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Radiation Imagery Chemistry: Process, Composition, Or Product Thereof > Registration Or Layout Process Other Than Color Proofing Registration Or Layout Process Other Than Color ProofingRegistration Or Layout Process Other Than Color Proofing patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.05/17/07 - 20070111116 - Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same To provide an exposure method and an exposure apparatus, using a complementary divided mask, designed to enable alignment of a complementary divided mask at a high precision over the entire region of a semiconductor wafer. Further, to provide a semiconductor device fabricated by the exposure method and a method of ... 05/03/07 - 20070099098 - Method of the adjustable matching map system in lithography A method is provided for improving layer to layer overlay of a second layer pattern on a first layer pattern formed in a substrate. A plurality of first reference marks is placed inside a pattern area on a first layer mask which is used to form the first layer pattern. ... 05/03/07 - 20070099097 - Multi-purpose measurement marks for semiconductor devices, and methods, systems and computer program products for using same A mark for use in measuring characteristics of a layer of the semiconductor device includes multiple staggered L-shaped patterns including adjacent vertices, and legs that include line segments having variable spacing between them. Related methods, systems and computer program products for using the mark to calibrate semiconductor devices also are ... 04/05/07 - 20070077503 - Overlay key, method of forming the overlay key and method of measuring overlay accuracy using the overlay key In an overlay key used for measuring overlay accuracy between first and second layers on a substrate, a first mark may be formed in the first layer, and a second mark may be formed on the second layer. The first mark may include first patterns having a first pitch and ... 03/29/07 - 20070072099 - Method of aligning a particle-beam-generated pattern to a pattern on a pre-patterned substrate A significant improvement in the alignment of a particle-beam-generated pattern relative to a pre-existing pattern present on a substrate has been accomplished using optical measurement to register the particle beam to the pre-existing pattern. Use of a position fiducial which can be accurately measured by both an optical microscope and ... 03/08/07 - 20070054205 - Process for forming anti-reflection coating and method for improving accuracy of overlay measurement and alignment A method for forming an anti-reflection coating (ARC) with no hole over an overlay mark is described, which applies a fluid material of the ARC onto a substrate and then conducts at least two curing steps to convert the fluid material into the ARC. Such a bottom anti-reflection coating with ... 02/15/07 - 20070037077 - Substrate holder and device manufacturing method A second substrate, e.g. a III/V compound semiconductor, is placed on a first substrate, e.g. a wafer, in the vicinity of placement marks on the first substrate. The second substrate is exposed to patterned radiation, e.g. for the manufacture of integrated circuits. ... 02/08/07 - 20070031743 - Alignment and alignment marks A lithographic substrate provided with an alignment mark, the alignment mark having a plurality of features spaced apart from one another, each feature being spaced apart from adjacent features by a different distance is disclosed. Further, there is disclosed a method of aligning a lithographic substrate provided with an alignment ... 01/11/07 - 20070009813 - Method of manufacturing liquid crystal display device A plurality of display areas are formed on an array substrate by stepper exposure. The array substrate is divided into array shot areas serving as shot units at the time of divided exposure. One display area is divided into four array shot areas. One array shot area is provided with ... 12/28/06 - 20060292463 - Device manufacturing method and a calibration substrate The present invention relates to a device manufacturing method wherein a plurality of front side marks are manufactured on the front side of the substrate. These marks are used to locally align the substrate when exposing. After certain processing steps, the positions of the front side marks are measured and ... 12/14/06 - 20060281019 - Photomask and method of manufacturing the same A photomask for defining a photoresist layer formed on a wafer having at least an alignment mark region, wherein each alignment mark region has an alignment mark. The photomask comprises a shot region and an alignment mark pattern region. The alignment mark pattern region has a profile equal to the ... 11/23/06 - 20060263706 - Overlay vernier and method for manufacturing semiconductor device using the same An overlay vernier comprises overlay vernier patterns having a layout identical to that of patterns disposed within a real cell. A lower overlay vernier pattern is formed within a scribe line region along with a lower layer pattern as a lower layer of the real cell, and an upper overlay ... 10/26/06 - 20060240344 - Method of manufacture of polymer arrays The present invention provides methods to reduce bleed-over of transmitted light through a photolithographic mask during photolysis by reducing the gap between the mask and the substrate upon which photolithography is being performed. In a preferred embodiment of the invention, a leveling method in combination with a compressed gas is ... 07/06/06 - 20060147820 - Phase contrast alignment method and apparatus for nano imprint lithography An apparatus (and method) for forming a pattern on a workpiece, includes an optical phase contrast image sensor, and an imprint lithography system coupled to the optical phase contrast image sensor for laterally aligning an imprint template feature relative to the workpiece. ... 06/29/06 - 20060141374 - Lithographic apparatus with multiple alignment arrangements and alignment measuring method A lithographic apparatus has a plurality of different alignment arrangements that are used to perform an alignment measurement on the same mark(s) by: detecting a first alignment mark located on an object and producing a first alignment signal by a first detector; detecting the first mark and producing a second ... 06/29/06 - 20060141373 - Lithographic apparatus and device manufacturing method A system and method use a substrate with a pattern of individual, indiscrete alignment marks, i.e., the marks are separate and distinct from each other, and each mark is not divided into component parts. The pattern of marks is distributed over an area of the substrate, and the method also ... 06/08/06 - 20060121374 - Method for determining pattern misalignment over a substrate A two dimensional vernier is provided along with a method of fabrication. The two dimensional vernier has a reference array patterned into a substrate, or a material overlying the substrate. An active array is patterned into photoresist overlying the substrate or the material. Both the reference array and the active ... 06/08/06 - 20060121373 - Method and structure for manufacturing bonded substrates using multiple photolithography tools A method of manufacturing bonded substrate structures. The method includes providing a first substrate comprising a first surface region and processing the first surface region to form a first pattern region using a first photolithographic stepper characterized by a first tolerance criteria for alignment. The method also includes providing a ... 06/01/06 - 20060115751 - Automated overlay metrology system Non-imaging measurement is made of misalignment of lithographic exposures by illuminating periodic features of a mark formed by two lithographic exposures with broadband light and detecting an interference pattern at different wavelengths using a specular spectroscopic scatterometer including a wavelength dispersive detector. Misalignment can be discriminated by inspection of a ... 05/25/06 - 20060110665 - Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus A lithographic apparatus, a device manufacturing method, and a projection element for use in a lithographic apparatus are disclosed. The lithographic apparatus has a radiation system for providing a pulsed beam of radiation, a patterning device for imparting the beam with a pattern to form a patterned radiation beam, and ... 04/13/06 - 20060078808 - Method for measuring overlay and overlay mark used therefor An overlay measurement method and related apparatus are provided in which overlay measurement data is calculated on the basis of distances measured in disparate manners in relation to whether the current process is an initial process or a subsequent process. Related overlay marks are also described. ... 04/13/06 - 20060078807 - Lithographic mask alignment Systems and methods of aligning a lithographic mask are described. In one aspect, a substrate and a lithographic mask are aligned based at least in part on a motive force between a substrate alignment mark on the substrate and a mask alignment mark on the lithographic mask that induces movement ... 03/30/06 - 20060068305 - Method for aligning exposure mask and method for manufacturing thin film device substrate A method for aligning an exposure mask, comprises :using a plurality of hologram masks, on which alignment marks are formed,; aligning position of the hologram masks toward an object, which is exposed and on which alignment marks are also formed, a plurality of times by using both alignment marks, wherein ... 03/30/06 - 20060068304 - Alignment method of exposure mask and manufacturing method of thin film element substrate A method for aligning an exposure mask comprises: using a plurality of hologram masks, on which an alignment mark is formed; aligning position of the hologram masks toward an object to be exposed and on which an alignment mark is also formed, with a plurality of times by using both ... 02/23/06 - 20060040191 - Detection method for optimum position detection formula, alignment method, exposure method, device production method, device, and measurement and/or inspection apparatus An alignment method enabling reduction of the effects on throughput and nonlinear correction for the optimum shot alignment for each wafer. According to the present invention, the nonlinear error is corrected by EGA calculation having higher order terms. One or more correction conditions (correction coefficients) are selected with reference EGA ... 02/23/06 - 20060040190 - Method of forming an integrated optical circuit A method for forming an optical circuit on a substrate. The method comprising a plurality of mask images to define the optical circuit image in photoresist. Each of the mask images defining parts of the optical circuit and the totality of all mask images substantially defining all of the optical ... 02/16/06 - 20060035159 - Method of providing alignment marks, method of aligning a substrate, device manufacturing method, computer program, and device In a method according to one embodiment, a first and second set of alignment marks are etched into a first side of the substrate. The first set of alignment marks are at location(s) such that they will appear in the object windows of front-to-backside alignment optics of a first lithographic ... 01/26/06 - 20060019184 - Multi-exposure lithography method and system providing increased overlay accuracy Multi-exposure lithography methods and systems that provide improved overlay accuracy. In one aspect of the invention, a method for multi-exposure lithography comprises determining overlay parameters corresponding to each of a plurality of sub-layouts, inputting the overlay parameters into an exposure system, exposing each sub-layout to photoresist on a wafer by ... 01/26/06 - 20060019183 - Imprint alignment method, system, and template An improved lithographic alignment method, system, and template. The method includes creating, within a lithographic subfield, subsequent-layer features which are intentionally offset from their respective previous-layer features, where the intentional offset may vary in magnitude and direction from one subfield to the next. The system includes an imprint lithographic machine ... 12/22/05 - 20050282074 - Method of manufacturing a semiconductor device A method of manufacturing a semiconductor device. The device includes a plurality of layers on a semiconductor substrate. The method includes the steps of dividing a pattern of at least one layer into a plurality of sub-patterns, and joining the divided sub-patterns to perform patterning. A layer that includes wiring ... 12/08/05 - 20050271955 - System and method for improvement of alignment and overlay for microlithography The present invention provides a method for determining the forces to be applied to a substrate in order to deform the same and correct for overlay misalignment. ... 11/24/05 - 20050260510 - Method for determining the relative positional accuracy of two structure elements on a wafer A measurement mark (3) for determining the relative positional accuracy of a progressive projection onto a wafer (5), the projection being performed with two masks (3, 4), comprising two structure elements (10, 20) formed on a respective one of the masks (1, 2). The structure elements (10, 20) overlap with ... 10/27/05 - 20050238970 - Device manufacturing method A method of manufacturing devices with device layers on both sides of a substrate according to an embodiment of the invention includes ensuring that the movements of the substrate during the exposure of the backside are a mirror image of the movements during the exposure of the frontside. In an ... 10/13/05 - 20050227154 - Image output controlling method and image output controlling program By configuring, in terms of hardware or software, an image output control means which automatically sets the film size, the film orientation, and the direction of dividing the film by using the image size, the image diagnosing direction, and the number of image frames as the input parameters, it is ... 09/29/05 - 20050214662 - Image processing system, projector, program, information storage medium, and image processing method A projector including: an image projection section for projecting an image onto a rectangular screen through a liquid crystal panel; a position adjustment information generation section for generating position adjustment information based on position adjustment of the image made by a user; a correction information generation section for generating position ... 09/29/05 - 20050214661 - Structure formed with template having nanoscale features A structure is provided that is formed with a template defining a pattern having nanoscale features. The template may be positioned on a substrate and include a resist layer having openings formed therein, where the template is configured to accommodate the controlled assembly of nanoscale objects. ... 09/22/05 - 20050208395 - Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same To provide an exposure method and an exposure apparatus, using a complementary divided mask, designed to enable alignment of a complementary divided mask at a high precision over the entire region of a semiconductor wafer. Further, to provide a semiconductor device fabricated by the exposure method and a method of ... 08/18/05 - 20050181288 - Overlay and cd process window structure The present invention provides photolithographic device and method for photolithography process window. The photolithography device comprises a substrate; and a pattern layer having radiant energy transparent portions and radiant energy blocking portions, where the pattern layer has features with a varying overlay. The overlay tolerance is determined by varying the ... 07/07/05 - 20050147902 - Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object may include a plurality of alignment marks of which desired positions are known. The method includes measuring a plurality of ... 06/09/05 - 20050123844 - Method and apparatus for measuring the relative position of a first and a second alignment mark The invention relates to a method for measuring the relative position of a first and a second alignment mark on a substrate. The first alignment mark comprises a periodic structure having a first portion with a first periodicity (PE1) and an adjacent second portion with a second periodicity (PE2). The ... 06/09/05 - 20050123843 - Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object has a plurality of alignment marks of which desired positions are known. The method includes measuring a plurality of positional ... ### FreshPatents.com Support |