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Coating Processes > Direct Application Of Electrical, Magnetic, Wave, Or Particulate Energy > Chemical Vapor Deposition (e.g., Electron Beam Or Heating Using Ir, Inductance, Resistance, Etc.) Chemical Vapor Deposition (e.g., Electron Beam Or Heating Using Ir, Inductance, Resistance, Etc.)Chemical Vapor Deposition (e.g., Electron Beam Or Heating Using Ir, Inductance, Resistance, Etc.) patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.03/22/07 - 20070065599 - Method and apparatus for chemical vapor deposition capable of preventing contamination and enhancing film growth rate Disclosed relates to a method for CVD comprises steps of injecting a purge gas, which doesn't either dissolve or generate byproducts by itself, into a reaction chamber where substrates are located; and supplying a source material of vapor phase participating directly in forming a film on the substrates to an ... 09/14/06 - 20060204673 - Semiconductor manufacturing method for inter-layer insulating film Provided is a technology capable of improving the reliability of a semiconductor device using a SiOC film as an interlayer film. In the invention, by forming an interlayer film from a SiOC film having a Si—CH3 bond/Si—O bond ratio less than 2.50% or having a strength ratio determined by the ... 08/31/06 - 20060193997 - Method and apparatus for euv plasma source target delivery target material handling An EUV target delivery system and method are disclosed which may comprise: a target material purification system connected to deliver liquid target material comprising: a first container and a second container in fluid contact with the target material reservoir; a filter intermediate the first chamber and the second chamber; a ... 06/29/06 - 20060141169 - Method and apparatus for vacuum deposition The vacuum deposition method measures temperature in an interior of a crucible for the resistance heating which contains at least one film-depositing material, controls heating of the crucible in accordance with a measurement result of the temperature and forming a film on a substrate under controlling of the heating of ... 06/22/06 - 20060134347 - Dense coating formation by reactive deposition Methods for forming coated substrates can be based on depositing material from a flow onto a substrate in which the coating material is formed by a reaction within the flow. In some embodiments, the product materials are formed in a reaction driven by photon energy absorbed from a radiation beam. ... 06/15/06 - 20060127602 - Nanostructure and process of production thereof A process for producing a nano-structure is provided which enables control of the pore diameters and the pore intervals by film formation conditions. The process produces a nano-structure of an aluminum-silicon-germanium mixed film containing silicon and germanium at a content of 20 to 70 atom % relative to aluminum, the ... 03/16/06 - 20060057305 - Method for treating organs subject to erosion by liquids and anti-erosion coating alloy The present invention relates to a method for treating organs subject to erosion by liquids, in particular vapour turbine components, which contemplates laser plating with a cobalt-based alloy comprising chromium from 28 to 32% by weight; tungsten from 5 to 7% by weight; silicon from 0.1 to 2% by weight; ... 03/09/06 - 20060051521 - Method for deposition onto a substrate and method for producing photo conductor A grounded vacuum container is filled, the container containing a plurality of substrates, with a CVD gas. A voltage is applied to the substrates to generate plasma around each of the substrates along with grounding a plurality of ground members arranged at positions opposite to the deposition surface of each ... 12/15/05 - 20050276932 - Electron beam processing method A microscopic projection or a characteristic pattern are formed in the vicinity of a region to be processed before processing using electron beam CVD, during processing an image of a region containing the projection or pattern formed by electron beam CVD is captured to obtain a current position of the ... 11/17/05 - 20050255257 - Method of controlling the film properties of pecvd-deposited thin films We have discovered methods of controlling a combination of PECVD deposition process parameters during deposition of thin films which provides improved control over surface standing wave effects which affect deposited film thickness uniformity and physical property uniformity. By minimizing surface standing wave effects, the uniformity of film properties across a ... 11/10/05 - 20050249888 - Multi-component deposition Physical vapor deposition is augmented by chemical vapor deposition from one or more organometallic compounds to deposit multi-component materials. The organometallic compounds may be carbonyls. The process may be used to deposit coatings and repair material on superalloy turbine engine parts. ... 09/15/05 - 20050202185 - Electromagnetic control of chemical catalysis The present disclosure methods and systems that provide heat, via at least Photon-Electron resonance, also known as excitation, of at least a particle utilized, at least in part, to initiate and/or drive at least one catalytic chemical reaction. In some implementations, the particles are structures or metallic structures, such as ... 08/04/05 - 20050170105 - Method for forming compressive alpha-tantalum on substrates and devices including same A layer of compressive alpha-tantalum is formed on a substrate by depositing a buffer layer on the substrate and depositing a layer of compressive alpha-tantalum on the buffer layer with lattice matching between the layer of compressive alpha-tantalum and the buffer layer. In some embodiments, the method may include depositing ... ### FreshPatents.com Support |