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Coating Processes > Direct Application Of Electrical, Magnetic, Wave, Or Particulate Energy > Plasma (e.g., Corona, Glow Discharge, Cold Plasma, Etc.) > Silicon Containing Coating Material Silicon Containing Coating MaterialSilicon Containing Coating Material patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.08/03/06 - 20060172088 - Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers Chemical vapor deposition methods of forming titanium silicide including layers on substrates are disclosed. TiCl4 and at least one silane are first fed to the chamber at or above a first volumetric ratio of TiCl4 to silane for a first period of time. The ratio is sufficiently high to avoid ... 08/03/06 - 20060172087 - Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers Chemical vapor deposition methods of forming titanium silicide including layers on substrates are disclosed. TiCl4 and at least one silane are first fed to the chamber at or above a first volumetric ratio of TiCl4 to silane for a first period of time. The ratio is sufficiently high to avoid ... ### FreshPatents.com Support |