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Radiation Imagery Chemistry: Process, Composition, Or Product Thereof > Imaging Affecting Physical Property Of Radiation Sensitive Material, Or Producing Nonplanar Or Printing Surface - Process, Composition, Or Product > Radiation Sensitive Composition Or Product Or Process Of Making Radiation Sensitive Composition Or Product Or Process Of MakingRadiation Sensitive Composition Or Product Or Process Of Making patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.06/07/07 - 20070128543 - Topcoats for use in immersion lithography A method of forming a top coat layer and a topcoat material for use in immersion lithography. A topcoat layer is formed on a photoresist layer from an aqueous solution that is immiscible with the photoresist layer. The topcoat layer is then rendered insoluble in neutral water but remains soluble ... 06/07/07 - 20070128542 - Recording method According to an aspect of the invention, there is provided a method of recording an image, including irradiating a CO2 laser having a wavelength of from 9 to 11 μm onto a recording material in which a recording layer and a protective layer are provided on a support in this ... 06/07/07 - 20070128541 - Materials for photoresist, negative-tone photoresist composition, method of forming resist pattern, and semiconductor device With the tendency of reducing the size of semiconductor circuit patterns, edge roughness on a resist pattern is increased when pattern dimensions required are close to the size of the resist molecules. The present invention provides a technique for preventing degradation of the device performance and negative effects over the ... 06/07/07 - 20070128540 - Photoresist resin composition, method of forming a photoresist pattern, and method of manufacturing a display substrate using the same A photoresist resin composition comprises about 10 to about 35% by weight of an acryl-based copolymer, about 5 to about 10% by weight of a quinone diazide compound, about 55 to about 80% by weight of a solvent, and about 0.01 to about 0.5% by weight of a silane-based surfactant ... 06/07/07 - 20070128539 - Composition for removing photoresist and method of forming a pattern using the same In a method of forming a pattern using a composition for removing photoresist, a layer is formed on a substrate, and then a photoresist pattern is formed on the layer. A portion of the layer exposed by the photoresist pattern is etched using the photoresist pattern as an etching mask ... 05/31/07 - 20070122745 - Planographic printing plate precursor, substrate for the same and surface hydrophilic material A planographic printing plate precursor comprises a substrate having disposed thereon a hydrophilic layer which includes hydrophilic graft chains and a crosslinked structure formed through hydrolytic polycondensation of an alkoxide of an element selected from Si, Ti, Zr and Al. An aluminum substrate for a planographic printing plate includes a ... 05/31/07 - 20070122744 - Positive-working photoresist composition and photosensitive material using same The invention discloses a chemical-amplification positive-working photoresist composition in the form of a solution which is particularly suitable for the formation, on the surface of a substrate, of a photoresist layer having a thickness of 100 to 650 nm to be in compliance with the trend toward increasing fineness of ... 05/31/07 - 20070122743 - Planographic printing plate precursor A planographic printing plate precursor includes a support having disposed thereon a recording layer containing a water-insoluble and alkali-soluble resin, a development inhibitor and an infrared absorber and exhibiting enhanced solubility in an aqueous alkali solution through light exposure. The recording layer may have either a mono-layer construction or a ... 05/31/07 - 20070122742 - Photocurable and thermosetting resin composition, dry film using the same, and cured product thereof A photocurable and thermosetting resin composition comprising (A) a carboxylic acid-containing photosensitive resin having at least one carboxyl group and at least two ethylenically unsaturated bonds in its molecule, (B) a filler, (C) a photopolymerization initiator, (D) a diluent, and (E) a compound having at least two cyclic ether groups ... 05/31/07 - 20070122741 - Resist protective coating material and patterning process A pattern-forming process uses a resist protective coating material comprising a C8-C12 ether compound as a solvent. A resist protective coating formed on a resist film is water-insoluble, soluble in an alkaline developer, and unmixable with the resist film, and thus the immersion lithography can be performed. During alkaline development, ... 05/31/07 - 20070122740 - Resist undercoat-forming material and patterning process In the lithographic multilayer resist process, a material comprising a copolymer of a hydroxy-containing vinylnaphthalene with hydroxy-free olefins is useful in forming a resist undercoat. The undercoat-forming material has a high transparency and optimum values of n and k so that it functions as an antireflective coating during short-wavelength exposure, ... 05/31/07 - 20070122739 - Planographic printing plate material and printing process Disclosed is a planographic printing plate material comprising a support and provided thereon, a hydrophilic layer and a thermosensitive image formation layer in that order, wherein the hydrophilic layer contains metal oxide particles (as light-to-heat conversion materials) having a Mohs hardness of from 6.0 to 10.0 and an average particle ... 05/31/07 - 20070122738 - Image forming material The present invention relates to an image forming material having, on a substrate, an image forming layer that includes at least (A) a novolac type phenolic resin containing phenol as a structural unit, (B) a photo-thermal converting agent, and (C) a specific ammonium compound or a specific onium salt. ... 05/31/07 - 20070122737 - Coating and developing system and coating and developing method A coating and developing system for forming a resist film on a substrate by coating the substrate with a liquid resist and developing the resist film after the resist film has been processed by immersion exposure that forms a liquid layer on the surface of the substrate is capable of ... 05/31/07 - 20070122736 - Resist protective film material and pattern formation method The invention is a protective film material for immersion lithography that enables desirable immersion lithography, can be removed simultaneously with development of a photoresist layer, and has excellent process adaptability. The invention also includes a method for forming a pattern using the material. More specifically, the invention is a protective ... 05/31/07 - 20070122735 - Optical storage device having limited-use content and method for making same The invention relates generally to optical storage devices, such as DVDs and CDs, on which compositions containing dyes are disposed so as to facilitate limited or selective use of at least a portion of the content of the optical storage devices. The invention also relates to methods of making limited-use ... 05/31/07 - 20070122734 - Molecular photoresist In one embodiment, a photoacid generator is attached to a primary resist molecule having a radius of gyration of less than about 3 nanometers, the primary molecule other than a traditional photoresist polymer. This embodiment may have increased homogeneity and decreased acid diffusion, which may increase the sensitivity of the ... 05/24/07 - 20070117045 - Chemical amplification type positive photoresist composition and resist pattern forming method The present invention provides a chemical amplification type positive photoresist composition which is excellent in storage stability as a resist solution in a bottle A novolak resin or a hydroxystyrenic resin is reacted with a crosslinking agent to give a slightly alkali-soluble or alkali-insoluble resin having such a property that ... 05/24/07 - 20070117044 - Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method A multilayer resist process comprises forming in sequence an undercoat film, an intermediate film, and a photoresist film on a patternable substrate, and effecting etching in multiple stages. A silicon-containing film forming composition is useful in forming the intermediate film serving as an etching mask, comprising a silicon-containing polymer obtained ... 05/24/07 - 20070117043 - Photoacid generators and lithographic resists comprising the same The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications. In one embodiment, the present invention provides a photoacid generator of Formula (I): ... 05/24/07 - 20070117042 - Imaging methods Methods of imaging are disclosed. Imaging compositions which are sensitive to low levels of energy are applied to a work piece. Energy is applied to the imaging compositions to cause a color or shade change such that workers may modify the work piece based on the color or shade change. ... 05/24/07 - 20070117041 - Photosensitive coating for enhancing a contrast of a photolithographic exposure In a preferred embodiment, a photosensitive coating material for use as a contrast enhancing layer (CEL) disposed at the bottom of a resist film includes a base polymer, which has no acid cleavable groups for being insoluble with respect to a developer, wherein the developer is designed to remove exposed ... 05/24/07 - 20070117040 - Water castable-water strippable top coats for 193 nm immersion lithography wherein R is an aliphatic or alicyclic radical; m and n are independently integers, and are the same or different; and p is zero or 1. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is particularly ... 05/24/07 - 20070117039 - Photosensitive resin composition, photosensitive layer using the same and photosensitive resin printing original plate The present invention is to obtain without any trouble a photosensitive resin composition, a photosensitive layer and a photosensitive resin printing original plate, which are developable with an aqueous developer, resistant to an aqueous ink and a cosolvent ink, and assured of good image reproducibility. The present invention relates to ... 05/17/07 - 20070111141 - Negative-working photosensitive resin composition and photosensitive resin plate using the same in a range of 3.5 wt % or less based on the weight of the photosensitive resin composition. A photosensitive resin plate using the photosensitive resin composition is also disclosed. By this invention, a negative-working photosensitive resin composition particularly excellent in the reproducibility of the highlight areas and the independent ... 05/17/07 - 20070111140 - Resist composition and patterning process using the same There is disclosed a resist composition which shows high sensitivity and high resolution on exposure to high energy beam, provides reduced Line Edge Roughness because swelling at the time of development is reduced, provides minor amounts of residue after development, has excellent dry etching resistance, and can also be used ... 05/17/07 - 20070111139 - Negative resist composition and patterning process A negative resist composition is provided comprising a polymer comprising recurring units having formula (1), an organic solvent, a crosslinker, and an optional photoacid generator. In formula (1), R1 and R2 are hydrogen or methyl, m is 0 or a positive integer of 1 to 5, p and q are ... 05/17/07 - 20070111138 - Photoactive compounds The present invention relates to novel photoacid generators. ... 05/17/07 - 20070111137 - Resist polymer solution and process for producing the same A resist polymer solution comprising a resist polymer containing a repeating unit decomposed by the action of an acid so as to be soluble in alkali and a repeating unit having a polar group, the resist polymer dissolved in a solvent for coating film formation, wherein the amount of impurities ... 05/17/07 - 20070111136 - Photosensitive resin composition, photosensitive element employing it, resist pattern forming method, process for manufacturing printed circuit board and method for removing photocured product The photosensitive resin composition of the invention comprises (A) a photopolymerizing compound with two or more ethylenic unsaturated bonds in the molecule and (B) a photopolymerization initiator which initiates photopolymerization reaction of the (A) photopolymerizing compound, the photosensitive resin composition being characterized in that the molecule of the (A) photopolymerizing ... 05/17/07 - 20070111135 - Positive resist composition and method of forming resist pattern using same A positive resist composition which includes a resin component (A) that exhibits increased alkali solubility under the action of acid, an acid generator component (B) that generates acid on exposure, and an organic solvent (C). The component (A) includes (i) a structural unit (a1), which contains an acid dissociable, dissolution ... 05/10/07 - 20070105046 - Photosensitive composition Photoresist compositions and methods suitable for depositing a thick photoresist layer in a single coating application are provided. Such photoresist layers are particularly suitable for use in chip scale packaging, for example, in the formation of metal bumps. ... 05/10/07 - 20070105045 - Positive resist composition and pattern formation method using the positive resist composition A positive resist composition comprises: (A) a resin that contains a repeating unit (A1) having a lactone structure and a cyano group, and increases its solubility to an alkali developer by action of an acid; (B) a compound that generates an acid by irradiation with actinic ray or radiation; and ... 05/10/07 - 20070105044 - Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern There is provided a means for forming a protective film of a fluorine-containing polymer composition excellent in smoothness and adhesiveness on a photoresist. Moreover, there is provided a means for removing the protective film without impairing the underlying photoresist. A polymer coating composition obtainable by dissolving a fluorine-containing polymer compound ... 05/10/07 - 20070105043 - Photosensitive coating for enhancing a contrast of a photolithographic exposure A photosensitive coating material for enhancing a contrast of a photolithographic exposure of a resist film formed on a substrate, including a base polymer, a solvent for facilitating deposition of the photosensitive coating material upon a surface adjacent to said resist film to form a film thereupon, an alkaline additive ... 05/10/07 - 20070105042 - Resist composition and patterning process A hydroxystyrene/indene/alkoxyisobutoxystyrene copolymer having Mw of 1,000-500,000 is formulated as a base resin to give a resist composition, typically chemically amplified positive resist composition. The composition exhibits a high resolution, a satisfactory resist pattern profile after development, and improved etch resistance and is thus suitable as a micropatterning material for ... 05/10/07 - 20070105041 - Lithographic printing plate comprising bi-functional compounds wherein Q and Z independently represent the necessary atoms to form an optionally substituted five or six membered aromatic or heteroaromatic ring. ... 05/10/07 - 20070105040 - Developable undercoating composition for thick photoresist layers The present invention relates to an undercoating composition for a photoresist comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, and a photoacid generator which produces a strong acid upon exposure to radiation, and further where the polymer is transparent at the ... 05/10/07 - 20070105039 - Dual band color forming composition A radiation image-able coating includes a first phase including a radiation curable polymer matrix and an activator disposed in the radiation curable polymer matrix, a second phase insolubly distributed in the first phase, the second phase including a color-former, and an antenna dye package distributed in at least one of ... 05/10/07 - 20070105038 - Positive resist composition and method for forming resist pattern A positive resist composition that includes a base resin component (A) and an acid generator component (B), wherein the component (A) is a copolymer that includes structural units (a-1), which are derived from an (α-lower alkyl) acrylate ester that contains an acid dissociable, dissolution inhibiting group, and also contains an ... 05/10/07 - 20070105037 - Thick film photoresist composition and method of forming resist pattern A negative thick film photoresist composition with improved alkali developability is provided. The composition comprises: (A) a resin component containing (a) from 61 to 90% by weight of a structural unit derived from a cyclic alkyl (meth)acrylate ester, and (b) a structural unit derived from a radical polymerizable compound containing ... 05/10/07 - 20070105036 - Photosensitive element, resist pattern formation method and printed wiring board production method [Chemical Formula I] ... // - 25.5≦R≦79.0 (1) - ... 05/03/07 - 20070099119 - Photosensitive composition with low yellowing under uv-light and sunlight exposure This disclosure relates to a photosensitive composition useful in preparing water-developable, relief printing plates and other photosensitive articles. The compositions comprise an unsaturated polyurethane pre-polymer, which is the reaction product of at least one polyether diol, at least one aliphatic diisocyanate, at least one hydroxyl-functionalized mono-, di- and tri-(meth)acrylate, and ... 05/03/07 - 20070099118 - Planographic printing plate precursor A positive planographic printing plate precursor includes a support having disposed thereon a lower thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound and an upper thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound, with alkali-solubility increasing under heat, wherein (i) both the upper thermosensitive layer and the lower ... 05/03/07 - 20070099117 - Sulfonamide compound, polymer compound, resist material and pattern formation method wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain ... 05/03/07 - 20070099116 - Photoconductive layer forming radiation image taking panel and radiation image taking panel A photoconductive layer for a radiation image taking panel is formed by selenium alloy containing 0.1 to 1000 molar ppm of monovalent metal and 0.1 to 1000 molar ppm of a chalcogenide element other than Se or selenium alloy containing 0.1 to 1000 molar ppm of monovalent metal and 0.1 ... 05/03/07 - 20070099115 - Photosensitive resin composition, image forming material and image forming method using thereof There is devised a novel acryl resin in which an unsaturated group introduced in an alkali soluble resin is placed at a longer distance from the resin skeleton of the alkali soluble resin, the mobility of the unsaturated group is promoted and the number of the unsaturated double bonds is ... 05/03/07 - 20070099114 - Polymer, resist composition and patterning process A polymer of which dissolution rate in an alkaline developer increases under the action of acid comprises recurring units having formulae (1) and (2) wherein R1, R2, and R4 are H or methyl, R3 is difluoromethyl or trifluoromethyl, and X is tertiary alkyl. A resist composition comprising the polymer has ... 05/03/07 - 20070099113 - Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Sulfonate salts have the formula: CF3—CH(OH)—CF2SO3−M+ wherein M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Because of inclusion within the molecule of a hydroxyl group which is a polar group, the sulfonic acids are effective for restraining the length of acid diffusion through hydrogen bond or the like. ... 05/03/07 - 20070099112 - Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process R1SO3—CH(Rf)-CF2SO3−M+ wherein R1 is alkyl or aryl, Rf is H or trifluoromethyl, and M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oximesulfonates and sulfonyloxyimides and other compounds derived from these sulfonate salts are effective photoacid generators in chemically amplified resist compositions. ... 05/03/07 - 20070099111 - Novel positive photosensitive polybenzoxazole precursor compositions A heat resistant positive-working photosensitive PBO precursor composition comprising: (a) at least one polybenzoxazole precursor polymer; (a) at least one plasticizer compound; (b) at least one solvent; wherein the amount of the plasticizer present in the composition is an amount effective to reduce the sidewall angle of imaged and cured ... 05/03/07 - 20070099110 - Organic anti-reflective coating polymer, organic anti-reflective coating composition and method for forming photoresist pattern wherein R1 is a C1-C5 linear or branched alkyl group, R2 and R3 are each independently hydrogen or methyl, X is halogen, n is a number from 1 to 5, and a, b and c, representing the mole fraction of each monomer, are each independently from about 0.1 to about ... 05/03/07 - 20070099109 - System and method for radiation imaging by in-situ particle formation A radiation image-able coating includes a curable polymer matrix, a metal complex disposed in the curable polymer matrix, wherein the metal complex is configured to form localized metallic particles when exposed to heat. ... 05/03/07 - 20070099108 - Anti-reflective coatings Novel self-crosslinking polymers are provided and which are useful in antireflective coatings to reduce outgassing. ... 05/03/07 - 20070099107 - Resin for positive resist composition, and positive resist composition using the same, laminate and method for forming resist pattern The use of a positive resist composition that includes a resin with a specific structure improves the resolution and yields a resist pattern with a favorable shape. In addition, when a resist layer is formed on either a magnetic film or a metallic oxidation prevention film formed on the magnetic ... 04/26/07 - 20070092836 - Lithographic printing plate precursor and lithographic printing method An on-press development or non-processing (non-development) type lithographic printing plate precursor capable of giving a printout image having a large lightness difference, and a lithographic printing method using this lithographic printing plate precursor are provided, a lithographic printing plate precursor comprising a support and a photosensitive-thermosensitive layer capable of recording ... 04/26/07 - 20070092835 - Photosensitive film A photosensitive film excellent in workability and making it possible, in a normal pressure laminating process, to laminate photosensitive films on the surface of substrate having a metallic surface with a reduced number of air voids generated and in a high product yield, said film comprising a support film (A), ... 04/26/07 - 20070092834 - Photoimageable, thermosettable fluorinated resists The present invention provides fluorinated, thermosettable compositions that are photoimageable and which function as low dielectric materials. Such low dielectric materials are useful as passivation resist layers in liquid crystal displays, electroluminescent displays, light emitting diodes and semiconductor manufacture. ... 04/26/07 - 20070092833 - Image recording media and image layers Imaging layers, image recording media, and methods of preparation of each, are disclosed. ... 04/26/07 - 20070092832 - Method and apparatus for controlled triggering of oxygen scavenging compositions utilizing a wrap-around shade An apparatus is provided for activating an oxygen scavenging composition that includes a plurality of UV lamps arranged in a bank and disposed in a UV chamber; the UV lamps include first and second sides through which UV light is transmittable. A series of guide rolls disposed in the UV ... 04/26/07 - 20070092831 - Radiation-absorbing polymeric materials and ophthalmic devices comprising same A radiation-absorbing polymeric material comprises units of a polymerizable UV-absorbing compound, a violet light-absorbing compound, and a monomer, and is capable of absorbing UV radiation, at least about 90 percent of light having wavelength of 425 nm, less than about 50 percent of light having wavelength of 450 nm, and ... 04/26/07 - 20070092830 - Polymeric radiation-absorbing materials and ophthalmic devices comprising same A polymeric radiation-absorbing material comprises units of a polymerizable benzotriazole-based radiation-absorbing compound and a monomer, and is capable of absorbing UV radiation, at least about 90 percent of light having wavelength of 425 nm, less than about 50 percent of light having wavelength of 450 nm, and less than about ... 04/26/07 - 20070092829 - Photosensitive coating for enhancing a contrast of a photolithographic exposure A photosensitive coating material for enhancing a contrast of a photolithographic exposure of a resist film formed on a substrate, including a base polymer, a solvent for facilitating deposition of the photosensitive coating material upon a surface adjacent to said resist film to form a film thereupon, an alkaline additive ... 04/26/07 - 20070092828 - Nir/ir curable coatings for light directed imaging An imaging medium comprises a substrate and an imaging composition disposed on the substrate. The imaging composition comprises a matrix, a thermochromic compound dispersed or dissolved in the matrix; and at least two photoinitiators dispersed or dissolved in the matrix. ... 04/26/07 - 20070092827 - Inks for use on light-activated imaging media An light activated imaging medium comprises a substrate and an imaging composition disposed on the substrate, the composition comprising a matrix and a color-forming agent within the matrix and an alloy of at least two leuco dyes, the leuco dyes having at least first and second melting points, respectively, and ... 04/19/07 - 20070087288 - Positive-working photosensitive composition and pattern forming method using the same A positive-working photosensitive composition that includes (A) a resin containing repeating units having diamantane structures and capable of decomposing under action of an acid to increase solubility in an alkali developer, (B) a compound capable of generating a specific organic acid upon irradiation with an actinic ray or radiation, and ... 04/19/07 - 20070087287 - Amine compound, chemically amplified resist composition and patterning process Chemically amplified resist compositions comprising amine compounds having a fluorinated alkyl group offer an excellent resolution and a precise pattern profile and are useful in microfabrication by KrF, ArF, F2, EUV, EB or X-ray lithography. They are also effective in the immersion lithography. ... 04/19/07 - 20070087286 - Compositions and processes for photolithography Overcoating layer compositions that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging. ... 04/19/07 - 20070087285 - Top antireflective coating composition with low refractive index at 193nm radiation wavelength Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and a refractive index value n of less than 1.5 with respect to a radiation wavelength of 193 nm have been found which are especially useful as top antireflective coatings in 193 nm dry lithographic processes. Polymers ... 04/12/07 - 20070082292 - Water-soluble material, chemically amplified resist and pattern formation method using the same A water-soluble material used for forming a water-soluble film on a chemically amplified resist film includes a water-soluble polymer, an acid generator and a compound constructing an inclusion compound for incorporating the acid generator. Also, in a pattern formation method, a chemically amplified resist film is formed on a substrate, ... 04/12/07 - 20070082291 - Lithographic printing plate precursor and lithographic printing method An image-recording material containing (A) a compound having a specific partial structure and at least one group selected from an acid group having a pKa of 11 or less, the derivative of the acid group and a group capable of generating the acid group, a lithographic printing plate precursor having ... 04/12/07 - 20070082290 - Planographic printing plate precursor The invention provides a planographic printing plate precursor including a photosensitive layer containing an infrared absorbent, a polymerization initiator, a polymerizable compound, and a binder polymer, and a protective layer containing an inorganic layered compound, formed in this order on a surface of a hydrophilic aluminum support, wherein at least ... 04/12/07 - 20070082289 - Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition A photosensitive composition comprising a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation; a pattern forming method using the photosensitive composition; a compound having a specific structure; and a compound capable of generating a compound having a specific structure upon irradiation ... 04/05/07 - 20070077520 - Recording medium, planographic printing plate using the same and production method thereof The invention provides a recording medium for producing a direct-writing planographic printing plate comprising: a support; a hydrophilic layer; and an ink receiving layer laminated in this order, wherein the ink receiving layer contains one or more compounds selected from the group consisting of organic fluorine compounds having a fluoroalkyl ... 04/05/07 - 20070077519 - Pattern forming method and resist composition used therefor A pattern forming method comprising: coating a resist composition on a substrate; adjusting a rotational speed of the substrate within a range of 500 to 1,500 rpm so that a film thickness of the resist composition coated is adjusted; and subjecting the resist composition to drying, exposure and development, wherein ... 04/05/07 - 20070077518 - Infrared-sensitive planographic printing plate precursor Provided is an infrared-sensitive planographic printing plate precursor, including a supporting plate, a recording layer formed on one face of the supporting plate, the recording layer containing a water-insoluble and alkali-soluble resin and an infrared absorbent and forming an image by irradiation of infrared ray, and an organic polymer layer ... 04/05/07 - 20070077517 - Novel tarc material for immersion watermark reduction A coating material disposed overlying a photo sensitive layer during an immersion lithography process includes a polymer that is substantially insoluble to an immersion fluid and an acid capable of neutralizing a base quencher from the photo sensitive layer. ... 04/05/07 - 20070077516 - Water mark defect prevention for immersion lithography A photoresist material having a polymer that turns soluble to a base solution in response to reaction with acid. The material includes a photo-acid generator (PAG) that decomposes to form acid in response to radiation energy and a quencher capable of neutralizing acid and having a reduced mobility. The photoresist ... 04/05/07 - 20070077515 - Reimageable printing member A reimageable printing member such as for use in flexography, includes a layer having a multiplicity of holes, wherein the holes include therein a dimension change material and a printing material upon the dimension change material. Thus, the holes house vertically expandable units, the top portion of which is capable ... 04/05/07 - 20070077514 - Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board [wherein X1, X2, X3, X4, X5 and X6 each independently represent a CH group, CCH3 group, CC2H5 group or nitrogen, Y1, Y2, Y3 and Y4 each independently represent optionally substituted aryl, and Y5 represents optionally substituted arylene]. ... 04/05/07 - 20070077513 - Positive-working lithographic printing plate precursor A positive-working lithographic printing plate precursor is disclosed which comprises (i) a grained and anodized aluminum support having a hydrophilic surface and (ii) a heat-sensitive oleophilic coating provided on the hydrophilic surface, wherein said coating comprises (a) a hydrophobic polymer which is soluble in an aqueous alkaline developer and (b) ... 04/05/07 - 20070077512 - Resist composition for electron beam or euv A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, as the principal component, one or more compounds selected from ... 03/29/07 - 20070072122 - Photosensitive polymer composition, method of forming relief patterns, and electronic equipment A photosensitive polymer composition, having (a) a polymer selected from polyimide precursors and polyimides having an acid group protected by a protecting group and having no amino group (—NH2) at the end; and (b) a compound that generates an acid when exposed to light and capable of deprotecting the protecting ... 03/29/07 - 20070072121 - Positive resist composition and pattern forming method using the same in the formula (Ia), AR represents an aromatic group, and X1 represents a group having a carbon number of 5 or more and being capable of decomposing under the action of an acid, and in the formula (A1), m represents an integer of one of 1 and 2. ... 03/29/07 - 20070072120 - Method for producing resin for chemically amplified positive resist A method for producing a resin for a chemically amplified positive resist by polymerizing at least one monomer and/or at least one oligomer which is polymerized to provide a resin for a chemically amplified positive resist, in which two or more polymerization initiators are used to initiate the polymerization, thereby ... 03/29/07 - 20070072119 - Lithographic printing plate precursor and lithographic printing method A lithographic printing plate precursor comprising a support and an image-recording layer containing at least one infrared absorbing agent of a cyanine dye in which a HOMO energy level of each of substituents present on both terminal nitrogen atoms is −10.0 eV or higher. ... 03/29/07 - 20070072118 - Positive photosensitive composition and pattern forming method using the same wherein R1 represents a hydrogen atom or an alkyl group, m represents an integer of from 1 to 30, n represents an integer of from 0 to 3, and p represents an integer of from 0 to 5. ... 03/29/07 - 20070072117 - Positive resist composition and pattern forming method using the same A positive resist composition comprising: a compound having at least two acid-decomposable groups, an aromatic ring and an alkylene or cycloalkylene chain and having a molecular weight of 2,000 or less, of which solubility in an alkali developer increases under an action of an acid; and a compound represented by ... 03/29/07 - 20070072116 - Lithographic printing plate precursor and lithographic printing method A lithographic printing plate precursor comprising a hydrophilic support, an undercoat layer and a laser-sensitive photopolymerizable layer, wherein the undercoat layer contains a copolymer containing (a1) a repeating unit having at least one ethylenically unsaturated bond and (a2) a repeating unit having at least one functional group capable of interacting ... 03/29/07 - 20070072115 - Positive resist compositions and patterning process A polymer is obtained from (meth)acrylate having a bridged ring lactone group, (meth)acrylate having an acid-labile leaving group, and (meth)acrylate having a hydroxynaphthyl pendant. A positive resist composition comprising the polymer as a base resin, when exposed to high-energy radiation and developed, exhibits a high sensitivity, a high resolution, and ... 03/29/07 - 20070072114 - Infrared-sensitvive planographic printing plate precursor According to an aspect of the invention, there is provided an infrared-sensitive planographic printing plate precursor including: a support; a recording layer on one surface of the support, which recording layer contains a water-insoluble and alkali-soluble resin and an infrared absorber, and is capable of forming an image by infrared ... 03/29/07 - 20070072113 - Photosensitive composition, and lithographic printing plate precursor and image-recording method using the same A photosensitive composition comprising: a compound having two or more mercapto groups directly connected to a hetero ring; a hexaarylbiimidazole compound; a sensitizing dye; and a polymerizable compound having an ethylenically unsaturated double bond. ... 03/29/07 - 20070072112 - Coating compositions In one aspect, coating compositions are provided that comprise a component a component that comprises one or more silicon, antimony, aluminum, yttrium, cerium, lanthanum, tin, titanium, zirconium, hafnium, indium or zinc compounds. In another aspect, coating compositions are provided that comprise a plurality of discrete particles. Preferred coating compositions of ... 03/29/07 - 20070072111 - Antireflective hardmask composition and methods for using same (b) a crosslinking component; and (c) an acid catalyst. ... 03/29/07 - 20070072110 - Reimageable paper An image forming medium includes a substrate and a mixture including a photochromic material and a solvent wherein the mixture is coated on the substrate, such that the photochromic material exhibits a reversible homogeneous-heterogeneous transition between a colorless state and a colored state in the solvent. ... 03/29/07 - 20070072109 - Thick film or ultrathick film responsive chemical amplification type photosensitive resin composition [Solving means] A chemically amplified photosensitive resin composition including an alkali soluble novolak resin (A), a resin or compound (B) which in itself is insoluble or slightly soluble in alkali, but becomes soluble in alkali by the action of an acid, that is acid generating agent (C), and a photosensitizing ... 03/22/07 - 20070065754 - Planographic printing plate material The planographic printing plate material has a support and provided thereon, a photopolymerizable light sensitive layer and a protective layer in that order. The protective layer contains a polyvinyl alcohol derivative A having a saponification degree of 90 to 100 mol % and a solubility of 20 to 200 g ... 03/22/07 - 20070065753 - Positive resist composition for immersion exposure and pattern forming method using the same A positive resist composition, comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin having a repeating unit containing at least one alicyclic structure, of which solubility in an alkali developer increases under an action of an acid; and (C) an ... 03/22/07 - 20070065752 - Positive resist composition and pattern forming method using the same A positive resist composition comprising: at least one compound selected from a compound capable of generating an acid represented by the formula (I) as defined herein upon irradiation with actinic rays or radiation and a compound capable of generating an acid represented by the following formula (II) upon irradiation with ... 03/22/07 - 20070065751 - Water-soluble photopolymer composition for flexographic printing and water-soluble photosensitive original printing plate for flexographic printing A water-soluble photopolymer composition for flexographic printing is provided which can be water developed and can form a photosensitive original printing plate for flexographic printing having a good flexibility and impact resilience as well as an adequate Shore hardness value. The water-soluble photopolymer composition for flexographic printing contains a water-soluble ... 03/22/07 - 20070065750 - Process for highly purified polyhedral oligomeric silsesquioxane monomers A synthesis process for polyhedral oligomeric silsesquioxanes that produces in high yield a low resin content, solvent free, and trace metal free monomer suitable for use in microelectronic applications. POSS silanols are reacted with a silane coupling agent in the presence of a solvent and a superbase. ... 03/22/07 - 20070065749 - Radiation-markable coatings for printing and imaging An light activated image recording medium, comprises a substrate, optionally, a color layer; and a layer of light-scattering pigment that becomes at least translucent when heated to a predetermined temperature. ... 03/22/07 - 20070065748 - Resin for photoresist composition, photoresist composition and method for forming resist pattern A resin for photoresist compositions is disclosed with excellent resolution and line edge roughness characteristics. A photoresist composition and a method for forming a resist pattern using such a resin are also disclosed. The resin has a hydroxyl group bonded to a carbon atom at a polymer terminal, and the ... 03/22/07 - 20070065747 - Norbornene derivative, norbornene polymer produced by ring-opening (co)polymerization, and process for producing the polymer by ring-opening (co)polymerization According to the present invention, a novel norbornene derivative that is useful as a precursor monomer for preparing a cycloolefin polymer exhibiting excellent transparency, heat resistance and low-water absorption properties and having been freely controlled in the birefringence properties and the wavelength dispersion properties can be provided. According to the ... 03/15/07 - 20070059640 - Processing method of substrate and processing apparatus of substrate A processing method of a substrate is capable of improving wettability on a surface of a resist film with respect to a developer without adverse effect on processing size of resist pattern, or without damage on the resist film. In the processing method it is also unnecessary to make separate ... 03/15/07 - 20070059639 - Positive resist composition and pattern-forming method using the same A positive resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid and not containing a silicon atom; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, (C) a silicon atom-containing resin having at ... 03/15/07 - 20070059638 - Photosensitive resin composition The present invention provides a photosensitive resin composition having improved stability in a bright room, which can provide a printing plate material having superior image remaining property and printing durability, which can be subjected to alkaline development. Accordingly, the present invention relates to a photosensitive resin composition comprising an ethylenically ... 03/15/07 - 20070059637 - Photosensitive resin composition The present invention provides a photosensitive resin composition which can provide a printing plate material having superior image remaining property and printing durability, which can be subjected to alkaline development. The present invention relates to a photosensitive resin composition comprising an ethylenically unsaturated compound, an alkali-soluble resin, a near-infrared-absorbing dye, ... 03/15/07 - 20070059636 - Light sensitive planographic printing plate material Disclosed is a light sensitive planographic printing plate material comprising a support and provided thereon, a light sensitive layer, wherein the light sensitive layer contains a polymerizable ethylenically unsaturated compound, a photopolymerization initiator, a polymeric binder, a sensitizing dye, and a copolymer having a first unit represented by formula (1), ... 03/15/07 - 20070059635 - Antireflective hardmask composition and methods for using same R7 may each independently be hydrogen, alkyl, aryl, allyl, or any combination thereof; and n may be a positive integer; (b) a crosslinking component; and (c) an acid catalyst. ... 03/15/07 - 20070059634 - Non-outgassing low activation energy resist Numerous embodiments of a method to prevent outgassing from a low activation energy photoresist are described. In one embodiment of the present invention, a photoresist material is dispensed over a substrate to form a photoresist layer. The photoresist layer includes branched polymers coupled with acetal or ketal linkages. An exposed ... 03/15/07 - 20070059633 - Photoacid generator wherein X represents a metal atom. The iridium hydride complex of the present invention can be used as an acid generator for chemically-amplified photoresists or color filters for liquid crystal, and in addition, can be widely applied in photographic-related or printing-related fields, or the like. ... 03/15/07 - 20070059632 - Method of manufacturing a semiconductor device wherein R1, R2, R4, R5, m0 to m2, and n0 to n2 are as defined in the description. Radiation sensitive compositions containing the compound of the formula 1 as a main component of the solid component are excellent in sensitivity, resolution, heat resistance, etching resistance, and solubility in solvent. ... 03/08/07 - 20070054218 - Radiation curable resin composition for making colored three dimensional objects A radiation curable resin composition suitable for making three dimensional objects comprising at least one epoxy compound, a cationic photoinitiator, wherein the resin composition has a first color or no color before cure and wherein a three dimensional object made from the resin by subjecting the resin to radiation shows ... 03/08/07 - 20070054217 - Positive photosensitive composition and pattern-forming method using the same A positive photosensitive composition comprises: (A) a compound capable of generating an acid upon irradiation with actinic ray or radiation; and (B) a resin having a group capable of decomposing by action of an acid to increase solubility of the group in an alkali developer, wherein the resin (B) comprises: ... 03/08/07 - 20070054216 - Near-infrared ray absorbing material and production method of the same A method of producing a near-infrared ray absorbing material comprising the steps of: applying a coating liquid of a near-infrared ray absorbing layer comprising a near-infrared ray absorbing dye and a latex onto a support to form a coated layer; and drying the coated layer by heat to form a ... 03/08/07 - 20070054215 - Reimageable paper An image forming medium includes a substrate and an imaging layer including a photochromic material and a polymer binder coated on the substrate, where the photochromic material exhibits a reversible homogeneous-heterogeneous transition between a colorless state and a colored state in the polymer binder. ... 03/08/07 - 20070054214 - Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions wherein R1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl, R2 to R4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable ... 03/01/07 - 20070048663 - Photopolymerizable photosensitive lithographic printing plate A negative type photopolymerizable photosensitive lithographic printing plate, which is capable of image-recording with laser beams, comprising: a hydrophilic support; at least one photopolymerizable photosensitive layer; and a protective layer, in this order, wherein the at least one photosensitive layer comprises: (i) a sensitizing dye having absorption maximum in a ... 03/01/07 - 20070048662 - Photoresist composition and method of manufacturing a thin-film transistor substrate using the same A photoresist composition includes about 10 to about 70% by weight of a binder resin including a phenol-based polymer, about 0.5 to about 10% by weight of a photo-acid generator, about 1 to about 20% by weight of a cross-linker, about 0.1 to about 5% by weight of a dye ... 03/01/07 - 20070048661 - Infrared-sensitive planographic printing plate precursor An infrared-sensitive planographic printing plate precursor including: a support; a recording layer capable of forming an image through infrared irradiation provided on or above one surface of the support, the recording layer containing a resin, which is water-insoluble and alkali-soluble, and an infrared absorbent; and an organic polymer layer provided ... 03/01/07 - 20070048660 - Resist composition, method for forming resist pattern, semiconductor device and method for manufacturing thereof A composition contains a resist material and an ammonium sulfate. A resist pattern formed from the composition can be uniformly thickened by a resist thickening material, thereby allowing formation of fine patterns beyond the resolution limit of the exposure devices. ... 03/01/07 - 20070048659 - Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same The object of the present invention is to provide a resist pattern thickening material, etc. which, when coated over a resist pattern formed of ArF resist material, etc., can efficiently thicken the resist pattern such as lines and spaces pattern, etc. regardless of the composition of ArF resist material, and ... 02/22/07 - 20070042293 - Lithographic printing plate precursor and lithographic printing process A lithographic printing plate precursor, which comprises: a support; an image-recording layer; and a protective layer, in this order, wherein at least one of the image-recording layer and the protective layer comprises a phosphonium salt having a specific structure, and a lithographic printing process, which comprises: exposing a lithographic printing ... 02/22/07 - 20070042292 - Radiation sensitive resin composition in the formula (1-1), R1 represents a methyl group and the like and X represents a specific polycyclic alicyclic hydrocarbon group and the like, in the formula (1-2), R1 represents a methyl group and the like and Z represents an acid-dissociable group which is dissociable by the action of an ... 02/22/07 - 20070042291 - Positive resist composition and a pattern forming method using the same A positive resist composition comprises (A) a compound capable of generating sulfonic acid, bis(alkylsulfonyl)amide, or tris(alkylsulfonyl)methine upon irradiation with actinic ray or radiation, and (B) a resin capable of increasing the solubility in an alkali developer by action of an acid having specific repeating units, and a pattern forming method ... 02/22/07 - 20070042290 - Positive resist composition for immersion exposure and pattern-forming method using the same A positive resist composition for immersion exposure comprises: (A) a resin capable of increasing its solubility in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, wherein the acid satisfies conditions of V≧230 and ... 02/22/07 - 20070042289 - Coating compositions for use with an overcoated photoresist Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating ... 02/22/07 - 20070042288 - Positive photoresist composition and method for forming resist pattern The invention provides a positive photoresist composition which exhibits a high level of etching resistance and attains high resolution, and enables the formation of a fine pattern using an electron beam exposure step, as well as a method for forming a resist pattern that uses the positive photoresist composition. This ... 02/15/07 - 20070037091 - Chemically amplified positive resist composition and patterning process A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline developer under the action of acid, and a basic compound has a high sensitivity, a high contrast of dissolution of resist film, a high resolution, and ... 02/15/07 - 20070037090 - Radiation sensitive material and method for forming pattern was obtained by loading adamantyl methacrylate monomer and t-butyl acrylate monomer by 1:1, then conducting polymerization, adding AIBN as a polymerization initiator, and then conducting precipitation purification with methanol. Then to the copolymer, triphenylsulfonium hexafluoroantimonate was added to prepare a cyclohexanone solution. This solution was applied to a wafer, and ... 02/15/07 - 20070037089 - Structure and method for improving photoresist pattern adhesion An anti-reflective coating comprises a plurality of main backbone chains, and at least one long free polymer chain coupled to at least one of the plurality of main backbone chains. ... 02/15/07 - 20070037088 - Color forming composition containing a plurality of antenna dyes A radiation image-able coating includes a first phase including a radiation curable polymer matrix and an activator disposed in the radiation curable polymer matrix, a second phase insolubly distributed in the first phase, the second phase including a color-former, and a hybrid antenna dye package distributed in at least one ... 02/08/07 - 20070031758 - Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material The positive-type radiation-sensitive resin composition for producing a metal-plating formed material relating to the present invention comprises (A) a polymer containing a structural unit having an acid-dissociative functional group, which is dissociated in the presence of an acid to generate an acidic functional group, and a crosslinking structure; (B) a ... 02/08/07 - 20070031757 - Positive photosensitive composition and method of pattern formation with the same A positive photosensitive composition comprising: (A) a compound which generates an acid upon irradiation with actinic rays or a radiation; (B) a resin which decomposes by an action of an acid to come to have an enhanced solubility in an alkaline developing solution; and (F) a solvent, wherein the resin ... 02/08/07 - 20070031756 - Photosensitive resin composition, method of forming level difference pattern using the photosensitive resin composition, and method of producing ink jet head To provide a positive type photosensitive resin composition, containing at least an acrylic resin having a carboxylic anhydride structure in a molecule, and a compound that generates an acid when irradiated with light. ... 02/08/07 - 20070031755 - Material for forming resist-protecting film for immersion exposure process, resist-protecting film made of such material, and method for forming resist pattern using such resist-protec- ting film The resist protective film forming material for liquid immersion lithography is provided, which is suitable when the non-aqueous solution with a high transparency and high refractive index exemplified by the fluorinated liquid is used. The resist protective film forming material includes at least one component selected from water-soluble and alkali-soluble ... 02/01/07 - 20070026344 - Infrared-sensitive planographic printing plate precursor The present invention provides an infrared-sensitive planographic printing plate precursor including: a support; a recording layer on one surface of the support, which recording layer contains a water-insoluble and alkali-soluble resin, an infrared absorber and a long-chain alkyl group-containing polymer, and is capable of forming an image by infrared irradiation; ... 02/01/07 - 20070026343 - Chemical amplification-type resist composition and production process thereof A production process of a chemical amplification-type resist composition, which is a process for producing a chemical amplification-type composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer is changed under an action ... 02/01/07 - 20070026342 - Imageable printing plate for on-press development A novel coating for lithographic printing plates can be imagewise exposed to radiation and then directly processed with only water to remove the non-exposed regions of the coating. The coating comprises a polymer, a monomer and/or oligomer, polymerization or cross link initiator, stabilizer, and dye or pigment, such that after ... 02/01/07 - 20070026341 - Resist protective coating material and patterning process A resist protective coating material is provided comprising an α-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of ... 02/01/07 - 20070026340 - Method of removing photoresist and photoresist rework method A method of removing photoresist is provided. In the whole process of removing the photoresist, plasma is not used. Instead, a first solution is used in a first removal step to remove a photoresist layer. Then, a second solution is used in a second removal step to completely remove the ... 02/01/07 - 20070026339 - Negative resists based on a acid-catalyzed elimination of polar molecules The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and ... 01/25/07 - 20070020559 - Positive-type photosensitive resin composition and cured film manufactured therefrom A positive-type photosensitive resin composition comprising component (A): an alkali-soluble resin having a functional group which undergoes heat crosslinking reaction with a compound of component (B), a functional group for film curing which undergoes thermoset reaction with a compound of component (C), and a number average molecular weight of 2,000 ... 01/25/07 - 20070020558 - Process for the preparation of a photoresist solution The invention relates to a process for the preparation of a photosensitive photoresist solution, characterized in that a novolak resin and a diazonaphthoquinonesulphonyl chloride are dissolved in a solvent from the group consisting of the photoresist solvents, a proportion of from 1 to 70 mol % of the phenolic hydroxyl ... 01/25/07 - 20070020557 - New organic bottom antireflective polymer compositions The present invention relates to bottom antireflective coating compositions, polymers useful in making such compositions, and their use in image processing by forming a thin layer between a reflective substrate and a photoresist coating. ... 01/25/07 - 20070020556 - Photosensitive articles and related manufacturing process A decorative photosensitive article having a design formed of a plurality of polyvinyl chloride plasticizers. At least one of the polyvinyl chloride plasticizers includes a photochromic pigment such that when exposed to light, the polyvinyl chloride plasticizer portion of the design having the photochromic pigment changes color, whereas the other ... 01/25/07 - 20070020555 - Photosensitive composition, photosensitive lithography plate and method for producing lithography plate Disclosed is a light sensitive composition containing a compound A having a group capable of undergoing radical polymerization, a compound B having a group capable of undergoing cationic polymerization, a photopolymerization initiator C, and a polymer binder D, the light sensitive composition being characterized in that the photopolymerization initiator C ... 01/18/07 - 20070015087 - Photosensitive composition A photosensitive composition comprising: (A) a sensitizing dye selected from the group consisting of compounds represented by formulae (1) and (2) defined herein; (B) an initiator compound capable of generating a radical, an acid or a base; and (C) a compound capable of changing irreversibly its physical or chemical property ... 01/18/07 - 20070015086 - Photosensitive composition, photosensitive planographic printing plate material, and image forming method of photosensitive planographic printing plate material A photosensitive composition containing: (A) a polymerizable compound containing an ethylenic double bond in the molecule; (B) a photopolymerization initiator; (C) a polymer binder; and (D) a dye exhibiting a maximum absorption wavelength of 350-450 nm, wherein the dye is represented by Formula (1): ... 01/18/07 - 20070015085 - Planographic printing plate material and method of forming visible image A planographic printing plate material comprising a substrate having a hydrophilic surface and a thermosensitive image formation layer on the hydrophilic surface, the thermonsensitive image formation layer being capable of changing from hydrophilic to hydrophobic by applying heat or light, wherein an electron donating color former and a water soluble ... 01/18/07 - 20070015084 - Photoactive compounds The present application relates to a compound of formula A-X-B, where (i) A-X-B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R500—SO3− or (ii) A-X-B form a non-ionic compound Ac-Xc-Bc, where Ai, Bi, ... 01/18/07 - 20070015083 - Antireflective composition and process of making a lithographic structure wherein 1≦x≦2; 1≦y≦5; 1≧0; m>0; n>0; R is a chromophore, M is a metal selected from Group IIIB to Group VIB, lanthanides, Group IIIA, Group IVA except silicon; and L is an optional ligand. The invention is also directed to a process of making a lithographic structure including a silicon-metal ... 01/18/07 - 20070015082 - Process of making a lithographic structure using antireflective materials A lithographic structure comprising: an organic antireflective material disposed on a substrate; and a silicon antireflective material disposed on the organic antireflective material. The silicon antireflective material comprises a crosslinked polymer with a SiOx backbone, a chromophore, and a transparent organic group that is substantially transparent to 193 nm or ... 01/18/07 - 20070015081 - Polycarbonate compositions having infrared absorbance, method of manufacture, and articles prepared therefrom A composition is disclosed, comprising a polycarbonate resin, an inorganic infrared shielding additive, and carbon black, wherein an article prepared from the composition has the inorganic infrared shielding additive present at about 0.01 to about 1.0 grams per square meter, and carbon black present at about 0.001 to about 2.0 ... 01/18/07 - 20070015080 - Photoresist composition for imaging thick films The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, a photoacid generator which produces a strong acid upon irradiation and a photobleachable dye. The invention further provides for ... 01/11/07 - 20070009833 - Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same A photoresist composition, a method for forming a film pattern using the photoresist composition, and a method for manufacturing a thin film transistor array panel using the photoresist composition are provided. In one embodiment, a photoresist composition includes an alkali-soluble resin, a photosensitive compound, and an additive, for advantageously providing ... 01/11/07 - 20070009832 - Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process Silicon compounds having fluorinated hemiacetal structure are provided. Silicone resins having the same structure have an appropriate acidity to enable formation of a finer pattern by minimizing the pattern collapse by swelling, exhibit improved resistance to the etching used in the pattern transfer to an organic film, and are thus ... 01/11/07 - 20070009831 - Planographic printing plate material and image formation method Disclosed is a planographic printing plate material comprising an aluminum support and provided thereon, a light sensitive layer containing an acid-generating agent composition generating an acid on violet laser beam exposure, a cationically polymerizable monomer which polymerizes by action of an acid, and an alkali-soluble polymeric binder, wherein the light ... 01/11/07 - 20070009830 - Underlayer compositons containing heterocyclic aromatic structures A composition suitable for use as a planarizing underlayer in a multilayer lithographic process is disclosed. The inventive composition comprises a polymer containing heterocyclic aromatic moieties. In another aspect, the composition further comprises an acid generator. In yet another aspect, the composition further comprises a crosslinker. The inventive compositions provide ... 01/11/07 - 20070009829 - Laser sensitive lithographic printing plate having a darker aluminum substrate A laser sensitive lithographic printing plate comprises an electrochemically grained, anodized, hydrophilically treated aluminum substrate with a reflection optical density of 0.30 or higher; a free radical polymerizable photosensitive layer; and a water soluble or dispersible overcoat. The photosensitive layer comprises a polymeric binder, a free radical polymerizable monomer, a ... 01/11/07 - 20070009828 - Positive resist composition, resist laminates and process for forming resist patterns A positive resist composition, comprising a resin component (A) that exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the component (A) includes either a silsesquioxane resin (A1) containing structural units (a1) represented by a general formula (I) ... 01/04/07 - 20070003871 - Positive photosensitive composition A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer. ... 01/04/07 - 20070003870 - Heat-sensitive lithographic printing plate precursor R4 and R5 are independently an optionally substituted alkyl, cycloalkyl, aryl or arylalkyl group. The precursor exhibits an excellent differentiation in dissolution kinetics between the exposed and non-exposed areas of the coating and a high chemical resistance against printing liquids and press chemicals. ... 01/04/07 - 20070003869 - Heat-sensitive lithographic printing plate-precursor The precursor exhibits an excellent differentiation in dissolution kinetics between the exposed and non-exposed areas of the coating and a high chemical resistance against printing liquids and press chemicals. ... 01/04/07 - 20070003868 - Systems and methods for fabricating blanks for microstructure masters by imaging a radiation sensitive layer sandwiched between outer layers, and blanks for microstructure masters fabricated thereby Microstructures are fabricated by imaging a microstructure master blank that includes a radiation sensitive layer sandwiched between a pair of outer layers, on an imaging platform, to define the microstructures in the radiation sensitive layer. At least one of the outer layers is then removed. The microstructures that were defined ... 01/04/07 - 20070003867 - Resist protective coating material and patterning process A resist protective coating material is provided comprising a polymer having a partial structure of formula (1) wherein R0 is H, F, alkyl or alkylene, and R1 is fluorinated alkyl or alkylene. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable ... 01/04/07 - 20070003866 - Photosensitive composition, photosensitive planographic printing plate material, and image forming method of the same A photosensitive composition comprising: (A) an addition-polymerizable compound containing an ethylenic double bond in the molecule; (B) an iron-arene complex which acts as a photopolymerization initiator; (C) a polymer binder; and (E) a siloxane glycol copolymer. ... 01/04/07 - 20070003865 - Imaging methods An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts. ... 01/04/07 - 20070003864 - Compositions and methods for image development of conventional chemically amplified photoresists Methods for carrying out lithography with a carbon dioxide development system are described. This invention involves methods for preferential removal of the darkfield region of conventional chemically amplified positive tone resists. The carbon dioxide development systems include one or more derivatizing agents, which may be an onium salt or a ... 01/04/07 - 20070003863 - Antireflective hardmask composition and methods for using same wherein A is a bivalent radical selected from the group consisting of carbonyl, oxy, alkylene, fluoroalkylene, phenyldioxy, and any combination thereof; R1 and R2 are each independently a bivalent radical selected from the group consisting of an alkylene, an arylene, and any combination thereof; and x, y, and z are ... 01/04/07 - 20070003862 - Resist composition, method of forming resist pattern, semiconductor device and method of manufacturing thereof The resist composition of the present invention contains at least one of a tannin and a derivative thereof. The method of forming a resist pattern of the present invention includes: forming a resist film on a surface of an object to be processed, by using the resist composition; and exposing ... 01/04/07 - 20070003861 - Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same wherein R1 and R2 are independently hydrogen, fluoro, methyl or fluoromethyl; R3 is a C1-10 hydrocarbon or a C1-10 hydrocarbon in which the hydrogen atoms are partly replaced by fluorine atoms; and a, b and c, representing the mole fraction of each monomer, are in the range between 0.05 and ... 01/04/07 - 20070003860 - Substrate adhesion improver for photosensitive resin composition and photosensitive resin composition containing the same wherein R1 to R4 each independently represent a hydrogen atom, a halogen atom or a C1-5 alkyl group; R5 to R9 each independently represent a hydrogen atom, a hydroxyl group, a C1-10 alkyl group, an aryl group, a C7-12 aralkyl group, —R10COOR11, or —R10CO—(OCH2CH2)n-OH provided that at least one of ... 12/28/06 - 20060292491 - Method of treating and removing a photoresist pattern and method of manufacturing a semiconductor device using the same Example embodiments of the present invention relate to methods of treating and removing a photoresist pattern and a method of manufacturing a semiconductor device using the same. Other example embodiments of the present invention relate to a method of treating a photoresist pattern and a method of removing a photoresist ... 12/28/06 - 20060292490 - Positive photosensitive composition and pattern forming method using the same A positive photosensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B1) a resin of which solubility in an alkali developer increases under an action of an acid; and (B2) a resin that has at least one group selected from (a) ... 12/28/06 - 20060292489 - Photoresist monomer polymer thereof and photoresist composition including the same In the above Formula, R* is a hydrogen or methyl group, R1 is saturated hydrocarbyl group of 1 to 5 carbon atoms, R is mono-cyclic or multi-cyclic homo or hetero saturated hydrocarbyl group of 3 to 50 carbon atoms, and n is an integer of at least 2. ... 12/28/06 - 20060292488 - Composition for formation of antireflection film, and antireflection film in which the same is used A composition for formation of an antireflection film having an excellent etching resistant characteristic and ability to prevent reflection of short-wavelength light (absorption ability of short-wavelength light) as well as excellent time dependent stability, and an antireflection film in which the same is used, are provided. A composition for formation ... 12/28/06 - 20060292487 - Printing plate and patterning method using the same A patterning method includes depositing a pattern target layer on a surface of a substrate, providing a printing plate with concaves in a first side of a transparent substrate and an opaque layer on the first side except in the concaves of the first sides, filling resins into the concaves ... 12/28/06 - 20060292486 - Processless lithographic printing plate precursor A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of chemically bonding to the hydrophobic polymer and to the hydrophilic polymer. The radiation-sensitive medium further may comprise a substance capable of converting radiation into heat. The ... 12/28/06 - 20060292485 - Topcoat compositions and methods of use thereof A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from the group consisting of α,α,α-trifluorotoluene, 2,2,3,3,4,4,5,5-octafluoropentyl-1,1,2,2-tetrafluoroethyl ether (OFP-TFEE), and a mixture consisting of a hydrophobic alkane and an alcohol is provided. Also provided is method of forming an image on a photoresist that includes forming a ... 12/28/06 - 20060292484 - Preparation of topcoat compositions and methods of use thereof A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from an alcohol is provided. Also provided is a method of forming an image on a photoresist that includes forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing ... 12/21/06 - 20060286482 - Lithographic apparatus and device manufacturing method utilizing a resettable or reversible contrast enhancing layer in a multiple exposure system A device manufacturing system and method are used to perform multiple exposures utilizing a resettable or reversible contrast enhancing layer. A radiation sensitive layer is formed on a substrate. A resettable or reversible contrast enhancing layer is formed on the radiation sensitive layer. The resettable or reversible contrast enhancing layer ... 12/21/06 - 20060286481 - Thermochromic recording medium A thermochromic reimageable recording medium comprises a substrate and thermochromic composition comprising a photochromic material, a transition metal salt and a binder. The thermochromic composition changes color from a colorless state to a colored state upon application of heat. The thermochromic recording medium may be used to display a viewable ... 12/14/06 - 20060281025 - Chemically amplified resist material and pattern formation method using the same In a pattern formation method, a resist film made of a chemically amplified resist material including a first polymer having hemiacetal or hemiketal is formed on a substrate. Then, with a liquid provided on the resist film, pattern exposure is performed by selectively irradiating the resist film with exposing light. ... 12/14/06 - 20060281024 - Printing element with an integral printing surface A relief image printing element with an integral imageable printing surface and a method of preparing the relief image printing element are described. The relief image printing element comprises a dimensionally stable base layer; a floor layer comprised of a cured polymer selected from the group consisting of photopolymers, and ... 12/14/06 - 20060281023 - Negative photoresist composition There is provided a negative photoresist composition, which is used in a method of forming a pattern in which an underlayer film is provided on a substrate, a photoresist film formed from the negative photoresist composition is provided on top of the underlayer film, the photoresist film is selectively exposed, ... 12/14/06 - 20060281022 - Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.0 4.8] nonan-3-one ring and photoresist resin composition wherein Ra is a hydrogen atom, a halogen atom, an alkyl group of 1 to 6 carbon atoms or an haloalkyl group of 1 to 6 carbon atoms; each of R1 and R2 is identical to or different from a hydrogen atom or a hydrocarbon group, provided that at least ... 12/07/06 - 20060275702 - Negative-working photosensitive resin composition and photosensitive resin plate using the same wherein -X represents —OR2, —COOH, —SO3H, —CONHR2, —COR2, —SO2NHR2, —HNCONHR2, or —HNCOOR2; R1 and R2, which may be the same or different, each represents a hydrogen atom, a substituted or unsubstituted, saturated or unsaturated hydrocarbon group, provided that it does not contain a radical polymerizable ethylenic double bond, a substituted ... 12/07/06 - 20060275701 - Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions Copolymers prepared by copolymerization of at least one fluorinated vinyl ether are provided. In one embodiment, the at least one fluorinated vinyl ether comprises ethylene directly substituted at an olefinic carbon atom with a moiety —OR* and optionally substituted with one, two, or three additional nonhydrogen substituents, wherein R* comprises ... 12/07/06 - 20060275700 - Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same A photosensitive resin composition for an organic layer pattern includes about 100 parts by weight of an acryl-based copolymer and about 5 to about 100 parts by weight of a 1,2-quinonediazide compound. The acryl-based copolymer is prepared by copolymerizing about 5 to about 60 percent by weight of an isobonyl ... 12/07/06 - 20060275699 - Novel photosensitive resin compositions n is an integer from 1 to 5; and each R1 is defined as above; and (f) at least one solvent; wherein the amount of the compound of Structure VI present is an amount effective to inhibit residue from forming when the composition is coated on a substrate and the ... 12/07/06 - 20060275698 - Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use Described herein are novel thermally reactive near-infrared absorbing acetal copolymers that undergo chemical and physical changes upon exposure to near-infrared radiation. Also described are the methods of preparation of the novel acetal copolymers starting either with vinyl-alcohol polymers or with acetal copolymers. Also described are the methods of use of ... 12/07/06 - 20060275697 - Top coating composition for photoresist and method of forming photoresist pattern using the same Provided are a top coating composition for a photoresist which can be used in immersion lithography, and a method of forming a photoresist pattern using the same. The top coating composition includes: a polymer including at least three different structural repeating units including a first repeating unit comprising a carboxy ... 12/07/06 - 20060275696 - Coating compositions for use with an overcoated photoresist In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a resin component with a blend of distinct resins, wherein at least one resin of the mixture comprises chromophore groups and at least one resin of the mixture is at least substantially or completely ... 12/07/06 - 20060275695 - Polymer for immersion lithography, photoresist composition containing the same, method of manufacturing a semiconductor device, and semiconductor device A polymer for immersion lithography comprising a repeating unit represented by Formula 1 and a photoresist composition containing the same. A photoresist film formed by the photoresist composition of the invention is highly resistant to dissolution, a photoacid generator in an aqueous solution for immersion lithography, thereby preventing contamination of ... 12/07/06 - 20060275694 - High resolution silicon-containing resist Non-chemically amplified radiation sensitive resist compositions containing silicon are especially useful for lithographic applications, especially E-beam lithography. More particularly, radiation-sensitive resist compositions comprising a polymer having at least one silicon-containing moiety and at least one radiation-sensitive moiety cleavable upon radiation exposure to form aqueous base soluble moiety can be used ... 12/07/06 - 20060275693 - Compositions, systems, and methods for imaging A composition, method, and system for recording an image. The system includes a multiphase imaging material in which energy is absorbed by an antenna material. The absorbed energy causes the reaction of an activator and a color-forming material. ... 11/30/06 - 20060269871 - Polymer, resist composition and patterning process A polymer comprising recurring units of formula (1) wherein R1 is F or fluoroalkyl, R2 is alkylene or fluoroalkylene, and R3 is an acid labile group and having a Mw of 1,000-500,000 is used to formulate a resist composition, which is processed by the lithography involving ArF exposure and offers ... 11/30/06 - 20060269870 - Novel polymerizable ester compounds Ester compounds having formula (1) wherein R1 is fluorine or C1-C10 fluoroalkyl, R2 is C1-C10 alkylene or fluoroalkylene, and R3 is an acid labile group are novel. They can be polymerized into polymers which are used to formulate resist compositions, which are processed by the lithography involving ArF exposure, offering ... 11/30/06 - 20060269869 - Aluminum support for light sensitive planographic printing plate material and light sensitive planographic printing plate material Disclosed is an aluminum support for a light sensitive planographic printing plate material, the aluminum support having an average surface roughness (Ra) of 0.40 to 0.65 μm, and Mr1 of 3.0 to 6.0%, and an Mr1 of 80 to 86%, the Mr1 and Mr2 being measured according to JIS B0671-2 ... 11/30/06 - 20060269868 - Ester group-containing poly (imide-azomethine) copolymer, ester group-containing poly (amide acid-azomethine) copolymer, and positive photosensitive resin composition wherein in the formulas (1) and (2), A and D are each independently a divalent aromatic or aliphatic group with D containing an ester group; and B is a tetravalent aromatic or aliphatic group. ... 11/30/06 - 20060269867 - Antireflective hardmask composition and methods for using same Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include: a) a polymer component, including a first monomeric unit and a second monomeric unit, wherein both the first monomeric unit ... 11/23/06 - 20060263723 - Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device is contained in a structure of the alkaline-soluble resin or in a structure of a compound used in combination with the alkaline-soluble resin, is disclosed. ... 11/23/06 - 20060263722 - Photoresist, photolithography method using the same, and method for producing photoresist There is provided a positive photoresist for near-field exposure excellent in light utilization efficiency even with small layer thickness of the photoresist layer for image formation, and allowing for reduced pattern edge roughness, and a photolithography method including a step of exposing by the near-field exposure the photoresist layer for ... 11/23/06 - 20060263721 - Image formation process and planographic printing plate material Disclosed is an image forming method possessing the steps of producing a planographic printing plate via a development treatment of exposing a hydrophilic surface of an aluminum support by removing a thermosensitive image formation layer provided on the hydrophilic surface, that is not imagewise heated on a printing press, after ... 11/23/06 - 20060263720 - Photosensitive lithographic printing plate wherein R21 represents a hydrogen atom or a methyl group; R22 represents a divalent hydrocarbon group having a carbon number of 3 to 30 and having an aliphatic cyclic structure; A represents an oxygen atom or —NR23—; and R23 represents a hydrogen atom or a monovalent hydrocarbon group having a ... 11/23/06 - 20060263719 - Resist material and pattern formation method using the same A resist film made of a resist material including 4-pentanelactam, that is, hetero cyclic ketone, is formed on a substrate, and subsequently, pattern exposure is performed by irradiating the resist film with exposing light through a mask. Then, the resist film having been subjected to the pattern exposure is developed, ... 11/23/06 - 20060263718 - Sacrificial compositions and methods of fabricating a structure using sacrificial compositions Compositions, methods of use thereof, and methods of decomposition thereof, are provided. One exemplary composition, among others, includes a polymer and a catalytic amount of a negative tone photoinitiator. ... 11/23/06 - 20060263717 - Photoresist coating composition and method for forming fine pattern using the same A photoresist coating composition that includes a compound represented by Formula 1 and an aqueous solvent, and a method for forming a fine pattern by coating the composition on a photoresist pattern to effectively reduce a size of a photoresist contact hole and a space, which can be applied to ... 11/23/06 - 20060263716 - Photoresist coating composition and method for forming fine pattern using the same A photoresist coating composition that includes a compound represented by Formula 1 and an aqueous solvent, and a method for forming a fine pattern by coating the composition on a photoresist pattern to effectively reduce a size of a photoresist contact hole and a space, which can be applied to ... 11/23/06 - 20060263715 - Block copolymer composition for photosensitive flexographic plate A composition for photosensitive flexographic plates which is capable of forming a sheet having a smooth surface and excellent antiflowing properties and less apt to have trouble caused by sticking and which further has excellent thin-line reproducibility; a block copolymer composition for photosensitive flexographic plates which is suitable for use ... 11/23/06 - 20060263714 - Resist composition and organic solvent for removing resist The present invention provides a resist composition comprising benzyl alcohol or its derivatives as an organic solvent. The present invention also provides an organic solvent for removing a resist, wherein the organic solvent comprises benzyl alcohol or its derivatives. The resist composition of the present invention is used in a ... 11/16/06 - 20060257786 - Method for employing vertical acid transport for lithographic imaging applications The present invention provides methods for forming images in positive- or negative-tone chemically amplified photoresists. The methods of the present invention rely on the vertical up-diffusion of photoacid generated by patternwise imaging of an underlayer disposed on a substrate and overcoated with a polymer containing acid labile functionality. In accordance ... 11/16/06 - 20060257785 - Method of forming a photoresist element A method of forming a photoresist element comprising the steps of: preparing a hot melt photoresist mixture; applying the photoimageable hot melt composition to a film substrate using a slot die coating system; cooling the hot melt sufficiently to prevent flow; and applying a protective cover film to the opposite ... 11/16/06 - 20060257784 - Copolymer for semiconductor lithography and process for production thereof A copolymer for semiconductor lithography, comprising at least a recurring unit (A) having a carboxylic acid ester structure whose solubility in alkali increases by the action of an acid and a carboxyl group-containing recurring unit (B), which copolymer is obtained via a step (P) of (co)polymerizing at least a monomer ... 11/16/06 - 20060257783 - Polymerizable composition and lithographic printing plate precursor A lithographic printing plate precursor having a photosensitive layer containing (A) at least one saccharide selected from the group consisting of an oligosaccharide and a polysaccharide, (B) a binder polymer, (C) a compound having an addition polymerizable ethylenic unsaturated bond, and (D) a polymerization initiator, or a lithographic printing plate ... 11/16/06 - 20060257782 - Photosensitive lithographic printing plate A photosensitive lithographic printing plate comprising: an aluminum support; a photopolymerizable photosensitive layer; and an oxygen blocking layer in this order, wherein the photopolymerizable photosensitive layer contains (1) a polyurethane binder, (2) a polymerizable compound having a urethane bond and two ethylenically unsaturated bonds, (3) a polymerizable compound having a ... 11/16/06 - 20060257781 - Photoresist polymer compositions The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described. ... 11/16/06 - 20060257780 - Method of making an article bearing a relief image using a removable film The invention is directed to methods of making an article bearing a relief image using a removable film. First, an imageable film that contains at least a mask substrate and an imageable material is imagewise exposed to imaging radiation to form an imaged film. The imaged film is then transferred ... 11/09/06 - 20060251991 - Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer the structural unit N is a structural unit derived from a monomer copolymerizable with the monomers to introduce the structural units M1 and M2a, and the structural units M1, M2a and N are contained in amounts of from 1 to 99% by mole, from 1 to 99% by mole and ... 11/09/06 - 20060251990 - Antireflective hardmask composition and methods for using same b) a crosslinking component; and c) an acid catalyst. ... 11/09/06 - 20060251989 - Photoresists for visible light imaging where Ar1 and Ar2 are independently selected from monocyclic aryl and monocyclic heteroaryl, R1 and R2 may be the same or different, and have the structure —X—R3 where X is O or S and R3 is C1-C6 hydrocarbyl or heteroatom-containing C1-C6 hydrocarbyl, and R4 and R5 are independently selected from ... 11/09/06 - 20060251988 - Photochromic paper with improved bistability An image forming medium including at least a polymer and a photochromic compound such as spiropyran embedded in the polymer, wherein spiropyran molecules of the spiropyran compound are chelated by a cation. ... 11/09/06 - 20060251987 - Negative photosensitive composition and negative photosensitive lithographic printing plate There are provided a negative-working photosensitive composition which can be cured by infrared rays and is less likely to suffer polymerization inhibition by oxygen during radical polymerization, and also exhibits high adhesion with a metal, and a negative-working photosensitive lithographic printing plate which is capable of directly forming images by ... 11/09/06 - 20060251986 - Positive resist composition and method for forming resist pattern A positive resist composition including a resin component (A) containing an acid dissociable dissolution inhibiting group whose alkali solubility increases under action of acid and an acid generator component (B) that generates acid on exposure, wherein the resin component (A) is a copolymer comprising a first structural unit (a1) derived ... 11/02/06 - 20060246374 - Alkali-soluble polymer and polymerizable composition thereof wherein R1 represents a hydrogen atom or a methyl group; R2 represents an (n+1)-valent organic linking group containing an ester group represented by —O(C═O)—; A represents an oxygen atom or NR3—; R3 represents a hydrogen atom, or an monovalent hydrocarbon group having from 1 to 10 carbon atoms; and n ... 11/02/06 - 20060246373 - Compositions and processes for immersion lithography New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially non-mixable with a resin component of the resist. Further preferred photoresist compositions of the invention comprise 1) Si substitution, 2) fluorine substitution; 3) hyperbranched ... 11/02/06 - 20060246372 - Planographic printing plate precursor The present invention relates to a positive planographic printing plate precursor comprising a support and a positive recording layer which is disposed on the support and contains (A) an alkali-soluble high-molecular weight compound having a heterocyclic ring bonded with a mercapto group. This positive planographic printing plate precursor is superior ... 11/02/06 - 20060246371 - Photosensitive fluororesin composition, cured film obtained from the composition, and method of forming pattern [PROBLEM TO BE SOLVED] To provide a cured product, which is excellent in the prevention of adherence of a water repellent oil component, finger prints and the like and wiping-off properties (anti-fouling properties) thereof, as well as in thermal shock properties, adhesion or other properties, and a photosensitive fluororesin composition ... 10/26/06 - 20060240356 - Positive type photosensitive epoxy resin composition and printed circuit board using the same A positive type, photosensitive epoxy resin composition comprising (a) an epoxy resin having two or more epoxy groups in one molecule, (b) a modified phenolic resin having a triazine ring, (c) a latent basic curing agent and (d) a photosensitive acid generator; and a preferably multilayered printed circuit board of ... 10/26/06 - 20060240355 - Positive resist composition and resist laminate for low-acceleration electron beam and mehod of pattern formation A positive resist composition and resist laminate for a low-acceleration electron beam, which exhibit excellent resolution and dry etching resistance, reduced thickness loss, and can be used favorably in a method of forming a resist pattern that includes a step of conducting exposure using a low-acceleration electron beam. This positive ... 10/19/06 - 20060234160 - Novel ester compounds, polymers, resist compositions and patterning process Novel ester compounds having formula (1) wherein A1 is a polymerizable functional group having a double bond, A2 is furandiyl, tetrahydrofurandiyl or oxanorbornanediyl, R1 and R2 each are a monovalent hydrocarbon group, or R1 and R2 may bond together to form an aliphatic hydrocarbon ring with the carbon atom, and ... 10/19/06 - 20060234159 - Photosensitive epoxy resin adhesive composition and use thereof A photosensitive epoxy resin adhesive composition which is capable of forming a pattern by exposure to light through a photomask and development, and which, even after having formed a pattern in that manner, may still exhibit high adhesiveness when heated while keeping its pattern as such, as well as a ... 10/19/06 - 20060234158 - Bottom resist layer composition and patterning process using the same There is disclosed a bottom resist layer composition for a multilayer-resist film used in lithography which comprises, at least, a polymer having a repeating unit represented by the following general formula (1). Thereby, there can be provided a bottom resist layer composition which shows an antireflection effect against an exposure ... 10/19/06 - 20060234157 - Composition and method for printing a patterned resist layer The invention relates to a composition for printing a patterned resist layer onto an underlying, preferably etchable layer comprising: a) an acid-functional resin that is soluble in alkaline medium and insoluble in acidic medium, having an acid number of at least 100 mg KOH/g; b) a base solvent having a ... 10/19/06 - 20060234156 - Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound There is provided an underlayer coating forming composition for lithography that is used in lithography process of manufacture of semiconductor device; and an underlayer coating having a high dry etching rate compared with photoresist. Concretely, it is a composition for forming an underlayer without use of crosslinking reaction by an ... 10/19/06 - 20060234155 - Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon Radiation-sensitive element comprising: (a) one or more types of monomers each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizer, (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from the following classes of ... 10/19/06 - 20060234154 - Radiation-sensitive resin composition A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number ... 10/19/06 - 20060234153 - Radiation-sensitive resin composition A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown ... 10/12/06 - 20060228648 - Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Sulfonate salts have the formula: CF3—CH(OCOR)—CF2SO3−M+ wherein R is C1-C20 alkyl or C6-C14 aryl, and M+ is a lithium, sodium, potassium, ammonium or tetramethylammonium ion. Onium salts, oximesulfonates and sulfonyloxyimides and other compounds derived from these sulfonate salts are effective photoacid generators in chemically amplified resist compositions. ... 10/12/06 - 20060228647 - Photoresist composition Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base. ... 10/12/06 - 20060228646 - Coating compositions for use with an overcoated photoresist Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred compositions of the invention comprise contain a crosslinker component that is resistant to sublimination or other ... 10/12/06 - 20060228645 - Nanocomposite photosensitive composition and use thereof The present invention relates to a photoresist composition suitable for image-wise exposure and development as a negative photoresist comprising a negative photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is greater than ... 10/12/06 - 20060228644 - Nanocomposite photoresist composition for imaging thick films The present invention relates to a photoresist composition suitable for image-wise exposure and development as a positive photoresist comprising a positive photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is greater than ... 10/05/06 - 20060223002 - Planographic printing plate precursor having an image-recording layer containing an infrared ray absorbent, a polymerization initiator, a polymerizable compound, and a thiol compound The present invention provides a planographic printing plate precursor having a support and, on the support, an image-recording layer containing an infrared ray absorbent, a polymerization initiator, a polymerizable compound, and a thiol compound. The planographic printing plate precursor preferably has a protective layer on the image-recording layer. ... 10/05/06 - 20060223001 - Radiation-sensitive resin composition wherein A represents a substituted or unsubstituted divalent cyclic hydrocarbon group, R1 represents a monovalent acid-dissociable group, X represents a single bond or a substituted or unsubstituted divalent hydrocarbon group, Y represents a single bond or a divalent coupling means, and Z represents a single bond or a substituted or ... 10/05/06 - 20060223000 - Method of reducing sensitivity of euv photoresists to out-of-band radiation and euv photoresists formed according to the method A modified EUV photoresist and a method of making the resist. The modified resist includes an EUV photoresist and a LAM incorporated into the EUV photoresist. ... 10/05/06 - 20060222999 - Photosensitive composition and cured products thereof There is provided a photosensitive composition excellent in photo-curability which comprises an epoxy compound having two or more epoxy groups, a polynuclear phenol compound having a specific structure and an energy beam-sensitive cationic polymerization initiator, and optionally a predetermined percentage of a hydroxyl group-containing compound having one or more hydroxyl ... 10/05/06 - 20060222998 - Positive photosensitive composition There is provided a positive photosensitive composition which requires no burning, makes it possible to obtain necessary and sufficient adhesion when it is applied under a humidity of 25 to 60%, can be developed at a low alkali intensity, makes it possible to carry out development with keeping high sensitivity ... 09/28/06 - 20060216643 - Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use A positive photoresist composition comprises a radiation sensitive acid generator, and a polymer that includes a first repeating unit derived from a sulfonamide monomer including a fluorosulfonamide functionality, a second repeating unit having a pendant acid-labile moiety, and a third repeating unit having a lactone functionality. The positive photoresist composition ... 09/28/06 - 20060216642 - Lithographic printing plate precursor and lithographic printing method wherein Ar1 and Ar2 each represents a benzene ring which may have a substituent, provided that two benzene rings are differing in the substituent from each other and a total of Hammett's σ values of substituents on at least one of the benzene rings is a negative value, and Z ... 09/28/06 - 20060216641 - Novel photosensitive resin compositions wherein, V is CH or N, Y is O or NR3 wherein R3 is H, CH3 or C2H5, R1 and R2 each independently are H, C1-C4 alkyl group, C1-C4 alkoxy group, cyclopentyl or cyclohexyl, or alternatively, R1 and R2 can be fused to produce a substituted or unsubstituted benzene ring; ... 09/28/06 - 20060216640 - Photosensitive lithographic printing plate A photosensitive lithographic printing plate comprising a hydrophilic support and a photosensitive layer containing a polymerization initiator, a chain transfer agent, a compound having an ethylenically unsaturated double bond, a polymer binder having a crosslinkable group in a side chain, a sensitizing dye represented by the formula (I) as defined ... 09/28/06 - 20060216639 - Planographic printing plate precursor and method of producing the same A planographic printing plate precursor of the present invention comprises: a support and a positive recording layer arranged on the support. the positive recording layer containing resin and an infrared absorber and being constituted of two or more sub-layers, wherein the solubility of the positive recording layer to an aqueous ... 09/28/06 - 20060216638 - Infrared-ray photosensitive planographic printing plate precursor The infrared-ray photosensitive planographic printing plate precursor of the present invention comprises a support, a recording layer provided on one side of the support, and a back coating layer provided on a side opposite to a side having the recording layer of the support, and the recording layer contains (a) ... 09/28/06 - 20060216637 - Planographic printing plate precursor and plate-making method thereof The planographic printing plate precursor according to the invention is a planographic printing plate precursor having a photosensitive layer containing an infrared absorbent, a polymerization initiator, a polymerizable compound, and a binder polymer and a protective layer formed in this order on a hydrophilic aluminum support surface, wherein the protective ... 09/28/06 - 20060216636 - Catalytic resist including metal precursor compound and method of patterning catalyst particles using the same A catalytic resist and a method of patterning catalyst particles using the same are provided. The catalytic resist includes a resist and a metal precursor compound uniformly dispersed in the resist. ... 09/28/06 - 20060216635 - Positive resist composition and pattern forming method using the same The invention provides a positive resist composition for the pattern formation by the use of actinic rays or radiation, ensuring that the sensitivity, resolution and pattern profile are good, the line edge roughness is small and the surface roughness is satisfied, and a pattern forming method using the composition, wherein ... 09/28/06 - 20060216634 - Photoactive adhesion promoter in a slam A semiconductor process technique to help reduce semiconductor process effects, such as undesired line edge roughness, insufficient lithographical resolution, and limited depth of focus problems associated with the removal of a photoresist layer. More particularly, embodiments of the invention use a photoacid generator (PAG) material in conjunction with a sacrificial ... 09/21/06 - 20060210924 - Photostorage solid drawing medium The invention provides a photostorage solid drawing medium comprising a solvent, a resin soluble in the solvent, a photostorage pigment and a gelling agent, wherein the photostorage pigment comprises a long afterglow fluorescent substance comprising an alkaline earth aluminosilicate as a matrix activated with a rare earth element wherein the ... 09/21/06 - 20060210923 - Photosensitive composition, image-recording material and image-recording method A photosensitive composition comprising: a hexaarylbiimidazole compound represented by the following formula (I) as defined herein; a sensitizing dye having an absorption maximum in a wavelength range of from 350 to 850 nm; and an addition-polymerizable compound capable of reacting by at least one of a radical and an acid. ... 09/21/06 - 20060210922 - Positive resist composition and pattern forming method using the resist composition A positive resist composition comprising: (A) a resin insoluble or sparingly soluble in an alkali but capable of decomposing under an action of an acid to increase a solubility in an alkali developer, the resin having a β-(meth)acroyloxy-γ-butyrolactone repeating unit represented by the following formula (1) containing a lactone ring ... 09/21/06 - 20060210921 - Positive photosensitive composition and image recording material using the same In the formula, R represents an alkyl, cycloalkyl, aralkyl or aryl group having an acid group, Y represents a bivalent to tetravalent connecting group having at least one partial structure selected from the following group of partial structures or a terminal group selected from one of the partial structures and ... 09/21/06 - 20060210920 - Photosensitive composition and lithographic printing plate precursor A photosensitive composition comprising: a polymer obtained by polymerization of a monomer having a structure represented by the formula (I) as defined herein; a polymerizable compound having an unsaturated double bond; and a radical polymerization initiator selected from a hexaarylbiimidazole compound and a metallocene compound. ... 09/21/06 - 20060210919 - Photosensitive composition and pattern-forming method using the same A photosensitive composition comprises (A) a specific compound, which is excellent in sensitivity, resolution, and defocus latitude (DOF), and a pattern-forming method using the photosensitive composition is provided. ... 09/21/06 - 20060210918 - Negative working light sensitive planographic printing plate material and planographic printing plate manufacturing process Disclosed is a negative working light sensitive planographic printing plate material comprising a support and provieded thereon, a light sensitive layer containing a spectral sensitizing agent, a polymerization initiator, a polymerizable compound, and a polymer as a polymeric binder, wherein the polymer has in the molecule a monomer unit with ... 09/21/06 - 20060210917 - Positive-working, thermally sensitive imageable element Imageable elements that contain copolymers soluble in alkaline solutions are disclosed and methods for forming imaging using the imageable elements are disclosed. The alkali soluble copolymers comprise about 3 to about 50 mol % of one or more of the monomers of the formula: CH2═CH(R1)—C(O)—X—Y—R2; in which: R1 is H ... 09/21/06 - 20060210916 - Positive photoresist composition and method of forming resist pattern A positive resist composition that includes a resin component (A), which contains acid dissociable, dissolution inhibiting groups and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the resin component (A) is a copolymer (A1) containing a first ... 09/21/06 - 20060210915 - Composition for forming lower layer film for lithography comprising compound having protected carboxyl group There is provided an underlayer coating forming composition for lithography, and an underlayer coating having a high dry-etching rate compared with photoresist, and causing no intermixing with the photoresist, which are used in lithography process of manufacture of semiconductor device. Concretely it is an underlayer coating forming composition comprising a ... 09/21/06 - 20060210914 - Positive photoresist composition and method of forming resist pattern There is provided a positive photoresist composition capable of forming a pattern with excellent resolution, excellent resistance to reflection off the substrate, and excellent perpendicularity. The positive photoresist composition comprises (A) an alkali-soluble novolak resin in which a portion of the hydrogen atoms of all the phenolic hydroxyl groups are ... 09/21/06 - 20060210913 - Photoresist composition and, used in the photoresist composition, low-molecular compound and high-molecular compound A high-molecular compound and a low-molecular compound or both having an alkali-soluble site (i) wherein at least a part of the alkali-soluble site (i) is protected with (ii) a halogen atom-containing acetal type acid-dissociative, dissolution inhibiting group, as well as a photoresist composition comprising the same. The photoresist composition is ... 09/21/06 - 20060210912 - Photosensitive resin film and cured film made therefrom The photosensitive resin film in an uncured state of the invention comprises (A) a specific alkali-soluble copolymer, (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator by the use of which a coating film having a dry film thickness of 70 ... 09/14/06 - 20060204893 - Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer the structural unit N is a structural unit derived from a monomer copolymerizable with the monomers to introduce the structural units M1 and M2a, and the structural units M1, M2a and N are contained in amounts of from 1 to 99% by mole, from 1 to 99% by mole and ... 09/14/06 - 20060204892 - Dyed photoresists and methods and articles of manufacture comprising same The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such ... 09/14/06 - 20060204891 - Photoresist undercoat-forming material and patterning process A material comprising a specific bisphenol compound with a group of many carbon atoms is useful in forming a photoresist undercoat. The undercoat-forming material, optionally combined with an intermediate layer having an antireflective effect, has an absorptivity coefficient sufficient to provide an antireflective effect at a thickness of at least ... 09/14/06 - 20060204890 - Positive photosensitive composition and pattern-forming method using the same A positive photosensitive composition comprising: (A) a resin having at least one repeating unit having a specific lactone structure at a side chain and being capable of decomposing by the action of an acid to increase the solubility in an alkali developer; and (B) a compound capable of generating a ... 09/14/06 - 20060204889 - Photosensitive composition A photosensitive composition comprising (A) a sensitizing dye having a specific structure, (B) a initiating compound capable of generating a radical, an acid or a base, and (C) a polymerizable compound capable of reaction by at least one of a radical, an acid and a base. ... 09/14/06 - 20060204888 - Positive photosensitive resin, process for production thereof, and resist composition containing positive photosensitive resin (wherein X1 and X2 may be the same or different and are each independently a straight chain or branched chain hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group, an aromatic hydrocarbon group or a heterocyclic group, and these groups may be substituted with straight chain or ... 09/14/06 - 20060204887 - Planographic printing plate precursor The planographic printing plate precursor of the present invention comprises a support, an intermediate layer containing a polymer having an aromatic ring having two or more carboxylic acid groups on a side chain, which is provided on the support, and an infrared-ray layer photosensitive positive-type recording layer provided on the ... 09/14/06 - 20060204886 - Heat transfer sheet, image forming material and image forming method The present invention provides a heat transfer sheet comprising a support, a light-to-heat converting layer and an image forming layer, wherein the image forming layer contains at least a white pigment and an amorphous organic polymer having a softening point of 40° C. to 150° C., an average particle size ... 09/07/06 - 20060199104 - Resist material and nanofabrication method A resist material and a nanofabrication method provide high-resolution nanofabrication without an expensive irradiation apparatus using, for example, electron beams or ion beams. That is, the resist material and the nanofabrication method provide finer processing using exposure apparatuses currently in use. A resist layer of an incompletely oxidized transition metal ... 09/07/06 - 20060199103 - Process for producing an image using a first minimum bottom antireflective coating composition Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the ... 09/07/06 - 20060199102 - Positive photosensitive resin composition wherein R2 is a monovalent organic group; each of R3, R4, R5, and R6 is independently hydrogen or a monovalent organic group; and Ar—NO2 is an aromatic hydrocarbon group having a nitro group at ortho-position, and (C) an amine compound. ... 09/07/06 - 20060199101 - Lithographic printing plate precursor A lithographic printing plate precursor comprising: a support; and a photosensitive layer containing (A) a sensitizing dye represented by the formula (I) as defined herein, (B) a polymerization initiator, (C) a polymerizable compound, and (D) a binder polymer having a crosslinkable group. ... 09/07/06 - 20060199100 - Positive resist composition and pattern-forming method using the same A positive resist composition, which comprises a resin having a structure showing a basicity and capable of increasing the solubility in an alkali developer by the action of an acid, and a pattern-forming method using the same. ... 09/07/06 - 20060199099 - Negative-type photosensitive resin composition containing epoxy-containing material Provided are negative-type photosensitive resin compositions which may be used as interlayer insulating layers on a silicon wafer. The compositions include a urea crosslinking agent together with an epoxy-containing material and vinylphenol resin. Also provided are methods of forming patterned insulating layers using such compositions. The resin compositions can be ... 09/07/06 - 20060199098 - Negative-type photosensitive resin composition containing epoxy-containing material Provided are negative-type photosensitive resin compositions which may be used in forming interlayer insulating layers on a silicon wafer or printed wiring board. The compositions include a vinylphenol resin, a biphenyl-phenol resin and epoxy-containing materials. Also provided are methods of forming patterned dielectric films using such compositions. The resin compositions ... 09/07/06 - 20060199097 - Lithographic printing plate precursor A lithographic printing plate precursor having a good press life with a practical energy amount, which can be on-press developed without passing through a development processing step after recording an image by a laser of emitting an infrared ray, is provided, which is a lithographic printing plate precursor capable of ... 08/31/06 - 20060194150 - Lithographic printing plate precursor, method for preparation of lithographic printing plate precursor, and lithographic printing method A lithographic printing plate precursor comprising: a support; an image-recording layer; and a protective layer containing an inorganic stratiform compound, provided in this order, wherein the inorganic stratiform compound contains an organic cation. ... 08/31/06 - 20060194149 - Lithographic printing plate precursor and lithographic printing method A lithographic printing plate precursor capable of forming an image without alkali development, comprising a hydrophilic support and a laser-sensitive photopolymerizable layer, wherein the photopolymerizable layer or other layer included in the lithographic printing plate precursor contains a copolymer containing at least a repeating unit having at least one ethylenically ... 08/31/06 - 20060194148 - Positive resist composition and pattern forming method using the same The invention provides a positive resist composition suitably usable at the time of using an ArF excimer laser light as the exposure light, source, assured of excellent performance in view of resist profile, sensitivity, resolution and line edge roughness, and free from occurrence of pattern falling and development defect, and ... 08/31/06 - 20060194147 - Resist composition, compound for use in the resist composition and pattern forming method using the resist composition Xn− represents an n-valent anion, n represents an integer of 1 to 3, and m represents the number of anions necessary for neutralizing the electric charge. ... 08/31/06 - 20060194146 - Planographic printing plate precursor The planographic printing plate precursor of the present invention comprises a substrate, and a recording layer provided on the substrate, the recording layer comprises a polymer compound having a partial structure of (1) silicon-oxygen bonds and (2) alkali-soluble groups. This planographic printing plate precursor provides excellent inking property on the ... 08/31/06 - 20060194145 - Photogenerated polyelectrolyte bilayers from an aqueous-processible photoresist A terpolymer of a hydrophobic polymer, for example, methyl methacrylate, a hydrophilic polymer, for example, poly(ethylene glycol) methacrylate, and a polymer having a sidegroup that is photocleavable to produce a carboxyl side chain, for example, o-nitrobenzyl methacrylate, is employed as a photoresist. ... 08/31/06 - 20060194144 - Low blur molecular resist A molecular resist composition and method of use is disclosed wherein the composition includes no silicon containing material, no polymeric material, and a substituted oligosaccharide, wherein the substituted oligosaccharide is substituted with at least one acid-cleavable —OR group, wherein the substituted oligosaccharide has 2 to 10 monosaccharides, wherein the molecular ... 08/31/06 - 20060194143 - Fluorine-containing polymerizable monomers, fluorine-containing polymer compounds, resist compositions using the same, and patterning process wherein R1 is any one functional group of a hydrogen atom, a methyl group and a trifluoromethyl group; R2 is a hydrogen atom or a straight-chain, branched or cyclic alkyl group having 1 to 25 carbon atoms, which may contain a fluorine atom, an oxygen atom, a nitrogen atom, a ... 08/31/06 - 20060194142 - Immersion lithography without using a topcoat A novel immersion medium for immersion lithography is provided. The immersion medium is introduced to fill a gap in between a front surface of a projection lens of a stepper and a top surface of a photoresist layer coated on a substrate positioned on a wafer stage. The present invention ... 08/31/06 - 20060194141 - Positive resist composition and method for forming resist pattern using same (wherein, R represents a hydrogen atom or a methyl group, and m is either 0 or 1), and exhibits increased alkali solubility under the action of acid; an acid generator component (B) that generates acid on exposure; and an organic solvent (C). ... 08/31/06 - 20060194140 - Chemical amplification type positive resist composition There is provided a positive resist composition which enables the formation of a fine resist pattern, enables the angle of the taper shape within that resist pattern to be controlled to a suitable angle, and enables the formation of a resist pattern with an excellent depth width of focus. This ... 08/24/06 - 20060188816 - Fluorinated compound, fluoropolymer and process for its production wherein each of R1 and R2 which are independent of each other, is a fluorine atom or a fluoroalkyl group having at most 5 carbon atoms. ... 08/24/06 - 20060188815 - Planographic printing plate material and printing method An object of the present invention is to provide a planographic printing plate material as well as a printing method in which excellent properties of on-press development, exposure image visualization, scratch resistance, background contamination resistance, and printing durability are exhibited. Disclosed is a planographic printing plate material possessing a hydrophilic ... 08/24/06 - 20060188814 - Photosensitive lithographic printing plate A photosensitive lithographic printing plate comprising a hydrophilic support and a photopolymerizable photosensitive layer containing: (i) a sensitizing dye having an absorption maximum in a wavelength range of from 360 to 450 nm; (ii) a hexaarylbisimidazole compound; (iii) an addition polymerizable compound having an ethylenically unsaturated double bond; (iv) a ... 08/24/06 - 20060188813 - Hydrophilic film, and planographic printing material, stain-preventative member and defogging member using the same The invention provides a hydrophilic film obtained by curing, by at least one energy source selected from heat and light, a composition comprising a compound that has, in a molecule thereof, two or more ring structures selected from the group consisting of five-membered structures and six-membered structures, wherein the ring ... 08/24/06 - 20060188812 - Phenolic hydroxyl group-containing copolymer and radiation-sensitive resin composition wherein R1′ represents a hydrogen atom or a methyl group, and R4, R5, and R6 represent saturated hydrocarbon groups having 1-4 carbon atoms. ... 08/24/06 - 20060188811 - Planographic printing plate material and printing process Disclosed is a planographic printing plate material comprising a support and provided thereon, a hydrophilic layer and an image formation layer containing heat melt particles or heat fusible particles, wherein the hydrophilic layer contains a starch derivative in an amount of from 0.1 to 10% by weight, or the image ... 08/24/06 - 20060188810 - Chemically amplified positive resist composition and patterning process A chemically amplified positive resist composition is provided comprising (A) a resin containing acid labile groups other than acetal type which changes its solubility in an alkaline developer as a result of the acid labile groups being eliminated under the action of acid and (B) specific sulfonium salts as a ... 08/24/06 - 20060188809 - Resist composition and patterning process A resist composition comprising a fullerene having five phenol derivatives is provided. ... 08/24/06 - 20060188808 - Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same where each of Z1 and Z2 is an alkyl group or an allyl group having one through twenty carbon atoms, a sensitizer, and a solvent. ... 08/24/06 - 20060188807 - Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same The present invention provides a resist pattern thickening material, which can utilize ArF excimer laser light; which, when applied over a resist pattern to be thickened e.g., in form of lines and spaces pattern, can thicken the resist pattern to be thickened regardless of the size of the resist pattern ... 08/24/06 - 20060188806 - Norbornene polymer for photoresist and photoresist composition comprising the same Disclosed herein is a photoresist composition which includes a norbomene copolymer having an epoxy group, an acid generator, and an organic solvent. The norbomene polymer shows superior mechanical and thermal properties, high transparency, excellent insulating properties, and particularly, improved mechanical properties due to the presence of an epoxy group. The ... 08/24/06 - 20060188805 - Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same The present invention provides a resist pattern thickening material, which can utilize ArF excimer laser light; which, when applied over a resist pattern to be thickened e.g., in form of lines and spaces pattern, can thicken the resist pattern to be thickened regardless of the size of the resist pattern ... 08/24/06 - 20060188804 - Immersion topcoat materials with improved performance wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium. ... 08/17/06 - 20060183051 - Positive resist composition, and patterning process using the same The present invention-provides a positive resist composition wherein at least a polymer included in a base resin has a repeating unit with an acid labile group having absorption at the 248 nm wavelength light and the repeating unit is included with a ratio of 1-10% of all repeating units of ... 08/17/06 - 20060183050 - Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator A process of forming ultra fine patterns using bottom anti-reflective coating containing acid generator. More particularly, a process of forming vertical patterns using an organic bottom anti-reflective coating containing excessive amount of acid generator, in order to prevent formation of sloping patterns due to photoresist resins absorbing wavelength of light ... 08/17/06 - 20060183049 - On-press development of high speed laser sensitive lithographic printing plates A method of on-press developing a laser sensitive lithographic printing plate with ink and/or fountain solution is described. The printing member comprises on a substrate a photosensitive layer soluble or dispersible in ink and/or fountain solution and capable of hardening upon exposure to a laser. The plate is exposed with ... 08/10/06 - 20060177767 - Photosensitive resin composition, thin film panel including a layer made from photosensitive resin composition, and method for manufacturing thin film panel A photosensitive resin composition includes an acrylic resin, a quinone diazide, and a solvent. The solvent includes a propylene glycol alkyl ether acetate and a trimethyl pentanediol monoisobutyrate (2,2,4-trimethyl-1,3-pentanediol monoisobutyrate). The propylene glycol alkyl ether acetate includes an alkyl group preferably containing about 1-5 carbon atoms. The resin composition may ... 08/10/06 - 20060177766 - Photoresist for enhanced patterning performance A photoresist is composed of an alkali soluble resin, a photosensitive agent and a solvent. The alkali soluble resin includes a first type novolak resin synthesized from meta-cresol, and the first novolak resin has an average molecular weight of about 8000 to 25000 and a polydispersity index of four or ... 08/10/06 - 20060177765 - Polymer, resist composition and patterning process A fluorinated polymer comprising recurring units of formulae (1a) to (1d) and having a Mw of 1,000-500,000 is provided. R1 is an acid labile group, R2 is a single bond or methylene, a1, a2, a3, and a4 are numbers from more than 0 to less than 1, and 0<a1+a2+a3+a4≦1, b ... 08/10/06 - 20060177764 - Positive-tone photosensitivity resin composition wherein R1, R2, R3, R4, R5, R, U, V, X, Y and Z are defined the same as the specification; (B) a naphthoquinone-diazide group containing compound; and (C) an solvent, the solvent is selected from the group consisting of ethers, ketones, esters, aromatic hydrocarbons and acetoacetates. ... 08/10/06 - 20060177763 - Method for producing compound having acid-labile group (wherein R1, R2, and R3 are the same as those defined above, respectively and X represents a halogen atom). ... 08/10/06 - 20060177762 - Negative photosensitive resin composition and negative photosensitive element An object of the present invention is to provide a negative photosensitive resin composition, which is capable of forming projections for controlling liquid crystal alignment that exhibit a higher level of precision than that attained by projections formed mug a positive photosensitive resin composition, as well as a photosensitive element ... 08/03/06 - 20060172226 - Resist composition and pattern forming method using the same wherein S1 to S8 each independently represents a substituent; a, n, m, l, k, o, p, q and r each independently represents an integer of 0 to 2; X represents a single bond or a divalent linking group; R1 and R2 each independently represents a hydrogen atom or a substituent, ... 08/03/06 - 20060172225 - Photoresist compositions Photoresists of the invention contain an added acid reaction component together with one or more resins and a photoactive component. Preferred photoresists of the invention can provide processes substrates such as microelectronic wafers with desired iso-dense bias values. Particularly preferred photoresists of the invention are chemically-amplified positive-acting resists and contain ... 08/03/06 - 20060172224 - Photoresist compositions Chemically-amplified positive photoresist compositions are provided that contain a resin that comprises acetal and alicyclic groups. Photoresists of the invention can exhibit notably enhanced lithographic properties. Preferred photoresists of the invention comprise one or more photoacid generator compounds and one or more phenolic resins comprise one or more photoacid-labile acetal ... 08/03/06 - 20060172223 - Photoresist compositions Chemically-amplified positive photoresist compositions are provided that contain an additive with acetal and alicyclic groups. Preferred photoresists of the invention comprise a resin component that includes a polymer with one or more photoacid-labile moieties, one or more photoacid generator compounds, and an additive that contains one or more alicyclic groups ... 08/03/06 - 20060172222 - Radiation-sensitive negative-type resist composition for pattern formation method The radiation-sensitive negative-type resist composition for pattern formation containing an epoxy resin, a radiation-sensitive cationic polymerization initiator, and a solvent for dissolving the epoxy resin therein, characterized in that the resist composition, through drying, forms a resist film having a softening point falling within range of 30 to 120 C. ... 07/27/06 - 20060166139 - Organic anti-reflective coating composition and method for forming photoresist patterns using the same The present disclosure relates to an organic anti-reflective coating composition and a method for forming photoresist patterns using the same. The anti-reflective coating compositions are useful for preventing reflection of a lower film layer or a substrate of a photoresist film, reducing standing waves caused by light and variations in ... 07/27/06 - 20060166138 - Radiation-sensitive resin composition wherein R14 and R15 individually represent a hydrogen atom or a linear or branched saturated hydrocarbon group having 1-6 carbon atoms. ... 07/27/06 - 20060166137 - Lithographic printing plate precursor, lithographic printing method and packaged body of lithographic printing plate precursors (1) A packaged body of lithographic printing plate precursors, wherein an image-recording layer or a protective layer of the outermost surface layer contains an inorganic layered compound. (2) A lithographic printing plate precursor having a protective layer containing an inorganic layered compound, and an image-recording layer containing a binder polymer. ... 07/27/06 - 20060166136 - Positive resist composition for immersion exposure and pattern-forming method using the same A positive resist composition for immersion exposure comprising: (A) a resin having an alicyclic hydrocarbon structure, wherein the resin is capable of increasing a solubility of the resin (A) in an alkaline developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation ... 07/27/06 - 20060166135 - Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition A photosensitive composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a compound for use in the photosensitive composition, and a pattern forming method using the ... 07/27/06 - 20060166134 - Photoresist composition and method of forming a pattern using the same A photoresist composition is provided. The photosensitive composition includes a photosensitive resin present in an amount of about 4% by weight to about 10% by weight, a photo-acid generator (PAG) present in an amount of about 0.1% by weight to about 0.5% by weight and a residual amount of a ... 07/27/06 - 20060166133 - Negative resist composition and patterning process A negative resist composition is provided comprising a polymer comprising recurring units having formula (1), a photoacid generator, and a crosslinker. In formula (1), X is alkyl or alkoxy, R1 and R2 are H, OH, alkyl, substitutable alkoxy or halogen, R3 and R4 are H or CH3, n is an ... 07/27/06 - 20060166132 - Ultraviolet light transparent nanoparticles for photoresists The transparency of photoresist films to ultraviolet light may be increased without sacrificing photospeed or resolution of the photoresist by including ultraviolet light transparent nanoparticles to the photoresist formulations. The ultraviolet light transparent nanoparticles may be included in the photoresist formulations as filler to “dilute” the ultraviolet light opacity of ... 07/27/06 - 20060166131 - Positive photoresist composition and method of forming resist pattern A positive photoresist composition comprising an alkali-soluble novolak resin (A) containing a structural unit (a1) represented by a general formula (I) shown below, and a structural unit (a2) represented by a general formula (II) shown below, and a photosensitizer (B). ... 07/27/06 - 20060166130 - Photoresist composition and method for forming resist pattern using the same A photoresist composition containing a polymer (A) containing an alkali-soluble constituent unit (a1) containing an alicyclic group having both a fluorine atom or a fluorinated alkyl group (i) and an alcoholic hydroxyl group (ii), whose alkali-solubility is changeable by an action of an acid; an acid generator (B) which generates ... 07/27/06 - 20060166129 - Fluorinated polymers useful as photoresists, and processes for microlithography This invention provides a fluorine-containing copolymer having a repeat unit derived from at least one fluorinated olefin and a repeat unit derived from at least one polycyclic ethylenically unsaturated monomer having pendant hydroxyl or esterified hydroxyl groups, and optionally other repeat units, typically derived from an acrylate. These polymers have ... 07/27/06 - 20060166128 - Lithographic materials based on polymers containing polyhedral oligomeric silsesquioxanes Materials are described suitable for optical lithography in the ultraviolet region (including 157 nm and extreme ultraviolet region), and for electron beam lithography. These materials are based on new homopolymers and copolymers, they are characterized by the presence of polyhedral oligomeric silsequioxanes in their molecule, and they are suitable for ... 07/20/06 - 20060160024 - Imaging methods An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts. ... 07/20/06 - 20060160023 - Photo acid generator, chemical amplification resist material and pattern formation method A high resolution resist material comprising an acid generator is provided so that high sensitivity and high resolution for high energy rays of 300 nm or less, small line-edge roughness, and excellence in heat stability and storage stability are obtained. Moreover, a pattern formation method using this resist material are ... 07/20/06 - 20060160022 - Photoresist compositions comprising resin blends New positive photoresist compositions are provided that contain a photoactive component and blend of at least two distinct resins: i) a first resin that comprises carbocyclic aryl units with hetero substitution (particularly hydroxy or thio) and ii) a second cross-linked resin. Preferred photoresists of the invention can be imaged at ... 07/20/06 - 20060160021 - Photoresist composition and method of forming a photoresist pattern using the same In a photoresist composition for a semiconductor manufacturing process and a method of forming a photoresist pattern using the photoresist composition, the photoresist composition includes an organic dispersing agent for dispersing acid (H+). The photoresist film may have enough spaces among photosensitive polymers so that acid may be dispersed sufficiently ... 07/20/06 - 20060160020 - Photosensitive polymer, photoresist composition having the photosensitive polymer and method of forming a photoresist pattern using the photoresist composition wherein R represents an acid-labile hydrocarbon group having from 1 up to 20 carbon atoms. ... 07/20/06 - 20060160019 - Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern by using the photoresist composition In a photosensitive resin, a photoresist composition having the photosensitive resin, and a method of forming a photoresist pattern by using the photoresist, the photosensitive resin includes a blocking group substituted for an acid. The photosensitive resin has a weight-average molecular weight of from about 6,000 up to about 8,000. ... 07/20/06 - 20060160018 - Electrode-forming composition for field emission type of display device, and method using such a composition A composition utilized in and a method for forming an electrode used in field emission type of display devices said composition is a photosensitive copper conductive composition comprising: a mixture of (a) copper powder at least 70 wt % out of 100 wt % copper powders having a particle size ... 07/20/06 - 20060160017 - Chemically amplified positive resist composition The present invention also provides an ester derivative useful as a component of the chemically amplified positive resist composition, and process for producing the ester derivative. ... 07/20/06 - 20060160016 - Inkjet-imageable lithographic printing members and methods of preparing and imaging them Lithographic printing plates are imaged using an inkjet printer to imagewise apply a chemical agent onto the plate surface. The chemical causes a change that facilitates lithographic printing. ... 07/20/06 - 20060160015 - Water soluble resin composition, method of pattern formation and method of inspecting resist pattern A water-soluble resin composition of the present invention comprises at least a water-soluble resin, an acid generator capable of generating an acid by heating and a solvent containing water. The water-soluble resin composition is applied on a highly water-repellant resist pattern 3 formed by a resist such as an ArF-responsive ... 07/20/06 - 20060160014 - Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric A change in dimension of a pattern formed of a polysilsesquiazane photosensitive composition containing a photoacid generating agent is prevented. The photosensitive composition according to the present invention is characterized by comprising: a modified polysilsesquiazane having a weight average molecular weight of 500 to 200,000 comprising basic constitutional units represented ... 07/13/06 - 20060154177 - Water soluble negative tone photoresist A method is described for reducing the space width of holes in a first resist pattern and simultaneously removing unwanted holes to change the pattern density in the resulting second pattern. This technique provides holes with a uniform space width as small as 100 nm or less that is independent ... 07/13/06 - 20060154176 - Photoresist composition, method of forming a photoresist pattern and method of forming a protection layer in a semiconductor device using the photoresist composition A photoresist composition comprising a hydrogen-bonding compound and a thermosetting resin is provided. A method of forming a photoresist pattern is also provided. The method comprises forming a photoresist film on an object by coating the object with a photoresist composition including a hydrogen-bonding compound and a thermosetting resin. Then, ... 07/13/06 - 20060154175 - Solid imaging compositions for preparing polypropylene-like articles This invention discloses compositions adapted to produce, through solid imaging means, excellent quality objects having material properties that simulate the look and feel of polypropylene articles. ... 07/13/06 - 20060154174 - Resist composition, multilayer body, and method for forming resist pattern A resist composition is disclosed that enables formation of a favorable resist pattern using a shrink process in which, following formation of the resist pattern, a treatment such as heating is used to narrow the resist pattern, and also disclosed are a laminate and a method for forming a resist ... 07/13/06 - 20060154173 - Resist composition There is provided a resist composition used for the production of printed boards, which comprises (A) a resin component, (B) a photopolymerization initiator, (C) water and (D) an organic solvent, wherein the organic solvent (D) contains: (D-1) at least one organic solvent selected from the group consisting of an α-hydroxycarboxylate ... 07/13/06 - 20060154172 - 1-4-dihydropyridine-containing ir-sensitive composition and use thereof for the production of imageable elements and R8 and R9 are independently selected from a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group and an optionally substituted aralkyl group. ... 07/13/06 - 20060154171 - Photoresist composition and method of forming resist pattern [wherein, X, Y, and Z each represent, independently, an alkyl group that may contain an aryl group bonded to a terminal (although two terminals from the groups X, Y, and Z may also be bonded together to form a cyclic structure), at least one of X, Y, and Z contains ... 07/13/06 - 20060154170 - Resist composition for liquid immersion exposure process and method of forming resist pattern therewith A resist composition for liquid immersion lithography process, which comprises: (A) a polymer comprising (a1) alkali-soluble constitutional units each comprising an alicyclic group having both (i) a fluorine atom or a fluoroalkyl group and (ii) an alcoholic hydroxyl group, wherein the polymer changes in alkali-solubility due to the action of ... 07/06/06 - 20060147839 - Photosensitive coating material for a substrate A radiation-sensitive coating material, in addition to a base polymer, has a solvent and a radiation-active substance which forms an acid on irradiation by light (including energetic electrons or ions), a fluorescent substance which alters its fluorescence property subject to a change in the acid content of its surroundings. In ... 07/06/06 - 20060147838 - Negative-working photosensitive resin composition and photosensitive resin plate using the same in a range of 3.5 wt % or less based on the weight of the photosensitive resin composition. A photosensitive resin plate using the photosensitive resin composition is also disclosed. By this invention, a negative-working photosensitive resin composition particularly excellent in the reproducibility of the highlight areas and the independent ... 07/06/06 - 20060147837 - Resist composition The resist composition of the present invention, ensuring excellent pattern profile and excellent isolation performance for use in the pattern formation by the irradiation of actinic rays or radiation, particularly, electron beam, X ray or EUV light, which comprising (A) a compound having a specific partial structure and a counter ... 07/06/06 - 20060147836 - Resist composition and patterning process using the same There is disclosed a resist composition which comprises, at least, a polymer in which a sulfonium salt having a polymerizable unsaturated bond, a (meth)acrylate having a lactone or a hydroxyl group as an adhesion group, and a (meth)acrylate having an ester substituted with an acid labile group are copolymerized. There ... 07/06/06 - 20060147835 - Chemically amplified photoresists and related methods A chemically-amplified photoresist composition includes a polymer resin, a photo acid generator (PAG), and a thermal acid generator (TAG), where a thermal deprotection temperature of the polymer resin is greater than an acid generation temperature of the TAG. The photoresist composition may be utilized in a photolithography process which includes ... 07/06/06 - 20060147834 - Water-soluble composition for coating photoresist pattern and method for forming fine patterns using the same wherein R1 and R2 are individually selected from the group consisting of H, linear or branched C1-C20 alkyl, linear or branched C2-C20 alkyl containing an ester linkage, linear or branched C2-C20 alkyl containing a ketone linkage, linear or branched C2-C20 alkyl containing a carboxylic acid group, linear or branched C7-C20 ... 07/06/06 - 20060147833 - Color forming compositions with improved marking sensitivity and image contrast and associated methods Compositions and methods for production of color images which are developable with improved marking sensitivity and image contrast are disclosed and described. Specifically, a color forming composition can comprise a polymeric activator phase including a polymer matrix and an activator dissolved therein, a color former phase including a color former, ... 07/06/06 - 20060147832 - Polymer and positive type resist composition (wherein, R represents a hydrogen atom or a methyl group), an acid generator component (B) that generates acid on exposure, and an organic solvent (C). ... 06/29/06 - 20060141394 - Photoresist formulation for high aspect ratio plating SU-8 photoresist compositions are modified to improve their adhesion properties by adding 1% to 6% of an adhesion promoter selected from the group consisting of glycidoxypropanetrimethoxysilane, mercatopropyltrimethoxysilane, and aminopropyltrimethoxysilane. SU-8 photoresist compositions are modified to improve their resistance to cracking and film stress by adding 0.5% to 3% of a ... 06/29/06 - 20060141393 - Photosensitive resin composition, thin film panel made with photosensitive composition, and method for manufacturing thin film panel The resin composition may be used in display panels. ... 06/29/06 - 20060141392 - Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same The present invention relates to a photosensitive resin composition, a preparation method thereof, and a dry film resist comprising the same. More particularly, the photosensitive resin composition of the present invention is directed to a photosensitive resin composition including a) an alkali-soluble acrylate resin, b) a cross-linking monomer having at ... 06/29/06 - 20060141391 - Laser marking of documents of value Disclosed are laser markings on a document of value and methods of preparing the same which are based on the interaction of the laser radiation with the printing-ink employed. ... 06/29/06 - 20060141390 - Composition for coating a photoresist pattern wherein R1 to R6, R′, R″ and n are defined in the specification. ... 06/29/06 - 20060141389 - Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 μm on top of a support, including (A) a compound that generates acid on irradiation with active light or radiation, and (B) a resin ... 06/29/06 - 20060141388 - Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 μm on top of a support, including (A) a compound that generates acid on irradiation with active light or radiation, and (B) a resin ... 06/29/06 - 20060141387 - Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 μm on top of a support, comprising (A) a compound that generates acid on irradiation with active light or radiation, (B) a resin that ... 06/29/06 - 20060141386 - Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 μm on top of a support, comprising (A) a compound that generates acid on irradiation with active light or radiation, (B) a resin that ... 06/29/06 - 20060141385 - Method for producing an exposed substrate Method for producing an exposed substrate, which has at least two different image areas. The substrate is provided with at least two photoresist layers, which are adjusted to the type of image areas to be produced. ... 06/29/06 - 20060141384 - Process for refining crude resin for electronic material A process is provided for effectively removing by-products such as oligomers contained within a crude resin for an electronic material, thus producing a resin for an electronic material. In this process, a crude resin for an electronic material containing (a1) structural units derived from a (meth)acrylate ester with a hydrophilic ... 06/29/06 - 20060141383 - Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin. ... 06/29/06 - 20060141382 - Resist composition and method of forming resist pattern using same There are provided a resist composition that produces a resist pattern of good shape, and a method of forming a resist pattern that uses such a resist composition. The resist composition comprises a resin component (A) that undergoes a change in alkali solubility under the action of acid, an acid ... 06/29/06 - 20060141381 - Photosensitive resin composition, and photosensitive element, method for forming resist pattern and printed wiring board using the composition A photosensitive resin composition, characterized in comprising: (A) a polymer having a carbon hydrocarbon double bond and carboxyl group, formed by the reaction of an acid anhydride with the reaction product of an epoxy compound having a structure wherein a glycidyloxy group is bonded to a main chain comprising an ... 06/22/06 - 20060134553 - Positive type resist composition and resist pattern formation method using same There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali ... 06/22/06 - 20060134552 - Positive type resist composition and resist pattern formation method using same There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali ... 06/22/06 - 20060134551 - Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof This invention relates to photochromic filaments composed of the lithium salt of a conjugated, polymerizable polyacetylene having a carboxylic acid or carboxylate terminal group wherein the length to width ratio of said filaments is between about 5000:1 and about 5:1 and the average length of the filament is up to ... 06/22/06 - 20060134550 - Light sensitive planographic printing plate precursor and its processing method Disclosed are a light sensitive planographic printing plate precursor and its processing method, the precursor comprising a hydrophilic support and provided thereon, a photopolymerizable light sensitive layer containing a compound represented by the following formula (1) or (2) and a compound represented by the following formula (3) or (4): ... 06/22/06 - 20060134549 - Photosensitive polymer, photoresist composition including the photosensitive polymer and method of forming a photoresist pattern using the photoresist composition wherein R1 represents hydrogen or an alkyl group having 1 to 10 carbon atoms, R2 represents an acid-labile hydrocarbon group having 3 to 12 carbon atoms, and n represents an integer greater than or equal to 1. The photoresist composition having good reproducibility and stability may form a photoresist film ... 06/22/06 - 20060134548 - Planographic printing plate precursor, substrate for the same and surface hydrophilic material A planographic printing plate precursor comprises a substrate having disposed thereon a hydrophilic layer which includes hydrophilic graft chains and a crosslinked structure formed through hydrolytic polycondensation of an alkoxide of an element selected from Si, Ti, Zr and Al. An aluminum substrate for a planographic printing plate includes a ... 06/22/06 - 20060134547 - Low refractive index polymers as underlayers for silicon-containing photoresists where each R1 is independently selected from an organic moiety or a halogen; each A is independently a single bond or an organic moiety; R2 is hydrogen or a methyl group; and each X, Y and Z is an integer of 0 to 7, and Y+Z is 7 or less. ... 06/22/06 - 20060134546 - Low refractive index polymers as underlayers for silicon-containing photoresists where each R1 is independently selected from an organic moiety or a halogen; each A is independently a single bond or an organic moiety; R2 is hydrogen or a methyl group; and each X, Y and Z is an integer of 0 to 7, and Y+Z is 7 or less. ... 06/22/06 - 20060134545 - Negative resist composition and process for formation of resist patterns wherein, R1 and R2 represent alkyl chains having 0 to 8 carbon atoms, R3 represents a substituent having at least two or more alicyclic structures, and R4 and R5 represent hydrogen atoms or alkyl groups having 1 to 8 carbon atoms. A method for forming a resist pattern uses the ... 06/15/06 - 20060127809 - Polymerizable composition and planographic printing plate precursor using the same wherein Z− represents COCOO−, COO−, SO3−, or SO2—N−—R where R represents a monovalent organic group and M+represents an onium cation. The present invention also provides a negative type planographic printing plate precursor responsive to an infrared laser, the precursor being superior in recording sensitivity and printing durability and using the ... 06/15/06 - 20060127808 - Positive type resist composition and resist pattern formation method using same There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali ... 06/15/06 - 20060127807 - Positive type resist composition and resist pattern formation method using same There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali ... 06/15/06 - 20060127806 - Positive type resist composition and resist pattern formation method using same There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali ... 06/15/06 - 20060127805 - Kit for making relief images A kit for making a relief image that includes a film made of an infrared-imageable material and a separate imageable article comprising a photosensitive material disposed on a substrate. The film may be used to form a mask image that is opaque to a curing radiation by exposing the infrared-imageable ... 06/15/06 - 20060127804 - Photoacid generating polymer, its preparation method and top anti-reflective coating composition comprising the same wherein R1 is a C1-10 hydrocarbon or a C1-10 hydrocarbon in which the hydrogen atoms are wholly or partly replaced by fluorine atoms; R2 is hydrogen or a methyl group; and a, b, c and d represent the mole fraction of each monomer and are in the range between about ... 06/15/06 - 20060127803 - Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same wherein R1 and R2 are independently, hydrogen, methyl or fluoromethyl; R3 and R4 are independently, a C1-10hydrocarbon or a C1-10 hydrocarbon in which the hydrogen atoms are wholly or partly replaced by fluorine atoms; and a, b, c, d and e represent the mole fraction of each monomer and are ... 06/15/06 - 20060127802 - Positive working thermal plates The invention generally relates to positive-working coating compositions and to a substrate formed with a coating of that composition. Advantageous versions of the invention provide an infrared imageable, positive lithographic printing plate having a coating comprising a hydroxy substituted polymer, a diphenylcarbinol solubility suppressing compound and an infrared radiation absorbing ... 06/15/06 - 20060127801 - Resist polymer and resist composition The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam ... 06/15/06 - 20060127800 - High sensitivity resist compositions for electron-based lithography The resist compositions having an acid sensitive imaging polymer and a radiation sensitive acid generator component comprising: (i) a first radiation sensitive acid generator selected from the group consisting of dissolution-inhibiting acid generators, and (ii) a second radiation sensitive acid generator selected from the group consisting of unprotected acidic group-functionalized ... 06/15/06 - 20060127799 - Method for forming resist pattern and resist pattern A resist pattern forming method which can prevent a fine resist pattern from collapsing in a drying step after a development treatment in case of forming a resist pattern is provided. This method comprises applying a positive resist composition comprising a resin component (A), which has an alkali-soluble unit content ... 06/15/06 - 20060127798 - Resist and method of forming resist pattern The resist according to the present invention includes any one of tetrachloromethyl tetramethoxycalix [4] arene and trichloromethyl tetramethoxycalix [4] arene. The resist including such kind of components is soluble in the solvent having less effect to worsen a working environment, namely, ethyl lactate (EL), propylene glycol monomethyl ether (PGME), propylene ... 06/08/06 - 20060121390 - High resolution resists for next generation lithographies The present invention addresses many of the current limitations in sub-100 nm lithographic techniques by providing novel resists that achieve high sensitivity, high contrast, high resolution, and high dry-etch resistance for pattern transfer to a substrate. In one embodiment, the present invention provides a polymeric resist comprising an adamantyl component ... 06/08/06 - 20060121389 - Melts A light-attenuating composition and method of using it are described. The light-attenuating composition may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the light-attenuating composition. The light-attenuating composition ... 06/08/06 - 20060121388 - Alkali-soluble resin with polyaromatic group and photosensitive composition comprising the resin wherein each of R1, R2, and R3, independently, is H or CH3; R4 is a substituted or unsubstituted polyaromatic derivative containing carbon and optionally containing one or more heteroatoms of oxygen, nitrogen and sulfur; X is alkyl, benzyl, or hydroxyl; each of n1 and n2, independently, is an integer of ... 06/01/06 - 20060115768 - Lithographic printing plate precursor, plate-making method, and lithographic printing method A lithographic printing plate precursor comprising a support and a layer containing a compound represented by the formula having a specific structure that is discolored by heat or a photochromic compound, and a lithographic printing method using the lithographic printing plate precursor. ... 06/01/06 - 20060115767 - Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a barrier rib for a plasma display panel, wherein the photosensitive composition is used. The photosensitive composition provides improved adherence to an inorganic ... 06/01/06 - 20060115766 - Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film This invention provides a positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant, used to form a planarization film for a TFT substrate, an interlayer dielectrics or a core or cladding of an optical waveguide. It is a ... 06/01/06 - 20060115765 - Photosensitive composition and color paste A photosensitive composition and a color paste for making the photosensitive composition. The photosensitive resin composition comprises a photosensitive resin system; a pigment; a photo-reactive amphipathic molecule; and a solvent. The color paste for making the photosensitive composition comprises the pigment and the photo-reactive amphipathic molecule. ... 05/25/06 - 20060110682 - Antihalation compositions Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder. ... 05/25/06 - 20060110681 - Photosensitive lithographic printing plate and method for making a printing plate A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate ... 05/25/06 - 20060110680 - Photosensitive resin composition This invention relates to a positive photosensitive resin composition allowing development with an alkaline aqueous solution and excellent in resolution, photosensitivity and pattern form even if the film formed from the resin is thick. Furthermore, this invention relates to a photosensitive resin composition comprising (a) a polymer having one or ... 05/25/06 - 20060110679 - Low-temperature curable photosensitive compositions The invention relates to low-temperature curable photosensitive compositions containing a polyamic acid, which compositions are developable in aqueous alkaline solutions and are curable, at a temperature of at least 160° C. and up to 200° C., to low modulus polyimides suitable for use in electronic circuitry applications, and which are ... 05/25/06 - 20060110678 - Low-temperature curable photosensitive compositions The invention relates to low-temperature curable photosensitive compositions containing a polyamic acid, which compositions are developable in aqueous alkaline solutions and are curable, at a temperature of at least 160° C. and up to 200° C., to low modulus polyimides suitable for use in electronic circuitry applications, and which are ... 05/25/06 - 20060110677 - Photoresist composition for deep uv and process thereof The present invention relates to a novel chemically amplified photoresist, which is sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a novel polymer comprising a sulfone group pendant from a polymer backbone that is insoluble in an aqueous alkaline solution and comprises at least one acidic ... 05/25/06 - 20060110676 - Resist material for liquid immersion lithography process and method for forming resist pattern using the resist material A negative resist material for a liquid immersion lithography process containing a resin component and a crosslinker component for this resin component, wherein the crosslinker component is poorly soluble in a liquid immersion medium, and a method for forming a resist pattern by the use thereof are provided. These simultaneously ... 05/18/06 - 20060105269 - Fluorinated photoresist materials with improved etch resistant properties where R1 represents hydrogen (H), a linear, branched or cyclo alkyl group of 1 to 20 carbons, a semi- or perfluorinated linear, branched or cyclo alkyl group of 1 to 20 carbons or CN; R2 represents an alicyclic group of 5 or more carbon atoms; X represents a methylene, ether, ... 05/18/06 - 20060105268 - Method for thermally processing photosensitive printing sleeves An improved method of manufacturing a photosensitive printing element that minimizes relief variation and improves image fidelity. The method involves a step of pre-curing the first (floor layer) of photocurable material prior to depositing an additional layer or layers of photocurable material that may be imaged and developed to produce ... 05/18/06 - 20060105267 - Positive resist containing naphthol functionality Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation are obtained using a polymer having acrylate/methacrylate monomeric units comprising a naphthol ester group. The resist may optionally contain polymer having acrylate/methacrylate monomeric units with fluorine-containing functional groups. The resists containing the polymer having acrylate/methacrylate monomeric units comprising a ... 05/18/06 - 20060105266 - Low activation energy positive resist Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation (and possibly other radiation) at low energy levels are obtained using a polymer having acrylate/methacrylate monomeric units comprising a low activation energy moiety preferably attached to a naphthalene ester group. The resist allows the performance benefit of acrylate/methacrylate polymers ... 05/11/06 - 20060099531 - Derivatized polyhydroxystyrenes (dphs) with a novolak type structure and blocked dphs (bdphs) and processes for preparing the same A process for preparing a blocked derivatized poly(4-hydroxystryrene)-DPHS having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure ... 05/04/06 - 20060093960 - Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process Cyclic structure-bearing fluorinated monomers having formula (1) wherein Z is a divalent organic group containing a polymerizable unsaturated group are useful to produce polymers for the manufacture of radiation-sensitive resist compositions which are fully transparent to radiation having a wavelength of up to 300 nm and have improved development properties. ... 05/04/06 - 20060093959 - Silicon containing tarc / barrier layer where R1 comprises an aqueous base soluble moiety, and x is from about 1 to about 1.95, more preferably from about 1 to about 1.75. ... 05/04/06 - 20060093958 - Color forming compositions and associated methods Compositions and methods for production of color images which are developable at sub-infrared wavelengths are disclosed and described. The color forming composition can include a polymer matrix having a color former phase adjacent to or dispersed within the polymer matrix. The color former phase can include a color former and ... 04/27/06 - 20060088785 - Silver salt photothermographic dry imaging material, thermal development method of the same, and thermal development apparatus for the same A photothermographic imaging material comprising a support having thereon, (a) a photosensitive layer containing an organic silver salt, photosensitive silver halide grains, a reducing agent and a binder, (b) a light-insensitive layer, and (c) a protective layer, wherein a weight reducing value from 25° C. to 100° C. by a ... 04/20/06 - 20060084007 - Method for curing aminoplasts A method for curing aminoplasts, during which layers having layer thicknesses of up to 300 um or filaments and fiber fibrids having a diameter of up to 300 um, which consist of: i) 95 to 99.95% by mass of solvent-free meltable aminoplast polycondensates with molar masses ranging from 1000 to ... 04/13/06 - 20060078824 - Photosensitive element, photosensitive element roll, process for the preparation of resist pattern using the same, resist pattern, resist pattern laminated substrate, process for the preparation of wiring pattern and wiring pattern There are disclosed a photosensitive element comprising a support film which comprises a biaxially oriented polyester film and a photosensitive resin composition layer formed on one surface of the polyester film; wherein a resin layer containing fine particles is formed on the opposite surface of the support film to which ... 04/13/06 - 20060078823 - Positive resist composition and pattern-forming method using the same A positive resist composition comprising (A) resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and capable of decomposing by the action of an acid to increase the solubility in an alkaline developer, (B) a compound capable of generating an acid upon treatment with one of an actinic ray and ... 04/13/06 - 20060078822 - Lithographic printing plate precursor requiring no dampening water A lithographic printing plate precursor requiring no dampening water, which is prevented from the scratching of the non-image portion during the development processing step and the printing step to solve the problem of the ink stain on prints, is provided, which is a lithographic printing plate precursor requiring no dampening ... 04/13/06 - 20060078821 - Positive-tone radiation-sensitive resin composition The metal impurity content in the component (A), in terms of the total ion content, is preferably 5,000 ppb or less. ... 04/13/06 - 20060078820 - Resist with reduced line edge roughness Novel photoresists containing at least about 0.2 molar ratio of a base with respect to the concentration of a photoacid generator present and their preparation are described. It has been discovered that inclusion of a sufficient amount of base counteracts the detrimental effects of photoacid generators, thus providing resists having ... 04/13/06 - 20060078819 - Photopolymer composition suitable for lithographic printing plates Radiation-sensitive elements are described whose radiation-sensitive coating comprises both a photopolymerizable oligomer with a biuret structural unit and a photopolymerizable phosphazene oligomer. ... 04/06/06 - 20060073414 - Hydrophilic polymer having silane coupling group terminal and lithographic printing plate base A polymer compound includes i) a polymerization unit represented by —(CHR3—CR4(-L1-Y1))x—(CHR5—CR6(-L2-Y2))y-; and ii) a silane coupling group represented by —S—(CH2)n—Si—(R1)m(OR2)3-m, as a terminal of the polymer, wherein R1, R2, R3, R4, R5, R6, n, x, y, L1, L2, Y1 and Y2 are defined in the specification. A lithographic printing plate ... 04/06/06 - 20060073413 - Silicon-containing resist composition and patterning process A resist composition is provided comprising a polysiloxane, a specific acid generator, a nitrogen-containing organic compound, and a solvent. The resist composition exerts high-resolution performance without the problem of a T-top profile and is suited for the bilayer resist process using ArF exposure. ... 04/06/06 - 20060073412 - Positive type photosensitive paste composition for pdp electrode, pdp electrode prepared therefrom, and pdp comprising the pdp electrode where R1 is H or CH3; R2 is a saturated or unsaturated C1-C6 alkyl group or a C1-C6 group containing an ether group, a carbonyl group or an ester group; R3 is a group having a hydroxyl group; R4 is hydrogen or a group having a carboxylic group; and R5 ... 04/06/06 - 20060073411 - Chemically amplified resist composition The present invention provides a chemically amplified resist composition comprising a treated resin (1), an acid generator and a solvent, wherein resin (1) is (a) a (meth)acrylic resin which is insoluble or poorly soluble in an alkali aqueous solution and becomes soluble in an alkali aqueous solution by the action ... 04/06/06 - 20060073410 - Photosensitive composition in which A represents an optionally substituted aromatic ring or an optionally substituted hetero ring; X represents an oxygen atoms a sulfur atom, or —N(R6)—; and R1, R2, R3, R4, R5, and R6 each independently represents a hydrogen atom or a monovalent non-metal atomic group; an activator compound being capable ... 04/06/06 - 20060073409 - Imaging compositions and methods An imaging composition, article and method of imaging are disclosed. The imaging composition is energy sensitive such that upon application of a sufficient amount of energy to the composition a color or shade change is affected. The imaging composition is coated on an article to form an energy sensitive article, ... 04/06/06 - 20060073408 - Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition A noble alicyclic unsaturated compound represented by the general formula (1): wherein at least one of R1 and R2 is a fluorine atom or a fluorinated alkyl group; a polymer formed by the polymerization of a polymer precursor comprising the alicyclic compound. The polymer is useful, in the lithography using ... 04/06/06 - 20060073407 - Coloring matter absorbing near-infrared light and filter for cutting off near-infrared ray The coloring matter absorbing a near-infrared ray is excellent in the resistance to heat and moisture, and thus exhibits an ability of absorbing a near-infrared ray not lowering for a long period of time. A filter for cutting off a near-infrared ray manufactured by using the coloring matter can be ... 03/30/06 - 20060068325 - Oxime derivatives and the use thereof as latent acids example halogen; R15, R16, R17 and R18 e.g. hydrogen or phenyl; R19, R20, R21, R22 and R23 are e.g. phenyl; are especially suitable for the preparation of photoresists. ... 03/30/06 - 20060068324 - Positive photosensitive resin and novel dithiol compound The positive photosensitive resin can alleviate the problems of conventional technique and, when used for formation of a fine patter in semiconductor production, can show a higher resist sensitivity than conventional products and can bring about effects such as reduction in impurities after development. The dithiol compound is novel and ... 03/30/06 - 20060068323 - Photosensitive lithographic printing plate A photosensitive lithographic printing plate comprising: a hydrophilic support; a photosensitive layer; and a protective layer, wherein the photosensitive layer contains a compound having an ethylenically unsaturated double bond, a high molecular binder having a crosslinking group and a hexaaryl biimidazole compound; and the protective layer has an oxygen permeability ... 03/30/06 - 20060068322 - Positive resist composition and pattern forming method using the same A positive resist composition satisfying high sensitivity, high resolution and good line edge roughness at the same time, and a pattern forming method using the composition, are provided, which is a positive resist composition comprising (A) a resin of which solubility in an alkali developer increases under the action of ... 03/30/06 - 20060068321 - Planographic printing plate precursor In general formula (1), R1 represents an alkyl group or a cyclic group, x represents 0 or 1, and A represents a bivalent bonding group. According to the invention, a positive planographic printing plate precursor for use with infrared lasers having excellent chemical resistance and wide image development latitude can ... 03/30/06 - 20060068320 - Resist composition and method of pattern formation with the same A resist composition comprises (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations. ... 03/30/06 - 20060068319 - Processless lithographic printing plate A positive-working, heat-sensitive material for making a lithographic printing plate by direct-to-plate recording is disclosed. The material comprises a hydrophobized grained and anodized aluminum support and a layer comprising a compound capable of converting light into heat provided onto said support, said support being obtainable by RF plasma treatment of ... 03/30/06 - 20060068318 - Pixelated photoresists A deliberately engineered placement and size constraint (molecular weight distribution) of photoacid generators, solubility switches, photoimageable species, and quenchers forms individual pixels within a photoresist. Upon irradiation, a self-contained reaction occurs within each of the individual pixels that were irradiated to pattern the photoresist. These pixels may take on a ... 03/30/06 - 20060068317 - Poly(arylene ether) composition A composition comprising poly(arylene ether), poly(alkenyl aromatic) resin, bis(hydroxy benzene) diphosphate, a hindered amine light stabilizer, and an ultra-violet light absorbing compound, wherein the composition has a color shift (dE) less than 6. ... 03/30/06 - 20060068316 - Marked article and method of making the same A method of marking a thermoplastic article can comprise: combining a thermoplastic with a light-marking additive to form a composition, forming the composition into an article having a maximum optical absorption wavelength; and illuminating, at a marking wavelength, at least a portion of the article with a device having a ... 03/23/06 - 20060063107 - Photoresist compositions comprising diamondoid derivatives Novel positive-working photoresist compositions are disclosed. The monomers of the base resin of the resist contain diamondoid-containing pendant groups higher than adamantane in the polymantane series; for example, diamantane, triamantane, tetramantane, pentamantane, hexamantane, etc. The diamondoid-containing pendant group may have hydrophilic-enhancing substituents such as a hydroxyl group, and may contain ... 03/23/06 - 20060063106 - Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings where: (1) each R is individually selected from the group consisting of —OH, —NH2, hydrogen, aliphatics, and phenyls; and (2) L is selected from the group consisting of —SO2— and —CR′2—. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the ... 03/23/06 - 20060063105 - Negative-working photoimageable bottom antireflective coating The present invention relates to novel negative-working, photoimageable, and aqueous developable antireflective coating compositions and their use in image processing by forming a thin layer of the novel antireflective coating composition between a reflective substrate and a photoresist coating. The negative bottom photoimageable antireflective coating composition is capable of being ... 03/23/06 - 20060063104 - Top anti-reflective coating composition and method for forming the pattern of a semiconductor device using the same Since the top anti-reflective coating composition dissolves a portion of a photoacid generator present at the top of an underlying photosensitizer, particularly, upon formation of a top anti-reflective coating, it can prevent the top from being formed into a thick section. Therefore, the use of the anti-reflective coating composition enables ... 03/23/06 - 20060063103 - Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition A radiation-sensitive composition (and method of fabricating a device using the composition) includes a nonpolymeric silsesquioxane including at least one acid labile moiety, a polymer including at least one member selected from the group consisting of an aqueous base soluble moiety and an acid labile moiety, and a radiation-sensitive acid ... 03/23/06 - 20060063102 - Positive resist composition There is provided a positive resist composition which, during resist pattern formation, can prevent the collapse of very fine resist patterns during the drying step following developing. This positive resist composition is used in a resist pattern formation method comprising a step, within the lithography process, for substituting a liquid ... 03/23/06 - 20060063101 - Radiation-sensitive elements The invention relates to radiation-sensitive elements comprising an aluminum substrate that has been roughened electrochemically with hydrochloric acid, and a radiation-sensitive coating comprising a coumarin sensitizer (I), a coinitiator a free-radical polymerizable monomer one or more P—OH groups and a biuret oligomer. ... 03/23/06 - 20060063100 - Polvmerizable compositions polymer, resist, and lithography methods A polymerizable composition for the production of a resist includes at least one unsaturated, polymerizable monomer. This monomer has at least one silicon atom and at least one carbonyl group. ... 03/16/06 - 20060057496 - Photoresist compositions comprising diamondoid derivatives Novel positive-working photoresist compositions are disclosed. The monomers of the base resin of the resist contain diamondoid-containing pendant groups higher than adamantane in the polymantane series; for example, diamantane, triamantane, tetramantane, pentamantane, hexamantane, etc. The diamondoid-containing pendant group may have hydrophilic-enhancing substituents such as a hydroxyl group, and may contain ... 03/16/06 - 20060057495 - Negative-working photosensitive resin composition and photosensitive resin plate using the same wherein —X represents —OR2, —COOH, —SO3H, —CONHR2, —COR2, —SO2NHR2, —HNCONHR2, or —HNCOOR2; R1 and R2, which may be the same or different, each represents a hydrogen atom, a substituted or unsubstituted, saturated or unsaturated hydrocarbon group, provided that it does not contain a radical polymerizable ethylenic double bond, a substituted ... 03/16/06 - 20060057494 - Photoresist monomer having spiro cyclic ketal goup, polymer thereof and photoresit composition including the same A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the deprotection reaction of the spiro cyclic ketal group, and ... 03/16/06 - 20060057493 - Planographic printing plate precursor wherein in the formula (1), Rf is a substituent containing a fluoroalkyl group or a perfluoroalkyl group having 9 or more fluorine atoms, n represents 1 or 2, and R1 represents hydrogen or a methyl group. ... 03/16/06 - 20060057492 - Polymer having polymerizable group, polymerizable composition, planographic printing plate precursor, and planographic printing method using the same A polymer having a polymerizable group and an alkyleneoxy groups on side chains thereof, and a polymerizable composition containing the polymer. The polymerizable composition preferably contains a polymerizable compound and a polymerization initiator. Also provided is a planographic printing plate precursor having a polymerizable layer on a hydrophilic support, the ... 03/16/06 - 20060057491 - Coating compositions for use with an overcoated photoresist Compositions (particularly antireflective coating compositions or “ARCs”) are provided that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. More particularly, the invention relates to organic coating compositions, particularly antireflective coating compositions, that contain a polyester ... 03/16/06 - 20060057490 - Colpolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same The present invention provides a polymer represented by the following formula 1 and a chemically amplified resist composition including the polymer, which resist composition is excellent in adhesion, storage stability and dry etch resistance, with good resolution in both C/H and L/S patterns, and provides a good pattern profile irrespective ... 03/16/06 - 20060057489 - Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same in the formula, X represents CH2, CH2CH2, O, S or NR1, and R1 represents hydrogen atom, a straight-chain, branched or cyclic alkyl group of a carbon number of 1-10. Hydrogen(s) of the alkyl group may partially or entirely be replaced with fluorine atom(s). Furthermore, a part of the alkyl group ... 03/09/06 - 20060051706 - Radiation sensitive compositions and methods The present invention provides radiation sensitive compositions and methods that comprise novel means for providing relief images of enhanced resolution. In one aspect the invention provides a method for controlling diffusion of photogenerated acid comprising adding a polar compound to a radiation sensitive composition and applying a layer of the ... 03/09/06 - 20060051705 - Method of imaging The application, according to a desired image, of an absorbance controlling composition to a receiver having an imaging layer comprising a radiation absorbing component, such as a dye or pigment, with spectral absorbance properties susceptible to change on treatment with the absorbance controlling composition provides a method of imaging by ... 03/09/06 - 20060051704 - Resin plate A resin plate comprising a first and at least one second layers is provided. The first layer comprises a resin having 75% by weight or larger of styrene-based unit on the basis of resin (A), and the second layer comprises an ultraviolet absorber and a resin having 50% by weight ... 03/09/06 - 20060051703 - Photosensitive film A photosensitive film excellent in workability and making it possible, in a normal pressure laminating process, to laminate photosensitive films on the surface of substrate having a metallic surface with a reduced number of air voids generated and in a high product yield, said film comprising a support film (A), ... 03/09/06 - 20060051702 - Resist material and pattern formation method A resist material includes a first polymer in which part of alkali-soluble groups are protected by an acid labile group labilized by an acid; a second polymer in which substantially all alkali-soluble groups are protected by an acid labile group labilized by an acid; and an acid generator. ... 03/09/06 - 20060051701 - Polymerizable composition and planographic printing plate precursor The present invention provides a polymerizable composition comprising (A) a compound represented by the following formula (I), (B) an infrared absorbent, and (C) a compound having at least one addition-polymerizable ethylenically unsaturated bond, and a negative planographic printing plate precursor having a recording layer containing the polymerizable composition. In the ... 03/09/06 - 20060051700 - Imageable element with masking layer comprising betaine-containing co-polymers Thermally imageable elements comprising a masking layer and a substrate are disclosed. The masking layer contains a sulfobetaine and/or a carboxybetaine containing co-polymer or a mixture of a sulfobetaine and/or a carboxybetaine containing co-polymers and absorbs both infrared and ultraviolet radiation. When the masking layer is on the substrate, the ... 03/09/06 - 20060051699 - Radiation-sensitive elements and their storage stability Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii) ... 03/09/06 - 20060051698 - Photosensitive resin composition and photosensitive element employing using the same A photosensitive resin composition for formation of a spacer layer in an optical disk comprising: two transparent substrates positioned opposite each other; and a recording layer and spacer layer positioned between the opposing sides of the transparent substrates, wherein the photosensitive resin composition comprises: a binder polymer; a photopolymerizable compound ... 03/02/06 - 20060046195 - Positive resist composition and pattern forming method using the same A positive resist composition satisfying high sensitivity, high resolution and good line edge roughness at the same time, and a pattern forming method using the resist composition are provided, which are a positive resist composition comprising (A) a resin which becomes soluble in alkali developer increases under the action of ... 03/02/06 - 20060046194 - Presensitized lithographic plate comprising support and hydrophilic image-recording layer A presensitized lithographic plate comprises a support and a hydrophilic image-recording layer. The hydrophilic image-recording layer contains a hydrophilic polymer and an agent capable of converting hydrophilic to hydrophobic when the agent is heated. The hydrophilic polymer comprises a main chain and branched chains. Each of the branched chain comprises ... 03/02/06 - 20060046193 - Polymerizable composition, hydrophilic film using it and planographic printing plate precursor A polymerizable composition including a hydrophilic polymer (A) having a radical polymerizable group on the terminal, a radical polymerizable compound (B), and a polymerization initiator (C); a hydrophilic film formed by curing a film by application of light or heat, which film includes the polymerizable composition; and a planographic printing ... 03/02/06 - 20060046192 - Planographic printing plate precursor In Formula (i), R1 represents a hydrogen atom or a methyl group; R2 represents a connecting group having two or more types of atom selected from the group consisting of a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom, and a sulfur atom and having 2 to ... 03/02/06 - 20060046191 - Photosensitive lithographic printing plate A photosensitive lithographic printing plate to be exposed by laser, which comprises a hydrophilic support and at least one polymerizable photosensitive layer, wherein the photosensitive layer has an absorbance of an emitting wavelength of the laser for exposure of not more than 0.4. ... 03/02/06 - 20060046190 - Positive resist composition and pattern forming method utilizing the same A positive resist composition comprising: a resin that comprises a repeating unit including a specific norbornane lactone structure and a repeating unit including a specific alicyclic hydrocarbon structure, and that increases a solubility of the resin in an alkaline developer by an action of an acid; and a compound that ... 03/02/06 - 20060046189 - Color image-forming material and lithographic printing plate precursor A color image-forming material capable of drawing an image by infrared laser exposure and excellent in image visibility, storage stability and white light stability, and an on-press development or non-processing (non-development) type lithographic printing plate precursor ensuring high sensitivity and high press life and being excellent in image visibility, on-press ... 03/02/06 - 20060046188 - Photosensitive lithographic printing plate A photosensitive lithographic printing plate comprising a support and a photopolymerizable photosensitive layer, wherein the photopolymerizable photosensitive layer contains a compound having three or more ethylenically unsaturated double bonds and containing four or more structural units selected from an ethyleneoxy structural unit and a propyleneoxy structural unit in one molecule ... 03/02/06 - 20060046187 - Planographic printing plate material Disclosed is a planographic printing plate material comprising a support and provided thereon, a photopolymerizable light sensitive layer and a protective layer in the order, wherein the protective layer contains a polyvinyl alcohol derivative A having a saponification degree of 90 to 100 mol % and a solubility of 0.1 ... 03/02/06 - 20060046186 - Planographic printing plate precursors, stacks of planographic printing plate precursors, and methods of making planographic printing plates A planographic printing plate precursor comprising an aluminum support having a hydrophilic front surface, and a negative recording layer provided on the front surface, wherein the negative recording layer includes a polymerizable compound, a radiation absorber, and a compound that generates a radical upon application of radiation or heat, and ... 03/02/06 - 20060046185 - Planographic printing plate precursor and method of making planographic printing plate Disclosed is a planographic printing plate precursor including a photosensitive layer containing an infrared absorber, a polymerization initiator, a polymerizable compound and a binder polymer and a protective layer laminated on a support in this order, wherein the protective layer contains a mica compound and at least one polyvinyl alcohol ... 03/02/06 - 20060046184 - Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same wherein n is between 7 and 25. Since the top anti-reflective coating composition dissolves a portion of a photoacid generator present at the top of an underlying photosensitizer, particularly, upon formation of a top anti-reflective coating, it can prevent the top from being formed into a thick section. Therefore, the ... 03/02/06 - 20060046183 - Photoresist formulation with surfactant additive A composition including a photoresist formulation and a surfactant additive is described herein. ... 02/23/06 - 20060040209 - Planographic printing plate precursor In Formula (2) above, rings A, B and C each independently represent a mono- to tri-nuclear aromatic hydrocarbon group or a heterocyclic aromatic group; at least one of the rings B and C is substituted with at least one substituent group selected from the group consisting of amino, alkoxy, aryloxy, ... 02/23/06 - 20060040208 - Chemical amplification resist composition and pattern-forming method using the same A chemical amplification resist composition comprising (A) a resin increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, (C) a compound having a fluorine atom and a hydroxyl group, and a ... 02/23/06 - 20060040207 - Printing plate material and printing plate It is an object of the present invention to provide that printing plate materials of the present invention exhibit excellent printing durability, less “out of color” registration, and improved printing image quality. Disclosed is a printing plate material possessing an image formation layer on one surface of a polyester support ... 02/23/06 - 20060040206 - Resist composition and patterning process A resist composition is provided comprising a silicone resin, a photoacid generator, a nitrogen-containing organic compound, and a solvent. The silicone resin is obtained through cohydrolytic condensation of a mixture of three silane monomers containing an organic group having a hydroxyl group and having at least 3 fluorine atoms, in ... 02/23/06 - 20060040205 - Planographic printing plate precursor A planographic printing plate precursor according to the invention includes: a support; and a recording layer disposed on the support and containing an alkali-soluble polymer compound and an infrared absorber, wherein a contact angle at a surface of the planographic printing plate precursor is 70° or less in a case ... 02/23/06 - 20060040204 - Light diffusion sheet and method of producing the light diffusion sheet, and screen A light diffusion sheet, a method of producing a light diffusion sheet, and a screen using the light diffusion sheet, are provided. The method of producing a light diffusion sheet includes transferring an uneven form of a surface of a mold to form a light diffusion layer having an uneven ... 02/23/06 - 20060040203 - Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition. ... 02/23/06 - 20060040202 - Positive working photosensitive composition A positive working photosensitive composition comprising an epoxy compound having two or more epoxy groups in one molecule, a curing catalyst or a compound for producing a curing catalyst by heat, and sulfonates, a method of manufacturing a member for a semiconductor comprising the steps of applying the positive working ... 02/23/06 - 20060040201 - Radiation sensitive resin composition A radiation sensitive resin composition which contains an alicyclic olefin resin obtained by ring-opening polymerization of a polymerizable monomer containing an alicyclic olefin monomer having carboxyl group using a ruthenium catalyst, followed by hydrogenation, an acid-generating agent, a crosslinking agent and a solvent; and a transparent resin pattern film formed ... 02/16/06 - 20060035170 - Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same A negative photoresist composition is used for the formation of thick films and includes (A) a novolak resin, (B) a plasticizer, (C) a crosslinking agent and (D) an acid generator. The composition is applied onto a substrate and thereby yields a photoresist film 5 to 100 μm thick. Likewise, the ... 02/16/06 - 20060035169 - Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same A negative photoresist composition is used for the formation of thick films and includes (A) a novolak resin, (B) a plasticizer, (C) a crosslinking agent and (D) an acid generator. The composition is applied onto a substrate and thereby yields a photoresist film 5 to 100 μm thick. Likewise, the ... 02/16/06 - 20060035168 - Method of manufacture of photosensitive material packaging body and photosensitive material packaging body Several sheets of sheet-shaped photosensitive material 1 are stacked on a paper tray container 2 prepared by press-forming stencil paper sheet, the photosensitive material 1 stacked on said paper tray container is inserted into a moisture-proof and light-shielding bag 3 made of a photosensitive material packaging material having moisture-proof and ... 02/16/06 - 20060035167 - Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer A barrier layer for fabricating at least one of a device and a mask includes a polymeric photoacid generator formed between a substrate and a resist layer. The barrier layer may be used, for example, in forming a resist image, and forming a patterned material feature on a substrate. ... 02/16/06 - 20060035166 - Imageable element with masking layer comprising sulfated polymer Thermally imageable elements comprising a masking layer and a substrate are disclosed. The masking layer contains a sulfated polymer or a mixture of sulfated polymers and absorbs both infrared and ultraviolet radiation. When the masking layer is on the substrate, the imageable element may be imaged and developed to form ... 02/16/06 - 20060035165 - Positive resist composition and method of forming a resist pattern using the same A positive resist composition comprises (A) a resin comprising specific repeating units and coming to have enhanced solubility in an alkaline developing solution by the action of an acid and (B) a compound generating an acid by the action of actinic rays or a radiation. ... 02/09/06 - 20060029885 - Resist developer and resist pattern formation method using same A resist developer capable of forming a high resolution resist pattern with good shape and little film thinning is provided, together with a resist pattern formation method using such a developer. The resist developer is an aqueous solution comprising an ammonium hydroxide represented by a general formula (I): R1nR24-nN+.OH− wherein ... 02/09/06 - 20060029884 - Polymer, resist protective coating material, and patterning process In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from an overlay material, exposing the layer structure to light in water, and developing. A water-insoluble, alkali-soluble material is used as the overlay material. ... 02/09/06 - 20060029883 - Photosensitive resin bag for non-pre-sensitized printing plate making A photosensitive resin bag used for the non-pre-sensitized printing plate making process comprises a transparent outer bag containing the liquid photosensitive resin. The liquid photosensitive resin is filled into the body of the thin bag with no air bubble. Furthermore, the quantity of the liquid photosensitive resin is limited by ... 02/09/06 - 20060029882 - Aqueous developable photoimageable compositions for use in photo-patterning methods (1) a nonacidic comonomer comprising a C1-10 alkyl acrylate, C1-10 alkyl methacrylate, styrenes, substituted styrenes or combinations thereof and (2) an acidic comonomer comprising ethylenically unsaturated carboxylic acid containing moiety; and (f) a bi-functional UV-curable monomer having a first and second functional unit, wherein the first functional unit is a ... 02/09/06 - 20060029881 - Thermally switchable imageable elements containing betaine-containing co-polymers Imageable elements useful as lithographic printing plate precursors are disclosed. The element comprises an imageable layer over a support. The imageable layer contains a photothermal conversion material and a polymeric binder that comprises a polymer backbone with sulfobetaine- and/or carboxybetaine-containing side chains. The imageable elements do not require processing in ... 02/02/06 - 20060024614 - Photopolymerizable composition A composition that is photopolymerizable upon absorption of light in the wavelength range from 300 to 450 nm, the composition comprising a binder, a polymerizable compound, a sensitizer and a photoinitiator, wherein the sensitizer is a fluorene compound that is conjugated via a double or triple bond with an aromatic ... 02/02/06 - 20060024613 - Composition for photoresist protective film, photoresist protective film and photoresist pattern formation process A composition for a photoresist protective film comprising a fluoropolymer having at least one functional group selected from the group consisting of —COOH, —SO3H, —OP(═O)(OH)2, —NR2 and —N+R3Cl− (wherein R represents a C1-4 alkyl group) and having a weight average molecular weight Mw of from 1,000 to 100,000 and a ... 02/02/06 - 20060024612 - Lithographic printing plate precursor and lithographic printing method A lithographic printing plate precursor comprising a support and an image-recording layer containing at least one compound selected from the group consisting of a spiropyran compound and a spirooxazine compound, and an acid generator, and a lithographic printing method including a process of removing the unexposed area of the image-recording ... 02/02/06 - 20060024611 - Photosensitive composition and lithographic printing plate precursor wherein X, Y and Z each independently represents a monovalent substituent. ... 02/02/06 - 20060024610 - Photoresist compositions The present invention provides for a photoresist composition comprising a mixture of two different copolymers. ... 02/02/06 - 20060024609 - Process for the production of negative working lithographic printing plate precursors with a coating comprising diazo resin A process for the production of lithographic printing plate precursors with a coating comprising a diazo resin is described, wherein a solvent mixture comprising (i) 2 to 9.9 wt.-% 1-methoxy-2-propanol, (ii) 20 to 50 wt.-% of at least one ketone with a boiling point below 130° C., (iii) 20 to ... 01/26/06 - 20060019196 - Planographic printing plate material, planographic printing plate, and printing process employing the same Disclosed is a planographic printing plate material comprising a plastic support and provided thereon, a subbing layer containing a water-soluble resin, a hydrophilic layer containing metal oxide particles with an average particle diameter of from 3 to 100 nm, and an image formation layer containing heat melting particles or heat ... 01/26/06 - 20060019195 - Photoresist undercoat-forming material and patterning process An undercoat-forming material comprising a novolak resin having a fluorene or tetrahydrospirobiindene structure, an organic solvent, an acid generator, and a crosslinker, optionally combined with an intermediate layer having an antireflective effect, has an absorptivity coefficient sufficient to provide an antireflective effect at a thickness of at least 200 nm ... 01/26/06 - 20060019194 - Thermally sensitive coating compositions useful for lithographic elements A photothermally sensitive composition which is primarily energy sensitive in the near infrared and ultraviolet region of the electromagnetic spectrum is composed of a novolak polymer, a melamine derivative crosslinking compound, an acid-generating compound, a polymeric dissolution inhibitor selected from cellulose acetate butyrate, cellulose acetate propionate and mixtures thereof and ... 01/26/06 - 20060019193 - Method for bump exposing relief image printing plates A process of producing a relief image printing plate, the process comprising the steps of providing a photosensitive printing element, quenching dissolved oxygen in the photosensitive resin layer by pre-exposing the photosensitive layer to one or more sources of actinic radiation, wherein the range of wavelengths spanned by the one ... 01/26/06 - 20060019192 - Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same The present invention relates to a chemically amplified polymer having a pendent group with dicyclohexyl bonded thereto, a process for the preparation thereof, and a resist composition comprising it, and more particularly, to a novel (meth)acrylic or norbornene carboxylate compound with dicyclohexyl bonded thereto, a process for the preparation thereof, ... 01/26/06 - 20060019191 - Polymer for heat-sensitive lithographic printing plate precursor A polymer for a heat-sensitive lithographic printing plate precursor is disclosed wherein the polymer comprises a phenolic monomeric unit of which the phenyl group is substituted by a group A characterised in that the group A comprises an inside or thioimide group and wherein the modification of the polymer increases ... 01/26/06 - 20060019190 - Heat-sensitive lithographic printing plate precursor A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating comprising an infrared absorbing agent and a polymer, which comprises a phenolic monomeric unit wherein the phenyl group of the phenolic monomeric unit is substituted by a group having the structure —N═N-Q wherein ... 01/19/06 - 20060014101 - Radiation-curable anti-reflective coating system A radiation-curable anti-reflective coating is disclosed. The coating may be deposited on a substrate by spinning, dipping or rolling. The anti-reflective coating may have two layers in which case the anti-reflective coating has a V-shaped reflectance pattern in the visible wavelength spectrum. The anti-reflective coating may have three layers in ... 01/19/06 - 20060014100 - Positive resist composition and resist pattern formation method wherein R represents a hydrogen atom or a methyl group, and R1 represents alkyl group having a carbon number of 1 to 5, and 1 represents an integer of 0 to 3. ... 01/19/06 - 20060014099 - Methods for producing photosensitive microparticles, aqueous compositions thereof and articles prepared therewith Described are aqueous compositions of an effective amount of at least one photosensitive material and at least one polymerizable component that are adapted to at least partially form photosensitive microparticles or at least partially crosslinked photosensitive polymeric microparticles. The photosensitive polymeric microparticles are made of integral surface and interior domains ... 01/19/06 - 20060014098 - Process for producing photoresist composition, filter, coater and photoresist composition A technique to acquire a photoresist composition which can reduce occurrence of defects of a resist pattern after development is provided. Further, a technique to obtain a photoresist composition having excellent storage stability characteristics as a resist solution (storage stability); and a technique to obtain a photoresist composition which reduces ... 01/12/06 - 20060008739 - Materials for use in programmed material consolidation processes Materials for use in programmed material consolidation processes, such as stereolithography, include a selectively consolidatable material and a filler. The filler may be included to optimize one or more physical properties of the material. The material is both selectively consolidatable and includes the desired physical property. Examples of physical properties ... 01/12/06 - 20060008738 - Formed body and methods thereof A formed body in the shape of a useful article formed from at least one material including a plurality of nanoparticles dispersed in the at least one material, wherein the plurality of nanoparticles are capable of inhibiting transmission of UV radiation. ... 01/12/06 - 20060008737 - Method of using a formed body A method for slowing the degradation of a polymeric container, the method including forming the polymeric container from a composition including a plurality of nanoparticles dispersed therein. ... 01/12/06 - 20060008736 - Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray ... 01/12/06 - 20060008735 - Radiation sensitive resin composition for forming microlens A radiation sensitive resin composition which contains (A) an alkali soluble polymer of a polymerizable mixture containing (a) 10 to 50 wt % of polymerizable unsaturated compound having an acid functional group, (b) 20 to 60 wt % of polymerizable unsaturated compound having an alicyclic hydrocarbon group and no acid ... 01/12/06 - 20060008734 - Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films. ... 01/12/06 - 20060008733 - Photosensitive composition and image recording method using the same A photosensitive composition comprising: a sensitizing dye represented by the formula (I) defined herein, in which Z represents a substituted divalent linking group forming a 5-membered or 6-membered ring, provided that a total volume of substituents arranged on the 5-membered or 6-membered ring formed by Z is 200 Å3 or ... 01/12/06 - 20060008732 - Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same wherein R1, R2 and R3 are independently hydrogen or a methyl group; and a, b and c represent the mole fraction of each monomer, and are independently in the range between about 0.05 and about 0.9. Because the disclosed top anti-reflective coatings are not soluble in water, they can be ... 01/12/06 - 20060008731 - Novel photoresist monomers and polymers where Hal=F, Cl or Br and X=H or F; and which is substantially transparent to ultraviolet radiation at a wavelength of about 157 nm, and at least one photoacid generator capable of generating an acid upon exposure to sufficient activating energy at a wavelength of about 157 nm. ... 01/12/06 - 20060008730 - Monomers for photoresists bearing acid-labile groups of reduced optical density Monomers and polymers useful for forming photoresists are provided. More particularly, photoresists, as well as monomers and polymers for photoresists useful in micro-lithography, specifically monomers bearing acid-labile groups of reduced optical density. The resulting photoresists exhibit improved transparency to 157 nm light. The photoresist compositions are composed of a mixture ... 01/12/06 - 20060008729 - Photosensitive resin printing plate original, process for producing the same and process for producing resin relief printing plate therewith An object of the present invention is to provide a photosensitive resin printing plate precursor capable of forming a protruding relief pattern without using any original pattern film. Specifically, the present invention relates to a photosensitive resin printing plate precursor including: a photosensitive resin layer (A) containing a water-soluble or ... 01/05/06 - 20060003256 - Photosensitive resin composition and coating film cured product thereof A photosensitive resin composition comprising a resin (A1) having fluorine atom-containing groups, silicon atom-containing groups and ethylenic double bonds, a radical initiator (B) and an alkali-soluble photosensitive resin (D) having at least three ethylenic double bonds per molecule. Further, a photosensitive resin composition comprising a resin (A2) having fluorine atom-containing ... 01/05/06 - 20060003255 - Methods for optimizing physical characteristics of selectively consolidatable materials Methods for optimizing physical properties of selectively consolidatable materials, such as photoimageable materials, include mixing filler materials with the selectively consolidatable materials. The resulting compound has the desired physical property, as well as selective consolidatability. Examples of physical properties that may optimized in a selectively consolidatable compound by mixing a ... 01/05/06 - 20060003254 - Photosensitive composition and method for forming pattern using same wherein m represents an integer of 0 or more. ... 01/05/06 - 20060003253 - Energy harvesting molecules and photoresist technology A composition including a first moiety; and a different second moiety capable of harvesting energy from an external source, wherein the second moiety is positioned such that energy harvested at the second moiety may be transferred to the first moiety. An article of manufacture including a film including a first ... 12/29/05 - 20050287475 - Solvent-less process for producing transient documents A solvent-less process for producing a transient document which is capable of self-erasing, wherein the solvent-less process includes a) heating and reacting a photochromic compound and a polymer to form a coating composition, and b) coating the coating composition onto an image-receiving side of a transient document substrate, and further ... 12/29/05 - 20050287474 - Resist polymer and method for producing the polymer Solving problems in the prior art, provided are a resist polymer which is small in lot-to-lot, reactor-to-reactor and scale-to-scale variations, and contains no high polymer, is excellent in solubility and storage stability, and is suitable for fine pattern formation, and a method for production thereof. The present invention provides the ... 12/29/05 - 20050287473 - Photosensitive composition and method for forming pattern using the same A positive working photosensitive composition which is useful in the manufacturing step of a semiconductor such as IC, the manufacture of a circuit board such as liquid crystals and thermal heads, and other fabrication steps and has an excellent resolution and line edge roughness, and a method for forming a ... 12/29/05 - 20050287472 - Photosensitive paste composition, pdp electrode manufactured using the composition, and pdp comprising th pdp electrode A photosensitive paste composition is provided. The photosensitive paste composition contains conductive powder, an inorganic binder, and an organic vehicle, wherein, assuming that 10% by weight of the particles consisting the conductive powder have a diameter less than D10 and 90% by weight of the particles have a diameter greater ... 12/29/05 - 20050287471 - Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same There is provided a novel fluorine-containing polymer having an acid-reactive group which has a high transparency against energy rays (radioactive rays) in a vacuum ultraviolet region (157 nm), and further there are provided a material for fluorine-containing base polymer prepared from the polymer and suitable for a photoresist and a ... 12/29/05 - 20050287470 - Curable compositions and rapid prototyping process using the same The present invention provides curable compositions and rapid prototyping processes using the same. In one embodiment, the present compositions include one or more aromatic epoxies and one or more aliphatic epoxies, and, after full cure, exhibit a heat deflection temperature of at least 105° C. and an elongation at break ... 12/29/05 - 20050287469 - Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric There is provided a photosensitive composition which possesses excellent storage stability and can yield an interlayer insulation film with an improved film thickness limit. The photosensitive composition is characterized by comprising: a modified polysilsesquiazane having a weight average molecular weight of 500 to 200,000 comprising basic constitutional units represented by ... 12/22/05 - 20050282084 - Imaging compositions and methods Imaging compositions and methods of using the compositions are disclosed. The imaging compositions include two discrete components. One component includes opacifying compounds and the second component includes sensitizing dyes. The second component is sensitive to low levels of energy. Application of the low levels of energy induces a color or ... 12/22/05 - 20050282083 - Polymer, resist composition and patterning process A polymer comprising recurring units having formulae (1) and (2) and having a weight average molecular weight of 1,000 to 50,000. In the formulae, R1 and R3 are H or CH3, R4 is alkylene, R2 is a lactone structure-containing substituent group selected from formulae (R2-1) to (R2-4) wherein Y is ... 12/22/05 - 20050282082 - Polymer, resist composition and patterning process A (meth)acrylic copolymer is endowed with a good profile of rigidity and hydrophilicity by introducing not only polycyclic structure units, but also recurring units having a high polarity. A chemically amplified positive resist composition comprising the polymer has a high sensitivity, resolution and etch resistance and improved substrate adhesion and ... 12/22/05 - 20050282081 - Printing plate material and image formation process Disclosed is a printing plate material comprising a hydrophilic support having a hydrophilic surface, and provided thereon, an image formation layer, wherein the hydrophilic surface of the hydrophilic support has a reflection density of not less than 1.0, and a reflection density of the image formation layer side surface of ... 12/22/05 - 20050282080 - Water-soluble negative photoresist polymer and composition containing the same Photoresist patterns are formed using a photoresist composition, which includes water, a negative photoresist polymer having a salt-type repeating unit, and a photoacid generator, so that a developing process can be performed not by using conventional TMAH solution but by using water. Additionally, because the main solvent of the composition ... 12/22/05 - 20050282079 - Water-soluble negative photoresist polymer, composition containing the same, and method of forming a photoresist pattern wherein R1, R2, R3, R4, R5, R6, R7, b, c, d and m are defined in the specification. ... 12/15/05 - 20050277060 - Positive resist composition and pattern forming method using the same A positive resist composition satisfying high sensitivity, high resolution, good pattern profile and good in-vacuum PED property at the same time, and a pattern forming method using the composition, are provided, which is a positive resist composition comprising: (A) a resin which is insoluble or sparingly soluble in an alkali ... 12/15/05 - 20050277059 - Protective film-forming composition for immersion exposure and pattern-forming method using the same A protective film-forming composition for immersion exposure comprises a water-insoluble and alkali-soluble resin comprising a repeating unit derived from a monomer having an acid dissociation constant pKa of 8 or more. ... 12/15/05 - 20050277058 - Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same The present invention provides a material for an antireflective film characterized by high etching selectivity with respect to a resist, that is, which has a fast etching speed when compared to the resist, and in addition, can be removed without damage to a film which is to be processed. The ... 12/15/05 - 20050277057 - Resist material and pattern formation method wherein R1, R2, R3, R7, R8 and R9 are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; ... 12/15/05 - 20050277056 - Photoresist composition and method of forming a pattern using the same The photoresist composition of the present invention includes a solvent mixture, a resin, a photo acid generator, and a quencher, the solvent mixture comprising a first solvent containing an ether compound and a second solvent having a polarity stronger than the first solvent, wherein an amount of the first solvent ... 12/15/05 - 20050277055 - Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device Technologies to form fine resist patterns consistently by solving the problem of poor patterning influenced by a resist-protecting film, are provided. A layer made of a resist (resist layer) is formed on a substrate, a resist-protecting film comprising an antistatic resin and a photo-acid generating agent is formed on the ... 12/15/05 - 20050277054 - Resist pattern thickening material and process for forming the same, and semiconductor device and process for manufacturing the same The present invention provides a resist pattern thickening material which can thicken a resist pattern and form a fine space pattern, exceeding exposure limits of exposure light used during patterning. The resist pattern thickening material contains a resin and a polyhydric alcohol. The present invention also provides a process for ... 12/15/05 - 20050277053 - Increased sensitivity, ir, and uv imageable photographic elements The invention provides a photosensitive element which comprises a sheet substrate having coated thereon an actinic radiation sensitive imageable layer. The imageable layer has an admixture an aromatic diazonium salt having an anion, and having a weight average molecular weight of from about 15,000 to about 35,000. The aromatic diazonium ... 12/15/05 - 20050277052 - Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography This invention provides novel fluorine containing polymers which comprise at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer with a fused 4-membered carbocyclic ring and, optionally, other components. The polymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the ... 12/08/05 - 20050271980 - Novel photosensitive resin compositions A positive photosensitive resin composition of at least one uncapped polybenzoxazole precursor polymer, at least one capped polybenzoxazole precursor polymer, at least one photosensitive agent and at least one solvent, use of such compositions to pattern an image on a substrate and the resulting relied patterned substrates and electronic parts ... 12/08/05 - 20050271979 - Photosensitive paste composition, pdp electrode prepared therefrom, and pdp comprising the pdp electrode A photosensitive paste composition including a conductive particle, an inorganic binder, and an organic vehicle, in which the amount of solids in the organic vehicle is 8 to 12 parts by weight based on 100 parts by weight of the composition and 10 to 20 parts by weight based on ... 12/08/05 - 20050271978 - Resist polymer, making method, and chemically amplified positive resist composition A polymer is prepared by radical polymerization of a monomer using an organotellurium or organoselenium compound as a polymerization initiator. The polymer has a narrower dispersity Mw/Mn and is adequately random. A resist composition comprising the polymer as a base resin has advantages including a dissolution contrast of resist film, ... 12/08/05 - 20050271977 - Photosensitive polymer and chemically amplified photoresist composition including the same R3 is a chlorine atom, a bromine atom, hydroxy, cyano, t-butoxy, CH2NH2, CONH2, CH═NH, CH(OH)NH2 or C(OH)═NH group, R4 is a hydrogen atom or methyl group, each of 1-x-y-z, x, y and z is a degree of polymerization of each repeating unit constituting the photosensitive polymer, x, y and z ... 12/08/05 - 20050271976 - Lithographic printing plate precursor and lithographic printing method An image-recording materials containing (A) a compound having a specific partial structure and at least one group selected from an acid group having a pKa of 11 or less, the derivative of the acid group and a group capable of generating the acid group, a lithographic printing plate precursor having ... 12/08/05 - 20050271975 - Films with photoresponsive wettability In various aspects, the present invention provides substantially monolayer thick molecular films with photoresponsive wettability, the molecules of said films comprising a photochromic molecule coordinated to a metal atom, which is coordinated to an organic tethering molecule, surface coupling group, or both, having a group for attachment to a surface ... 12/08/05 - 20050271974 - Photoactive compounds The present invention relates to novel photoacid generators. ... 12/08/05 - 20050271973 - Negative acting photoresist with improved blocking resistance Novel compositions comprising photoactive urethane acrylate resins and an ethylenically unsaturated reactive diluent are disclosed. The urethane acrylate resin comprises the reaction product of a polyhydric acrylate monomer and an isocyanurate. The compositions find particular application in negative photoresist compositions and exhibit improved blocking resistance compared with other negative photoresist ... 12/08/05 - 20050271972 - Chemically amplified positive photosensitive resin composition A photosensitive resin composition suitable for forming a thick film and an ultra-thick film used for forming a thick resist pattern used in the process of forming a magnetic pole on a magnetic head and a bump, which comprises (A) an alkali soluble novolak resin, (B) an alkali soluble acrylic ... 12/08/05 - 20050271971 - Photoresist base material, method for purification thereof, and photoresist compositions wherein A is a central structure that is an aliphatic group having 1 to 50 carbon atoms, an aromatic group having 6 to 50 carbon atoms, an organic group containing these together or an organic group having a cyclic structure formed by repetition of these, each of B to D ... 12/01/05 - 20050266346 - Method for forming photoresist pattern and photoresist laminate A method for forming a photoresist pattern involves the steps of: depositing a photoresist film on a substrate, the photoresist film containing an acid-generating agent capable of generating an acid upon exposure to light; overlaying an antireflective film over the photoresist film, the antireflective film containing a fluorine-based acidic compound; ... 12/01/05 - 20050266345 - Imaging compositions and methods Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be applied to a work piece to mark it and removed ... 12/01/05 - 20050266344 - Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide The present invention provides a radiation curing composition comprising (a): a siloxane resin, (b): a photoacid generator or photobase generator, and (c): a solvent capable of dissolving component (a), and (d): a curing acceleration catalyst. ... 12/01/05 - 20050266343 - Photoresist composition and method of forming same In a photoresist composition including a blocking group less sensitive to a temperature during a PEB process, the photoresist composition comprising from about 2% to about 10% by weight of a photosensitive resin, from about 0.1% to about 0.5% by weight of a photoacid generator, and a residual amount of ... 12/01/05 - 20050266342 - Photoresist composition and method of forming a pattern using same A photoresist composition for preventing exposing failures and a method of forming a pattern using the same are disclosed. The photoresist composition preferably comprises about 0.1% to about 0.5% by weight of a photo acid generator, and about 2% to about 10% by weight of a polymer resin, the PAG ... 12/01/05 - 20050266341 - Photosensitive resin composition and lcd using the same A photosensitive resin composition includes: a copolymer of an unsaturated carboxylic acid and a compound with unsaturated ethylenic bonds; an acrylate multi-functional monomer; a phenolic compound; a photopolymerization initiator; and an organic solvent. The photosensitive resin composition according to the present invention has superior resolution and development property because of ... 12/01/05 - 20050266340 - Positive resist composition and compound used therein (wherein, each R1 group and each R3 group represents, independently, a hydrogen atom, an alkyl group of 1 to 3 carbon atoms, or a cycloalkyl group of 4 to 6 carbon atoms, provided at least one of the R1 and R3 groups is a cycloalkyl group of 4 to 6 ... 12/01/05 - 20050266339 - Photoresist composition for organic layer of liquid crystal display, spin-less coating method thereof, fabrication method of organic layer pattern and liquid crystal display fabricated using the same The invention relates to a photoresist composition for an organic layer for a liquid crystal display, whch may beused for a large-scale substrate, a spin-less coating method using the composition, a method for fabricating an organic layer pattern, and a liquid crystal display having the organic layer pattern. In particular, ... 12/01/05 - 20050266338 - Resist material and pattern formation method wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain ... 12/01/05 - 20050266337 - Resist material and pattern formation method wherein R1, R2, R3, R7 and R8 are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 ... 12/01/05 - 20050266336 - Photosensitive composition and pattern-forming method using the photosensitive composition wherein Y represents an alkylene group substituted with at least one fluorine atom, and R represents an alkyl group or a cycloalkyl group. ... 12/01/05 - 20050266335 - Photoimageable coating composition and composite article thereof A photoimagable composition suitable for use as a negative photoresist comprising: (A) at least one epoxidized polyfunctional bisphenol A formaldehyde novolak resin; (B) at least one polycaprolactone polyol reactive diluent, wherein the amount of component (A) is from about 95% to about 75% by weight of the sum of (A) ... 11/24/05 - 20050260526 - Radiation sensitive resin composition, cathode separator and el display device A radiation sensitive resin composition for the formation of cathode separators for EL display devices which have heat resistance and adhesion required for cathode separators for EL display devices and an inversely tapered shape, cathode separators formed therefrom and an EL display device comprising the cathode separators. The radiation sensitive ... 11/24/05 - 20050260525 - Chemically amplified positive resist composition, a haloester derivative and a process for producing the same The present invention also provides a haloester derivative of the formula (XXI) and a process for producing the same. ... 11/24/05 - 20050260524 - Planographic printing plate material and preparing process of planographic printing plate A photosensitive composition containing: (A) a sensitizing dye; (B) a photopolymerization initiator; (c) a polymerizable compound having an ethylenically unsaturated bond; and (D) a polymer binder, wherein the photopolymerization initiator exhibits a reaction rate constant with a semiquinone radical anion in the range of 2.0×102 to 1.0×108 (mol−1·l·s−1). ... 11/24/05 - 20050260523 - Photoresist composition for lcd light diffuse reflecting film A photoresist composition for LCD light diffuse reflecting film is disclosed, which comprises (a) 8 to 90% by weight of base-soluble resin; (b) 1 to 30% by weight of polyfunctional unit; (c) 0.1 to 20% by weight of photopolymerization initiator; (d) 0.1 to 20% by weight of thermosetting cross-linking reagent; ... 11/24/05 - 20050260522 - Permanent resist composition, cured product thereof, and use thereof A permanent photoresist composition comprising: (A) one or more bisphenol A-novolac epoxy resins according to Formula I; wherein each group R in Formula I is individually selected from glycidyl or hydrogen and k in Formula I is a real number ranging from 0 to about 30; (B) one or more ... 11/24/05 - 20050260521 - Polymer, resist composition and patterning process A polymer comprising recurring units containing silicon and recurring units having a substituent group of formula (1) is novel wherein A1 is a divalent group selected from furandiyl, tetrahydrofurandiyl and oxanorbornanediyl, R1 and R2 are selected from monovalent C1-C10 hydrocarbon groups, or R1 and R2 taken together may form an ... 11/24/05 - 20050260520 - Heat stable photocurable resin composition for dry film resist The invention relates to a process for preparing a dry film resist by forming a photocurable resin composition onto a support film with a thickness of 1 to 50 μm and optionally laminate a protective film onto the photocursable composition layer to obtain a dry film resist; whereby the photocurable ... 11/24/05 - 20050260519 - Dissolution inhibitors in photoresist compositions for microlithography The invention relates to a photoresist composition comprising a polymeric binder; a photoactive component; and at least one dissolution inhibitor comprising a paraffinic or cycloparaffinic compound containing at least one functional group having the structure —C(Rf)(Rf′)OR wherein Rf and Rf′ are the same or different fluoroalkyl groups of from one ... 11/17/05 - 20050255406 - Marking on a thin film A technique of applying a protective layer and an absorbing layer to a wrapping material for wrapping a product, such as a candy bar or potato chips. The protective layer prevents a laser marking tool from puncturing the film. The absorbing layer absorbs radiation from the laser marking tool to ... 11/17/05 - 20050255405 - Photoresist resin composition The invention provides photoresist resin compositions and in particular, a photoresist resin compositions comprising a) an acrylate monomer having two urethane bonds, b) a crosslinkable urethane monomer having at least two ethylene double bonds, c) an alkali-soluble compound, d) a photopolymerization initiator and e) a solvent, and a photoresist dry ... 11/17/05 - 20050255404 - Lithographic printing plate precursor A lithographic printing plate precursor comprising a photosensitive layer comprising: (A) a fluorescent brightening agent; (B) an activator compound being capable of inducing a chemical change by an interaction with light absorption of the fluorescent brightening agent to produce at least one of a radical, an acid and a base; ... 11/17/05 - 20050255403 - Method for cleavage of labile functional groups from chemical compounds The present invention provides a method for cleavage of labile functional groups from molecules by the action of electromagnetic radiation, wherein the molecules are contacted with a chemical compound whose triplet state is energetically higher than the triplet state of the labile functional group, and are subsequently exposed to electromagnetic ... 11/10/05 - 20050250045 - Functional polymer A polymer having α,β unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking. ... 11/10/05 - 20050250044 - Functional polymer A polymer having α,β unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking. ... 11/10/05 - 20050250043 - Method of making a photopolymer sleeve blank for flexographic printing A method of making a photopolymer sleeve blank is provided which includes providing a base sleeve, applying a cushion layer over the base sleeve, and applying a first photopolymer layer over the cushion layer. The exterior-facing surface of the first photopolymer layer is exposed to a curing source, followed by ... 11/10/05 - 20050250042 - Derivatized polyhydroxystyrenes with a novolak type structure and processes for preparing the same A process for preparing derivatized poly(4-hydroxystryrene) having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert ... 11/10/05 - 20050250041 - Composition which forms an electrically conductive resist layer and a method for patterning a photoresist using the resist layer A composition is specified which forms an electrically conductive resist layer and comprises a resin that can be crosslinked to form a base polymer, an organic compound that can be crosslinked to form an electrically conductive substance, a crosslinking agent having an oxidative or reductive action, and at least one ... 11/10/05 - 20050250040 - On press developable imageable element Co-polymers that contain siloxane groups, imageable elements that comprise the co-polymers, and methods for forming images by imaging and developing the imageable elements are disclosed. The imageable elements are useful as lithographic printing plate precursors that can be developed with water or with fountain solution. ... 11/03/05 - 20050244750 - Negative resist composition comprising hydroxy-substituted base polymer and si-containing crosslinker having epoxy ring and a method for patterning semiconductor devices using the same A negative resist composition and a method for patterning semiconductor devices using the composition are provided. The negative resist composition contains an alkali-soluble hydroxy-substituted base polymer, a silicon-containing crosslinker having an epoxy ring, and a photoacid generator. In the method for patterning semiconductor devices, fine patterns are formed according to ... 11/03/05 - 20050244749 - Printing plate precursor comprising solvent-resistant copolymer The present invention provides a positive-working, thermally imageable element generally comprising a multi-layered imageable coating. The invention provides an imageable element comprising a substrate, an ink-receptive top layer, and an underlayer, the underlayer including a specific copolymer described herein. The copolymer can be a polymer comprising constitutional units derived from: ... 11/03/05 - 20050244748 - Photoresist polymer and photoresist composition containing the same R1-R12, a, b, c and d are as defined in the description. ... 11/03/05 - 20050244747 - Positive-tone radiation-sensitive resin composition wherein R1 and R2 are individually halogen atom, methyl, cyano, or nitro group, X is a C1-20 organic group, and h and i are 0-4. The resin composition is useful as a chemically amplified positive-tone resist excelling in focal depth allowance, sensitivity, resolution, pattern profile, and PED stability. ... 11/03/05 - 20050244746 - Lithographic printing plate precursor and lithographic printing method A lithographic printing plate precursor comprising an image recording layer containing a sensitizing dye, a polymerization initiator, a polymerizable compound and a binder polymer and a hydrophilic support, wherein the image recording layer or a layer optionally provided between the image recording layer and the hydrophilic support contains a compound ... 11/03/05 - 20050244745 - Photoresist compositions with si-component Photoresist compositions are provided with a silicon-containing component and an added sulfonic acid component. Preferred resists of the invention also contain a non-hydroxylic solvent such as propylene glycol methyl ether acetate as the primary or sole solvent. Preferred resist compositions of the invention can exhibit enhanced stability during storage between ... 11/03/05 - 20050244744 - Method for forming temporary image An image forming method composed of: (a) providing a reimageable medium composed of a substrate and a photochromic material, wherein the medium is capable of exhibiting a color contrast and an absence of the color contrast; (b) exposing the medium to an imaging light corresponding to a predetermined image to ... 11/03/05 - 20050244743 - Reimageable medium An reimageable medium composed of: a substrate; and a photochromic material, wherein the medium is capable of exhibiting a color contrast and an absence of the color contrast, wherein the medium has a characteristic that when the medium exhibits the absence of the color contrast and is then exposed to ... 11/03/05 - 20050244742 - Reimageable medium with light absorbing material A reimageable medium for receiving an imaging light having a predetermined wavelength scope, the medium composed of: a substrate; a photochromic material capable of reversibly converting among a number of different forms, wherein one form has an absorption spectrum that overlaps with the predetermined wavelength scope; and a light absorbing ... 11/03/05 - 20050244741 - Compositions, systems, and methods for imaging A composition, method, and system for recording an image. The system includes a multiphase imaging material in which energy is absorbed by an antenna material. The absorbed energy causes the reaction of an activator and a color-forming material to form a mark. A fixer is employed to retard the fading ... 11/03/05 - 20050244740 - Chemically amplified positive photo resist composition and method for forming resist pattern The present invention provides a chemical amplification type positive photoresist composition which is excellent in storage stability as a resist solution in a bottle. A novolak resin or a hydroxystyrenic resin is reacted with a crosslinking agent to give a slightly alkali-soluble or alkali-insoluble resin having such a property that ... 11/03/05 - 20050244739 - Highly heat-resistant, negative-type photosensitive resin composition Disclosed is a negative type photosensitive resin composition comprising (A) a polyamide having a photopolymerizable unsaturated double bond, (B) a monomer having a photopolymerizable unsaturated double bond, (C) a photopolymerization initiator and (D) a melamine resin. ... 10/27/05 - 20050238996 - Photosensitive resin laminate A photosensitive resin laminate comprising at least a support, a photosensitive resin layer and an IR ablation layer, wherein the IR ablation layer comprises an IR absorbent metal layer which is disposed in contact with the photosensitive resin layer. ... 10/27/05 - 20050238995 - Heat-sensitive composition in which removal of the unexposed regions is unnecessary, negative lithographic plate coated with the said composition and method for forming a negative image on the said plate A heat-sensitive composition which forms an image without the removal of material, which does not require any developing treatment after the stage of exposure to heat and comprises: (a) a switchable polymer, (b) an IR absorber, (c) a triazine compound, and (d) a novolak resin. Negative lithographic plate comprising a ... 10/27/05 - 20050238994 - Negative working, heat-sensitive lithographic printing plate precursor A negative-working lithographic printing plate precursor is disclosed comprising on a support having a hydrophilic surface or which is provided with a hydrophilic layer, a coating comprising an infrared absorbing agent, a first layer comprising an aqueous dispersion comprising hydrophobic thermoplastic polymer particles and a first hydrophobic binder, and a ... 10/27/05 - 20050238993 - Nitrogen-containing organic compound, chemically amplified resist composition and patterning process Chemically amplified resist compositions comprising nitrogen-containing organic compounds having a 7-oxanorbornane-2-carboxylic ester structure have an excellent resolution and provide a precise pattern profile and are useful in microfabrication using electron beams or deep-UV light. ... 10/27/05 - 20050238992 - Photosensitive composition, compound used in the same, and patterning method using the same wherein Y1, Y2 and Y3 each independently represents a nitrogen-containing heteroaryl group, an alkyl group, a cycloalkyl group, an aryl group or an alkenyl group, at least one of Y1, Y2 and Y3 represents a nitrogen-containing heteroaryl group, and at least two of Y1, Y2 and Y3 may combine with ... 10/27/05 - 20050238991 - Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same wherein R1, R2 and R3 are independently hydrogen or a methyl group; and a, b and c represent the mole fraction of each monomer, and are in the range between about 0.05 and about 0.9. Since a top anti-reflective coating formed using the above anti-reflective coating polymer is not soluble ... 10/27/05 - 20050238990 - Photoresist resin and photoresist resin composition A photoresist resin of the invention contains at least a constitutional repeating unit A containing a group capable of partially leaving by the action of an acid to thereby become soluble in an alkali, and a constitutional repeating unit B containing an alicyclic skeleton having a polar group, and has ... 10/20/05 - 20050233245 - Chemically amplified positive resist composition and patterning process A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline developer under the action of acid, and a basic compound has a high sensitivity, a high contrast of dissolution of resist film, a high resolution, and ... 10/20/05 - 20050233244 - Printing plate material and printing process employing the same Disclosed is a printing plate material comprising a surface roughened aluminum support, and provided thereon, an image formation layer containing a heat-curable polymer having a main chain polymer in the main chain, and an acryloyl group or a methacryloyl group in the side chain, a glass transition temperature Tg of ... 10/20/05 - 20050233243 - Printing plate material and printing process Disclosed is a printing plate material comprising a support and provided thereon, a hydrophilic layer and a thermosensitive image formation layer containing a blocked isocyanate compound, which is a reaction product of an isocyanate compound, a polyol, and an isocyanate group-blocking material, wherein the thermosensitive image formation layer is formed ... 10/20/05 - 20050233242 - Photosensitive composition and pattern forming method using the same A photosensitive composition comprising (A) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, (B) a compound that generates an acid upon irradiation of an actinic ray or radiation, and (C1) a compound having a molecular weight of 1,000 or ... 10/13/05 - 20050227175 - Method of manufacture of integrated optical devices A hybrid sol-gel material is placed in optical contact with two optical surfaces and the surfaces are precisely aligned as necessary to meet desired optical specifications. The sol-gel material filling the gap between the surfaces is then cured, such as by exposure to UV radiation. This allows, for example, the ... 10/13/05 - 20050227174 - Positive resist compositions and patterning process A polymer which is obtained from a combination of (meth)acrylate having a bridged ring lactone group and (meth)acrylate having an acid leaving group with a hexafluoroalcohol group is used as a base resin to formulate a positive resist composition which when exposed to high-energy radiation and developed, exhibits a high ... 10/13/05 - 20050227173 - Positive resist compositions and patterning process A polymer comprising units derived from an exo-form ester and units derived from an ester having two hexafluoroisopropanol groups is used as a base resin to formulate a positive resist composition which, when exposed and developed by photolithography, is minimized in line edge roughness by swelling during development and residue ... 10/13/05 - 20050227172 - Process for producing photoresist composition, filtration device, application device, and photoresist composition (wherein, R represents a hydrogen atom or a methyl group, and m represents an integer from 1 to 3). (2) The first filtration membrane has a critical surface tension of at least 70 dyne/cm, and has not been subjected to charge modification. ... 10/13/05 - 20050227171 - Lift-off positive resist composition A lift-off positive resist composition capable of forming a fine lift-off pattern is provided. This composition comprises a base resin component (A) and an acid generator component (B) generating an acid under exposure, wherein the base resin component (A) is a silicone resin. ... 10/13/05 - 20050227170 - Positive resist composition A positive resist composition having excellent mask linearity is provided. This composition is a positive resist composition comprising a base resin component (A) and an acid generator component (B) generating an acid under exposure, wherein the base resin component (A) is a silicone resin and the acid generator component (B) ... 10/13/05 - 20050227169 - Dye-containing resist composition and color filter using same There is provided a color resist composition comprising a resin (A), a photoacid generator or a photobase generator (B), a crosslinking compound (C) and a dye mixture (D) containing a dye having a structure of amino sulfonate ester or ammonium sulfonate salt in a proportion of 40 to 95% by ... 10/13/05 - 20050227168 - Uv radiation blocking protective layers compatible with thick film pastes This invention relates to novel compositions comprising a protective polymer layer and a UV blocking agent. This is used in the fabrication of electronic devices using thick film pastes. The present invention is also an electronic device fabrication process using the compositions. The protective polymer layer is fabricated from materials, ... 10/13/05 - 20050227167 - Negative photoresist and method of using thereof A negative photoresist composition and a method of patterning a substrate through use of the negative photoresist composition. The negative photoresist composition comprises a radiation sensitive acid generator, a first polymer containing an alkoxymethyl amido group and a hydroxy-containing second polymer. The first and second polymers may also have a ... 10/13/05 - 20050227166 - Active energy ray sensitive resin composition, active energy ray sensitive resin film and method for forming pattern using said film An activation energy ray-sensitive composition permitting development with neutral water. Provided is an activation energy ray-sensitive composition characterized by comprising a dispersion which comprises an aqueous solution of a water-soluble resin, and an acid former dispersed in the aqueous solution in the form of fine powder, the acid former being ... 10/13/05 - 20050227165 - Photosensitive resin composition for original printing plate capable of being carved by laser A photosensitive resin composition for forming a laser engravable printing element, comprising: (a) 100 parts by weight of a resin which is in a solid state at 20° C., wherein the resin has a number average molecular weight of from 5,000 to 300,000, (b) 5 to 200 parts by weight ... 10/13/05 - 20050227164 - Near infrared absorbing film and plasma display filter comprising the same Disclosed is an infrared absorbing film and a plasma display filter comprising the same cross-linkable binder resin which can be cured by easily radiation or heat and infrared absorbing dye, wherein the film and filter decrease transmittance difference in high temperature and humid and have excellent durability, heat-stability as well ... 10/06/05 - 20050221227 - Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same in the Formula (2), R3, R4, and R5 express one of a hydrogen atom and a monovalent organic group, and may be identical or different, “m” expresses an integer, and “n” expresses an integer of 1 to 5. Preferably, 0.25≦a≦0.60, and 0≦c≦0.25. The composition is preferably used in a resist ... 10/06/05 - 20050221226 - Lithographic printing plate precursor and lithographic printing method using the same A lithographic printing plate precursor capable of forming an image without undergoing alkali development, which comprises a hydrophilic support and a laser-sensitive photopolymerizing layer, wherein the photopolymerizing layer contains a polymer compound having at least one of an ether group, an ester group and an amido group in its molecule, ... 10/06/05 - 20050221225 - Positive resist composition A positive resist composition capable of forming a resist pattern having excellent shape is provided. This composition is a positive resist composition including a base resin component (A) and an acid generator component (B) generating an acid under exposure, which are dissolved in an organic solvent, wherein the base resin ... 10/06/05 - 20050221224 - Positive resist composition for use with electron beam, euv light or x ray, and pattern formation method using the same A positive resist composition for use with an electron beam, an EUV light or an X ray, the positive resist composition comprising: (A) at least one compound that generates an acid upon treatment with one of an actinic ray and radiation; and (B) a resin that increases a solubility of ... 10/06/05 - 20050221223 - Printing plate material, roll of a printing plate material and printing method A printing plate material including: a plastic support; a hydrophilic layer on the plastic support; and a back layer on the plastic support, being provided on the opposite side to the hydrophilic layer, wherein the back layer includes a matting agent, and a distribution width of a projection amount of ... 10/06/05 - 20050221222 - Photosensitive resin composition, resist pattern forming method, substrate processing method, and device manufacturing method A photosensitive resin composition is constituted by a polymer, as a component (A), having a monodisperse molecular weight distribution; and a compound, as a component (B), first generating a functional group which is capable of being silylated by radiation irradiation. ... 10/06/05 - 20050221221 - Polymer, resist composition, and patterning process A chemically amplified resist composition using an alternating copolymer of α-trifluoroacrylic acid with norbornene as a base polymer lends itself to ArF laser lithographic micropatterning and is improved in transparency, plasma etching resistance, and line edge roughness. ... 10/06/05 - 20050221220 - Photoacid generators based on novel superacids Carborane based PAG's are bulky, produce a strong and large superacid, and have polarities that are compatible with the chemically amplified polymers typically used in photoresists. Carborane based PAG's also provide another broad class of bulky PAG's that may be used in photoresist formulations that offer flexibility in acid strength ... 10/06/05 - 20050221219 - Resist compounds including acid labile groups attached to polymeric chains at anhydride linkages A compound including a polymeric chain, and an acid labile group attached to the polymeric chain at an anhydride linkage is disclosed. Compositions including the compound, and methods of using the compositions are also disclosed. ... 10/06/05 - 20050221218 - Novel anti-reflective coatings Anti-reflective materials such as bottom anti-reflective coatings (BARC's) and sacrificial light absorbing materials (SLAM) may be made more effective at preventing coherent light or electron beam reflection from a substrate by including in the anti-reflective material an additive to alter the radiation beam path of the reflected light or electrons. ... 10/06/05 - 20050221217 - Resist compounds including acid labile groups having hydrophilic groups attached thereto A compound including a polymeric chain, an acid labile group attached to the polymeric chain, and at least one hydrophilic group attached to the acid labile group is disclosed. Compositions including the compound, and methods of using the compositions are also disclosed. ... 09/29/05 - 20050214680 - Radiation-sensitive resin composition wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic ... 09/29/05 - 20050214679 - Negative dye-containing curable composition, color filter and method of producing the same There is provided a negative dye-containing curable composition, comprising an alkali-soluble binder, an organic solvent-soluble dye, a photopolymerizable compound, a photopolymerization initiator and an organic solvent, wherein: the mass of the organic solvent-soluble dye is greater than the mass of the alkali-soluble binder; the mass of the organic solvent-soluble dye ... 09/29/05 - 20050214678 - Light-sensitive lithographic printing plate A light-sensitive lithographic printing plate comprises a hydrophilic substrate provided thereon with an infrared light-sensitive layer which comprises (A) an acetal polymer having a specific structure; (B) a polymeric compound carrying, on the side chains, fluorinated aliphatic groups in which the fluorinated aliphatic groups are those derived from fluorinated aliphatic ... 09/29/05 - 20050214677 - Light-sensitive lithographic printing plate A light-sensitive lithographic printing plate comprising a hydrophilic substrate provided thereon with a layer sensitive to infrared light rays comprising (A) a polymer represented by the following general formula (I); (B) an organic acid and/or a cyclic acid anhydride; and (C) a light-heat conversion substance. The light-sensitive lithographic printing plate ... 09/29/05 - 20050214676 - Chemically amplified positive resist composition wherein R1 and R2 each independently represents a hydrogen or an alkyl having 1 to 4 carbon atoms, R3, R4 and R5 each independently represents a hydrogen or a hydroxyl. ... 09/29/05 - 20050214675 - Positive-type photosensitive composition The positive-type photosensitive composition according to the present invention contains a novolak resin (A), an alkali-soluble resin (B) selected from the group consisting of resins prepared by addition polymerization of a vinyl compound and condensation polymers such as imide, amide, urethane, urea, ester, and resol resins, an infrared absorbing agent ... 09/29/05 - 20050214674 - Positive-working photoimageable bottom antireflective coating The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a ... 09/22/05 - 20050208424 - Polymer, resist composition and patterning process R1, R2 and R5 are H or CH3, R3 and R4 are H or OH, and X is a tertiary alkyl group having an adamantane structure. A resist composition comprising the inventive polymer has a sensitivity to high-energy radiation, improved resolution and minimized proximity bias and lends itself to micropatterning ... 09/22/05 - 20050208423 - Lithographic printing plate precursor A lithographic printing plate precursor comprising a support and an image-recording layer that contains (A) a radical polymerization initiator, (B) a polymerizable compound and (C) a lipophilic binder polymer substantially not containing an acid group and is capable of being removed with either or both of printing ink and dampening ... 09/22/05 - 20050208422 - Support for lithographic printing plate and presensitized plate Disclosed is a support for a lithographic printing plate which, when measured over a 400 μm×400 μm surface region thereon using a three-dimensional non-contact roughness tester, has at most 5.0 convex portions of a height from centerline of at least 0.70 μm and an equivalent circle diameter of at least ... 09/22/05 - 20050208421 - Photosensitive resin composition and use of the same A photosensitive resin composition which, when exposed to light through a photomask and then developed, can form a pattern comprising a polyimide film having a thickness of 20 μm or larger with high resolution; and a use of the composition, in particular, a method of forming a pattern comprising the ... 09/22/05 - 20050208420 - Environmentally friendly photoacid generators (pags) with no perfluorooctyl sulfonates (pfos) Novel classes of ionic photoacid generator (PAGs) compounds having relatively environmentally friendly anions with no perfluorooctyl sulfonate (no-PFOS) are provided and photoresist composition that comprise such compounds. The new PAGs produce a photoacid having a short or no perfluoro alkyl chain (ie., no-PFOS) attached to a variety of functional groups. ... 09/22/05 - 20050208419 - Positive resist composition for immersion exposure and pattern-forming method using the same A positive resist composition for immersion exposure comprises: (A) a resin containing at least one repeating unit having a fluorine atom and increasing a solubility of the resin in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with ... 09/22/05 - 20050208418 - Cyanoadamantyl compounds and polymers Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are employed in photoresists imaged at wavelengths less than 250 nm such as 248 nm and 193 nm. ... 09/22/05 - 20050208417 - Cyanoadamantyl compounds and polymers and photoresists comprising same Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are employed in photoresists imaged at wavelengths less than 250 nm such as 248 nm and 193 nm. ... 09/22/05 - 20050208416 - Branched polyarylene ethers and processes for the preparation thereof wherein B is as defined herein, and (iv) a carbonate base; and (B) heating the reaction mixture and removing generated water from the reaction mixture, thereby effecting a polymerization reaction. Also disclosed are polymers prepared by this process and imaging members containing these polymers. ... 09/15/05 - 20050202345 - Resist composition A resist composition which can easily form a resist pattern excellent in transparency for vacuum ultraviolet rays such as an F2 excimer laser or the like and dry etching characteristics and further excellent in sensitivity, resolution, flatness, thermal resistance and the like, is provided. The resist composition, characterized by comprising ... 09/15/05 - 20050202344 - Method of producing ultraviolet radiation absorbent An ultraviolet radiation absorbent for thermoplastic polymer materials such as polyethylene terephthalate or polycarbonate contains cyclic imino ester compound of a specified structure in an amount of over 99.5 weight % and less than 100 weight % and having an acid value in the range of 1×10−3-1 and/or a chlorine ... 09/15/05 - 20050202343 - Curable composition and image forming material containing the same A curable composition comprising: (A) an infrared absorber which is a cyanine dye having a structure in which hetero rings are bonded to each other via a methine chain and which has at least one substituent having a structure selected from the group consisting of an amide bond, a urethane ... 09/15/05 - 20050202342 - Planographic printing plate precursor A planographic printing plate precursor comprises: a support; and a recording layer disposed on the support, the recording layer comprising a lower layer and an upper layer disposed on the lower layer, wherein the lower layer contains a resin having in a main chain structure a phenol skeleton and a ... 09/15/05 - 20050202341 - Polymerizable composition, photopolymerizing method and process for producing lithographic printing plate using the polymerizable composition A polymerizable composition comprising an ethylenic monomer, a photopolymerization initiator and a specific benzotriazole compound or sulfone compound, and a method for producing a lithographic printing plate comprising a step of exposing a light-sensitive layer containing the above-described polymerizable composition on a support with laser light having a wavelength of ... 09/15/05 - 20050202340 - Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof The present invention relates to a process for imaging deep ultraviolet (uv) photoresists with a topcoat using deep uv immersion lithography. The invention further relates to a topcoat composition comprising a polymer with at least one ionizable group having a pKa ranging from about −9 to about 11. The invention ... 09/15/05 - 20050202339 - Negative photoresist and method of using thereof A negative photoresist composition and a method of patterning a substrate through use of the negative photoresist composition. The composition includes: a radiation sensitive acid generator; a multihydroxy-containing additive; and a resist polymer comprising a first repeating unit from a first monomer. The resist polymer may also comprise a second ... 09/15/05 - 20050202338 - Preparation of crosslinked particles from polymers having activatible crosslinking groups Crosslinked particles are provided that are useful in the manufacture of dielectric materials for use in electronic devices such as integrated circuits. The crosslinked particles are prepared by activating crosslinkable groups on synthetic polymer molecules, where the crosslinkable groups are inert until activated and, when activated, undergo an irreversible intramolecular ... 09/15/05 - 20050202337 - Photosensitive resin composition and method for preparing heat-resistant resin film The present invention is directed to a photosensitive resin composition comprising (a) a resin having a specific structure, (b) a photosensitive agent, and (c) an organic solvent having a boiling point at atmospheric pressure of 100° C. or higher and 140° C. or lower, the content of the component (c) ... 09/08/05 - 20050196699 - Polymers and photoresists comprising same New polymers are provided that contain both Ti and Si atoms and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more polymer repeat units comprise carbon atom(s). Polymers of the invention are particularly useful as a resin component of photoresists imaged at short wavelengths such ... 09/08/05 - 20050196698 - Polymerizable composition and lithographic printing plate precursor wherein X represents a tri- or higher valent atom; R1 and R2 each independently represent a single bond or an alkylene group optionally having a substituent, provided that R1 and R2 do not represent a single bond at a same time; A represents a straight chain linking group; and n ... 09/08/05 - 20050196697 - Actinic ray curable composition, image forming method using the same and ink-jet recording apparatus using the same An actinic ray curable composition containing a quinacridone pigment; a dispersant; a cationically polymerizable monomer; a photo acid generator; and a quinacridone derivative. ... 09/08/05 - 20050196696 - Photochromic optical article Describes a photochromic article, e.g., an ophthalmic photochromic plastic article, such as a lens, in which the article includes (1) a rigid substrate, e.g., polymeric substrate, such as a thermoset or thermoplastic substrate, (2) a photochromic polymeric coating appended to at least one surface of the substrate, the photochromic polymeric ... 09/01/05 - 20050191580 - Negative photosensitive resin composition A negative photosensitive resin composition comprising an alkali-soluble photosensitive resin (A) having acidic groups and having at least three ethylenic double bonds per molecule, an ink repellent (B) made of a polymer having polymerized units (b1) having a C20 or lower alkyl group in which at least one of its ... 09/01/05 - 20050191579 - Protecting groups in polymers, photoresists and processes for microlithography The invention relates to a photoresist composition having a protecting group and a protected material incorporated in a cyclic chemical structure. In this invention a protected material has a cyclic ether group or cyclic ester group as a protecting group. A specific example of a cyclic ether group is an ... 09/01/05 - 20050191578 - Process for preparing fluorine-containing polymer and photoresist composition wherein R50 and R51 are the same or different and each is a hydrocarbon group having 1 to 30 carbon atoms which may have ether bond (an atom at an end of bond is not oxygen atom); p1 and p2 are the same or different and each is 0 or ... 09/01/05 - 20050191577 - Planographic printing plate precursor A planographic printing plate precursor comprises a support and two or more positive recording layers which are formed on the support, contain a resin and an infrared absorbing agent and exhibit an increase in solubility in an aqueous alkali solution by exposure to infrared laser light, wherein the positive recording ... 09/01/05 - 20050191576 - Water-soluble material, chemically amplified resist and pattern formation method using the same A water-soluble material used for forming a water-soluble film on a chemically amplified resist film includes a water-soluble polymer, an acid generator and a compound constructing an inclusion compound for incorporating the acid generator. Also, in a pattern formation method, a chemically amplified resist film is formed on a substrate, ... 08/25/05 - 20050186508 - Stereolithographic resin composition comprising photo-curable component, sol-gel resin and filler and stereolithographic method using the same The invention provides a stereolithographic resin composition including a photo-curable component, a resin having a function of causing a reversible, quick sol-gel phase transition based on temperature change, and a filler, and a stereolithographic method using the resin composition. ... 08/25/05 - 20050186507 - Photoresist composition New photoresists are provided that comprise a blend of at least two distinct phenolic polymers, wherein each polymer has distinct photoacid labile groups from the other polymer. One or preferably both distinct phenolic resins of the blend have extremely low polydispersity values. Photoresists of the invention can exhibit excellent resolution ... 08/25/05 - 20050186506 - Positive resist composition and pattern forming method using the same A positive resist composition satisfying all of high sensitivity, high resolution, good pattern profile, good line edge roughness and good in-vacuum PED characteristics, is provided, the positive resist composition comprising: (A) a resin containing a repeating unit having a specific styrene skeleton, which is insoluble or hardly soluble in an ... 08/25/05 - 20050186505 - Positive resist composition for immersion exposure and method of pattern formation with the same A positive resist composition for immersion exposure which comprises (A) a resin which enhances its solubility in an alkaline developer by the action of an acid and (B) at least one compound which generates an acid upon irradiation with an actinic ray or a radiation, the compound being selected from ... 08/25/05 - 20050186504 - Photopolymerizable composition and recording material using the same wherein R1 and R2 independently represent an optionally substituted aliphatic group, or may be bound to each other to form a ring, A represents an optionally substituted divalent aliphatic linking group, or may be bound to R1 or R2 to form a ring, B represents an optionally substituted divalent linking ... 08/25/05 - 20050186503 - Resist composition for immersion exposure and pattern formation method using the same A resist composition for immersion, comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a photoacid generator; and (C) a mixed solvent containing an alkylene glycol alkyl ether carboxylate and a propylene glycol monomethyl ether. ... 08/25/05 - 20050186502 - Directly photodefinable polymer compositions and methods thereof The present invention relates to a directly photoimageable polymer composition (DPPC) and methods for its use in forming microelectronic and optoelectronic devices. Such DPPC encompasses a polymer having at least one norbornene-type repeat unit having a pendant silyl containing radical and at least one norbornene-type repeat unit having an acrylate ... 08/25/05 - 20050186501 - Polymer compound, resist material and pattern formation method wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a ... 08/25/05 - 20050186500 - Method of making and structuring a photoresist A method of producing and structuring a UV 300/400 light sensitive highly viscous, chemically amplified positive photoresist which can be developed in an aqueous alkaline medium for application in layers of a thickness of 100 μm or more and which can be removed without leaving any residue, for use in ... 08/18/05 - 20050181306 - Light-sensitive lithographic printing plate precursor A light-sensitive lithographic printing plate precursor comprising an aluminum support having an anodized film on both surfaces thereof and a photo-polymerizable light-sensitive layer on one side of the support, wherein the anodized film on the surface of the support opposite to the light-sensitive layer side is provided on the entire ... 08/18/05 - 20050181305 - Photosensitive composition A photosensitive composition comprising (i) at least one titanocene compound, (ii) a pyridine compound having a structure represented by formula (1) defined in the specification or a cyan compound having a structure represented by formula (3) defined in the specification, and (iii) a compound capable of undergoing a reaction with ... 08/18/05 - 20050181304 - Method of forming fine pattern There is provided a method of forming a fine pattern by using a highly practicable fluorine-containing polymer which has a high transparency to exposure light having a short wavelength such as F2 laser and can improve dry etching resistance without remarkably lowering transparency. The method comprises (I) a step for ... 08/18/05 - 20050181303 - Photosensitive lithographic printing plate precursor A photosensitive lithographic printing plate precursor comprising a support and at least one photopolymerizable layer for imaging by scanning with a laser beam, and showing a difference of 5 μm or smaller between Wa (μm) and Wb (μm) when imagewise exposed with a laser beam and developed in a developing ... 08/18/05 - 20050181302 - Printing plate material Disclosed is a printing plate material comprising a hydrophilic support and provided thereon, an image formation layer containing and provided resin particles in an amount of from 60 to 100% by weight, the thermoplastic resin particles having a glass transition point (Tg) and an average particle size of from 0.01 ... 08/18/05 - 20050181301 - Light sensitive planographic printing plate material Disclosed is a light sensitive planographic printing plate material comprising a hydrophilic support and provided thereon, a light sensitve layer containing (A) an infrared absorbing dye, (B) a radical generating agent, and (C) a radically polymerizable compound, the light sensitve layer being an outermost layer, wherein the radical generating agent ... 08/18/05 - 20050181300 - Photobase generator and curable composition wherein Ar, R, A+ and X− are as defined in the specification. Since the photobase generator of the formula 1 absorbs ultraviolet lights of relatively long wavelength and is photolyzed to generate a strong base efficiently, a composition containing the photobase generator and an episulfide compound is easily cured by ... 08/18/05 - 20050181299 - Coating compositions Coating compositions are provided that include a component that is a product of materials comprising an amine and an anhydride and/or an anhydride derivative. Compositions of the invention are particularly useful as an underlying antireflective coating composition (“ARC”) employed with an overcoated photoresist layer in the manufacture of microelectronic wafers ... 08/18/05 - 20050181298 - Compositions for positive heat sensitive lithographic pringting plates The invention relates to a composition for positive heat sensitive CTP lithographic printing plates comprising a phenolic resin and an IR absorber characterized by the fact that it contains from 1 to 30% w/w of an organic oxygenated phosphorous compound chosen from the group of general formula (I): wherein R1, ... 08/11/05 - 20050175936 - Chemically amplified resist composition and method for forming patterned film using same A chemically amplified resist composition which comprises a base resin reacting in the presence of an acid, a photo acid generator generating an acid upon exposure, and a compound having the combination of an acetal moiety and a site which is eliminated by an acid in its molecule, or which ... 08/11/05 - 20050175935 - Polymer, resist composition, and patterning process A chemically amplified resist composition comprising an alternating copolymer of an acrylate monomer having a fluoroalkyl group at alpha-position with a norbornene derivative, when processed through ArF excimer laser exposure by lithography, is improved in resolution and dry etching resistance and minimized in line edge roughness. ... 08/11/05 - 20050175934 - Polymerizable lithographic printing plate precursor A polymerizable lithographic printing plate precursor comprising a support having in order thereon, a polymerizable photosensitive layer and a protective layer containing (A) polyvinyl alcohol and (B) a polyoxyethylene castor oil ether surfactant. ... 08/11/05 - 20050175933 - Light shielding film for display device, production process thereof, metal-particle-containing composition, photosensitive transfer material, substrate for display device, and color filter A light shielding film for a display device, comprising a polymer binder, metal particles dispersed in the polymer binder, and a compound including a sulfur atom or a nitrogen atom. A substrate for a display device comprising the light shielding film. And a color filter comprising the light shielding film. ... 08/11/05 - 20050175932 - Planographic printing plate material, printing plate and printing method An object of the invention is to provide a planographic printing plate material providing excellent initial ink receptively, excellent printing durability and greatly improved registering property, a printing plate prepared therefrom, and a printing method employing the printing plate. The forgoing printing plate material comprising a hydrophilic layer on one ... 08/11/05 - 20050175931 - Imaging compositions and methods Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be applied to a work piece to mark it and removed ... 08/11/05 - 20050175930 - Photosensitive resin composition for black matrix (Z1 is selected from the group consisting of Ra, Rb-S, Rc-O, wherein each of Ra, Rb, Rc is independently H, alkyl or aryl; Z2 is H, alkyl of C1-C4, or halide.) ... 08/11/05 - 20050175929 - Imaging composition and method Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be used in methods of marking. ... 08/11/05 - 20050175928 - Negative photoresist composition involving non-crosslinking chemistry A negative photoresist composition and a method of patterning a substrate through use of the negative photoresist composition. The composition includes: a radiation sensitive acid generator; an additive; and a resist polymer derived from at least one first monomer including a hydroxy group. The first monomer may be acidic or ... 08/11/05 - 20050175927 - Composition for antireflection film formation There is provided a composition for forming anti-reflective coating containing a urea compound substituted by hydroxyalkyl group or alkoxyalkyl group, and preferably a light absorbing compound and/or a light absorbing resin; a method of forming a anti-reflective coating for a semiconductor device by use of the composition; and a process ... 08/11/05 - 20050175926 - Coating forming agent for reducing pattern dimension and method of forming fine pattern therewith It is disclosed an over-coating agent for forming fine patterns which is applied to cover a substrate having thereon photoresist patterns and allowed to shrink under heat so that the spacing between adjacent photoresist patterns is lessened, with the applied film of the over-coating agent being removed substantially completely to ... 08/11/05 - 20050175925 - Photocurable compositions containing reactive particles A photocurable composition, including (a) a photocurable monomer, e.g. a cationically curable monomer and/or a radically curable monomer; (b) reactive particles comprising a crosslinked elastomeric core, e.g. made of polysiloxane material, and a shell of reactive groups on an outer surface of the core, wherein the reactive groups comprise epoxy ... 08/04/05 - 20050170286 - Printing plates using binder resins having polyethylene oxide segments The present invention relates to a polymerizable coating composition suitable for the manufacture of printing plates, which may be developable on-press. The coating composition comprises (i) a polymerizable compound and (ii) a polymeric binder comprising polyethylene oxide segments, wherein the polymeric binder is selected from the group consisting of at ... 08/04/05 - 20050170285 - Polymerizable composition A polymerizable composition comprising: (A) a non-acrylic binder polymer having an ethylenically unsaturated bond on a side chain; (B) a neutrally charged compound capable of generating a radical under light or heat; and (C) a compound having an ethylenically unsaturated bond, and a polymerizable composition comprising: (A′) a polyurethane resin ... 08/04/05 - 20050170284 - Photosensitive conducting composition for a plasma display panel A photosensitive conducting composition for a plasma display panel includes a photosensitive conducting composition comprising a silane compound, a photosensitive organic vehicle, a glass frit and a conducting powder. ... 08/04/05 - 20050170283 - Polymers based on cinnamic acid as a bottom antireflective coating for 157 nm photolithography A bottom antireflective coating for photolithography at 157 nm or less, where the bottom antireflective coating includes a crosslinkable polymer which contains cinnamic acid derivatives. ... 08/04/05 - 20050170282 - Lithographic printing plate precursor and lithographic printing method An on-press development or non-processing (non-development) type lithographic printing plate precursor capable of giving a printout image having a large lightness difference, and a lithographic printing method using this lithographic printing plate precursor are provided, a lithographic printing plate precursor comprising a support and a photosensitive-thermosensitive layer capable of recording ... 08/04/05 - 20050170281 - Method of cleaving labile functional groups from chemical compounds The present invention provides a method of cleaving labile functional groups from molecules by exposure to electromagnetic radiation in which the molecules are contacted with a chemical compound whose triplet state is energetically higher than the triplet state of the labile functional group and are then exposed to electromagnetic radiation, ... 08/04/05 - 20050170280 - Environmentally friendly, 100% solids, actinic radiation curable coating compositions for coating thermally sensitive surfaces and/or rusted surfaces and methods, processes and assemblages for coating thereof Disclosed are environmentally friendly, substantially all solids coating compositions which are curable using ultraviolet and visible radiation. In addition, the disclosed coating compositions are suitable for coating thermally sensitive objects and/or rusted surfaces. In addition, methods are disclosed for coating surfaces, or at least a portion of the surfaces, and ... 08/04/05 - 20050170279 - Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivatives A photoresist that is suitable for use in 157 nm photolithography includes a polymer based on fluorinated norbornene derivatives. ... 08/04/05 - 20050170278 - Polymer and photoresist compositions Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions. ... 08/04/05 - 20050170277 - Fluorinated photoresists prepared, deposited, developed and removed in carbon dioxide The present invention provides a compound that is a terpolymer of: (a) at least one ethylenically unsaturated linear or branched compound that has at least one fluorine atom covalently coupled thereto; (b) at least one ethylenically unsaturated precursor of a cyclic or polycyclic compound that has at least one fluorine ... 08/04/05 - 20050170276 - Chemical-amplification positive-working photoresist composition Disclosed is a chemical-amplification positive-working photoresist composition having compliability to various types of resist patterns with excellent sensitivity and pattern resolution exhibiting high exposure margin and focusing depth latitude. Of the essential components including (A) a resin capable of being imparted with increased alkali-solubility by interacting with an acid and ... 07/28/05 - 20050164124 - Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board wherein E0 represents an exposure amount in mJ/cm2 at which the photosensitive resin composition is cured at the 21st step of the density 1.00 of a 41-step step tablet having a density range from 0.00 to 2.00, a density step of 0.05, a tablet size of 20 mm×187 mm and ... // - 1 - ... // - 25 - ... // - 100 - ... // - 1 - ... // - 25 - ... 07/28/05 - 20050164123 - Positive resist composition and pattern formation method using the same A positive resist composition which can be suitably used in an ultramicrolithography process such as production of VLSI or high-capacity microchip and in other photofabrication processes and can ensure good sensitivity, resolution, pattern profile and line edge roughness when irradiated with actinic rays or radiation, particularly, electron beam, X-ray or ... 07/28/05 - 20050164122 - Chemically amplified resist and pattern formation method A resist film made of a chemically amplified resist including a water-soluble polymer is formed on a substrate, whereas the water-soluble polymer has lower gas permeability than the chemically amplified resist. Subsequently, pattern exposure is carried out by selectively irradiating the resist film with exposing light through a mask, and ... 07/28/05 - 20050164121 - Mask A mask is described for forming an image on a substrate. The mask may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the mask. The mask and portions ... 07/28/05 - 20050164120 - Photopolymerizable composition The invention provides a photopolymerizable composition having a high photosensitivity, which comprises a metal complex of a squarylium compound, a radical generator, and a compound having at least one ethylenically unsaturated double bond. The photopolymerizable composition of the present invention is advantageously used for a visible laser recording material such ... 07/28/05 - 20050164119 - Monomer having fluorine-containing acetalor ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same R represents an atomic group containing a carbon-carbon double bond exhibiting polymerization activity; at least one of R1 and R2 is fluorinated alkyl group or fluorinated aryl group having 1 to 20 carbon atoms; and R3 represents a radical selected from the group consisting of hydrogen atom, alkyl group, alkoxy-substituted ... 07/28/05 - 20050164118 - Method of joining a workpiece and a microstructure light exposure A method of joining a workpiece and a microstructure by light exposure, a microstructure obtainable by the method comprising a workpiece joined thereto, means thereto and use thereof; in particular a microstructure-forming composition comprising a light-sensitive, structure-forming material comprising one or more photo resist materials which are sensitive to preferably ... 07/21/05 - 20050158658 - Planographic printing plate precursor, substrate for the same and surface hydrophilic material A planographic printing plate precursor comprises a substrate having disposed thereon a hydrophilic layer which includes hydrophilic graft chains and a crosslinked structure formed through hydrolytic polycondensation of an alkoxide of an element selected from Si, Ti, Zr and Al. An aluminum substrate for a planographic printing plate includes a ... 07/21/05 - 20050158657 - Radiation-sensitive resin composition A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl ... 07/21/05 - 20050158656 - Chemical amplification type positive resist composition (B) an acid generator. The present composition is suitable for excimer laser lithography using ArF, KrF and the like, and shows various outstanding resist abilities, specifically, gives better effective sensitivity and resolution to resist patterns obtained therefrom, and gives particularly excellent pattern shape and excellent line edge roughness. ... 07/21/05 - 20050158655 - Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions Photoacid generator salts comprising photoactive cationic moieties and segmented, highly fluorinated-hydrocarbon anionic moieties are disclosed which provide high photoacid strength and can be tailored for solubility and polarity. The present invention further relates to photoacid generators as they are used in photoinitiated acid-catalyzed processes for uses such as photoresists for ... 07/21/05 - 20050158654 - Reducing outgassing of reactive material upon exposure of photolithography resists Outgassing of reactive material upon exposure of a photolithographic resist may be reduced. Outgassing may foul optical components of the photolithographic system. In one embodiment, a ring compound with iodine or sulfur may be formed. The ring compound may be more resistant to the generation of reactive outgassing components. ... 07/21/05 - 20050158653 - Sample surface inspection apparatus and method The present invention provides a surface inspection method and apparatus for inspecting a surface of a sample, in which a resistive film is coated on the surface, and a beam is irradiated to the surface having the resistive film coated thereon, to thereby conduct inspection of the surface of the ... 07/14/05 - 20050153240 - Norbornene-type monomers and polymers containing pendent lactone or sultone groups The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions ... 07/14/05 - 20050153239 - Lithographic printing plate precursor and lithographic printing method using the same A lithographic printing plate precursor comprises: a support; and an image recording layer that contains image forming particles and a non-water-soluble binder, the non-water-soluble binder interacting with the surface of the image forming particles. A lithographic printing plate precursor comprises: a support; and an image recording layer that contains a ... 07/14/05 - 20050153238 - Photosensitive polyimide resin composition, insulating film using the same, process for producing insulating film, and electronic component using the insulating film A photosensitive polyimide resin composition has: a polyimide resin composition having a polyimide copolymer that is prepared by an imidation reaction of an acid dianhydride with a diamine; and a photosensitizer added to the polyimide resin composition. The polyimide copolymer has a polyimide constitutional unit-to-substituent ratio of 200 to 600, ... 07/14/05 - 20050153237 - Planographic printing plate material and preparing process of planographic printing plate A planographic printing plate material including a support having thereon a photosensitive layer containing: (A) a photopolymerization initiator; (B) a polymer binder; (c) a polymerizable compound having an ethylenically unsaturated bond; and (D) an anionic dye, wherein the photopolymerization initiator is a metal-arene complex, and the anionic dye has a ... 07/14/05 - 20050153236 - Novel polymer and chemically amplified resist composition containing the same The present invention provides a chemically amplified resist composition including a novel polymer, a photoacid generator, and a solvent: The chemically amplified resist can form a resist pattern that is excellent in adhesiveness with a low dependency to the substrate, transparency at the far ultraviolet wavelength range such as KrF ... 07/14/05 - 20050153235 - Photosensitive material for immersion photolithography When rays of light converge inside a photosensitive material at angles larger than 70 degrees, one polarization of the light may fail to produce the desired image contrast in conventional exposure media. This invention describes a material which may be applied to a semiconductor wafer surface which ensures that the ... 07/14/05 - 20050153234 - Photosensitive material for immersion photolithography When rays of light converge inside a photosensitive material at angles larger than 70 degrees, one polarization of the light may fail to produce the desired image contrast in conventional exposure media. This invention describes means of suppressing the effects of the undesired polarization by using a class of photosensitive ... 07/14/05 - 20050153233 - Norbornene-type monomers and polymers containing pendent lactone or sultone groups The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions ... 07/14/05 - 20050153232 - Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use A positive photoresist composition comprises a radiations sensitive acid generator, and a polymer that may include a first repeating unit derived from a sulfonamide monomer including a fluorosulfonamide functionality, and a second repeating unit, which may include a pendant acid-labile moiety. The positive photoresist composition may also comprise at least ... 07/14/05 - 20050153231 - Thiol compound, photopolymerization initiator composition and photosensitive composition A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the α- and/or β-position with respect to the mercapto group and a photopolymerization initiator; a photosensitive composition containing the composition; and a novel ... 07/14/05 - 20050153230 - Photosensitive resins, resin compositions and products of curing thereof A photosensitive resin (A) consisting substantially of a product obtained by reacting a polyester (c) which is a reaction product of a polyol (a) with a tetrabasic acid dianhydride (b) with a compound (d) having an ethylenically unsaturated group and an epoxy group in the molecule; an alkali-soluble photosensitive resin ... 07/07/05 - 20050147918 - Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them Photoresist compositions that demonstrate superior photolithographic performance and hardened resist films that show superior resistance to solvents, have excellent resistance to under plating during the electrodeposition of metals, and show excellent resist stripping characteristics. These photoresist compositions according to the invention are well-suited as for applications in the manufacture of ... 07/07/05 - 20050147917 - Etching resist precursor compound, fabrication method of circuit board using the same and circuit board The fabricating method of a circuit board by the present invention draws a desired pattern of an etching resist endurable to form a fine wiring on the circuit board by a paste sintered on a substrate by performing the steps in order of (a) fabricating the paste (etching resist precursor ... 07/07/05 - 20050147916 - Low outgassing and non-crosslinking series of polymers for euv negative tone photoresists A series structure of a chemically amplified negative tone photoresist that is not based on cross-linking chemistry is herein described. The photoresist may comprise: a first aromatic structure copolymerized with a cycloolefin, wherein the cycloolefin is functionalized with a di-ol. The photoresist may also include a photo acid generator (PAG). ... 07/07/05 - 20050147915 - Photoresist composition The present invention relates to a photosensitive composition useful at wavelengths between 300 nm and 10 nm which comprises a polymer containing a substituted or unsubstituted higher adamantane. ... 07/07/05 - 20050147914 - Positively photosensitive resin composition and method of pattern formation The present invention provides a positive photosensitive resin composition which can be developed with a tetramethylammonium hydroxide aqueous solution with a usual concentration, has high sensitivity and excellent resolution, and is excellent in heat resistance, planarization properties, transparency, low water absorption or the like. Further, the present invention provides a ... 06/30/05 - 20050142488 - Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity An anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity comprising the steps of polymerization, purification, transesterification, purification, catalyst removal, and solvent exchange. The resultant polymer in solution can be used directly, without further processing steps, to prepare a photoresist composition. ... 06/30/05 - 20050142487 - Polymerizable adamantane derivative, production process thereof and polymeric compound wherein R1 is a fluorine atom or a fluoroalkyl group; and the adamantane ring in the formula may have a substituent. As the said fluoroalkyl group, there may be mentioned, for example, a trifluoromethyl, a pentafluoroethyl, a 2,2,2-trifluoroethyl, a 2,2,2-trifluoro-1-(trifluoromethyl)ethyl, a heptafluoropropyl group and so on. ... 06/30/05 - 20050142486 - Polymers and photoresist compositions comprising same The present invention relates to new polymers and use of such polymers as a resin binder component for photoresist compositions, particularly chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Preferred polymers of the invention are terpolymers and tetrapolymers that can ... 06/30/05 - 20050142485 - Image recording material wherein R1 represents a hydrogen atom or a methyl group; R2 represents a hydrocarbon group having (n+1) valences and having an aliphatic ring structure having 3 to 30 carbon atoms; A represents an oxygen atom or —NR3— wherein R3 represents a hydrogen atom or a monovalent hydrocarbon group having 1 ... 06/30/05 - 20050142484 - Image recording material wherein the substituent groups of the formulae (I) to (IV) are specified in the specification for this invention. ... 06/30/05 - 20050142483 - Lithographic printing plate precursor and lithographic printing method The present invention provides a lithographic printing plate precursor and a lithographic printing method using the lithographic printing plate precursor, which is capable of an image recording by infrared laser scanning and an on-press development and excellent in fine line reproducibility and press life while maintaining good on-press developing properties, ... 06/30/05 - 20050142482 - Photoresist for spacer and manufacturing method of liquid crystal display using the same The present invention provides a photoresist for a spacer comprising: a copolymer, a multi-functional monomer, and a photoinitiator as a basic composition; and a solvent which includes at least one of MEC, PGMEA and DEME, and EEP. The solvent of the photoresist may further include n-BA, and additionally include a ... 06/30/05 - 20050142481 - Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the same A cross-linking polymer for an organic anti-reflective coating that is able to improve the uniformity of an ultra-fine photoresist pattern formed using a photolithography process and an ArF light source with 194 nm wavelength. Organic anti-reflective coatings including the same and a method for forming a photoresist pattern using the ... 06/30/05 - 20050142480 - Photosensitive element for use as flexographic printing plate A photosensitive element for use as a flexographic printing plate comprises a support, an elastomeric photopolymerizable layer, and a matted layer disposed above a surface of the photopolymerizable layer opposite the support, comprising a polymeric binder and at least one matting agent which is capable of being anchored in the ... 06/30/05 - 20050142479 - Radiation curable resin composition for making colored three dimensional objects The present invention relates to resin compositions suitable for making colored three dimensional objects and to methods for making colored three dimensional objects. ... 06/23/05 - 20050136356 - Heat-sensitive lithographic printing plate precursor A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating thereon which comprises an infrared light-to-heat converter, an alkali-soluble binder and a polymeric developer accelerator. The polymeric developer accelerator is preferably a phenolic formaldehyde resin comprising at least 70 mol % of meta-cresol ... 06/23/05 - 20050136355 - Heat-sensitive lithographic printing plate precursor According to the present invention there is provided a positive-working lithographic printing plate precursor which comprises on a support having a hydrophilic surface or which is provided with a hydrophilic layer, an oleophilic coating comprising an infrared absorbing agent, an alkali-soluble polymeric binder and a polysiloxane which comprises at least ... 06/16/05 - 20050130063 - Composition for light-scattering film and light-scattering film using the same A composition for a light-scattering film contains fluorine-containing resin fine particles each including a copolymer of a first ethylenically unsaturated monomer containing fluorine with other ethylenically unsaturated monomer component, and having an average particle diameter of 0.8 to 5.0 μm; and a transparent resin having a refractive index of 1.50 ... 06/16/05 - 20050130062 - Printing plate material and printing process Disclosed are a printing plate material comprising a support and provided thereon, a hydrophilic layer and a thermosensitive image formation layer in that order, wherein the hydrophilic layer contains from 40 to 90% by weight of metal oxide particles having a light-to-heat conversion function and the thermosensitive image formation layer ... 06/16/05 - 20050130061 - Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused reflection of lower film layer or substrate and reduce standing waves caused by variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of ... 06/16/05 - 20050130060 - Positive photosensitive composition A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer. ... 06/16/05 - 20050130059 - Infrared absorbing n-alkylsulfate cyanine compounds Y is O, S, NR′, or C(R′)2, where R′ is hydrogen or alkyl; preferably methyl; Z is hydrogen, halogen, alkyl, substituted or unsubstituted aralkyl; substituted or unsubstituted aroxyl, substituted or unsubstituted thioaroxyl, or substituted or unsubstituted diphenylamino; m is zero or one; and X is a cation, preferably sodium, potassium, ... // - Infrared absorbing N-alkylsulfate cyanine compounds and imageable compositions containing the compounds are disclosed. The compounds have the structure I: - ... 06/16/05 - 20050130058 - Photoresist composition for deep uv and process thereof The present invention relates to a novel photoresist composition sensitive to radiation in the deep ultraviolet and a process for imaging the composition. The photoresist composition comprises a) a novel polymer that is insoluble in an aqueous alkaline solution and comprises at least one acid labile group, and b) a ... 06/16/05 - 20050130057 - Acid-degradable resin compositions containing ketene-aldehyde copolymer wherein R1 and R2 independently represent hydrogen atom, halogen atom, C1-20 hydrocarbon group, a heterocyclic group, a cyano group, a nitro group, C(═O)R4 group, S(O)nR4 group, P(═O)(R4)2 group or M(R4)3 group; R3 represents C1-20 hydrocarbon group or a heterocyclic group: R4 represents C1-20 hydrocarbonoxy group, C1-20 hydrocarbon group, C1-20 hydrocarbonthio ... 06/16/05 - 20050130056 - Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound To ensure etching resistance, an alicyclic group is introduced into a side chain portion. Hydrogen atoms on the ring of the alicyclic group are highly fluorinated to ensure transparency to light of 157 nanometer wavelength, represented by an adsorption coefficient equal to or less than 3.0 μm−1. As the alicyclic ... 06/09/05 - 20050123854 - Positive resist composition and base material carrying layer of the positive resist composition A positive resist composition includes (A) an alkali-soluble polysiloxane resin, (B) an acid generator composed of a compound which generates an acid upon irradiation of active light or radiant ray, and (C) a compound in which at least one hydrogen atom of phenolic hydroxyl group or carboxyl group is substituted ... 06/09/05 - 20050123853 - Water-developable infrared-sensitive printing plate The present invention provides an imageable element including a lithographic substrate and an imageable layer disposed on the substrate. The imageable layer includes a radically polymerizable component, an initiator system capable of generating radicals sufficient to initiate a polymerization reaction upon exposure to imaging radiation, and a polymeric binder having ... 06/09/05 - 20050123852 - Method for patterning a low activation energy photoresist Polymers containing an acetal or ketal linkage and their use in lithographic photoresist compositions, particularly in chemical amplification photoresists, are provided. The polymer is prepared from at least one first olefinic monomer containing an acetal or ketal linkage, the acid-catalyzed cleavage of which renders the polymer soluble in aqueous base; ... 06/09/05 - 20050123851 - Coating material for pattern fineness enhancement and method of forming fine pattern with the same It is disclosed an over-coating agent for forming fine patterns which is applied to cover a substrate having photoresist patterns thereon and allowed to shrink under heat so that the spacing between adjacent photoresist patterns is lessened, with the applied film of the over-coating agent being removed substantially completely to ... 06/02/05 - 20050118529 - Photoimageable composition The use of photoacid generators including an alkoxyphenylphenyliodonium salt and/or bis(t-butylphenyl)iodonium salt in a photoimageable composition helps improve resolution. Suitable photoimageable compositions includes: (a) a multifunctional polymeric epoxy resin that is dissolved in an organic solvent wherein the epoxy resin comprises oligomers of bisphenyl A that is quantitatively protected by ... 06/02/05 - 20050118528 - Lithographic apparatus and device manufacturing method An array of individually controllable elements is comprised of elements, each formed of a stack of layers of dielectric material. At least one layer is an electro-optical material. The at least one layer's refractive index for radiation that is plane polarized in a given direction can be changed by application ... 06/02/05 - 20050118527 - Wide band gap semiconductor composite detector plates for x-ray digital radiography An imaging composition for radiation detection systems which includes an admixture of at least one non-heat treated, non-ground particulate semiconductor with a polymeric binder. The non-heat treated, non-ground particulate semiconductor is selected from mercuric iodide, lead iodide, bismuth iodide, thallium bromide and cadmium-zinc-telluride (CZT), and at least 90% of the ... ### FreshPatents.com Support |