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Coating Processes > Direct Application Of Electrical, Magnetic, Wave, Or Particulate Energy > Pretreatment Of Substrate Or Post-treatment Of Coated Substrate > Ionized Gas Utilized (e.g., Electrically Powered Source, Corona Discharge, Plasma, Glow Discharge, Etc.) > Plasma (e.g., Cold Plasma, Corona, Glow Discharge, Etc.) Plasma (e.g., Cold Plasma, Corona, Glow Discharge, Etc.)Plasma (e.g., Cold Plasma, Corona, Glow Discharge, Etc.) patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.03/22/07 - 20070065596 - Plasma thin-film deposition method A plasma thin-film deposition method for depositing a thin film on the surface of an object, wherein a plasma is generated in one or more inert plasmagenic gases and precursor gases, and the plasma is sprayed onto the surface being treated. The one or more precursor gases include at least ... 09/28/06 - 20060216432 - Plasma treatment method and method of manufacturing semiconductor device An insulation film on a substrate is subjected to a plasma treatment using a gas containing at least either of a CH-based gas and a CO-based gas, whereby variations in the dielectric constant of the insulation film and adsorption of water onto the insulation film can be suppressed. ... 08/31/06 - 20060193996 - Method for pecvd deposition of selected material films A process for PECVD of selected material films on a substrate comprising the steps of placing a substrate in a PECVD chamber and maintaining the chamber under vacuum pressure while introducing a precursor gas, a reactant gas, and an ionization enhancer agent into the chamber. A plasma is generated from ... 08/10/06 - 20060177596 - Method and apparatus for the production of metal coated steel products The present invention is related to a method for the production of metal coated steel products, comprising the steps of: providing a steel product with a metal coating; adding an additional metallic element to said coating; subjecting said product to a thermal treatment, characterized in that: prior to the addition ... 08/03/06 - 20060172083 - Method of fabricating a thin film Methods of fabricating a thin film. An example method includes forming a GeSbTe thin film on a surface of a substrate by chemically reacting a first precursor including germanium (Ge), a second precursor including antimony (Sb), and a third precursor including tellurium (Te) in a reaction chamber and processing the ... 12/08/05 - 20050271828 - Wiring board and production method thereof, and semiconductor apparatus Provided is a wiring board and production method thereof, wherein production of wiring by a full additive method is achieved. This is extremely useful in forming fine copper wiring featuring a high adhesion on an insulating resin substrate. A resin having an excellent alkali resistance is used as the insulating ... 08/04/05 - 20050170102 - Method for manufacturing semiconductor device A method for manufacturing a semiconductor device comprises: exposing a surface of a substrate to plasma; and forming an insulating film containing a low dielectric constant material on the surface of the substrate. A method for manufacturing a semiconductor device comprises: forming a modified layer by exposing a surface of ... 06/02/05 - 20050118350 - Atmospheric plasma surface treatment method and device for same The invention relates to an atmospheric plasma surface treatment method consisting in generating at least two plasma jets using plasma generators, said plasma jets being created by an electric discharge in the flows of gas or input gaseous mixture having an ionisation enthalpy of less than that of the ambient ... ### FreshPatents.com Support |