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Material Or Article Handling > Chamber Of A Type Utilized For A Heating Function And Material Charging Or Discharging Means Therefor
Chamber Of A Type Utilized For A Heating Function And Material Charging Or Discharging Means ThereforChamber Of A Type Utilized For A Heating Function And Material Charging Or Discharging Means Therefor patent applications listed include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.
05/13/10 - 20100119337 - Thermal processing system and method of using
Embodiments of the invention provide a thermal processing system and methods for uniformly heating and/or cooling a semiconductor wafer. Embodiments of the invention may be applied to provide a more uniform temperature profile when processing 300 mm and larger wafers having different curvature profiles that occur at the same and/or...
03/05/09 - 20090060686 - Substrate transport apparatus and heat treatment apparatus
A chilled arm that transports a substrate to and from a heating plate for performing a heating process on the substrate is formed with a flow passage pipe therein, and cools the entire holding area thereof opposed to the substrate held by the chilled arm to a predetermined reference temperature...