photon absorption recording material to heat treatment by which refractive index, absorptivity or luminescence intensity is modulated according ... 02/22/07 - 20070042296 - Positive photosensitive insulating resin composition, cured product thereof, and electronic component Disclosed is a positive photosensitive insulating resin composition including: (A) an alkali soluble resin, (B) a compound having a quinonediazide group, and (C) an epoxy resin having a softening point of not lower than 30° C.; and a cured product which is obtained by curing the composition. The cured product ... 02/15/07 - 20070037096 - Photo radical generator, photo sensitive resin composition and article The invention provides a radical generator, although being a self-cleavage type initiator, which is capable of suppressing volatilization of low molecular weight decomposition materials at the time of light radiation and post-baking, and leaving no low molecular weight decomposition materials in the final product, a photosensitive resin composition and an ... 01/11/07 - 20070009834 - Photosensitive thermosetting resin composition, and photosensitive cover lay and flexible printed wiring board using the composition An object of the present invention is to provide a photosensitive thermosetting resin composition that has a long shelf life and has excellent normal temperature storage stability, has good solder heat resistance after curing, and according to which high adhesive strength can be maintained. The present invention provides a photosensitive ... 09/28/06 - 20060216644 - Method for preparing photosensitive aqueous developable coating composition A method for preparing a photosensitive aqueous developable coating composition is disclosed. The method does not involve a step of drying, pulverizing, and re-dissolving a solid polymer when preparing the coating composition. In addition, dilution of a polymerization solution by a solvent and a separate process for adjusting the viscosity ... 04/27/06 - 20060088787 - Nanocomposite negative resists for next generation lithographies The present invention provides new high resolution nanocomposite resists applicable to next generation lithographies, methods of making these novel resists, and methods of using these new resists in lithographic processes to effect state-of-the-art lithographies. New nanocomposite negative resists comprising a photoacid generating component, a styrene component, and an optional polyhedral ... 03/30/06 - 20060068327 - Lithographic printing plate precursor A lithographic printing plate precursor comprising: a hydrophilic support; a photosensitive layer containing a sensitizing dye, a polymerization initiator, a chain transfer agent, a compound having an ethylenically unsaturated double bond and a polymer binder having a crosslinkable group; and a protective layer containing an inorganic stratiform compound, in this ... 03/09/06 - 20060051707 - Conductive lithographic polymer and method of making devices using same A conductive photolithographic film and method of forming a device using the conductive photolithographic film. The method includes depositing a conductive photolithographic film on a top surface of a substrate; and patterning the conductive photolithographic film to create a desired circuit pattern using a lithographic process. The conductive photolithographic film ... 01/05/06 - 20060003260 - Chemical amplified positive photo resist composition and method for forming resist pattern To provide a chemical amplification type positive photoresist composition, which has high sensitivity, high heat resistance and high resolution (high contrast) and is capable of suppressing an undulation phenomenon, and a method for formation of a resist pattern, a chemical amplification type positive photoresist composition comprising (A) an alkali soluble ... 01/05/06 - 20060003259 - Composition sensitive to visible light wherein R1, R2, and R3 are the same or different and each represents substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, or alternatively R1 and R2 form cycloalkyl together with the adjacent carbon atom, and R4 represents lower alkyl, (b) a compound that generates an ... 12/29/05 - 20050287476 - Photocurable ink-jet ink, ink-jet image forming method and ink-jet recording apparatus using the same A photocurable composition containing a photopolymerizable compound, a photoinitiator, a compound selected from the group consisting of a deodorizer, a perfume and an antioxidant. ... 10/27/05 - 20050238998 - Photosensitive resin composition and photosensitive dry film containing the same OCH2CH2 (I) ... 10/27/05 - 20050238997 - Thermally cured undercoat for lithographic application b) a phenolic crosslinker; c) a thermal acid generator (TAG); and d) a solvent. ... 10/20/05 - 20050233248 - Planographic printing plate material and planographic printing plate preparing process R1—C(X)2—(C═O)—(Y)n—R2 Formula (1) ... 07/21/05 - 20050158662 - Adamantane derivatives and resin compositions using the same as raw material wherein R5 to R7 may be the same or different from each other and are independently a hydrogen atom, alkyl, halogen or halogen-containing alkyl, are excellent in optical properties, heat resistance and acid-dissociating property, and useful as crosslinking-type resins, optical materials such as optical fibers, light wave guides, optical disk ... 07/21/05 - 20050158661 - Resins curable with actinic energy ray, process for the production thereof, and photocurable and thermosetting resin composition wherein R1 represents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms, R2, R3 and R4 independently represent a hydrogen atom, an alkyl group of 1 to 6 carbon atoms, an aryl group, an aralkyl group, a cyano group, a fluorine atom, or a furyl group, ... 07/21/05 - 20050158660 - Solid imaging compositions for preparing polypropylene-like articles This invention discloses compositions adapted to produce, through solid imaging means, excellent quality objects having material properties that simulate the look and feel of polypropylene articles. ... 06/30/05 - 20050142491 - Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods wherein, R1 and R2 each independently represents a hydrogen atom or a linear, branched or cyclic C1-10 alkyl group in which hydrogen atoms on one or more constituent carbon atoms thereof may be partially or entirely substituted by one or more halogen atoms, or the constituent —CH2— may be substituted ... 06/16/05 - 20050130064 - Antihalation dye for negative-working printing plates Negative working imageable compositions and imageable elements comprising a layer of the imageable composition over a support are disclosed. The imageable compositions comprise a free-radical polymerizable system and an effective amount of curcumin. The curcumin is effective as an antihalation agent, but does not substantially reduce the photospeed of the ... ### FreshPatents.com Support |