REGISTER now for FREE 
|
FREE patent keyword monitoring and additional FREE benefits. REGISTER now for FREE
|
|
|
Coating Processes > Centrifugal Force Utilized Centrifugal Force UtilizedCentrifugal Force Utilized patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.06/07/07 - 20070128356 - Substrate processing apparatus and substrate processing method On top of respective areas divided by partition plates, that is, a cassette station, a processing station, and an interface section in a coating and developing processing system, gas supply sections for supplying an inert gas into the respective areas are provided. Exhaust pipes for exhausting atmospheres in the respective ... 06/07/07 - 20070128355 - Method for coating photoresist material A method for coating photoresist material comprises loading a substrate onto a spin chuck in a spin coater. Thinner is injected onto the substrate being in rest during a first period of time. The substrate is spun with a first speed for a second period of time less than the ... 05/31/07 - 20070122551 - Coater/developer and coating/developing method A coating and developing system prevents wetting its component units with water when the coating and developing system forms a resist film on a substrate and processes the substrate processed by immersion exposure by a developing process. A substrate having a surface coated with a resist film and processed by ... 05/24/07 - 20070116871 - Braid-reinforced hollow fiber membrane within the range of 200 to 3,000 g/m2. ... // - 2 - ... 05/17/07 - 20070110896 - Closure sealant dispenser A machine for applying sealant material to non-circular closures using a rotating chuck coupled to a rotational motor and a fixedly mounted dispensing apparatus. The chuck is also moved in at least one linear direction in a plane normal to the rotational axis of the chuck. The rotational motor may ... 05/17/07 - 20070110895 - Single side workpiece processing A centrifugal workpiece processor for processing semiconductor wafers and similar workpieces includes a head which holds and spins the workpiece. The head includes a rotor having a gas system. Gas is sprayed or jetted from inlets in the rotor to create a rotational gas flow. The rotational gas flow causes ... 04/26/07 - 20070092644 - Uv curable coating composition Disclosed is method of coating an inkjet print head using a UV curable coating composition containing a (methyl)acryloxy or vinyl functionalized silane, silica and polyurethane acrylate oligomer containing at least two acrylate groups. ... 04/26/07 - 20070092643 - Resist coating method and resist coating apparatus A resist coating method supplies a resist solution to substantially the center of a target substrate to be processed while rotating the target substrate at a first rotational speed, then reduces a rotational speed of the target substrate to a second rotational speed lower than the first rotational speed, reduces ... 04/26/07 - 20070092642 - Resist coating method and resist coating apparatus A resist coating method supplies a resist solution to substantially the center of a target substrate to be processed while rotating the target substrate at a first rotational speed, then decelerates the rotation of the substrate to a second rotational speed lower than the first rotational speed, or until rotational ... 04/05/07 - 20070077352 - Photoresist coating system and method A photoresist coating system and method solving an edge bead problem that occurs in photoresist coating by adding at least one of high boiling point solvent, which may generate a film on the surface of a solvent having a higher boiling point than a solvent contained in a liquid photoresist ... 03/29/07 - 20070071891 - Cooling unit and method for cooling and coating wafer by using the same A cooling unit in a photolithography equipment may comprise a spin chuck module including a spin chuck configured to suction and fix a wafer. The cooling unit may also include a spin motor configured to rotate the spin chuck, the spin motor being located below the spin chuck. The cooling ... 03/29/07 - 20070071890 - Apparatus and method of forming an applied film There is provided an apparatus including: a processing cup having an opening opened upward to allow a substrate to be loaded and unloaded, an exhaust port for exhausting an unnecessary atmosphere produced in forming a film applied on the substrate, and an aspiration port for aspirating external air; and an ... 03/22/07 - 20070065575 - Method for in situ photoresist thickness characterization An in situ photoresist thickness characterization process and apparatus characterizes a photoresist process used for processing a semiconductor wafer. Photoresist is dispensed on a spinning semiconductor wafer as part of the characterization process. The thickness of the photoresist is monitored at a plurality of locations on the spinning semiconductor wafer ... 03/08/07 - 20070054042 - Method of srcu2o2 spin-on precursor synthesis and low temperature p-type thin film deposition A method of SrCu2O2 spin-on precursor synthesis and low temperature p-type thin film deposition, includes preparing a wafer to receive a spin-coating thereon; selecting metalorganic compounds to form a SrCu2O2 precursor, mixing and refluxing the metalorganic compounds to form a precursor mixture; filtering the precursor mixture to produce a spin-coating ... 01/04/07 - 20070003695 - Method of manufacturing a polymer memory device An embodiment of the invention is a method of manufacturing a polymer for a polymer ferroelectric memory. In particular, and among other features, the method of an embodiment alters the ferroelectric transition temperature, or Curie temperature, of the polymer by rapidly cooling the polymer from an elevated temperature. In particular, ... 12/14/06 - 20060280865 - Chemical solution application apparatus and chemical solution application method An object is to provide a chemical solution application apparatus capable of applying a chemical solution evenly and without irregularity by a spin coating method. A plurality of nozzles are provided for applying a chemical solution to an application object that is fixed over a stage. Each of the nozzles ... 11/30/06 - 20060269663 - Method of manufacturing laminated body A process for efficiently forming a thick coating layer having a uniform thickness on the surface of a base material having a curved surface. The process comprises the steps of forming a coating film having a predetermined thickness by applying a coating agent containing a polymerizable monomer on the curved ... 11/23/06 - 20060263520 - Method for improving high-viscosity thick film photoresist coating in uv liga process A method for improving high-viscosity thick film photoresist coating in UV LIGA process is provided. Two photoresists of identical material but different solvent amount are coated on a silicon wafer in different ways to improve film thickness and flatness. The thick film photoresist SU8-2035 and SU8-2100 from MicroChem Corp. have ... 11/16/06 - 20060257561 - Method and apparatus for coating a wafer A method and apparatus for coating liquid films on to the surface of a wafer substrate by rotating the substrate at a speed sufficient to cause a liquid, through centrifugal effect, to flow outwardly toward the perimeter of the surface and form a substantially uniform thickness liquid coating thereon, and ... 11/16/06 - 20060257560 - Polymer surfaces for insitu synthesis of polymer arrays In one aspect of the present invention polymers are used to create films providing three-dimensional array substrates. The films were stable and presented good hydroxyl group numbers as compared with arrays without polymer films. It is an object of the present invention that three dimensional arrays substrates provide a means ... 11/09/06 - 20060251809 - Method of manufacturing mask blank A method for manufacturing a mask blank by depositing a film of a resist liquid on a substrate having a thin film functioning as a transfer pattern by a spin-coating process, covering the substrate with a covering member, and performing removal by dissolving of an unnecessary part of the resist ... 10/26/06 - 20060240186 - Coating film forming method The object of the present invention is to provide a method for forming a coating film in which a coating film is prevented from drastically shrinking by controlling the temperature accurately when a SOG film is formed in a substrate with a coating liquid containing an alkoxysilane compound, cracks are ... 10/19/06 - 20060233952 - Liquid processing method and liquid processing apparatus In a nozzle unit 4 equipped with processing-liquid nozzles 4A to 4J, an air layer 73 and a solvent layer 74 for processing liquid are successively formed outside a processing-liquid layer 71 included in the tip of each nozzle 4A (4B to 4J). Next, the solvent layer 74 in the ... 08/17/06 - 20060182883 - Abrasion resistant coatings with color component for gemstones and such In accordance with the present invention, there are provided methods for imparting abrasion wear resistant color to “gemstones” by providing an integrated coating consisting of the color imparting agent and the abrasion wear resistant agent. The color imparting agent may provide the perception of color via interference phenomena or via ... 08/17/06 - 20060182882 - Spin-coat application method, optical disk produced by the method, and spin-coat application apparatus A spin-coat application method wherein a coating liquid is spin-coat applied to a member to be coated in a condition where a processing atmosphere in a spin coater is humidified to a humidity of 60% or more by acidic water of pH 6 or less. ... 07/27/06 - 20060165888 - Method of forming linear patterns The present invention discloses a method of forming linear patterns, called “directional spin coating” technology. Parallel banks are formed on a substrate to define some trenches; the substrate is vertically erected on outer edge of a spin disc; and a liquid material is applied to the trenches, the spin disc ... 07/27/06 - 20060165887 - Method of coating photoresist and photoresist layer formed by the same A method of coating photoresist is provided. A wafer is first provided and a spouting site is set up in a location within the circumference of the wafer. The spouting site is disposed at a distance from the center of the wafer. Next, the wafer is spun and a solvent ... 06/15/06 - 20060127575 - Substrate coating unit and substrate coating method The present invention is a coating unit for coating a substrate with a coating solution, comprising a coating solution discharge member for discharging the coating solution to the substrate which is positioned in a downward part. A lower surface of the coating solution discharge member is in a shape having ... 05/25/06 - 20060110529 - Method and apparatus for finishing articles An apparatus for applying a finish to a wooden article comprises a rotating platen including a generally planar surface for receiving a surface of the wooden article, a shaft protruding from the planar surface, and a shaft support having at least one rotating member for supporting the shaft, the platen ... 05/11/06 - 20060099339 - Substrate treatment method and substrate treatment apparatus A substrate treatment method is disclosed, which can effectively reduce the amount of charges accumulated on a substrate due to treatment of the substrate with a water-containing liquid. The method comprises the steps of: supplying a water-containing liquid to a substrate held generally horizontally by a substrate holding/rotating mechanism while ... 05/04/06 - 20060093739 - Chemical treating composition for forming hydrophilic and fuzziness-proof surfaces on a glass substrate and utilizing methods for the chemical treating composition A chemical treating composition for forming hydrophilic and fuzziness-proof surfaces on a glass substrate, wherein the chemical treating composition contains silicon dioxide particles within 100 nm diameter, a polysiloxane derivative, ammonium hydrogen fluoride (ammonium bifluoride), ammonium fluosilicate, a surfactant agent, hydrogen peroxide, phosphate anion and water. The chemical treating composition ... 04/20/06 - 20060083854 - Polymer coatings The present invention provides compounds of formulae (I), (II), and (III), which can be block copolymers with various substituents and side-chain groups. The side-chains can include semifluorinated alkyl- and PEG-derived groups. The block copolymers can be surface active block copolymers (SABCs) and can be used as antifouling coatings. Coating compositions ... 03/30/06 - 20060068095 - Active liquid applicator for forming active film An active liquid applicator is provided which is designed to coat a surface of an electronic parts such as an oxygen sensor with an active liquid for forming an electrode. The liquid applicator includes a nozzle head and a nozzle tube. The nozzle tube has disposed therein a pearmable member ... 03/30/06 - 20060068094 - Production paint shop design A paint application facility including a paint booth assembly for applying paint to automotive vehicles each defining a longitudinal axis includes a carrier adapted to serially move a plurality of automotive vehicles through the booth assembly in a direction generally perpendicular to the longitudinal axis of the vehicle. ... 03/30/06 - 20060068093 - Coating device and coating film forming method The resist coating unit (COT) has a spin chuck (41) which holds the wafer to be supplied with a resist liquid, and a process cup (50) which accommodates the spin chuck (41) and exhaustes an atmosphere around the wafer W from a bottom thereof. The process cup (50) comprises a ... 02/23/06 - 20060040051 - Developing apparatus and method A developing apparatus for developing a substrate whose surface is coated with a coating solution and then exposed includes a substrate supporting unit for horizontally supporting the substrate, a rotation driving mechanism for rotating the substrate supporting unit forwardly or backwardly with respect to a vertical axis, a developer nozzle, ... 02/09/06 - 20060029731 - Conductive inks for metalization in integrated polymer microsystems A system of metalization in an integrated polymer microsystem. A flexible polymer substrate is provided and conductive ink is applied to the substrate. In one embodiment the flexible polymer substrate is silicone. In another embodiment the flexible polymer substrate comprises poly(dimethylsiloxane). ... 01/19/06 - 20060013953 - Method and system for dispensing resist solution An apparatus and method for dispensing a solution on a substrate is described in which the solution is dispensed through a solution nozzle assembly while the substrate is rotated. As the solution is dispensed, the solution on the substrate forms a wave front that radially spreads from the substrate center ... 12/22/05 - 20050281947 - Substrate processing unit and substrate processing apparatus A substrate processing unit, by employing the processing unit to carry out different processings with different processing liquids, can make a reduction in the space for carrying out the entire process of substrate processing and a reduction in the energy necessary for substrate transportation. The substrate processing unit includes: a ... 12/15/05 - 20050276921 - Substrate processing apparatus and method In the vicinity of a rim portion of a spin base 5, a plurality of supports 7 which abut on a bottom rim portion of a substrate W and support the substrate W are formed projecting toward above from the spin base 5. The substrate W is supported horizontally by ... 12/15/05 - 20050276920 - Spin-coating apparatus for manufacturing semiconductor device and method of preventing transfer device from improperly positioning a wafer in the apparatus Spin-coating apparatus for use in manufacturing a semiconductor device or the like and a method of operation of the apparatus prevent substrates from being positioned incorrectly in a process module of the apparatus. The spin-coating apparatus includes an image sensor that captures an image of the wafer in the process ... 11/24/05 - 20050260345 - Apparatus for electroless deposition of metals onto semiconductor substrates An electroless deposition system and electroless deposition stations are provided. The system includes a processing mainframe, at least one substrate cleaning station positioned on the mainframe, and an electroless deposition station positioned on the mainframe. The electroless deposition station includes an environmentally controlled processing enclosure, a first processing station configured ... 11/03/05 - 20050244579 - Substrate processing device and substrate processing method In a substrate treatment apparatus, a substrate to be treated (11) held on a substrate chuck section (13) is spun, and a plurality of treatment solutions are supplied onto the substrate to be treated (11). The apparatus has a plurality of collection tanks (16 to 19) provided to collect by ... 09/08/05 - 20050196532 - Hydrogel coatings and their employment in a quartz crytal microbalance ion sensor A method to attach hydrophilic and/or ionogenic coatings to metallic surfaces robustly. Important applications for the invention extend to sensor types, various biomedical devices, and additional technologies requiring metal coatings with specified properties, such as sensors that employ the Quartz Crystal Microbalance (QCM) principle. This is a method to produce ... 08/18/05 - 20050181127 - Coating treatment apparatus and coating treatment method In the present invention, a gas flow restraining ring facing corner portions of the front face of a substrate horizontally held on a substrate holding unit and movable up and down, is set to a predetermined height in accordance with a coating treatment. Then, a coating solution containing a coating ... 08/11/05 - 20050175775 - Device and method for forming improved resist layer A device and method for improving the uniformity of resist layers. The method includes controlling the evaporation of solvent from a deposited resist layer by impinging a control fluid onto a deposited resist layer. Optional sensing of flow parameters and other environmental conditions (such as temperature or humidity) adjacent the ... 08/04/05 - 20050170087 - Coating film forming method and apparatus A coating solution is sprayed on a rotating wafer held horizontally from a nozzle provided above the wafer while the nozzle is travelling over the wafer from a wafer center to a wafer outer area, thus spirally spraying the coating solution on the wafer. The nozzle stops when the coating ... ### FreshPatents.com Support |