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Photography > Fluid-treating Apparatus > Fluid Application To One Side Only Of Photographic Medium > Plate Or Wafer-type Photographic Medium Plate Or Wafer-type Photographic MediumPlate Or Wafer-type Photographic Medium patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.08/09/07 - 20070183775 - Developing apparatus and developing method A joint nozzle that delivers a developer, a rinsing liquid and nitrogen gas is disposed adjacent the spin center of a substrate in plan view. A controller operates electromagnetic switch valves to continue supply of the developer, while spinning the substrate, in a developing process, and to start supply of ... 08/02/07 - 20070177869 - Coater/developer and coating/developing method Accurate coating and developing having high intrasurface uniformity is achieved by suppressing the influence of components of a resist that may be eluted while a substrate coated with the resist is processed by immersion exposure. A coating unit coats a surface of a substrate with a resist. then, a first ... 06/28/07 - 20070147832 - Method of processing substrate, substrate processing system and substrate processing apparatus Immediately before or immediately after an alignment process for adjusting an exposure position of a pattern image in an exposure unit compatible with immersion exposure, a dummy substrate for use in the alignment process is transported from the exposure unit to a substrate processing apparatus. In the substrate processing apparatus, ... 06/28/07 - 20070147831 - Substrate processing apparatus for performing exposure process A substrate processing apparatus for performing an exposure process by printing a pattern on a substrate coated with a photosensitive material includes an exposure part for performing an immersion exposure process, a cleaning part and a transport mechanism which are provided within an exposure chamber. After the exposure part performs ... 06/07/07 - 20070127916 - Substrate processing apparatus and substrate processing method On top of respective areas divided by partition plates, that is, a cassette station, a processing station, and an interface section in a coating and developing processing system, gas supply sections for supplying an inert gas into the respective areas are provided. Exhaust pipes for exhausting atmospheres in the respective ... 05/03/07 - 20070098401 - Substrate processing method and apparatus thereof A substrate processing method for performing development on an exposed resist on a processing target substrate, and an apparatus thereof. A developing solution is supplied to the processing target substrate to fill the solution on the processing target substrate to cause development of the exposed resist on the processing target ... 03/29/07 - 20070071439 - Substrate processing apparatus The transporting process from cleaning and drying processing of a substrate in a cleaning/drying processing unit in a cleaning/drying processing group to post-exposure bake (PEB) of the substrate in a thermal processing group for post-exposure bake in a cleaning/drying processing block is described below. First, after the substrate after exposure ... 03/22/07 - 20070065145 - Development apparatus and development method A development apparatus has a holder which horizontally holds a substrate, a nozzle which supplies a developer to a resist film on the substrate held by the holder, a liquid flow suppressing member whose size in a two-dimensional plane viewing field is equal to or larger than that of the ... 03/22/07 - 20070065144 - Substrate transport apparatus with automated alignment A substrate processing apparatus is provided with a substrate transport apparatus. The transport apparatus is used for automating alignment of the processing apparatus. In one aspect, a through-beam sensor on the transport apparatus is used to level parts of the processing apparatus. In another aspect, a through-beam sensor on the ... 02/08/07 - 20070031145 - Developing treatment apparatus and developing treatment method In the present invention, a substrate transfer unit into/from which a substrate is transferred from/to the outside of a treatment container and a developing treatment unit in which development of the substrate is performed are arranged side by side in the treatment container, and a carrier mechanism is provided which ... 01/04/07 - 20070003279 - Post-exposure baking apparatus and related method A post-exposure baking apparatus comprising a supporting member, a heating member, and a cooling member is disclosed. A wafer is disposed on the supporting member and a photoresist layer is formed on the wafer. The heating member comprises electrical heating wires and is adapted to apply heat to the wafer ... 01/04/07 - 20070003278 - Substrate drying apparatus, substrate cleaning apparatus and substrate processing system A substrate processing system includes a substrate processing apparatus and a cleaning/drying apparatus. The substrate processing apparatus includes an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block and a first ... 12/28/06 - 20060291855 - Substrate processing apparatus A substrate processing apparatus comprises an indexer block, an edge-cleaning processing block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block and an interface block. An exposure device is ... 09/28/06 - 20060216025 - Exposure apparatus Disclosed is an exposure apparatus and a device manufacturing method, in which an amount of wafer warp produced as a result of device manufacturing processes made earlier is measured or inputted in relation to each wafer lot or each wafer in the lot as a process parameter, while on the ... 09/07/06 - 20060198633 - Method of setting processing condition in photolithography process, apparatus for setting processing condition in photolithography process, program, and computer readable recording medium In the present invention, in the photolithography process in which a certain processing condition has been already set, a resist film on a substrate is exposed to light using a mask, which reduces only zero-order light of a light source at a predetermined light reduction rate and transmits the light, ... 08/31/06 - 20060193630 - Monitoring apparatus and method particularly useful in photolithographically Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a ... 07/27/06 - 20060165409 - Coating and developing system and coating and developing method A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and ... 07/20/06 - 20060159449 - Substrate processing apparatus A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The drying processing block comprises a drying processing group. The ... 07/06/06 - 20060147202 - Substrate processing apparatus and substrate processing method A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a washing/development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. A resist film is formed on a substrate by the resist film processing block. ... 07/06/06 - 20060147201 - Substrate processing apparatus and substrate processing method An interface transport mechanism employs an upper hand during the transport of a substrate to an exposure device, and employs a lower hand during the transport of the substrate that has been carried out of the exposure device. A fifth central robot employs a lower hand during the transport of ... 06/29/06 - 20060140624 - Method of developing a resist film and a resist development processor The present invention provides a resist development processor consisting of a development processing chamber for storing a resist substrate having an exposed resist on the substrate and for developing the exposed resist by means of a development solvent consisting of a supercritical fluid; and a supercritical fluid container for storing ... 06/08/06 - 20060120717 - Developing method and apparatus for performing development processing properly and a solution processing method enabling enhanced uniformity in the processing A substrate processing apparatus and method provide for exhausting air from a first peripheral region α around a substrate undergoing processing, and for exhausting air from a second peripheral region β between the first peripheral region and the substrate. The method reduces the effects of air flow on a developing ... 06/08/06 - 20060120716 - Substrate processing apparatus When a first substrate transferred outwardly from an indexer cell is the last substrate prior to reticle change in an exposure apparatus, the outward transfer of a second substrate to be processed subsequently to the first substrate from the indexer cell is temporarily stopped. After a lapse of time corresponding ... 05/18/06 - 20060104635 - Substrate processing apparatus and substrate processing method A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. An exposure device is arranged adjacent to the interface block. A resist ... 05/11/06 - 20060098979 - Substrate processing apparatus and substrate processing method A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and ... 05/11/06 - 20060098978 - Substrate processing apparatus and substrate processing method A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a ... 05/11/06 - 20060098977 - Substrate processing apparatus and substrate processing method An interface transport mechanism uses an upper hand when transporting a substrate from a substrate platform to an exposure device before exposure processing by an exposure device, and uses a lower hand when transporting the substrate from the exposure device to the substrate platform after the exposure processing by the ... 02/09/06 - 20060029388 - Liquid processing apparatus processing a substrate surface with a processing liquid, liquid processing method, and liquid condition detection apparatus detecting fluctuation of the processing liquid In a liquid processing apparatus a spin chuck holds a wafer having a surface supplied with a liquid to be applied through a nozzle receiving the liquid through a feed path and whether the liquid passing through the feed path has fluctuation is detected by a fluctuation detection device. Thus ... 01/26/06 - 20060018655 - Photo processing apparatus The photo processing apparatus of the present invention, connected to a terminal via a network, includes: a data storage section for storing data; an order storage section for storing an order specifying data to be printed among data stored in the data storage section; a printing section for printing data ... 12/08/05 - 20050271382 - Resist pattern forming apparatus and method thereof A resist pattern forming apparatus comprising a controller having a controlling portion that controls a processing of a coating and developing apparatus with a coating unit and a developing unit being provided therewith and an aligner being connected thereto, while an inspecting portion and the like measures at least one ... 11/10/05 - 20050249494 - Photographic processor A photographic processor comprises a base member in which the material is located and two side channels for holding the processing solution. Spreading means spreads the solution from one channel to another and thus across the material. ... 09/15/05 - 20050201747 - Semiconductor wafer washing system and method of supplying chemicals to the washing tanks of the system A semiconductor wafer washing system can execute a method in which the washing solution is quickly changed over and over again without the need to alter the structure of the system. The wafer washing system includes a washing solution supply section in which a plurality of chemicals are stored separately, ... 09/01/05 - 20050191051 - Method and device for processing substrate A substrate processing method comprises stopping the transfer of a head substrate of a succeeding lot for a period which is an integral multiple of a cycle time after a last substrate of a preceding lot is transferred from a cassette section to a processing section by a transfer mechanism, ... 08/25/05 - 20050185952 - Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit lithographic processing cell, and computer program A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method comprises predicting times at which the lithographic ... 08/11/05 - 20050175337 - Method for processing a color reversal photographic film The present invention relates to a method for processing a color reversal photographic film that enables the amount of silver and tin (II) ions present in the washing water to be reduced, in order to obtain effluents that can be discharged to the drains and satisfy the regulations in force. ... 06/30/05 - 20050141891 - Line width measuring method, substrate processing method, substrate processing apparatus and substrate cooling processing unit In optical line width measurement performed using the scatterometry technique, the present invention measures the line width formed on a substrate more accurately than in the prior art. After a predetermined pattern is formed in a resist film on a substrate, the refractive index and the extinction coefficient of the ... ### FreshPatents.com Support |