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Coating Processes > Direct Application Of Electrical, Magnetic, Wave, Or Particulate Energy > Pretreatment Of Substrate Or Post-treatment Of Coated Substrate > Ionized Gas Utilized (e.g., Electrically Powered Source, Corona Discharge, Plasma, Glow Discharge, Etc.) Ionized Gas Utilized (e.g., Electrically Powered Source, Corona Discharge, Plasma, Glow Discharge, Etc.)Ionized Gas Utilized (e.g., Electrically Powered Source, Corona Discharge, Plasma, Glow Discharge, Etc.) patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.05/10/07 - 20070104888 - Method for the organised growth of nanostructures the growth of nanostructures (8) on the nucleation sites thus formed. ... 04/19/07 - 20070087131 - Methods of forming multilayer articles by surface treatment applications Coated articles may comprise one or more coating layers, including water resistant coatings. A method comprises applying such coating layers by treating the article substrate by one or more methods selected from flame treatment, corona treatment, ionized air treatment, plasma air treatment and plasma arc treatment and dip, spray or ... 03/22/07 - 20070065594 - System for depositing a film by modulated ion-induced atomic layer deposition (mii-ald) The present invention relates to an enhanced sequential atomic layer deposition (ALD) technique suitable for deposition of barrier layers, adhesion layers, seed layers, low dielectric constant (low-k) films, high dielectric constant (high-k) films, and other conductive, semi-conductive, and non-conductive films. This is accomplished by 1) providing a non-thermal or non-pyrolytic ... 08/31/06 - 20060193995 - Method for preparing a coated substrate wherein maleic anhydride and acrylic ester are added to the breathable polymer to enhance the melt strength and bond strength of the breathable polymer (28) onto the surface of the substrate (26). ... 08/24/06 - 20060188661 - Method of forming film pattern, method of manufacturing device, electro-optical device, and electronic apparatus A method of forming a film pattern by arranging a functional liquid on a substrate includes; forming first banks having a lyophobic property on surfaces thereof; arranging a first functional liquid in regions partitioned by the first banks; baking the first functional liquid; forming second banks on the first banks; ... ### FreshPatents.com Support |