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Radiation Imagery Chemistry: Process, Composition, Or Product Thereof > Imaging Affecting Physical Property Of Radiation Sensitive Material, Or Producing Nonplanar Or Printing Surface - Process, Composition, Or Product > Radiation Sensitive Composition Or Product Or Process Of Making Radiation Sensitive Composition Or Product Or Process Of MakingRadiation Sensitive Composition Or Product Or Process Of Making patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.06/07/07 - 20070128543 - Topcoats for use in immersion lithography A method of forming a top coat layer and a topcoat material for use in immersion lithography. A topcoat layer is formed on a photoresist layer from an aqueous solution that is immiscible with the photoresist layer. The topcoat layer is then rendered insoluble in neutral water but remains soluble ... 06/07/07 - 20070128542 - Recording method According to an aspect of the invention, there is provided a method of recording an image, including irradiating a CO2 laser having a wavelength of from 9 to 11 μm onto a recording material in which a recording layer and a protective layer are provided on a support in this ... 06/07/07 - 20070128541 - Materials for photoresist, negative-tone photoresist composition, method of forming resist pattern, and semiconductor device With the tendency of reducing the size of semiconductor circuit patterns, edge roughness on a resist pattern is increased when pattern dimensions required are close to the size of the resist molecules. The present invention provides a technique for preventing degradation of the device performance and negative effects over the ... 06/07/07 - 20070128540 - Photoresist resin composition, method of forming a photoresist pattern, and method of manufacturing a display substrate using the same A photoresist resin composition comprises about 10 to about 35% by weight of an acryl-based copolymer, about 5 to about 10% by weight of a quinone diazide compound, about 55 to about 80% by weight of a solvent, and about 0.01 to about 0.5% by weight of a silane-based surfactant ... 06/07/07 - 20070128539 - Composition for removing photoresist and method of forming a pattern using the same In a method of forming a pattern using a composition for removing photoresist, a layer is formed on a substrate, and then a photoresist pattern is formed on the layer. A portion of the layer exposed by the photoresist pattern is etched using the photoresist pattern as an etching mask ... 05/31/07 - 20070122745 - Planographic printing plate precursor, substrate for the same and surface hydrophilic material A planographic printing plate precursor comprises a substrate having disposed thereon a hydrophilic layer which includes hydrophilic graft chains and a crosslinked structure formed through hydrolytic polycondensation of an alkoxide of an element selected from Si, Ti, Zr and Al. An aluminum substrate for a planographic printing plate includes a ... 05/31/07 - 20070122744 - Positive-working photoresist composition and photosensitive material using same The invention discloses a chemical-amplification positive-working photoresist composition in the form of a solution which is particularly suitable for the formation, on the surface of a substrate, of a photoresist layer having a thickness of 100 to 650 nm to be in compliance with the trend toward increasing fineness of ... 05/31/07 - 20070122743 - Planographic printing plate precursor A planographic printing plate precursor includes a support having disposed thereon a recording layer containing a water-insoluble and alkali-soluble resin, a development inhibitor and an infrared absorber and exhibiting enhanced solubility in an aqueous alkali solution through light exposure. The recording layer may have either a mono-layer construction or a ... 05/31/07 - 20070122742 - Photocurable and thermosetting resin composition, dry film using the same, and cured product thereof A photocurable and thermosetting resin composition comprising (A) a carboxylic acid-containing photosensitive resin having at least one carboxyl group and at least two ethylenically unsaturated bonds in its molecule, (B) a filler, (C) a photopolymerization initiator, (D) a diluent, and (E) a compound having at least two cyclic ether groups ... 05/31/07 - 20070122741 - Resist protective coating material and patterning process A pattern-forming process uses a resist protective coating material comprising a C8-C12 ether compound as a solvent. A resist protective coating formed on a resist film is water-insoluble, soluble in an alkaline developer, and unmixable with the resist film, and thus the immersion lithography can be performed. During alkaline development, ... 05/31/07 - 20070122740 - Resist undercoat-forming material and patterning process In the lithographic multilayer resist process, a material comprising a copolymer of a hydroxy-containing vinylnaphthalene with hydroxy-free olefins is useful in forming a resist undercoat. The undercoat-forming material has a high transparency and optimum values of n and k so that it functions as an antireflective coating during short-wavelength exposure, ... 05/31/07 - 20070122739 - Planographic printing plate material and printing process Disclosed is a planographic printing plate material comprising a support and provided thereon, a hydrophilic layer and a thermosensitive image formation layer in that order, wherein the hydrophilic layer contains metal oxide particles (as light-to-heat conversion materials) having a Mohs hardness of from 6.0 to 10.0 and an average particle ... 05/31/07 - 20070122738 - Image forming material The present invention relates to an image forming material having, on a substrate, an image forming layer that includes at least (A) a novolac type phenolic resin containing phenol as a structural unit, (B) a photo-thermal converting agent, and (C) a specific ammonium compound or a specific onium salt. ... 05/31/07 - 20070122737 - Coating and developing system and coating and developing method A coating and developing system for forming a resist film on a substrate by coating the substrate with a liquid resist and developing the resist film after the resist film has been processed by immersion exposure that forms a liquid layer on the surface of the substrate is capable of ... 05/31/07 - 20070122736 - Resist protective film material and pattern formation method The invention is a protective film material for immersion lithography that enables desirable immersion lithography, can be removed simultaneously with development of a photoresist layer, and has excellent process adaptability. The invention also includes a method for forming a pattern using the material. More specifically, the invention is a protective ... 05/31/07 - 20070122735 - Optical storage device having limited-use content and method for making same The invention relates generally to optical storage devices, such as DVDs and CDs, on which compositions containing dyes are disposed so as to facilitate limited or selective use of at least a portion of the content of the optical storage devices. The invention also relates to methods of making limited-use ... 05/31/07 - 20070122734 - Molecular photoresist In one embodiment, a photoacid generator is attached to a primary resist molecule having a radius of gyration of less than about 3 nanometers, the primary molecule other than a traditional photoresist polymer. This embodiment may have increased homogeneity and decreased acid diffusion, which may increase the sensitivity of the ... 05/24/07 - 20070117045 - Chemical amplification type positive photoresist composition and resist pattern forming method The present invention provides a chemical amplification type positive photoresist composition which is excellent in storage stability as a resist solution in a bottle A novolak resin or a hydroxystyrenic resin is reacted with a crosslinking agent to give a slightly alkali-soluble or alkali-insoluble resin having such a property that ... 05/24/07 - 20070117044 - Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method A multilayer resist process comprises forming in sequence an undercoat film, an intermediate film, and a photoresist film on a patternable substrate, and effecting etching in multiple stages. A silicon-containing film forming composition is useful in forming the intermediate film serving as an etching mask, comprising a silicon-containing polymer obtained ... 05/24/07 - 20070117043 - Photoacid generators and lithographic resists comprising the same The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications. In one embodiment, the present invention provides a photoacid generator of Formula (I): ... 05/24/07 - 20070117042 - Imaging methods Methods of imaging are disclosed. Imaging compositions which are sensitive to low levels of energy are applied to a work piece. Energy is applied to the imaging compositions to cause a color or shade change such that workers may modify the work piece based on the color or shade change. ... 05/24/07 - 20070117041 - Photosensitive coating for enhancing a contrast of a photolithographic exposure In a preferred embodiment, a photosensitive coating material for use as a contrast enhancing layer (CEL) disposed at the bottom of a resist film includes a base polymer, which has no acid cleavable groups for being insoluble with respect to a developer, wherein the developer is designed to remove exposed ... 05/24/07 - 20070117040 - Water castable-water strippable top coats for 193 nm immersion lithography wherein R is an aliphatic or alicyclic radical; m and n are independently integers, and are the same or different; and p is zero or 1. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is particularly ... 05/24/07 - 20070117039 - Photosensitive resin composition, photosensitive layer using the same and photosensitive resin printing original plate The present invention is to obtain without any trouble a photosensitive resin composition, a photosensitive layer and a photosensitive resin printing original plate, which are developable with an aqueous developer, resistant to an aqueous ink and a cosolvent ink, and assured of good image reproducibility. The present invention relates to ... 05/17/07 - 20070111141 - Negative-working photosensitive resin composition and photosensitive resin plate using the same in a range of 3.5 wt % or less based on the weight of the photosensitive resin composition. A photosensitive resin plate using the photosensitive resin composition is also disclosed. By this invention, a negative-working photosensitive resin composition particularly excellent in the reproducibility of the highlight areas and the independent ... 05/17/07 - 20070111140 - Resist composition and patterning process using the same There is disclosed a resist composition which shows high sensitivity and high resolution on exposure to high energy beam, provides reduced Line Edge Roughness because swelling at the time of development is reduced, provides minor amounts of residue after development, has excellent dry etching resistance, and can also be used ... 05/17/07 - 20070111139 - Negative resist composition and patterning process A negative resist composition is provided comprising a polymer comprising recurring units having formula (1), an organic solvent, a crosslinker, and an optional photoacid generator. In formula (1), R1 and R2 are hydrogen or methyl, m is 0 or a positive integer of 1 to 5, p and q are ... 05/17/07 - 20070111138 - Photoactive compounds The present invention relates to novel photoacid generators. ... 05/17/07 - 20070111137 - Resist polymer solution and process for producing the same A resist polymer solution comprising a resist polymer containing a repeating unit decomposed by the action of an acid so as to be soluble in alkali and a repeating unit having a polar group, the resist polymer dissolved in a solvent for coating film formation, wherein the amount of impurities ... 05/17/07 - 20070111136 - Photosensitive resin composition, photosensitive element employing it, resist pattern forming method, process for manufacturing printed circuit board and method for removing photocured product The photosensitive resin composition of the invention comprises (A) a photopolymerizing compound with two or more ethylenic unsaturated bonds in the molecule and (B) a photopolymerization initiator which initiates photopolymerization reaction of the (A) photopolymerizing compound, the photosensitive resin composition being characterized in that the molecule of the (A) photopolymerizing ... 05/17/07 - 20070111135 - Positive resist composition and method of forming resist pattern using same A positive resist composition which includes a resin component (A) that exhibits increased alkali solubility under the action of acid, an acid generator component (B) that generates acid on exposure, and an organic solvent (C). The component (A) includes (i) a structural unit (a1), which contains an acid dissociable, dissolution ... 05/10/07 - 20070105046 - Photosensitive composition Photoresist compositions and methods suitable for depositing a thick photoresist layer in a single coating application are provided. Such photoresist layers are particularly suitable for use in chip scale packaging, for example, in the formation of metal bumps. ... 05/10/07 - 20070105045 - Positive resist composition and pattern formation method using the positive resist composition A positive resist composition comprises: (A) a resin that contains a repeating unit (A1) having a lactone structure and a cyano group, and increases its solubility to an alkali developer by action of an acid; (B) a compound that generates an acid by irradiation with actinic ray or radiation; and ... 05/10/07 - 20070105044 - Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern There is provided a means for forming a protective film of a fluorine-containing polymer composition excellent in smoothness and adhesiveness on a photoresist. Moreover, there is provided a means for removing the protective film without impairing the underlying photoresist. A polymer coating composition obtainable by dissolving a fluorine-containing polymer compound ... 05/10/07 - 20070105043 - Photosensitive coating for enhancing a contrast of a photolithographic exposure A photosensitive coating material for enhancing a contrast of a photolithographic exposure of a resist film formed on a substrate, including a base polymer, a solvent for facilitating deposition of the photosensitive coating material upon a surface adjacent to said resist film to form a film thereupon, an alkaline additive ... 05/10/07 - 20070105042 - Resist composition and patterning process A hydroxystyrene/indene/alkoxyisobutoxystyrene copolymer having Mw of 1,000-500,000 is formulated as a base resin to give a resist composition, typically chemically amplified positive resist composition. The composition exhibits a high resolution, a satisfactory resist pattern profile after development, and improved etch resistance and is thus suitable as a micropatterning material for ... 05/10/07 - 20070105041 - Lithographic printing plate comprising bi-functional compounds wherein Q and Z independently represent the necessary atoms to form an optionally substituted five or six membered aromatic or heteroaromatic ring. ... 05/10/07 - 20070105040 - Developable undercoating composition for thick photoresist layers The present invention relates to an undercoating composition for a photoresist comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, and a photoacid generator which produces a strong acid upon exposure to radiation, and further where the polymer is transparent at the ... 05/10/07 - 20070105039 - Dual band color forming composition A radiation image-able coating includes a first phase including a radiation curable polymer matrix and an activator disposed in the radiation curable polymer matrix, a second phase insolubly distributed in the first phase, the second phase including a color-former, and an antenna dye package distributed in at least one of ... 05/10/07 - 20070105038 - Positive resist composition and method for forming resist pattern A positive resist composition that includes a base resin component (A) and an acid generator component (B), wherein the component (A) is a copolymer that includes structural units (a-1), which are derived from an (α-lower alkyl) acrylate ester that contains an acid dissociable, dissolution inhibiting group, and also contains an ... 05/10/07 - 20070105037 - Thick film photoresist composition and method of forming resist pattern A negative thick film photoresist composition with improved alkali developability is provided. The composition comprises: (A) a resin component containing (a) from 61 to 90% by weight of a structural unit derived from a cyclic alkyl (meth)acrylate ester, and (b) a structural unit derived from a radical polymerizable compound containing ... 05/10/07 - 20070105036 - Photosensitive element, resist pattern formation method and printed wiring board production method [Chemical Formula I] ... // - 25.5≦R≦79.0 (1) - ... 05/03/07 - 20070099119 - Photosensitive composition with low yellowing under uv-light and sunlight exposure This disclosure relates to a photosensitive composition useful in preparing water-developable, relief printing plates and other photosensitive articles. The compositions comprise an unsaturated polyurethane pre-polymer, which is the reaction product of at least one polyether diol, at least one aliphatic diisocyanate, at least one hydroxyl-functionalized mono-, di- and tri-(meth)acrylate, and ... 05/03/07 - 20070099118 - Planographic printing plate precursor A positive planographic printing plate precursor includes a support having disposed thereon a lower thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound and an upper thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound, with alkali-solubility increasing under heat, wherein (i) both the upper thermosensitive layer and the lower ... 05/03/07 - 20070099117 - Sulfonamide compound, polymer compound, resist material and pattern formation method wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain ... 05/03/07 - 20070099116 - Photoconductive layer forming radiation image taking panel and radiation image taking panel A photoconductive layer for a radiation image taking panel is formed by selenium alloy containing 0.1 to 1000 molar ppm of monovalent metal and 0.1 to 1000 molar ppm of a chalcogenide element other than Se or selenium alloy containing 0.1 to 1000 molar ppm of monovalent metal and 0.1 ... 05/03/07 - 20070099115 - Photosensitive resin composition, image forming material and image forming method using thereof There is devised a novel acryl resin in which an unsaturated group introduced in an alkali soluble resin is placed at a longer distance from the resin skeleton of the alkali soluble resin, the mobility of the unsaturated group is promoted and the number of the unsaturated double bonds is ... 05/03/07 - 20070099114 - Polymer, resist composition and patterning process A polymer of which dissolution rate in an alkaline developer increases under the action of acid comprises recurring units having formulae (1) and (2) wherein R1, R2, and R4 are H or methyl, R3 is difluoromethyl or trifluoromethyl, and X is tertiary alkyl. A resist composition comprising the polymer has ... 05/03/07 - 20070099113 - Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Sulfonate salts have the formula: CF3—CH(OH)—CF2SO3−M+ wherein M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Because of inclusion within the molecule of a hydroxyl group which is a polar group, the sulfonic acids are effective for restraining the length of acid diffusion through hydrogen bond or the like. ... 05/03/07 - 20070099112 - Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process R1SO3—CH(Rf)-CF2SO3−M+ wherein R1 is alkyl or aryl, Rf is H or trifluoromethyl, and M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oximesulfonates and sulfonyloxyimides and other compounds derived from these sulfonate salts are effective photoacid generators in chemically amplified resist compositions. ... 05/03/07 - 20070099111 - Novel positive photosensitive polybenzoxazole precursor compositions A heat resistant positive-working photosensitive PBO precursor composition comprising: (a) at least one polybenzoxazole precursor polymer; (a) at least one plasticizer compound; (b) at least one solvent; wherein the amount of the plasticizer present in the composition is an amount effective to reduce the sidewall angle of imaged and cured ... 05/03/07 - 20070099110 - Organic anti-reflective coating polymer, organic anti-reflective coating composition and method for forming photoresist pattern wherein R1 is a C1-C5 linear or branched alkyl group, R2 and R3 are each independently hydrogen or methyl, X is halogen, n is a number from 1 to 5, and a, b and c, representing the mole fraction of each monomer, are each independently from about 0.1 to about ... 05/03/07 - 20070099109 - System and method for radiation imaging by in-situ particle formation A radiation image-able coating includes a curable polymer matrix, a metal complex disposed in the curable polymer matrix, wherein the metal complex is configured to form localized metallic particles when exposed to heat. ... 05/03/07 - 20070099108 - Anti-reflective coatings Novel self-crosslinking polymers are provided and which are useful in antireflective coatings to reduce outgassing. ... 05/03/07 - 20070099107 - Resin for positive resist composition, and positive resist composition using the same, laminate and method for forming resist pattern The use of a positive resist composition that includes a resin with a specific structure improves the resolution and yields a resist pattern with a favorable shape. In addition, when a resist layer is formed on either a magnetic film or a metallic oxidation prevention film formed on the magnetic ... 04/26/07 - 20070092836 - Lithographic printing plate precursor and lithographic printing method An on-press development or non-processing (non-development) type lithographic printing plate precursor capable of giving a printout image having a large lightness difference, and a lithographic printing method using this lithographic printing plate precursor are provided, a lithographic printing plate precursor comprising a support and a photosensitive-thermosensitive layer capable of recording ... 04/26/07 - 20070092835 - Photosensitive film A photosensitive film excellent in workability and making it possible, in a normal pressure laminating process, to laminate photosensitive films on the surface of substrate having a metallic surface with a reduced number of air voids generated and in a high product yield, said film comprising a support film (A), ... 04/26/07 - 20070092834 - Photoimageable, thermosettable fluorinated resists The present invention provides fluorinated, thermosettable compositions that are photoimageable and which function as low dielectric materials. Such low dielectric materials are useful as passivation resist layers in liquid crystal displays, electroluminescent displays, light emitting diodes and semiconductor manufacture. ... 04/26/07 - 20070092833 - Image recording media and image layers Imaging layers, image recording media, and methods of preparation of each, are disclosed. ... 04/26/07 - 20070092832 - Method and apparatus for controlled triggering of oxygen scavenging compositions utilizing a wrap-around shade An apparatus is provided for activating an oxygen scavenging composition that includes a plurality of UV lamps arranged in a bank and disposed in a UV chamber; the UV lamps include first and second sides through which UV light is transmittable. A series of guide rolls disposed in the UV ... 04/26/07 - 20070092831 - Radiation-absorbing polymeric materials and ophthalmic devices comprising same A radiation-absorbing polymeric material comprises units of a polymerizable UV-absorbing compound, a violet light-absorbing compound, and a monomer, and is capable of absorbing UV radiation, at least about 90 percent of light having wavelength of 425 nm, less than about 50 percent of light having wavelength of 450 nm, and ... 04/26/07 - 20070092830 - Polymeric radiation-absorbing materials and ophthalmic devices comprising same A polymeric radiation-absorbing material comprises units of a polymerizable benzotriazole-based radiation-absorbing compound and a monomer, and is capable of absorbing UV radiation, at least about 90 percent of light having wavelength of 425 nm, less than about 50 percent of light having wavelength of 450 nm, and less than about ... 04/26/07 - 20070092829 - Photosensitive coating for enhancing a contrast of a photolithographic exposure A photosensitive coating material for enhancing a contrast of a photolithographic exposure of a resist film formed on a substrate, including a base polymer, a solvent for facilitating deposition of the photosensitive coating material upon a surface adjacent to said resist film to form a film thereupon, an alkaline additive ... 04/26/07 - 20070092828 - Nir/ir curable coatings for light directed imaging An imaging medium comprises a substrate and an imaging composition disposed on the substrate. The imaging composition comprises a matrix, a thermochromic compound dispersed or dissolved in the matrix; and at least two photoinitiators dispersed or dissolved in the matrix. ... 04/26/07 - 20070092827 - Inks for use on light-activated imaging media An light activated imaging medium comprises a substrate and an imaging composition disposed on the substrate, the composition comprising a matrix and a color-forming agent within the matrix and an alloy of at least two leuco dyes, the leuco dyes having at least first and second melting points, respectively, and ... 04/19/07 - 20070087288 - Positive-working photosensitive composition and pattern forming method using the same A positive-working photosensitive composition that includes (A) a resin containing repeating units having diamantane structures and capable of decomposing under action of an acid to increase solubility in an alkali developer, (B) a compound capable of generating a specific organic acid upon irradiation with an actinic ray or radiation, and ... 04/19/07 - 20070087287 - Amine compound, chemically amplified resist composition and patterning process Chemically amplified resist compositions comprising amine compounds having a fluorinated alkyl group offer an excellent resolution and a precise pattern profile and are useful in microfabrication by KrF, ArF, F2, EUV, EB or X-ray lithography. They are also effective in the immersion lithography. ... 04/19/07 - 20070087286 - Compositions and processes for photolithography Overcoating layer compositions that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging. ... 04/19/07 - 20070087285 - Top antireflective coating composition with low refractive index at 193nm radiation wavelength Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and a refractive index value n of less than 1.5 with respect to a radiation wavelength of 193 nm have been found which are especially useful as top antireflective coatings in 193 nm dry lithographic processes. Polymers ... 04/12/07 - 20070082292 - Water-soluble material, chemically amplified resist and pattern formation method using the same A water-soluble material used for forming a water-soluble film on a chemically amplified resist film includes a water-soluble polymer, an acid generator and a compound constructing an inclusion compound for incorporating the acid generator. Also, in a pattern formation method, a chemically amplified resist film is formed on a substrate, ... 04/12/07 - 20070082291 - Lithographic printing plate precursor and lithographic printing method An image-recording material containing (A) a compound having a specific partial structure and at least one group selected from an acid group having a pKa of 11 or less, the derivative of the acid group and a group capable of generating the acid group, a lithographic printing plate precursor having ... 04/12/07 - 20070082290 - Planographic printing plate precursor The invention provides a planographic printing plate precursor including a photosensitive layer containing an infrared absorbent, a polymerization initiator, a polymerizable compound, and a binder polymer, and a protective layer containing an inorganic layered compound, formed in this order on a surface of a hydrophilic aluminum support, wherein at least ... 04/12/07 - 20070082289 - Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition A photosensitive composition comprising a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation; a pattern forming method using the photosensitive composition; a compound having a specific structure; and a compound capable of generating a compound having a specific structure upon irradiation ... 04/05/07 - 20070077520 - Recording medium, planographic printing plate using the same and production method thereof The invention provides a recording medium for producing a direct-writing planographic printing plate comprising: a support; a hydrophilic layer; and an ink receiving layer laminated in this order, wherein the ink receiving layer contains one or more compounds selected from the group consisting of organic fluorine compounds having a fluoroalkyl ... 04/05/07 - 20070077519 - Pattern forming method and resist composition used therefor A pattern forming method comprising: coating a resist composition on a substrate; adjusting a rotational speed of the substrate within a range of 500 to 1,500 rpm so that a film thickness of the resist composition coated is adjusted; and subjecting the resist composition to drying, exposure and development, wherein ... 04/05/07 - 20070077518 - Infrared-sensitive planographic printing plate precursor Provided is an infrared-sensitive planographic printing plate precursor, including a supporting plate, a recording layer formed on one face of the supporting plate, the recording layer containing a water-insoluble and alkali-soluble resin and an infrared absorbent and forming an image by irradiation of infrared ray, and an organic polymer layer ... 04/05/07 - 20070077517 - Novel tarc material for immersion watermark reduction A coating material disposed overlying a photo sensitive layer during an immersion lithography process includes a polymer that is substantially insoluble to an immersion fluid and an acid capable of neutralizing a base quencher from the photo sensitive layer. ... 04/05/07 - 20070077516 - Water mark defect prevention for immersion lithography A photoresist material having a polymer that turns soluble to a base solution in response to reaction with acid. The material includes a photo-acid generator (PAG) that decomposes to form acid in response to radiation energy and a quencher capable of neutralizing acid and having a reduced mobility. The photoresist ... 04/05/07 - 20070077515 - Reimageable printing member A reimageable printing member such as for use in flexography, includes a layer having a multiplicity of holes, wherein the holes include therein a dimension change material and a printing material upon the dimension change material. Thus, the holes house vertically expandable units, the top portion of which is capable ... 04/05/07 - 20070077514 - Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board [wherein X1, X2, X3, X4, X5 and X6 each independently represent a CH group, CCH3 group, CC2H5 group or nitrogen, Y1, Y2, Y3 and Y4 each independently represent optionally substituted aryl, and Y5 represents optionally substituted arylene]. ... 04/05/07 - 20070077513 - Positive-working lithographic printing plate precursor A positive-working lithographic printing plate precursor is disclosed which comprises (i) a grained and anodized aluminum support having a hydrophilic surface and (ii) a heat-sensitive oleophilic coating provided on the hydrophilic surface, wherein said coating comprises (a) a hydrophobic polymer which is soluble in an aqueous alkaline developer and (b) ... 04/05/07 - 20070077512 - Resist composition for electron beam or euv A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, as the principal component, one or more compounds selected from ... 03/29/07 - 20070072122 - Photosensitive polymer composition, method of forming relief patterns, and electronic equipment A photosensitive polymer composition, having (a) a polymer selected from polyimide precursors and polyimides having an acid group protected by a protecting group and having no amino group (—NH2) at the end; and (b) a compound that generates an acid when exposed to light and capable of deprotecting the protecting ... 03/29/07 - 20070072121 - Positive resist composition and pattern forming method using the same in the formula (Ia), AR represents an aromatic group, and X1 represents a group having a carbon number of 5 or more and being capable of decomposing under the action of an acid, and in the formula (A1), m represents an integer of one of 1 and 2. ... 03/29/07 - 20070072120 - Method for producing resin for chemically amplified positive resist A method for producing a resin for a chemically amplified positive resist by polymerizing at least one monomer and/or at least one oligomer which is polymerized to provide a resin for a chemically amplified positive resist, in which two or more polymerization initiators are used to initiate the polymerization, thereby ... 03/29/07 - 20070072119 - Lithographic printing plate precursor and lithographic printing method A lithographic printing plate precursor comprising a support and an image-recording layer containing at least one infrared absorbing agent of a cyanine dye in which a HOMO energy level of each of substituents present on both terminal nitrogen atoms is −10.0 eV or higher. ... 03/29/07 - 20070072118 - Positive photosensitive composition and pattern forming method using the same wherein R1 represents a hydrogen atom or an alkyl group, m represents an integer of from 1 to 30, n represents an integer of from 0 to 3, and p represents an integer of from 0 to 5. ... 03/29/07 - 20070072117 - Positive resist composition and pattern forming method using the same A positive resist composition comprising: a compound having at least two acid-decomposable groups, an aromatic ring and an alkylene or cycloalkylene chain and having a molecular weight of 2,000 or less, of which solubility in an alkali developer increases under an action of an acid; and a compound represented by ... 03/29/07 - 20070072116 - Lithographic printing plate precursor and lithographic printing method A lithographic printing plate precursor comprising a hydrophilic support, an undercoat layer and a laser-sensitive photopolymerizable layer, wherein the undercoat layer contains a copolymer containing (a1) a repeating unit having at least one ethylenically unsaturated bond and (a2) a repeating unit having at least one functional group capable of interacting ... 03/29/07 - 20070072115 - Positive resist compositions and patterning process A polymer is obtained from (meth)acrylate having a bridged ring lactone group, (meth)acrylate having an acid-labile leaving group, and (meth)acrylate having a hydroxynaphthyl pendant. A positive resist composition comprising the polymer as a base resin, when exposed to high-energy radiation and developed, exhibits a high sensitivity, a high resolution, and ... 03/29/07 - 20070072114 - Infrared-sensitvive planographic printing plate precursor According to an aspect of the invention, there is provided an infrared-sensitive planographic printing plate precursor including: a support; a recording layer on one surface of the support, which recording layer contains a water-insoluble and alkali-soluble resin and an infrared absorber, and is capable of forming an image by infrared ... 03/29/07 - 20070072113 - Photosensitive composition, and lithographic printing plate precursor and image-recording method using the same A photosensitive composition comprising: a compound having two or more mercapto groups directly connected to a hetero ring; a hexaarylbiimidazole compound; a sensitizing dye; and a polymerizable compound having an ethylenically unsaturated double bond. ... 03/29/07 - 20070072112 - Coating compositions In one aspect, coating compositions are provided that comprise a component a component that comprises one or more silicon, antimony, aluminum, yttrium, cerium, lanthanum, tin, titanium, zirconium, hafnium, indium or zinc compounds. In another aspect, coating compositions are provided that comprise a plurality of discrete particles. Preferred coating compositions of ... 03/29/07 - 20070072111 - Antireflective hardmask composition and methods for using same (b) a crosslinking component; and (c) an acid catalyst. ... 03/29/07 - 20070072110 - Reimageable paper An image forming medium includes a substrate and a mixture including a photochromic material and a solvent wherein the mixture is coated on the substrate, such that the photochromic material exhibits a reversible homogeneous-heterogeneous transition between a colorless state and a colored state in the solvent. ... 03/29/07 - 20070072109 - Thick film or ultrathick film responsive chemical amplification type photosensitive resin composition [Solving means] A chemically amplified photosensitive resin composition including an alkali soluble novolak resin (A), a resin or compound (B) which in itself is insoluble or slightly soluble in alkali, but becomes soluble in alkali by the action of an acid, that is acid generating agent (C), and a photosensitizing ... 03/22/07 - 20070065754 - Planographic printing plate material The planographic printing plate material has a support and provided thereon, a photopolymerizable light sensitive layer and a protective layer in that order. The protective layer contains a polyvinyl alcohol derivative A having a saponification degree of 90 to 100 mol % and a solubility of 20 to 200 g ... 03/22/07 - 20070065753 - Positive resist composition for immersion exposure and pattern forming method using the same A positive resist composition, comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin having a repeating unit containing at least one alicyclic structure, of which solubility in an alkali developer increases under an action of an acid; and (C) an ... 03/22/07 - 20070065752 - Positive resist composition and pattern forming method using the same A positive resist composition comprising: at least one compound selected from a compound capable of generating an acid represented by the formula (I) as defined herein upon irradiation with actinic rays or radiation and a compound capable of generating an acid represented by the following formula (II) upon irradiation with ... 03/22/07 - 20070065751 - Water-soluble photopolymer composition for flexographic printing and water-soluble photosensitive original printing plate for flexographic printing A water-soluble photopolymer composition for flexographic printing is provided which can be water developed and can form a photosensitive original printing plate for flexographic printing having a good flexibility and impact resilience as well as an adequate Shore hardness value. The water-soluble photopolymer composition for flexographic printing contains a water-soluble ... 03/22/07 - 20070065750 - Process for highly purified polyhedral oligomeric silsesquioxane monomers A synthesis process for polyhedral oligomeric silsesquioxanes that produces in high yield a low resin content, solvent free, and trace metal free monomer suitable for use in microelectronic applications. POSS silanols are reacted with a silane coupling agent in the presence of a solvent and a superbase. ... 03/22/07 - 20070065749 - Radiation-markable coatings for printing and imaging An light activated image recording medium, comprises a substrate, optionally, a color layer; and a layer of light-scattering pigment that becomes at least translucent when heated to a predetermined temperature. ... 03/22/07 - 20070065748 - Resin for photoresist composition, photoresist composition and method for forming resist pattern A resin for photoresist compositions is disclosed with excellent resolution and line edge roughness characteristics. A photoresist composition and a method for forming a resist pattern using such a resin are also disclosed. The resin has a hydroxyl group bonded to a carbon atom at a polymer terminal, and the ... 03/22/07 - 20070065747 - Norbornene derivative, norbornene polymer produced by ring-opening (co)polymerization, and process for producing the polymer by ring-opening (co)polymerization According to the present invention, a novel norbornene derivative that is useful as a precursor monomer for preparing a cycloolefin polymer exhibiting excellent transparency, heat resistance and low-water absorption properties and having been freely controlled in the birefringence properties and the wavelength dispersion properties can be provided. According to the ... 03/15/07 - 20070059640 - Processing method of substrate and processing apparatus of substrate A processing method of a substrate is capable of improving wettability on a surface of a resist film with respect to a developer without adverse effect on processing size of resist pattern, or without damage on the resist film. In the processing method it is also unnecessary to make separate ... 03/15/07 - 20070059639 - Positive resist composition and pattern-forming method using the same A positive resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid and not containing a silicon atom; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, (C) a silicon atom-containing resin having at ... 03/15/07 - 20070059638 - Photosensitive resin composition The present invention provides a photosensitive resin composition having improved stability in a bright room, which can provide a printing plate material having superior image remaining property and printing durability, which can be subjected to alkaline development. Accordingly, the present invention relates to a photosensitive resin composition comprising an ethylenically ... 03/15/07 - 20070059637 - Photosensitive resin composition The present invention provides a photosensitive resin composition which can provide a printing plate material having superior image remaining property and printing durability, which can be subjected to alkaline development. The present invention relates to a photosensitive resin composition comprising an ethylenically unsaturated compound, an alkali-soluble resin, a near-infrared-absorbing dye, ... 03/15/07 - 20070059636 - Light sensitive planographic printing plate material Disclosed is a light sensitive planographic printing plate material comprising a support and provided thereon, a light sensitive layer, wherein the light sensitive layer contains a polymerizable ethylenically unsaturated compound, a photopolymerization initiator, a polymeric binder, a sensitizing dye, and a copolymer having a first unit represented by formula (1), ... 03/15/07 - 20070059635 - Antireflective hardmask composition and methods for using same R7 may each independently be hydrogen, alkyl, aryl, allyl, or any combination thereof; and n may be a positive integer; (b) a crosslinking component; and (c) an acid catalyst. ... 03/15/07 - 20070059634 - Non-outgassing low activation energy resist Numerous embodiments of a method to prevent outgassing from a low activation energy photoresist are described. In one embodiment of the present invention, a photoresist material is dispensed over a substrate to form a photoresist layer. The photoresist layer includes branched polymers coupled with acetal or ketal linkages. An exposed ... 03/15/07 - 20070059633 - Photoacid generator wherein X represents a metal atom. The iridium hydride complex of the present invention can be used as an acid generator for chemically-amplified photoresists or color filters for liquid crystal, and in addition, can be widely applied in photographic-related or printing-related fields, or the like. ... 03/15/07 - 20070059632 - Method of manufacturing a semiconductor device wherein R1, R2, R4, R5, m0 to m2, and n0 to n2 are as defined in the description. Radiation sensitive compositions containing the compound of the formula 1 as a main component of the solid component are excellent in sensitivity, resolution, heat resistance, etching resistance, and solubility in solvent. ... 03/08/07 - 20070054218 - Radiation curable resin composition for making colored three dimensional objects A radiation curable resin composition suitable for making three dimensional objects comprising at least one epoxy compound, a cationic photoinitiator, wherein the resin composition has a first color or no color before cure and wherein a three dimensional object made from the resin by subjecting the resin to radiation shows ... 03/08/07 - 20070054217 - Positive photosensitive composition and pattern-forming method using the same A positive photosensitive composition comprises: (A) a compound capable of generating an acid upon irradiation with actinic ray or radiation; and (B) a resin having a group capable of decomposing by action of an acid to increase solubility of the group in an alkali developer, wherein the resin (B) comprises: ... 03/08/07 - 20070054216 - Near-infrared ray absorbing material and production method of the same A method of producing a near-infrared ray absorbing material comprising the steps of: applying a coating liquid of a near-infrared ray absorbing layer comprising a near-infrared ray absorbing dye and a latex onto a support to form a coated layer; and drying the coated layer by heat to form a ... 03/08/07 - 20070054215 - Reimageable paper An image forming medium includes a substrate and an imaging layer including a photochromic material and a polymer binder coated on the substrate, where the photochromic material exhibits a reversible homogeneous-heterogeneous transition between a colorless state and a colored state in the polymer binder. ... 03/08/07 - 20070054214 - Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions wherein R1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl, R2 to R4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable ... 03/01/07 - 20070048663 - Photopolymerizable photosensitive lithographic printing plate A negative type photopolymerizable photosensitive lithographic printing plate, which is capable of image-recording with laser beams, comprising: a hydrophilic support; at least one photopolymerizable photosensitive layer; and a protective layer, in this order, wherein the at least one photosensitive layer comprises: (i) a sensitizing dye having absorption maximum in a ... 03/01/07 - 20070048662 - Photoresist composition and method of manufacturing a thin-film transistor substrate using the same A photoresist composition includes about 10 to about 70% by weight of a binder resin including a phenol-based polymer, about 0.5 to about 10% by weight of a photo-acid generator, about 1 to about 20% by weight of a cross-linker, about 0.1 to about 5% by weight of a dye ... 03/01/07 - 20070048661 - Infrared-sensitive planographic printing plate precursor An infrared-sensitive planographic printing plate precursor including: a support; a recording layer capable of forming an image through infrared irradiation provided on or above one surface of the support, the recording layer containing a resin, which is water-insoluble and alkali-soluble, and an infrared absorbent; and an organic polymer layer provided ... 03/01/07 - 20070048660 - Resist composition, method for forming resist pattern, semiconductor device and method for manufacturing thereof A composition contains a resist material and an ammonium sulfate. A resist pattern formed from the composition can be uniformly thickened by a resist thickening material, thereby allowing formation of fine patterns beyond the resolution limit of the exposure devices. ... 03/01/07 - 20070048659 - Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same The object of the present invention is to provide a resist pattern thickening material, etc. which, when coated over a resist pattern formed of ArF resist material, etc., can efficiently thicken the resist pattern such as lines and spaces pattern, etc. regardless of the composition of ArF resist material, and ... 02/22/07 - 20070042293 - Lithographic printing plate precursor and lithographic printing process A lithographic printing plate precursor, which comprises: a support; an image-recording layer; and a protective layer, in this order, wherein at least one of the image-recording layer and the protective layer comprises a phosphonium salt having a specific structure, and a lithographic printing process, which comprises: exposing a lithographic printing ... 02/22/07 - 20070042292 - Radiation sensitive resin composition in the formula (1-1), R1 represents a methyl group and the like and X represents a specific polycyclic alicyclic hydrocarbon group and the like, in the formula (1-2), R1 represents a methyl group and the like and Z represents an acid-dissociable group which is dissociable by the action of an ... 02/22/07 - 20070042291 - Positive resist composition and a pattern forming method using the same A positive resist composition comprises (A) a compound capable of generating sulfonic acid, bis(alkylsulfonyl)amide, or tris(alkylsulfonyl)methine upon irradiation with actinic ray or radiation, and (B) a resin capable of increasing the solubility in an alkali developer by action of an acid having specific repeating units, and a pattern forming method ... 02/22/07 - 20070042290 - Positive resist composition for immersion exposure and pattern-forming method using the same A positive resist composition for immersion exposure comprises: (A) a resin capable of increasing its solubility in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, wherein the acid satisfies conditions of V≧230 and ... 02/22/07 - 20070042289 - Coating compositions for use with an overcoated photoresist Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating ... 02/22/07 - 20070042288 - Positive photoresist composition and method for forming resist pattern The invention provides a positive photoresist composition which exhibits a high level of etching resistance and attains high resolution, and enables the formation of a fine pattern using an electron beam exposure step, as well as a method for forming a resist pattern that uses the positive photoresist composition. This ... 02/15/07 - 20070037091 - Chemically amplified positive resist composition and patterning process A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline developer under the action of acid, and a basic compound has a high sensitivity, a high contrast of dissolution of resist film, a high resolution, and ... 02/15/07 - 20070037090 - Radiation sensitive material and method for forming pattern was obtained by loading adamantyl methacrylate monomer and t-butyl acrylate monomer by 1:1, then conducting polymerization, adding AIBN as a polymerization initiator, and then conducting precipitation purification with methanol. Then to the copolymer, triphenylsulfonium hexafluoroantimonate was added to prepare a cyclohexanone solution. This solution was applied to a wafer, and ... 02/15/07 - 20070037089 - Structure and method for improving photoresist pattern adhesion An anti-reflective coating comprises a plurality of main backbone chains, and at least one long free polymer chain coupled to at least one of the plurality of main backbone chains. ... 02/15/07 - 20070037088 - Color forming composition containing a plurality of antenna dyes A radiation image-able coating includes a first phase including a radiation curable polymer matrix and an activator disposed in the radiation curable polymer matrix, a second phase insolubly distributed in the first phase, the second phase including a color-former, and a hybrid antenna dye package distributed in at least one ... 02/08/07 - 20070031758 - Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material The positive-type radiation-sensitive resin composition for producing a metal-plating formed material relating to the present invention comprises (A) a polymer containing a structural unit having an acid-dissociative functional group, which is dissociated in the presence of an acid to generate an acidic functional group, and a crosslinking structure; (B) a ... 02/08/07 - 20070031757 - Positive photosensitive composition and method of pattern formation with the same A positive photosensitive composition comprising: (A) a compound which generates an acid upon irradiation with actinic rays or a radiation; (B) a resin which decomposes by an action of an acid to come to have an enhanced solubility in an alkaline developing solution; and (F) a solvent, wherein the resin ... 02/08/07 - 20070031756 - Photosensitive resin composition, method of forming level difference pattern using the photosensitive resin composition, and method of producing ink jet head To provide a positive type photosensitive resin composition, containing at least an acrylic resin having a carboxylic anhydride structure in a molecule, and a compound that generates an acid when irradiated with light. ... 02/08/07 - 20070031755 - Material for forming resist-protecting film for immersion exposure process, resist-protecting film made of such material, and method for forming resist pattern using such resist-protec- ting film The resist protective film forming material for liquid immersion lithography is provided, which is suitable when the non-aqueous solution with a high transparency and high refractive index exemplified by the fluorinated liquid is used. The resist protective film forming material includes at least one component selected from water-soluble and alkali-soluble ... 02/01/07 - 20070026344 - Infrared-sensitive planographic printing plate precursor The present invention provides an infrared-sensitive planographic printing plate precursor including: a support; a recording layer on one surface of the support, which recording layer contains a water-insoluble and alkali-soluble resin, an infrared absorber and a long-chain alkyl group-containing polymer, and is capable of forming an image by infrared irradiation; ... 02/01/07 - 20070026343 - Chemical amplification-type resist composition and production process thereof A production process of a chemical amplification-type resist composition, which is a process for producing a chemical amplification-type composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer is changed under an action ... 02/01/07 - 20070026342 - Imageable printing plate for on-press development A novel coating for lithographic printing plates can be imagewise exposed to radiation and then directly processed with only water to remove the non-exposed regions of the coating. The coating comprises a polymer, a monomer and/or oligomer, polymerization or cross link initiator, stabilizer, and dye or pigment, such that after ... 02/01/07 - 20070026341 - Resist protective coating material and patterning process A resist protective coating material is provided comprising an α-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of ... 02/01/07 - 20070026340 - Method of removing photoresist and photoresist rework method A method of removing photoresist is provided. In the whole process of removing the photoresist, plasma is not used. Instead, a first solution is used in a first removal step to remove a photoresist layer. Then, a second solution is used in a second removal step to completely remove the ... 02/01/07 - 20070026339 - Negative resists based on a acid-catalyzed elimination of polar molecules The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and ... 01/25/07 - 20070020559 - Positive-type photosensitive resin composition and cured film manufactured therefrom A positive-type photosensitive resin composition comprising component (A): an alkali-soluble resin having a functional group which undergoes heat crosslinking reaction with a compound of component (B), a functional group for film curing which undergoes thermoset reaction with a compound of component (C), and a number average molecular weight of 2,000 ... 01/25/07 - 20070020558 - Process for the preparation of a photoresist solution The invention relates to a process for the preparation of a photosensitive photoresist solution, characterized in that a novolak resin and a diazonaphthoquinonesulphonyl chloride are dissolved in a solvent from the group consisting of the photoresist solvents, a proportion of from 1 to 70 mol % of the phenolic hydroxyl ... 01/25/07 - 20070020557 - New organic bottom antireflective polymer compositions The present invention relates to bottom antireflective coating compositions, polymers useful in making such compositions, and their use in image processing by forming a thin layer between a reflective substrate and a photoresist coating. ... 01/25/07 - 20070020556 - Photosensitive articles and related manufacturing process A decorative photosensitive article having a design formed of a plurality of polyvinyl chloride plasticizers. At least one of the polyvinyl chloride plasticizers includes a photochromic pigment such that when exposed to light, the polyvinyl chloride plasticizer portion of the design having the photochromic pigment changes color, whereas the other ... 01/25/07 - 20070020555 - Photosensitive composition, photosensitive lithography plate and method for producing lithography plate Disclosed is a light sensitive composition containing a compound A having a group capable of undergoing radical polymerization, a compound B having a group capable of undergoing cationic polymerization, a photopolymerization initiator C, and a polymer binder D, the light sensitive composition being characterized in that the photopolymerization initiator C ... 01/18/07 - 20070015087 - Photosensitive composition A photosensitive composition comprising: (A) a sensitizing dye selected from the group consisting of compounds represented by formulae (1) and (2) defined herein; (B) an initiator compound capable of generating a radical, an acid or a base; and (C) a compound capable of changing irreversibly its physical or chemical property ... 01/18/07 - 20070015086 - Photosensitive composition, photosensitive planographic printing plate material, and image forming method of photosensitive planographic printing plate material A photosensitive composition containing: (A) a polymerizable compound containing an ethylenic double bond in the molecule; (B) a photopolymerization initiator; (C) a polymer binder; and (D) a dye exhibiting a maximum absorption wavelength of 350-450 nm, wherein the dye is represented by Formula (1): ... 01/18/07 - 20070015085 - Planographic printing plate material and method of forming visible image A planographic printing plate material comprising a substrate having a hydrophilic surface and a thermosensitive image formation layer on the hydrophilic surface, the thermonsensitive image formation layer being capable of changing from hydrophilic to hydrophobic by applying heat or light, wherein an electron donating color former and a water soluble ... 01/18/07 - 20070015084 - Photoactive compounds The present application relates to a compound of formula A-X-B, where (i) A-X-B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R500—SO3− or (ii) A-X-B form a non-ionic compound Ac-Xc-Bc, where Ai, Bi, ... 01/18/07 - 20070015083 - Antireflective composition and process of making a lithographic structure wherein 1≦x≦2; 1≦y≦5; 1≧0; m>0; n>0; R is a chromophore, M is a metal selected from Group IIIB to Group VIB, lanthanides, Group IIIA, Group IVA except silicon; and L is an optional ligand. The invention is also directed to a process of making a lithographic structure including a silicon-metal ... 01/18/07 - 20070015082 - Process of making a lithographic structure using antireflective materials A lithographic structure comprising: an organic antireflective material disposed on a substrate; and a silicon antireflective material disposed on the organic antireflective material. The silicon antireflective material comprises a crosslinked polymer with a SiOx backbone, a chromophore, and a transparent organic group that is substantially transparent to 193 nm or ... 01/18/07 - 20070015081 - Polycarbonate compositions having infrared absorbance, method of manufacture, and articles prepared therefrom A composition is disclosed, comprising a polycarbonate resin, an inorganic infrared shielding additive, and carbon black, wherein an article prepared from the composition has the inorganic infrared shielding additive present at about 0.01 to about 1.0 grams per square meter, and carbon black present at about 0.001 to about 2.0 ... 01/18/07 - 20070015080 - Photoresist composition for imaging thick films The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, a photoacid generator which produces a strong acid upon irradiation and a photobleachable dye. The invention further provides for ... 01/11/07 - 20070009833 - Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same A photoresist composition, a method for forming a film pattern using the photoresist composition, and a method for manufacturing a thin film transistor array panel using the photoresist composition are provided. In one embodiment, a photoresist composition includes an alkali-soluble resin, a photosensitive compound, and an additive, for advantageously providing ... 01/11/07 - 20070009832 - Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process Silicon compounds having fluorinated hemiacetal structure are provided. Silicone resins having the same structure have an appropriate acidity to enable formation of a finer pattern by minimizing the pattern collapse by swelling, exhibit improved resistance to the etching used in the pattern transfer to an organic film, and are thus ... 01/11/07 - 20070009831 - Planographic printing plate material and image formation method Disclosed is a planographic printing plate material comprising an aluminum support and provided thereon, a light sensitive layer containing an acid-generating agent composition generating an acid on violet laser beam exposure, a cationically polymerizable monomer which polymerizes by action of an acid, and an alkali-soluble polymeric binder, wherein the light ... 01/11/07 - 20070009830 - Underlayer compositons containing heterocyclic aromatic structures A composition suitable for use as a planarizing underlayer in a multilayer lithographic process is disclosed. The inventive composition comprises a polymer containing heterocyclic aromatic moieties. In another aspect, the composition further comprises an acid generator. In yet another aspect, the composition further comprises a crosslinker. The inventive compositions provide ... 01/11/07 - 20070009829 - Laser sensitive lithographic printing plate having a darker aluminum substrate A laser sensitive lithographic printing plate comprises an electrochemically grained, anodized, hydrophilically treated aluminum substrate with a reflection optical density of 0.30 or higher; a free radical polymerizable photosensitive layer; and a water soluble or dispersible overcoat. The photosensitive layer comprises a polymeric binder, a free radical polymerizable monomer, a ... 01/11/07 - 20070009828 - Positive resist composition, resist laminates and process for forming resist patterns A positive resist composition, comprising a resin component (A) that exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the component (A) includes either a silsesquioxane resin (A1) containing structural units (a1) represented by a general formula (I) ... 01/04/07 - 20070003871 - Positive photosensitive composition A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer. ... 01/04/07 - 20070003870 - Heat-sensitive lithographic printing plate precursor R4 and R5 are independently an optionally substituted alkyl, cycloalkyl, aryl or arylalkyl group. The precursor exhibits an excellent differentiation in dissolution kinetics between the exposed and non-exposed areas of the coating and a high chemical resistance against printing liquids and press chemicals. ... 01/04/07 - 20070003869 - Heat-sensitive lithographic printing plate-precursor The precursor exhibits an excellent differentiation in dissolution kinetics between the exposed and non-exposed areas of the coating and a high chemical resistance against printing liquids and press chemicals. ... 01/04/07 - 20070003868 - Systems and methods for fabricating blanks for microstructure masters by imaging a radiation sensitive layer sandwiched between outer layers, and blanks for microstructure masters fabricated thereby Microstructures are fabricated by imaging a microstructure master blank that includes a radiation sensitive layer sandwiched between a pair of outer layers, on an imaging platform, to define the microstructures in the radiation sensitive layer. At least one of the outer layers is then removed. The microstructures that were defined ... 01/04/07 - 20070003867 - Resist protective coating material and patterning process A resist protective coating material is provided comprising a polymer having a partial structure of formula (1) wherein R0 is H, F, alkyl or alkylene, and R1 is fluorinated alkyl or alkylene. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable ... 01/04/07 - 20070003866 - Photosensitive composition, photosensitive planographic printing plate material, and image forming method of the same A photosensitive composition comprising: (A) an addition-polymerizable compound containing an ethylenic double bond in the molecule; (B) an iron-arene complex which acts as a photopolymerization initiator; (C) a polymer binder; and (E) a siloxane glycol copolymer. ... 01/04/07 - 20070003865 - Imaging methods An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts. ... 01/04/07 - 20070003864 - Compositions and methods for image development of conventional chemically amplified photoresists Methods for carrying out lithography with a carbon dioxide development system are described. This invention involves methods for preferential removal of the darkfield region of conventional chemically amplified positive tone resists. The carbon dioxide development systems include one or more derivatizing agents, which may be an onium salt or a ... 01/04/07 - 20070003863 - Antireflective hardmask composition and methods for using same wherein A is a bivalent radical selected from the group consisting of carbonyl, oxy, alkylene, fluoroalkylene, phenyldioxy, and any combination thereof; R1 and R2 are each independently a bivalent radical selected from the group consisting of an alkylene, an arylene, and any combination thereof; and x, y, and z are ... 01/04/07 - 20070003862 - Resist composition, method of forming resist pattern, semiconductor device and method of manufacturing thereof The resist composition of the present invention contains at least one of a tannin and a derivative thereof. The method of forming a resist pattern of the present invention includes: forming a resist film on a surface of an object to be processed, by using the resist composition; and exposing ... 01/04/07 - 20070003861 - Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same wherein R1 and R2 are independently hydrogen, fluoro, methyl or fluoromethyl; R3 is a C1-10 hydrocarbon or a C1-10 hydrocarbon in which the hydrogen atoms are partly replaced by fluorine atoms; and a, b and c, representing the mole fraction of each monomer, are in the range between 0.05 and ... 01/04/07 - 20070003860 - Substrate adhesion improver for photosensitive resin composition and photosensitive resin composition containing the same wherein R1 to R4 each independently represent a hydrogen atom, a halogen atom or a C1-5 alkyl group; R5 to R9 each independently represent a hydrogen atom, a hydroxyl group, a C1-10 alkyl group, an aryl group, a C7-12 aralkyl group, —R10COOR11, or —R10CO—(OCH2CH2)n-OH provided that at least one of ... 12/28/06 - 20060292491 - Method of treating and removing a photoresist pattern and method of manufacturing a semiconductor device using the same Example embodiments of the present invention relate to methods of treating and removing a photoresist pattern and a method of manufacturing a semiconductor device using the same. Other example embodiments of the present invention relate to a method of treating a photoresist pattern and a method of removing a photoresist ... 12/28/06 - 20060292490 - Positive photosensitive composition and pattern forming method using the same A positive photosensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B1) a resin of which solubility in an alkali developer increases under an action of an acid; and (B2) a resin that has at least one group selected from (a) ... 12/28/06 - 20060292489 - Photoresist monomer polymer thereof and photoresist composition including the same In the above Formula, R* is a hydrogen or methyl group, R1 is saturated hydrocarbyl group of 1 to 5 carbon atoms, R is mono-cyclic or multi-cyclic homo or hetero saturated hydrocarbyl group of 3 to 50 carbon atoms, and n is an integer of at least 2. ... 12/28/06 - 20060292488 - Composition for formation of antireflection film, and antireflection film in which the same is used A composition for formation of an antireflection film having an excellent etching resistant characteristic and ability to prevent reflection of short-wavelength light (absorption ability of short-wavelength light) as well as excellent time dependent stability, and an antireflection film in which the same is used, are provided. A composition for formation ... 12/28/06 - 20060292487 - Printing plate and patterning method using the same A patterning method includes depositing a pattern target layer on a surface of a substrate, providing a printing plate with concaves in a first side of a transparent substrate and an opaque layer on the first side except in the concaves of the first sides, filling resins into the concaves ... 12/28/06 - 20060292486 - Processless lithographic printing plate precursor A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of chemically bonding to the hydrophobic polymer and to the hydrophilic polymer. The radiation-sensitive medium further may comprise a substance capable of converting radiation into heat. The ... 12/28/06 - 20060292485 - Topcoat compositions and methods of use thereof A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from the group consisting of α,α,α-trifluorotoluene, 2,2,3,3,4,4,5,5-octafluoropentyl-1,1,2,2-tetrafluoroethyl ether (OFP-TFEE), and a mixture consisting of a hydrophobic alkane and an alcohol is provided. Also provided is method of forming an image on a photoresist that includes forming a ... 12/28/06 - 20060292484 - Preparation of topcoat compositions and methods of use thereof A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from an alcohol is provided. Also provided is a method of forming an image on a photoresist that includes forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing ... 12/21/06 - 20060286482 - Lithographic apparatus and device manufacturing method utilizing a resettable or reversible contrast enhancing layer in a multiple exposure system A device manufacturing system and method are used to perform multiple exposures utilizing a resettable or reversible contrast enhancing layer. A radiation sensitive layer is formed on a substrate. A resettable or reversible contrast enhancing layer is formed on the radiation sensitive layer. The resettable or reversible contrast enhancing layer ... 12/21/06 - 20060286481 - Thermochromic recording medium A thermochromic reimageable recording medium comprises a substrate and thermochromic composition comprising a photochromic material, a transition metal salt and a binder. The thermochromic composition changes color from a colorless state to a colored state upon application of heat. The thermochromic recording medium may be used to display a viewable ... 12/14/06 - 20060281025 - Chemically amplified resist material and pattern formation method using the same In a pattern formation method, a resist film made of a chemically amplified resist material including a first polymer having hemiacetal or hemiketal is formed on a substrate. Then, with a liquid provided on the resist film, pattern exposure is performed by selectively irradiating the resist film with exposing light. ... 12/14/06 - 20060281024 - Printing element with an integral printing surface A relief image printing element with an integral imageable printing surface and a method of preparing the relief image printing element are described. The relief image printing element comprises a dimensionally stable base layer; a floor layer comprised of a cured polymer selected from the group consisting of photopolymers, and ... 12/14/06 - 20060281023 - Negative photoresist composition There is provided a negative photoresist composition, which is used in a method of forming a pattern in which an underlayer film is provided on a substrate, a photoresist film formed from the negative photoresist composition is provided on top of the underlayer film, the photoresist film is selectively exposed, ... 12/14/06 - 20060281022 - Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.0 4.8] nonan-3-one ring and photoresist resin composition wherein Ra is a hydrogen atom, a halogen atom, an alkyl group of 1 to 6 carbon atoms or an haloalkyl group of 1 to 6 carbon atoms; each of R1 and R2 is identical to or different from a hydrogen atom or a hydrocarbon group, provided that at least ... 12/07/06 - 20060275702 - Negative-working photosensitive resin composition and photosensitive resin plate using the same wherein -X represents —OR2, —COOH, —SO3H, —CONHR2, —COR2, —SO2NHR2, —HNCONHR2, or —HNCOOR2; R1 and R2, which may be the same or different, each represents a hydrogen atom, a substituted or unsubstituted, saturated or unsaturated hydrocarbon group, provided that it does not contain a radical polymerizable ethylenic double bond, a substituted ... 12/07/06 - 20060275701 - Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions Copolymers prepared by copolymerization of at least one fluorinated vinyl ether are provided. In one embodiment, the at least one fluorinated vinyl ether comprises ethylene directly substituted at an olefinic carbon atom with a moiety —OR* and optionally substituted with one, two, or three additional nonhydrogen substituents, wherein R* comprises ... 12/07/06 - 20060275700 - Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same A photosensitive resin composition for an organic layer pattern includes about 100 parts by weight of an acryl-based copolymer and about 5 to about 100 parts by weight of a 1,2-quinonediazide compound. The acryl-based copolymer is prepared by copolymerizing about 5 to about 60 percent by weight of an isobonyl ... 12/07/06 - 20060275699 - Novel photosensitive resin compositions n is an integer from 1 to 5; and each R1 is defined as above; and (f) at least one solvent; wherein the amount of the compound of Structure VI present is an amount effective to inhibit residue from forming when the composition is coated on a substrate and the ... 12/07/06 - 20060275698 - Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use Described herein are novel thermally reactive near-infrared absorbing acetal copolymers that undergo chemical and physical changes upon exposure to near-infrared radiation. Also described are the methods of preparation of the novel acetal copolymers starting either with vinyl-alcohol polymers or with acetal copolymers. Also described are the methods of use of ... 12/07/06 - 20060275697 - Top coating composition for photoresist and method of forming photoresist pattern using the same Provided are a top coating composition for a photoresist which can be used in immersion lithography, and a method of forming a photoresist pattern using the same. The top coating composition includes: a polymer including at least three different structural repeating units including a first repeating unit comprising a carboxy ... 12/07/06 - 2006027569 |