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Coating Processes > Direct Application Of Electrical, Magnetic, Wave, Or Particulate Energy > Ion Plating Or Implantation Ion Plating Or ImplantationIon Plating Or Implantation patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.05/31/07 - 20070122560 - Solid-free-form fabrication process including in-process component deformation A solid free form fabrication method is performed for manufacturing a component from successive layers of metal feedstock material, with each of the successive layers representing a cross-sectional component slice. First, a first of the successive layers is formed by directing the feedstock material to a predetermined region, the layer ... 04/05/07 - 20070077366 - Plasma doping method and plasma doping apparatus for performing the same A method of doping ions into an object using plasma, including providing a doping gas between a first electrode and a second electrode, where an object is disposed between the first and the second electrodes, applying a first power to the first electrode and grounding the second electrode, exciting the ... 03/29/07 - 20070071906 - Heating process of the light irradiation type A light irradiation heating process in which, even in the case of an asymmetrical physical property of an article to be treated, uniform heating is possible, or in which heating can be performed such that the article acquires a desired physical property after heat treatment. Based on the measured value ... 03/01/07 - 20070048453 - Systems and methods for plasma doping microfeature workpieces Systems and methods for plasma doping microfeature workpieces are disclosed herein. In one embodiment, a method of implanting boron ions into a region of a workpiece includes generating a plasma in a chamber, selectively applying a pulsed electrical potential to the workpiece with a duty cycle of between approximately 20 ... 01/11/07 - 20070009672 - Nanocomposite solution with complex-function and method for preparation thereof A method for preparation of nanocomposite solution, comprises preparing basic silica colloid aqueous solution; providing an electrolysis apparatus by installing a negative electrode containing aluminum and a positive electrode containing silver into the basic silica colloid aqueous solution; and forming nanocomposite by applying voltage to the respective electrodes of the ... 12/07/06 - 20060275556 - Method for depositing an amorphous layer primarily containing fluorine and carbon, and device suited for carrying out this method A method for depositing, under vacuum, an amorphous layer primarily containing fluorine and carbon onto a substrate (9), characterized in that it comprises a step for depositing this layer with an ion gun (1) for ejecting ions in the form of a beam of accelerated ions that is created from ... 10/12/06 - 20060228492 - Method for manufacturing simox wafer In the method for manufacturing a SIMOX wafer, oxygen ions are implanted into a silicon wafer, then the silicon wafer is subjected to a prescribed heat treatment so as to form a buried oxide layer in the silicon wafer. The prescribed heat treatment includes: a step of ramping up a ... 08/10/06 - 20060177594 - Method of fabricating a polarizing layer on an interface A method of fabricating a polarizing layer using a gas cluster ion beam apparatus (GCIB) is disclosed. The method includes generating a metal-organic gas that includes a metal-organic compound. The metal-organic compound includes a polarizing material, such as iron Fe, Co, or CoFe, for example. The metal-organic gas and a ... 05/04/06 - 20060093754 - System and method for supplying precursor gases to an implantation tool An improved supply system for an ion source of an ion implantation tool and a method of operating the same is provided. By using a buffer volume between an SDS gas bottle and the ion source, stability of the gas flow to the ion source is significantly enhanced, while at ... 05/04/06 - 20060093753 - Method of engineering a property of an interface A method of engineering a property of an interface using a gas cluster ion beam (GCIB) apparatus is disclosed. The method includes introducing a metal-organic compound with a carrier gas to form a metal-organic gas and mixing the metal-organic gas with a cluster gas used in the GCIB. The GCIB ... 05/04/06 - 20060093752 - Methods for depositing gamma-prime nickel aluminide coatings Methods for depositing an overlay coating on articles intended for use in hostile thermal environments. The coating has a predominantly gamma prime-phase nickel aluminide (Ni3Al) composition suitable for use as an environmental coating and as a bond coat of a thermal barrier coating system. The coating further contains at least ... 03/16/06 - 20060057303 - Controlled dose ion implantation An ion implanter for creating a ribbon or ribbon-like beam by having a scanning device that produces a side to side scanning of ions emitting by a source to provide a thin beam of ions moving into an implantation chamber. A workpiece support positions a workpiece within the implantation chamber ... 02/23/06 - 20060040065 - Method for the surface activation on the metalization of electronic devices A method for surface activation on the metallization of electronic devices is provided. It uses plasma-immersion ion implantation and electroless plating to implant the seeds onto the diffusion barrier layer as catalyst for the electroless Cu plating to accomplish the ULSI interconnect metallization. It achieves electroless Cu plating in the ... 01/26/06 - 20060019039 - Plasma immersion ion implantation reactor having multiple ion shower grids A plasma immersion ion implantation process for implanting a selected species at a desired ion implantation depth profile in a workpiece is carried out in a reactor chamber having a set of plural parallel ion shower grids that divide the chamber into an upper ion generation region and a lower ... 01/19/06 - 20060013964 - Apparatus and method for focused electric field enhanced plasma-based ion implantation There is disclosed an apparatus and method for focused electric field enhanced plasma-based ion implantation. The apparatus includes an implantation chamber, a vacuum pump for maintaining the pressure in the implantation chamber at a desired level, a sample holder, means for applying a negative potential to the sample holder, and ... 12/29/05 - 20050287307 - Etch and deposition control for plasma implantation A method for ion implantation of a substrate includes forming a plasma from at least one implant material comprising at least one implant species, implanting the at least one implant species into a surface of the substrate, and directing at least one surface-modifying species at the surface to reduce a ... 11/24/05 - 20050260354 - In-situ process chamber preparation methods for plasma ion implantation systems A method for plasma ion implantation of a substrate includes providing a plasma ion implantation system including a process chamber, a source for producing a plasma in the process chamber, a platen for holding the substrate in the process chamber, and a voltage source for accelerating ions from the plasma ... 08/11/05 - 20050175790 - Magnetic film forming method, magnetic pattern forming method and magnetic recording medium manufacturing method A boron ion 6 is locally implanted into a thin film 4 containing, as main components, at least one of Fe and Co and at least one of Pd and Pt and a heat treatment is then carried out, and a portion 7 into which the boron ion 6 is ... 06/02/05 - 20050118349 - Layered structures A process of making a product which comprises at least two layers in contact with each other, each layer being of a wide-gap material and each layer differing from each other in at least one property, includes the steps of: (i) providing a substrate of a wide-band gap material having ... ### FreshPatents.com Support |