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Coating Processes > Electrical Product Produced > Electron Emissive Or Suppressive (excluding Electrode For Arc) Electron Emissive Or Suppressive (excluding Electrode For Arc)Electron Emissive Or Suppressive (excluding Electrode For Arc) patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.07/05/07 - 20070154625 - Method for activating electron emission surface of field emission display A method activates the electron emission surface of a field emission display. After an un-activated cathode plate is manufactured, a protective layer is formed by coating a solvent to one face of the electron emission source layer. A coating is applied to the protective layer to form a covering layer ... 03/15/07 - 20070059439 - Electron emitting device manufacture method and image display apparatus manufacture method A method for manufacturing electron emitting devices each having electrodes formed on a substrate and an electroconductive thin film connected between a pair of electrodes and having an electron emitting region is provided which can manufacture electron emitting devices having an excellent uniformity of electron emitting characteristics by improving the ... 02/08/07 - 20070031589 - Electron emission source of field emission display and method for making the same A method for fabricating an electronic emission source of a field emission display includes to provide a substrate, screen print or lightgraphic etching the laminate to form a cathode electrode layer within the cavities, wherein the surface of the cathode electrode layer fabricates a photoresist by lightgraphy technology, coat a ... 10/26/06 - 20060240180 - Substrate for electron source formation, electron source, and image-forming apparatus A substrate for electron source formation on which a plurality of electron-emitting devices are arranged, comprising a layer where SiO2 is made a main component on the substrate, wherein an etching rate of the SiO2 layer at room temperature in 0.4 wt % of hydrogen fluoride ammonium solution (NH4-HF2) is ... 10/26/06 - 20060240179 - Method of manufacturing a display device having an electron source To obtain a paste for electron sources which can enhance heat resistance of carbon nanotubes, which can suppress burn-out of the carbon nanotubes even during heating at a high temperature, and can exhibit a high electron emission performance, boron (B) is added to the paste formed of the carbon nanotubes ... 04/06/06 - 20060073271 - Lamp tube having a uniform lighting profile and a manufacturing method therefor A method of treating a lamp tube having a first end and a second end comprising introducing a first quantity of a luminescent substance into the first end of the lamp tube and introducing a second quantity of a luminescent substance into the second end of the lamp tube is ... 03/16/06 - 20060057279 - Electron-emitting device, electron source substrate, electron beam apparatus, display apparatus, and manufacturing method thereof An electron-emitting device comprises a pair of opposing electrodes formed on a substrate, an electroconductive film having a fissure arranged between the pair of electrodes, and at least a film having a gap and containing carbon as a main ingredient, arranged at an end portion of the electroconductive film facing ... 03/02/06 - 20060045961 - Method of manufacturing electroconductive member pattern, and methods of manufacturing electron source and image displaying apparatus each using the same Provided is a method for producing a pattern of an electroconductive member, comprising: a step of forming a resin film on a substrate surface; a step of incorporating the first metal component into the resin by applying to the resin a liquid which contains a complex of a first metal ... 01/12/06 - 20060008578 - Method of fabricating electrode structure of field-emission display A method of fabricating a cathode structure of a field-emission display. Screen printing or thick-film photolithography technique is employed to apply low-cost silver ink on a substrate. The silver ink formed on the substrate serves as an electrode layer. The silver ink contains particles with diameters ranged between 0.1 microns ... ### FreshPatents.com Support |