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Coating Processes > Direct Application Of Electrical, Magnetic, Wave, Or Particulate Energy Direct Application Of Electrical, Magnetic, Wave, Or Particulate EnergyDirect Application Of Electrical, Magnetic, Wave, Or Particulate Energy patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.05/31/07 - 20070122559 - Processing liquid coating apparatus and a processing liquid coating method The present invention relates to a processing liquid coating apparatus and a processing liquid coating method suitable for use in a lithography process for forming fine circuit patterns on a surface of a substrate such as a semiconductor wafer. The processing liquid coating apparatus according to the present invention includes ... 05/17/07 - 20070110916 - Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector ... 04/19/07 - 20070087130 - Deposition device It is an object of the present invention to provide a deposition device that can selectively form a thin film without using a shadow mask with respect to a substrate having a large size. In the deposition device, an evaporation source is provided with a cylinder cell, a heater for ... 04/12/07 - 20070082142 - Superabsorbent polymers having radiation activatable surface cross-linkers and method of making them The present invention relates to superabsorbent polymer particles with improved surface cross-linking and their use in absorbent articles. The superabsorbent polymer particles of the present invention comprise a water-absorbing resin and the reaction product of a radiation activatable surface cross-linker wherein the reaction product of the radiation activatable surface cross-linker ... 04/05/07 - 20070077364 - Method to coat insulation film on aluminum body of electrolytic capacitor A method to coat insulation film on aluminum body of electrolytic capacitor, which is to produce ion beam according to the high potential difference between anode and cathode, or microwave controlled electric field with microwave generator; this ion strikes polytetrafluoroethylene so as to strike out fluorine atom, then gaseous ion ... 02/22/07 - 20070042127 - Film growth at low pressure mediated by liquid flux and induced by activated oxygen The present invention is useful in growing complex films with high quality (low lattice strain, large grain size, high degree of perfection) at high rates and large area, and high efficiency use of material. A solid-state film is grown from a liquid, where atoms are supplied continuously by vapor deposition ... 01/18/07 - 20070014932 - Chemical vapor deposition apparatus and method of using the same A deposition method includes placing a substrate on a susceptor inside a chamber, the susceptor including a center pin passing through the susceptor for lifting the substrate, energizing an electrode to applying a uniform electric field to the substrate, electrically connecting a ground member extending along and attached to an ... 11/30/06 - 20060269686 - Fluid injection apparatus for semiconductor processing A fluid injection apparatus for discharging a fluid against a surface in a controlled manner is disclosed. The fluid injection apparatus includes at least one fluid supply conduit, at least one rotatable and vertically-movable fluid injector provided in fluid communication with the fluid supply conduit and at least one fluid ... 10/12/06 - 20060228490 - Gas distribution uniformity improvement by baffle plate with multi-size holes for large size pecvd systems Embodiments of a gas distribution plate for distributing gas in a processing chamber for large area substrates are provided. The embodiments describe a gas distribution plate assembly for a plasma processing chamber having a cover plate comprises a diffuser plate having an upstream side, a downstream side facing a processing ... 06/08/06 - 20060121206 - Method to prevent low temperature degradation of zirconia The invention is directed to a method of producing the material that is unaffected by the low-temperature degradation, humidity-enhanced phase transformation typical of yttria-stabilized zirconia, as well as of yttria-stabilized tetragonal zirconia polycrystalline ceramic (Y-TZP). Because of the high fracture toughness and high mechanical strength, this class of materials is ... 04/06/06 - 20060073283 - Apparatus for metal plasma vapor deposition and re-sputter with source and bias power frequencies applied through the workpiece A plasma reactor includes a vacuum chamber including a sidewall, a ceiling and a wafer support pedestal near a floor of the chamber, and a vacuum pump coupled to the chamber. A process gas inlet is coupled to the chamber and a process gas source coupled to the process gas ... 03/09/06 - 20060051517 - Thermally controlled fluidic self-assembly method and support A support and a method for fluidic assembly are provided. The support has a surface having binding sites adapted to receive micro-components of a type that are applied to the surface using a fluid; and energy absorbing heat producers at selected binding site. Each energy absorbing heat producer is adapted ... 11/03/05 - 20050244586 - Method for impregnation of matters in wood utilizing sound vibration energy Disclosed is a method for impregnation of matters in wood utilizing sound vibration energy. The impregnation method is to impregnate specific functional matters or specific color paints into a semi-finished wood processed in the fiber direction or in the rectangular fiber direction. Impregnation fluid is coated on the surface of ... 10/06/05 - 20050221017 - Method of heat treating coatings by using microwave A method for heat treatment of coatings for application to metal surfaces wherein a ceramic is positioned adjacent to the coating to be treated and the ceramic is exposed to a microwave beam having a predetermined frequency and power density which are sufficient to heat the ceramic to a desired ... 09/01/05 - 20050191434 - Nanolithography methods and products therefor and produced thereby In one aspect, a method of nanolithography is provided using a driving force to control the movement of a deposition compound from a scanning probe microscope tip to a substrate. Another aspect of the invention provides a tip for use in nanolithography having an internal cavity and an aperture restricting ... 08/11/05 - 20050175789 - Method for energy-assisted atomic layer deposition and removal A method for energy-assisted atomic layer deposition and removal of a dielectric film are provided. In one embodiment a substrate is placed into a reaction chamber and a gaseous precursor is introduced into the reaction chamber. Energy is provide by a pulse of electromagnetic radiation which forms radical species of ... 06/09/05 - 20050123687 - Method and apparatus for depositing charge and/or nanoparticles A method and apparatus for use in depositing electrical charge and/or nanoparticles is provided. A stamping process is used in which a stamp having a flexible layer such as a flexible semiconductor layer applies a charge pattern on a substrate. Other techniques include lithographic patterning, the use of pre-patterned dissimilar ... 06/02/05 - 20050118348 - Surface treatment process A continuous web having a first surface and a second surface is coated with a coating powder by allowing the web to move between a first and a second electrode, which are in different potentials and are located on the opposite sides of the web, applying the coating powder on ... 06/02/05 - 20050118347 - Method for treating powdery particles A method for preliminary treatment of particles of a powder in a dry surface treatment process before applying the powder particles on a surface of a substrate by utilizing an electric field created by electrodes. The Electrodes are located at opposite sides of the substrate in such a way that ... ### FreshPatents.com Support |