REGISTER now for FREE 
|
FREE patent keyword monitoring and additional FREE benefits. REGISTER now for FREE
|
|
|
Coating Processes > Coating By Vapor, Gas, Or Smoke > Mixture Of Vapors Or Gases (e.g., Deposition Gas And Inert Gas, Inert Gas And Reactive Gas, Two Or More Reactive Gases, Etc.) Utilized Mixture Of Vapors Or Gases (e.g., Deposition Gas And Inert Gas, Inert Gas And Reactive Gas, Two Or More Reactive Gases, Etc.) UtilizedMixture Of Vapors Or Gases (e.g., Deposition Gas And Inert Gas, Inert Gas And Reactive Gas, Two Or More Reactive Gases, Etc.) Utilized patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.05/03/07 - 20070098896 - Preparation of membranes using solvent-less vapor deposition followed by in-situ polymerization A system of fabricating a composite membrane from a membrane substrate using solvent-less vapor deposition followed by in-situ polymerization. A first monomer and a second monomer are directed into a mixing chamber in a deposition chamber. The first monomer and the second monomer are mixed in the mixing chamber providing ... 12/14/06 - 20060280869 - Photo-luminescence layer in the optical spectral region and in adjacent spectral regions This invention relates to a photoluminescent layer in the optical and adjoining spectral regions based on a solid solution of organic dyes. The photoluminescent layer includes organic dye molecules with a low dye concentration and a matrix material of metal oxides, with the matrix material having a slightly sub-stoichiometric oxygen ... 11/24/05 - 20050260348 - Thin film including multi components and method of forming the same A thin film including multi components and a method of forming the thin film are provided, wherein a method according to an embodiment of the present invention, a substrate is loaded into a reaction chamber. A unit material layer is formed on the substrate. The unit material layer is a ... 07/21/05 - 20050158469 - Reactor for thin film deposition and method for depositing thin film on wafer using the reactor A reactor for thin film deposition and a thin film deposition method using the reactor are provided. The reactor includes: a reactor block which receives a wafer transferred through a wafer transfer slit; a wafer block which is installed in the reactor block to receive the wafer thereon; a top ... ### FreshPatents.com Support |