REGISTER now for FREE 
|
FREE patent keyword monitoring and additional FREE benefits. REGISTER now for FREE
|
|
|
Radiant Energy > Irradiation Of Objects Or Material > Irradiation Of Semiconductor Devices > Pattern Control Pattern ControlPattern Control patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.01/31/08 - 20080023656 - Integrated thermal unit having a shuttle with a temperature controlled surface An integrated thermal unit comprising a bake plate configured to heat a substrate supported on a surface of the bake plate; a chill plate configured to cool a substrate supported on a surface of the chill plate; and a substrate transfer shuttle configured to transfer substrates from the bake plate ... 12/06/07 - 20070278428 - Apparatus and method for controlled particle beam manufacturing A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to ... 11/22/07 - 20070267582 - Substrate edge exposure apparatus Prior to edge exposure, the type of a photo resist that has been coated on a semiconductor wafer is identified. Then, the sensitivity of this resist is determined based on the information of the identified resist type. Based on the determined resist sensitivity, a laser output from a semiconductor laser ... 11/08/07 - 20070257212 - Digital parallel electron beam lithography stamp An array of vertically aligned electron emitting nanotips such as multiwall carbon nanotubes are formed for use as a lithographic stamp. Crosswire addressing is used to generate electron emission from particular nanotips within the array. The nanotip array may be used to cure a resist, produce localized electrochemical reactions, establish ... 11/01/07 - 20070252094 - Reduction projection objective and projection exposure apparatus including the same A reduction projection objective for projection lithography has a plurality of optical elements arranged along an optical axis and designed for imaging an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at ... 10/18/07 - 20070241291 - Method for writing a large-area closed curvilinear pattern with a cartesian electron beam writing system A method for operating a Cartesian-type electron beam (e-beam) lithography (EBL) tool enables the efficient and precise writing of a closed curvilinear pattern, such as a circle, over a wide area of a workpiece. The curvilinear pattern overlies a plurality of contiguous fields of the EBL tool's x-y positioning stage, ... 10/04/07 - 20070228296 - Parallel electron beam lithography stamp (pebls) An array of vertically aligned electron emitting nanotips such as multiwall carbon nanotubes are formed and patterned for use as a lithographic stamp. The spacing and/or arrangement of the nanotips correspond to a predetermined pattern that is desired to be formed on an opposing substrate. Simultaneous actuation of the nanotips ... 10/04/07 - 20070228295 - Lithographic apparatus, support, device manufacturing method, and a method of supporting A lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; wherein the support is arranged to subject, ... 09/20/07 - 20070215820 - Methods and systems for thermal-based laser processing a multi-material device A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the ... 06/07/07 - 20070125967 - System and method pf electron beam writing A system and method for improved electron beam writing that is capable of taking design intent, equipment capability and design requirements into consideration. The system and method determines an optimal writing pattern based, at least in part, on the received information. ... 05/24/07 - 20070114462 - Charged particle beam irradiation method and charged particle beam apparatus A computer sets a process area based on an image obtained by observing a mask, and determines the positions of representative points that form a contour of the process area for each pixel with sub-pixel accuracy that is better than a pixel, the position of each of the representative points ... 05/24/07 - 20070114461 - Charged beam drawing apparatus and charged beam drawing method There is provided a charged beam drawing apparatus which includes main/sub two-stage deflectors, divides a main deflection drawing region on a sample into sub deflection drawing regions determined by the deflection width of the sub deflector, selects one of the sub deflection drawing regions by use of the main deflector ... 05/24/07 - 20070114460 - Charged particle beam processing method and charged particle beam apparatus A reference area that contains a straight contour of a workpiece pattern is irradiated with a beam at a fixed interval to form images. The positions of the contour line in the images before and after a certain time of image formation are compared with each other and the amount ... 05/24/07 - 20070114459 - Charged particle beam writing method and apparatus and readable storage medium A charged particle beam writing method includes inputting pattern data for writing a writing region, predicting a writing time for writing the pattern of the pattern data, acquiring, by using a correlation among a time required from a writing start time, the predicted writing time and a base dose of ... 04/05/07 - 20070075275 - Beam exposure writing strategy system and method A beam exposure writing strategy method and system are disclosed for exposing a desired pattern on a substrate, by raster scanning a beam such as a particle beam, across a major field on the substrate. The beam is also vector scanned across a minor field of the substrate superimposed along ... 03/29/07 - 20070069158 - Charged particle beam apparatus When a sample includes repeated cells, a scale pattern corresponding to the repeated cells is generated. Next, the scale pattern generated is superimposed on the image of the repeated cells of the sample, thereby identifying a destination cell. Moreover, disposition of the repeated cells of the sample is determined based ... 03/01/07 - 20070045572 - Lithographic apparatus and device manufacturing method utilizing a multiple dictionary compression method for fpd A lithographic apparatus comprises an array of individually controllable elements that modulate a beam of radiation, a compressed-pattern memory that stores a compressed representation of a requested dose pattern to be formed on a substrate by the modulated beam, and a dictionary decompressor that at least partially decompress the compressed ... 02/08/07 - 20070029507 - Reliability in a maskless lithography system The invention pertains to a maskless lithography system for transferring a pattern onto a surface of a target, comprising at least one beamlet optical unit for generating a plurality of beamlets, at least one measuring unit for measuring properties of each beamlet, at least one control unit for generating and ... 02/01/07 - 20070023703 - Electron beam writing apparatus and writing method A writing apparatus including a selector unit responsive to receipt of input data of a pattern to be written by shots of irradiation of an electron beam, configured to select a current density of the electron beam being shot and a maximal shot size thereof based on the input data ... 02/01/07 - 20070023702 - Method for manufacturing a mask and an organic el element and an organic el printer A mask for the use of an etching process for forming a film on a subject film deposition substrate into a predetermined pattern includes a protection section for covering the film on a pattern area to be formed into the pattern, and a projecting section provided on a facing surface ... 12/28/06 - 20060289804 - Particle-optical systems and arrangements and particle-optical components for such systems and arrangements An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and ... 12/21/06 - 20060284120 - Method for correcting electron beam exposure data First, electron beam exposure data identifiable for each type of pattern of a semiconductor device is inputted (S601). Then, electron beam exposure data on a first type of pattern is not corrected, while electron beam exposure data on a second type of pattern is corrected (S603). The first type of ... 12/21/06 - 20060284119 - Electron-beam exposure system An electron-beam exposure system includes: density-per-area map generating means configured to divide a certain area on which an electron beam is irradiated into meshes, to figure out a ratio of an area of patterns to be irradiated on each divided region to an area of the divided region, thus to ... 12/14/06 - 20060278833 - Lithographic apparatus and cleaning method therefor A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an application surface to be targeted by the hydrogen radicals. The guide is provided with a coating having a hydrogen radical recombination ... 11/02/06 - 20060243922 - Raster frame beam system for electron beam lithography A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern ... 11/02/06 - 20060243921 - Electron beam exposure apparatus, electron beam exposure method and method of manufacturing semiconductor device An electron beam exposure apparatus has a first shaping aperture having a plurality of rectangular openings, each having sizes different from each other and shaping a beam shape of an electron beam, a rectangular opening selection deflector which controls a path of the electron beam to irradiate the electron beam ... 09/28/06 - 20060214119 - Pattern data creation method, pattern data creation program, computer-readable medium and fabrication process of a semiconductor device A pattern data creation method creates mask pattern data on an exposure mask, the exposure mask having a surface divided into plural unit regions and the mask pattern data including pattern data parts each defined for one of the plural unit regions, each of the pattern data parts including pattern ... 09/21/06 - 20060208205 - Method, program product and apparatus for improving calibration of resist models used in critical dimension calculation Improved calibration of a resist model used in critical dimension (CD) calculation is disclosed. A dose function is obtained based on optical tool to be used form the resist on a wafer. The dose function indicates the amount of energy in a resist. The dose function is convolved with a ... 08/31/06 - 20060192150 - Method and apparatus for reducing charge density on a dielectric coated substrate after exposure to a large area electron beam Embodiments in accordance with the present invention relate to a number of techniques, which may be applied alone or in combination, to reduce charge damage of substrates exposed to electron beam radiation. In one embodiment, charge damage is reduced by establishing a robust electrical connection between the exposed substrate and ... 08/31/06 - 20060192149 - Parameter control in a lithographic apparatus using polarization A lithographic apparatus includes an illuminator configured to provide a projection beam of radiation and a polarization controller configured to control an intensity of a preferred state of polarization of the projection beam. The lithographic apparatus further includes a support configured to hold a patterning device. The patterning device configured ... 08/31/06 - 20060192148 - Electron beam irradiating apparatus and irradiating method It is made possible to prevent the color aberration at the lenses from increasing and prevent the current distribution on the sample surface from changing at the time of the blanking operation. A deflector is placed between the first and second shaping apertures. A first crossover image is formed between ... 08/24/06 - 20060186355 - Phase-shift masked zone plate array lithography A lithography system includes a source of radiation energy and a zone plate array to focus the radiation energy to create an array of images in order to produce a permanent pattern on a substrate. A phase-shift mask is optically located between the source of radiation energy and the zone ... 08/03/06 - 20060169926 - Electron beam lithography apparatus and lithography method An electron beam lithography apparatus includes a control device in which, for each column stripe in each drawing time of multiple drawing, optional conditions of dividing a pattern to be drawn on the sample can be set; and a time obtained by dividing a total irradiation time by the number ... 08/03/06 - 20060169925 - Variable rectangle-type electron beam exposure apparatus and pattern exposure-formation method A variable rectangle-type electron beam exposure apparatus for forming rectangular beams of different angles which is capable of highly finely conducting exposure with respect to a predetermined fine line pattern having an arbitrary angle in the pattern region. The apparatus includes a first slit member (10) in which a plurality ... 07/27/06 - 20060163499 - Apparatus and method for irradiating electron beam An electron beam irradiation apparatus includes an electron beam emission section having an electron beam irradiating tube that emits an electron beam; an electron beam irradiation section for irradiating the emitted electron beam to a target; a transfer mechanism for transferring the target to the electron beam irradiation section; a ... 07/13/06 - 20060151721 - Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program According to an aspect of the invention, there is provided an electron beam drawing apparatus comprising at least one stage of a deflection amplifier and a deflection unit, a first storage section which stores shot information at a drawing time, a second storage section which stores a correction table indicating ... 07/13/06 - 20060151720 - Electromagnetic focusing method for electron-beam lithography system A method for projecting a predetermined pattern of an electron beam from an emitter to a wafer in a vacuum chamber of an electron-beam lithography system is provided. An initial condition for performing an electromagnetic focusing is first set and outspread phenomenon of the electron beam, which is caused by ... 07/06/06 - 20060145097 - Optics for generation of high current density patterned charged particle beams A direct-write electron beam lithography system employing a patterned beam-defining aperture to enable the generation of high current-density shaped beams without the need for multiple beam-shaping apertures, lenses and deflectors is disclosed. Beam blanking is accomplished without the need for an intermediate crossover between the electron source and the wafer ... 06/29/06 - 20060138359 - Charged-particle beam exposure apparatus and method This invention makes it possible to provide a charged-particle beam exposure apparatus which implements highly accurate pattern drawing by detecting the intensity distribution of irradiation charged-particle beams and controlling the distribution to be uniform. The charged-particle beam exposure apparatus splits a charged-particle beam irradiated from a charged-particle beam source into ... 06/29/06 - 20060138358 - Lithographic apparatus and device manufacturing method A projection system comprises an array of lenses MLA, each lens transmitting a unique part of a patterned beam. Measuring devices measure a distance between the array of lenses MLA and a substrate W. A controller controls an actuator to adjust a position (e.g., height and/or tilt) of the microlens ... 05/25/06 - 20060108546 - Charged beam exposure apparatus, charged beam control method and manufacturing method of semiconductor device A charged beam exposure apparatus includes: a first shaping aperture provided with a plurality of rectangular openings which are different from each other in at least one of area and shape thereof; a second shaping aperture provided with a pattern having a shape corresponding to that of a pattern to ... 05/18/06 - 20060102856 - Particle beam irradiation system A particle beam irradiation system capable of ensuring a more uniform dose distribution at an irradiation object even when a certain time is required from output of a beam extraction stop signal to the time when extraction of a charged particle beam from an accelerator is actually stopped. The particle ... 04/13/06 - 20060076514 - Charged particle beam processing apparatus A charged particle beam processing apparatus includes a sample chamber to process a substrate including side faces by a charged particle beam, a movable stage in the sample chamber, the stage including a place on which the substrate is to be mounted, a height and position acquiring unit to acquire ... 04/13/06 - 20060076513 - Variable rectangle-type electron beam exposure apparatus and pattern exposure-formation method A variable rectangle-type electron beam exposure apparatus for forming rectangular beams of different angles is provided which is capable of highly finely conducting exposure with respect to a predetermined fine line pattern having an arbitrary angle in the pattern region. The apparatus comprises: a first slit member (10) in which ... 03/30/06 - 20060065855 - Particle beam irradiarion system A particle beam irradiation system which can increase an availability factor. An ion beam extracted from one proton beam linac is bent at 90 degrees by a switching magnet and is introduced to RI production equipment through a beam line. In the RI production equipment, a RI is produced using ... 03/23/06 - 20060060799 - Lithographic apparatus and device menufacturing method A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference ... 03/23/06 - 20060060798 - Method and apparatus for multi-beam exposure A multi-beam exposure apparatus of the present invention includes a two-dimensional light modulator which is configured to project plural exposure beam spots onto an exposure surface, the plural exposure beam spots being arranged in parallel with the scanning direction while two-dimensionally arrayed; and a pixel block shifting member which divides ... 02/16/06 - 20060033051 - Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program The transmission or reflection loss due to surface contamination of a mask is predicted as a function of position on the mask and time. At the time of an exposure compensation for the transmission or reflection loss is effected using a device capable of adjusting the beam intensity across the ... 02/16/06 - 20060033050 - Electron-beam drawing apparatus and electron-beam drawing method In the case of drawing an oblique figure pattern, when drawing an oblique figure by using a slender rectangular beam, a problem occurs that edge roughness occurs at an oblique-side portion to deteriorate the drawing accuracy. The present invention solves the above problem and provides an electron-beam drawing apparatus and ... 02/16/06 - 20060033049 - Design pattern data preparing method, mask pattern data preparing method, mask manufacturing method, semiconductor device manufacturing method, and program recording medium A design pattern data preparing method including preparing first mask pattern data based on first design pattern data, predicting a wafer pattern to be formed on a wafer corresponding to the first mask pattern based on the first mask pattern data, judging whether or not a finite difference between the ... 02/16/06 - 20060033048 - Method of generation of charged particle beam exposure data and charged particle beam exposure method using a block mask A method of generation of exposure data for charged particle beam exposure using a block mask, in which a first transmission beam is formed by transmission of a charged particle beam through a rectangular first transmission aperture; a second transmission beam is formed by causing the first transmission beam to ... 02/09/06 - 20060027764 - Methodology for determining electron beam penetration depth is modified to accurately predict depth of electron beam penetration into a target material. A two-layer stack is formed comprising a thickness of the target material overlying a detection material exhibiting greater sensitivity to the electron beam than the target material. The target material is exposed to electron beam radiation ... // - 0.046 - ... 02/02/06 - 20060022151 - System and method for producing terahertz radiation An apparatus for producing an annular electron beam comprises a cathode for generating electrons, a cavity having an annular shape and operable to receive the electrons, an energy input coupled to the cavity, where the energy input is operable to supply Radio Frequency (RF) energy at the cavity and an ... 01/26/06 - 20060017019 - Charged particle beam exposure apparatus, charged particle beam exposure method and device manufacturing method In a charged particle exposure apparatus which exposes a substrate using a blanking unit to repeat blocking and exposure of charged particle beam to the substrate, a blanking direction is adjusted. As an example of the blanking direction, a direction vertical to a raster scanning direction is used. ... 01/19/06 - 20060011869 - Measurement method of electron beam current, electron beam lithography method and system In an electron-beam lithography system for performing a pattern drawing by causing electron beams to be switched ON/OFF at a high speed in an exposure/non-exposure portion, non-straight line property of beam shot dosage relative to beam ON time worsens dimension accuracy of the drawing pattern formed on a sample. In ... 01/19/06 - 20060011868 - Method and apparatus for sample formation and microanalysis in a vacuum chamber Methods and apparatus are disclosed for forming a sample of an object, extracting the sample from the object, and subjecting this sample to microanalysis including surface analysis and electron transparency analysis in a vacuum chamber. In some embodiments, a method is provided for imaging an object cross section surface of ... 12/29/05 - 20050285054 - Charged particle beam drawing apparatus In the present invention, vector data developing unit, ends separating unit, overlap removing unit and bitmapped data generating unit are sequentially connected in order to make pipeline processing. In addition, data of each raster is orderly arranged as a unit so that each processor can process data of each raster ... 12/29/05 - 20050285053 - Method and apparatus for electron beam processing of substrates Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes two encoder wheels. One encoder wheel is configured to provide a rotational speed data ... 12/15/05 - 20050274911 - Raster frame beam system for electron beam lithography A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern ... 12/08/05 - 20050269528 - Charged particle beam exposure system A charged particle beam exposure apparatus for transferring a pattern onto a surface of a target, comprising a beam generator comprising a plurality of n changed particle sources, substantially in one plane, each source adapted for generating a charged particle beam, a first aperture array, comprising a plurality of groups ... 12/01/05 - 20050263722 - Method for reducing proximity effects in electron beam lithography An electric field is applied below a resist to reduce proximity effects associated with electron beam scattering, thereby improving the resolution of features or lines written into the resist. Although the electrons in the electron beam can be very energetic (e.g., >>10 keV), it is shown that even a small ... 11/17/05 - 20050253093 - Parallel multi-electron beam lithography for ic fabrication with precise x-y translation A maskless, direct write electron lithography apparatus for accurately and simultaneously writing plural sub-micron patterns on a silicon substrate employs plural parallel electron beams with precise X-Y mechanical translation of the substrate to provide low cost, high throughput integrated circuit (IC) fabrication. Plural compact micro electron gun assemblies arranged in ... 11/03/05 - 20050242303 - Advanced pattern definition for particle-beam exposure In a pattern definition device for use in a particle-beam exposure apparatus a plurality of blanking openings (910) are arranged within a pattern definition field (bf) composed of a plurality of staggered lines (b1) of blanking openings, each provided with a deflection means controllable by a blanking signal (911); for ... 11/03/05 - 20050242302 - Advanced pattern definition for particle-beam processing In a pattern definition device for use in a particle-beam processing apparatus a plurality of apertures (21) are arranged within a pattern definition field (pf) wherein the positions of the apertures (21) in the pattern definition field (pf) taken with respect to a direction (X, Y) perpendicular, or parallel, to ... 10/13/05 - 20050224725 - System and method for proximity effect correction in imaging systems A system and method are disclosed for providing error correction in an imaging system. The system includes an error determination unit for determining an amount of error associated with a spot at (x,y) in a binary pattern to be imaged, a determination unit for determining the location of a nearest ... 10/13/05 - 20050224724 - Lithographic apparatus, device manufacturing method and device manufactured thereby A device manufacturing method using lithographic apparatus, in which method a patterned beam of radiation is projected on to a target portion of a substrate. Prior to exposing the substrate to the patterned beam of radiation a beam of compensating radiation is irradiated on to a predetermined area of the ... 09/29/05 - 20050211929 - Charged particle beam photolithography machine, standard substrate for correcting misalignment factor of charged particle beam photolithography machine, correcting method for charged particle beam photolithography machine, and method of manufacturing elec A charged particle beam photolithography machine includes an electron gun, a deflector, a wafer stage, a standard substrate formed with a chip-shaped first mark group having a plurality of first marks and a chip-shaped second mark group having a plurality of second marks, a correction map having misalignment factors of ... 09/29/05 - 20050211928 - Charged-particle-beam lithographic system A charged-particle-beam lithographic system capable of sending data to a data converter in a short time. The system has a library memory for saving a library of graphics data, a writing memory for storing data about the number of reads for reading graphics data from the library memory in succession ... 09/22/05 - 20050205809 - Electron beam exposure apparatus An electron beam exposure apparatus comprising: column 1 for irradiating an electron beam to wafer 10 serving as a sample; sample chamber 3 having vacuum pump 40 as a vacuum exhaustion unit for controlling the internal unit to a vacuum atmosphere; stage 4A arranged in the sample chamber 3 for ... 09/01/05 - 20050189501 - Charged particle system and a method for measuring image magnification A charged particle beam apparatus capable of automatically measuring an image magnification error of an apparatus and capable of automatically calibrating the image magnification in high precision is provided. To this end, while an image processing operation of either an auto-correlation function or an FFT transformation is employed with respect ... 08/25/05 - 20050184258 - Method of exposing using electron beam Provided is a method of exposing using an electron beam. The provided method of exposing using the electron beam includes defining main fields on an exposure area of an electron beam exposure target and defining a plurality of sub-fields on the main fields, selecting a main field to be exposed, ... 08/25/05 - 20050184257 - Characterizing an electron beam treatment apparatus One embodiment of the present invention is a method for characterizing an electron beam treatment apparatus that includes: (a) e-beam treating one or more of a predetermined type of wafer or substrate utilizing one or more sets of electron beam treatment parameters; (b) making post-electron beam treatment measurements of intensity ... 08/25/05 - 20050184256 - Method and apparatus for a formatter following electron beam substrate processing system Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured ... 08/18/05 - 20050178983 - Electron beam lithography device and drawing method using electron beams In an electron beam lithography apparatus, when a plotting pattern is an isolated fine pattern, an exposure energy upon plotting lacks. In the prior art set forth above, dimension dependent exposure energy correction is performed as a measure, however, a problem is encountered in that excessive exposure is caused in ... 08/18/05 - 20050178982 - Particle source with selectable beam current and energy spread The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 13 eccentrically through a lens 6. As a result of this, energy dispersion will occur in an image 15 formed by the lens 6. By projecting this ... 08/04/05 - 20050167616 - Particle beam irradiation system and method of adjusting irradiation field forming apparatus A particle therapy system, as one example of a particle beam irradiation system, comprises a charged particle beam generator and an irradiation field forming apparatus. An ion beam from the charged particle beam generator is irradiated to a diseased part in the body of a patient through the irradiation field ... 08/04/05 - 20050167615 - Charged beam writing apparatus and writing method A charged beam writing apparatus is disclosed, which comprises a shaped beam forming unit which shapes a charged beam radiated from a charged beam source into a beam of a desired shape by using at least two shaping masks each having a shaping aperture to form a shaped beam, a ... 07/28/05 - 20050161620 - Charged beam exposure apparatus having blanking aperture and basic figure aperture Two or more-staged masks are prepared for a charged beam generating source. One mask has first aperture sections having rectangular apertures arranged into a lattice form, and electrodes which deflects a beam at respective first aperture sections. The other mask has a second aperture section having basic figure apertures for ... 07/14/05 - 20050151096 - Lithographic apparatus and device manufacturing method A lithographic apparatus is provided. The apparatus includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding ... 07/07/05 - 20050145805 - Lithographic apparatus and device manufacturing method A method of manufacturing first and second substrates that are coupled together, e.g., an active and passive plate of a flat panel display. The active plate is formed according to a standard pattern and inspected. The passive plate is then formed by modifying the pattern data for the passive plate ... 06/30/05 - 20050139788 - Laser mask and crystallization method using the same A crystallization method using a mask includes providing a substrate having a semiconductor layer; positioning a mask over the substrate, the mask having first, second and third blocks, each block having a periodic pattern including a plurality of transmitting regions and a blocking region, the periodic pattern of the first ... 06/23/05 - 20050133739 - Charged beam writing method and writing tool A charged beam writing method includes acquiring reference data of shapes or positions of a plurality of apertures of a second shaping aperture, thereafter performing a writing operation, scanning a beam passed through a first shaping aperture over the second shaping aperture while a blanking deflector is driven to intercept ... 06/09/05 - 20050121628 - Pattern size correcting device and pattern size correcting method A pattern size correcting device includes: a testing photomask (1) having a test pattern; a quantifying unit (2) that quantifies, using the testing photomask (1), size variation in the test pattern as a function of distance and in relation to an open area ratio; an open area ratio calculating unit ... 06/02/05 - 20050116185 - Exposure system and exposure method An exposure system and exposure method able to obtain a transfer pattern matching to a high precision an offset of an underlying pattern of an exposed member and improving an overlay accuracy of the underlying pattern and transfer pattern. The system and method swing an electron beam back and forth ... ### FreshPatents.com Support |