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Radiant Energy > Irradiation Of Objects Or Material > Irradiation Of Semiconductor Devices Irradiation Of Semiconductor DevicesIrradiation Of Semiconductor Devices patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.01/31/08 - 20080023652 - Lithographic apparatus and device manufacturing method A method and apparatus for monitoring a level of silicon dioxide in a liquid and removing the silicon dioxide using polishers is disclosed. In an embodiment, two polishers that absorb carbon dioxide and silicon dioxide, but which have a greater affinity for carbon dioxide, are placed in series along a ... 01/17/08 - 20080011968 - Laser irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device It is an object of the present invention to provide a laser irradiation apparatus, a laser irradiation method, and a method for manufacturing a semiconductor device using the laser irradiation method that can suppress the energy distribution of the laser beam. The present invention provides a laser irradiation apparatus including ... 01/03/08 - 20080001102 - Probe and method for fabricating the same A probe needle 20 includes a cantilever 21, a column 22 and a tip 23. The column 22 is cantilevered from an end of the cantilever 21. The tip 23 is formed on a top end of the column 22. The column 22 is formed so as to be longer ... 12/27/07 - 20070295918 - Method for fabricating semiconductor device and equipment for fabricating the same A method for fabricating a semiconductor device and an equipment for fabricating the semiconductor device are described. According to the method and the equipment, a semiconductor substrate is irradiated with a particle beam through an opening formed in a thin film portion of a stencil mask having the thin film ... 12/06/07 - 20070278425 - Method of operating emitter for electron-beam projection lithography system An emitter for an electron-beam projection lithography system includes a photoconductor substrate, an insulating layer formed on a front surface of the photoconductor substrate, a gate electrode layer formed on the insulating layer, and a base electrode layer formed on a rear surface of the photoconductor substrate and formed of ... 11/08/07 - 20070257206 - Transmission of data between microchips using a particle beam A device includes first and second chips, each chip containing at least one electronic circuit. The second chip has one or more receivers. A deflection mechanism operationally connected to an electronic circuit of the first chip directs a charged particle beam to different ones of the receivers, based, at least ... 09/13/07 - 20070210264 - Uv-c sensitive composition and dosimeter The invention is a UV sensitive composition that undergoes a color change upon exposure to a predetermined dosage of UV-C radiation. The UV-C sensitive composition comprises a halogenated polymer, such as polyvinylidene chloride, that produces an acid upon exposure to UV radiation, and a pH sensitive dye. Upon exposure to ... 08/16/07 - 20070187618 - Electrostatic particle gettering in an ion implanter Methods and apparatus are disclosed for removing particles from an ion implantation chamber by introducing at least one sacrificial wafer into the implanter and subjecting it to ion implantation. As the sacrificial wafer is exposed to the ion beam, it becomes charged. Particles present in the implantation chamber are then ... 08/09/07 - 20070181829 - Electron-beam exposure system An electron-beam exposure system includes: an electron gun; a first mask having a first opening for shaping a beam of electrons; a second mask having a second opening for shaping the beam of electrons; a stencil mask disposed below the first mask and the second mask, the stencil mask having ... 07/12/07 - 20070158589 - Method for charging substrate to a potential A surface of an insulating substrate is charged to a target potential. In one embodiment, the surface is flooded with a higher-energy electron beam such that the electron yield is greater than one. Subsequently, the surface is flooded with a lower-energy electron beam such that the electron yield is less ... 07/12/07 - 20070158588 - Charged particle beam emitting device and method for operating a charged particle beam emitting device A method for operating a charged particle beam emitting device and, in particular, an electron beam emitting device including a cold field emitter is provided. The method includes the steps of placing the cold field emitter in a vacuum of a given pressure, the emitter exhibiting a high initial emission ... 06/28/07 - 20070145296 - Method for cleaning a lithographic apparatus module, cleaning arrangement for a lithographic apparatus module and lithographic apparatus comprising the cleaning arrangement A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a ... 06/28/07 - 20070145295 - Radical cleaning arrangement for a lithographic apparatus A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at particular positions inside the ... 06/14/07 - 20070131879 - Force provider with adjustable force characteristics for a stage assembly A stage assembly (220A) includes a stage (206A) and a force provider (232A) that provides an acceleration/deceleration force on the stage (206A). The force provider (232A) includes a provider housing (238A) and a piston assembly (240A). The provider housing (238A) defines a piston chamber (344), and includes a first beam ... 06/14/07 - 20070131878 - Controlling the flow through the collector during cleaning A lithographic apparatus includes a collector configured to collect radiation from a radiation source, the collector including a plurality of shells forming separate compartments, and a cleaning arrangement including a gas inlet and a gas outlet, the cleaning arrangement being configured to clean surfaces of the plurality of shells by ... 06/14/07 - 20070131877 - Pattern inspection method and system therefor Conventionally, defect data outputted by an inspection system comprised only characteristic quantitative data, such as coordinate data, area, and projected length, and only the coordinate data for moving to a defect location could be utilized effectively. By contrast, the present invention, by using image data in addition to characteristic quantitative ... 06/07/07 - 20070125964 - Lithographic apparatus including a cleaning device and method for cleaning an optical element An EUV lithographic apparatus includes an EUV radiation source, an optical element and a cleaning device. The cleaning device includes a hydrogen radical source and a flow tube in communication with the hydrogen radical source. The cleaning device is configured to provide a flow of hydrogen radicals and the flow ... 06/07/07 - 20070125963 - Radiation system and lithographic apparatus A radiation system for generating a beam of radiation is disclosed. The radiation system includes a pulsed EUV source for generating EUV radiation, and a spectral filter mounted in front of the EUV source for selectively passing a spectral range of a beam of EUV radiation from the EUV source. ... 05/24/07 - 20070114454 - Charged particle beam scan and irradiation method, charged particle beam apparatus, workpiece observation method and workpiece processing method After a scan area for observing or processing a mask is set, a computer of the charged particle beam apparatus determines a plurality of scan lines in the scan area by the following steps of: setting a scan line along the outer circumference of the scan area; determining a scan ... 05/24/07 - 20070114453 - Beam dose computing method and writing method and record carrier body and writing apparatus A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first ... 05/24/07 - 20070114452 - Lithographic apparatus and device manufacturing method Lithographic Apparatus and Device Manufacturing Method In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap. ... 04/26/07 - 20070090302 - Display device and fabricating method thereof A display device capable of implementing a high resolution and a method of fabricating the same. The display device includes a substrate, a silicon member, an electron emission member, and a phosphor layer. The silicon member is attached to the substrate. The silicon member has a groove formed on at ... 04/19/07 - 20070085034 - Exposure method and apparatus for immersion lithography A method for immersion lithography includes providing a substrate coated with an imaging layer, dispensing a conductive immersion fluid between the substrate and an imaging lens of a lithography system, and performing an exposure process to the imaging layer using a radiation energy through the conductive immersion fluid. ... 04/05/07 - 20070075272 - Method and apparatus for manufacturing a semiconductor device A method of manufacturing a semiconductor device by processing a wafer, comprises: measuring a reflectivity of a substrate peripheral structure before heating, the substrate peripheral structure being placed close to the wafer and being heated simultaneously with the wafer by a plurality of heat sources; measuring a wafer reflectivity of ... 03/15/07 - 20070057201 - Lithographic apparatus and device manufacturing method An attenuation adjustment device is disposed in a radiation system of a lithography device and includes a plurality of members for casting penumbras in the radiation beam illuminating the patterning device. Furthermore an attenuation control device is provided for adjusting the members in such a manner as to control the ... 02/01/07 - 20070023694 - Method of removing particles on an object, apparatus for performing the removing method, method of measuring particles on an object and apparatus for performing the measuring method In a method of removing particles on an object, a fluid is injected into a spacer where the object is placed to remove foreign substances in the space. A first light is irradiated to the object to remove charges between an upper face of the object and the particles, and ... 02/01/07 - 20070023693 - Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus A method for filtering particles out of a beam of radiation propagating from a radiation source is provided. The method includes passing the beam of radiation through a filter having a first portion within the beam of radiation and a second portion outside of the beam of radiation, capturing at ... 02/01/07 - 20070023692 - Seamless stitching of patterns formed by interference lithography This invention addresses the scalability problem of periodic “nanostructured” surface treatments such as those formed by interference lithography. A novel but simple method is described that achieves seamless stitching of nanostructure surface textures at the pattern exposure level. The described tiling approach will enable scaling up of coherent nanostructured surfaces ... 01/25/07 - 20070018118 - Lithographic apparatus, contaminant trap, and device manufacturing method A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction ... 01/04/07 - 20070001127 - Active bandwidth control for a laser In a first aspect, a lithography apparatus may comprise a mask designed using optical proximity correction (OPC), a pulsed laser source, and an active bandwidth control system configured to increase the bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is below a predetermined bandwidth range ... 01/04/07 - 20070001126 - Lithographic apparatus, radiation system and device manufacturing method A foil trap is located in a path of a radiation beam. The foil trap includes an array of conductive strips. A voltage application circuit is coupled to the strips to apply voltage differences between pairs of adjacent ones of the strips. The voltage application circuit includes a current limiting ... 12/28/06 - 20060289797 - Electron beam writing method, electron beam writing apparatus and semiconductor device manufacturing method An electron beam writing method is disclosed, which includes preparing electron beam writing data structured from writing pattern data expressed by both data of VSB shots which are units of shaping beams at the time of carrying out writing a pattern and data of CP shots serving as bases of ... 12/28/06 - 20060289796 - Uv-c sensitive composition and dosimeter The invention is a UV sensitive composition that undergoes a color change upon exposure to a predetermined dosage of UV-C radiation. The UV-C sensitive composition comprises a halogenated polymer, such as polyvinylidene chloride, that produces an acid upon exposure to UV radiation, and a pH sensitive dye. Upon exposure to ... 12/07/06 - 20060273263 - Apparatus and method for enhanced critical dimension scatterometry Scatterometers and methods of using scatterometry to determine several parameters of periodic microstructures, pseudo-periodic structures, and other very small structures having features sizes as small as 100 nm or less. Several specific embodiments of the present invention are particularly useful in the semiconductor industry to determine the width, depth, line ... 11/23/06 - 20060261290 - Radiation system and lithographic apparatus A radiation system for providing a projection beam of radiation in a lithographic apparatus is disclosed. The radiation system includes an EUV source for providing EUV radiation, and a contamination barrier that includes a plurality of foil plates for trapping contaminant material coming from the EUV source. The foil plates ... 11/09/06 - 20060249695 - Heat reflector and substrate processing apparatus comprising the same A substrate processing apparatus includes a process chamber including upper and lower quartz walls, a substrate support disposed in the process chamber, radiant heaters respectively provided above and below the quartz walls of the chamber, and heat reflectors disposed outside the process chamber for reflecting heat towards the substrate support. ... 11/02/06 - 20060243918 - Raster frame beam system for electron beam lithography A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern ... 10/05/06 - 20060219950 - Lithographic apparatus and device manufacturing method A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the ... 09/28/06 - 20060214118 - Exposure apparatus and device manufacturing method An exposure apparatus for exposing a substrate to light via a reticle includes a reflective optical system including a plurality of reflective optical elements and configured to conduct the light, a cooling mechanism configured to cool a first optical element included in the reflective optical system and arranged on an ... 08/24/06 - 20060186354 - Apparatus and method for thermal processing In this invention, a wafer is placed and kept in the low-temperature region at the bottom of a temperature space that is in a state of radiation equilibrium and that is formed inside chamber by a heating unit. The substrate temperature is gradually raised to 750 deg C. to 800 ... 08/24/06 - 20060186353 - Lithographic apparatus, radiation system and filter system A filter system for filtering debris particles out of a predetermined cross-section of the radiation emitted by a radiation source of a lithographic apparatus includes a first set of foils and a second set of foils for trapping the debris particles, and a first heat sink and a second heat ... 08/10/06 - 20060175558 - Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a ... 07/27/06 - 20060163494 - Ion implantation method and method for manufacturing semiconductor device An object of the present invention is to provide an ion implantation method for shortening a down time of an ion implantation apparatus after exposure of a chamber and for improving throughput and a method for manufacturing a semiconductor device. Specifically, the object of the invention is to provide an ... 07/13/06 - 20060151718 - Exposure apparatus and exposure method The present invention pertains to an exposure apparatus and exposure method that produces plasma from the target material, generates pulsed light and carries out exposure with the pulsed light; and has as its object to obtain good uniformity of exposure dose even in the case that a pulsed light generated ... 07/13/06 - 20060151717 - Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering p Particles emitted by a radiation source, and moving from the radiation source towards a processing system for processing the radiation from the radiation source, are filtered out of radiation propagating through a predetermined cross section of the radiation as emitted by the radiation source by a filter system. The filter ... 07/06/06 - 20060145094 - Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby An optical element including an anti-reflection (AR) coating is configured to reflect Extreme-Ultra-Violet (EUV) radiation only. ... 06/29/06 - 20060138351 - Laser anneal apparatus A laser anneal apparatus is provided with a laser source; a homogenizing optical system disposed in an optical path of laser light emitted from the laser source to homogenize an intensity distribution of the laser light in a section which is perpendicular to the optical path; a phase shifter disposed ... 06/29/06 - 20060138350 - Lithographic apparatus, illumination system and method for mitigating debris particles A lithographic apparatus includes a source for generating radiation, an illumination system for conditioning the radiation, a patterning device for patterning the conditioned radiation, and a projection system for projecting the patterned radiation onto a target portion of a substrate. The illumination system includes a debris mitigating system for mitigating ... 06/29/06 - 20060138349 - Lithographic apparatus and device manufacturing method A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can ... 06/15/06 - 20060124866 - Electron beam exposure method and system therefor A method of leading an electron beam radiated from an electron emitter through openings provided in a stencil mask to a sensitive sample and exposing it includes placing the electron beam under a low field intensity where the electron beam progresses at a slow speed until reaching the openings of ... 06/08/06 - 20060118735 - Lithography systems and methods for operating the same A lithography system and method for operating the same. The lithography system may include a cathode adapted to emit an electron beam, a beam-homogenizing structure, capable of increasing at least one of the uniformity and energetic of the electron beam, and a mask adapted to accelerate the electron beam to ... 06/08/06 - 20060118734 - Charged beam drawing data creation method, charged beam drawing method, charged beam drawing apparatus and semiconductor device manufacturing method Drawing-data creating method includes selecting charged beam drawing-apparatus dividing drawing area into main fields, subfields and unit fields (U-fields), dividing design data (D-data) corresponding to pattern drawn on area into first D-data corresponding to main fields, dividing first D-data into second D-data corresponding to subfields, dividing second D-data into third ... 05/11/06 - 20060097191 - Electron beam control method, electron beam drawing apparatus and method of fabricating a semiconductor device An electron beam control method has the following steps, selecting one of a plurality of pattern openings by a character beam electrode having a plurality of electrode units to allow an electron beam to pass through any pattern opening on an aperture mask on which the plurality of pattern openings ... 05/11/06 - 20060097190 - Method and apparatus for forming optical elements by inducing changes in the index of refraction by utilizing electron beam radiation The exposure of selected optical materials to large area electron beam irradiation can raise the refractive index of the optical material to allow the fabrication of waveguides, optical fibers, gradient index lenses, interference filters, antireflection coatings, heat reflective thermal control coatings and other optical elements. ... 05/04/06 - 20060091324 - Optical component, optical system including such an optical component, lithographic apparatus, method of correcting apodization in an optical system, device manufacturing method, and device manufactured thereby A method of correcting apodization in an optical system includes determining effects of apodization on an intensity distribution of a beam of radiation in a predetermined plane of the optical system; determining a more desirable intensity distribution of the beam of radiation in the predetermined plane such that apodization is ... 04/13/06 - 20060076509 - Electron beam irradiating method and manufacturing method of magnetic recording medium The present invention is to make it possible to form a fine pattern, and improve a recording density on a magnetic recording medium and increase signal intensity. There is provided an electron beam irradiating method which irradiates an electron beam on a resist to perform irradiating using an electron beam ... 04/06/06 - 20060071180 - Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby A device for generating radiation or a source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The ... 03/23/06 - 20060060794 - Method of preventing charging, and apparatus for charged particle beam using the same An apparatus for a charged particle beam has a charged particle source; a charged particle optical system for focusing and deflecting a charged particle beam emitted from the charged particle source; a detector for detecting secondary particles emitted from a sample irradiated with the charged particle beam; and a sample ... 03/09/06 - 20060049367 - Cooling apparatus, exposure apparatus, and device fabrication method An apparatus for adjusting temperature of an object includes a heat radiation member, a deflection member to deflect heat radiation from the heat radiation member toward a region of the object, and an adjusting system to adjust temperature of the heat radiation member. ... 02/23/06 - 20060038137 - Charged particle beam apparatus and method of forming electrodes having narrow gap therebetween by using the same A focused ion beam apparatus having two pieces of probers brought into contact with two points of a surface of a sample, a voltage source for applying a constant voltage between the two points with which the probers are brought into contact, and an ammeter for measuring a current flowing ... 02/16/06 - 20060033043 - Stacked six degree-of-freedom table A table with six degrees of freedom, such as a wafer table for a lithography system, has an upper table stacked on top of a lower table. Each of these two stacked tables has three degrees of freedom and is provided with actuators for controlling its motions in these three ... 01/19/06 - 20060011864 - Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby A device for generating radiation source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The cathode and/or ... 01/12/06 - 20060006345 - Inductively-driven light source for lithography An apparatus for producing light includes a chamber that has a plasma discharge region and that contains an ionizable medium. The apparatus also includes a magnetic core that surrounds a portion of the plasma discharge region. The apparatus also includes a pulse power system for providing at least one pulse ... 01/05/06 - 20060000985 - Optics for extreme ultraviolet lithography According to an embodiment of the invention, extreme ultraviolet (EUV) photolithography is performed using lobster eye transmission optics. A light source, such as a source plasma, is located at the center of a circle. Several mirror segments are arranged on an arc of the circle. The mirror segments may be ... 12/08/05 - 20050269525 - Lithographic apparatus and device manufacturing method A lithographic apparatus is provided. The apparatus includes an illumination system that conditions a beam of radiation, an article support member that supports an article to be placed in a beam path of the beam of radiation on the article support, and a movable carriage for moving the article support ... 12/01/05 - 20050263720 - Method and apparatus for recycling gases used in a lithography tool A system and method are used to recycle gases in a lithography tool. A first chamber includes an element that emits light based on a first gas. A second chamber uses the emitted light to perform a process and includes the second gas. The first and second gases converge between ... 11/17/05 - 20050253092 - Radiation source, lithographic apparatus, and device manufacturing method A radiation source unit is provided that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a space between said anode and cathode and to form a plasma so as to generate electromagnetic radiation. The substance may comprise xenon, indium, ... 11/17/05 - 20050253091 - Lithographic apparatus, device manufacturing method and radiation system A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a ... 11/17/05 - 20050253090 - Apparatus and method for immersion lithography An immersion lithography system for semiconductor manufacturing provides a lens assembly that moves relative to a wafer surface and includes a nozzle and drain assembly that is coupled to, and moves along, the lens assembly. The nozzle and drain assemblies may be disposed circumferentially opposite each other about the lens ... 11/03/05 - 20050242301 - Targeted radiation treatment using a spectrally selective radiation emitter Radiation from a spectrally broad radiation source is reduced to radiation of limited spectral range with high efficiency by an emitter that includes a radiation source and a multilayer optical coating that reflects radiation of certain wavelengths back toward the source, allowing other wavelengths to pass. The multilayer optical coating ... 11/03/05 - 20050242300 - Atomic beam to protect a reticle Embodiments of the invention provide a beam generator to produce an atomic beam that travels across a patterned surface of a reticle. The beam may interact with particles to prevent the particles from contaminating the reticle. ... 10/27/05 - 20050236585 - Exposure apparatus and exposure method using euv light Disclosed is an exposure apparatus and an exposure method using EUV light. In one preferred form of the present invention, the exposure apparatus is arranged to expose a substrate to a pattern of an original by use of extreme ultraviolet light, and it includes a blaze type diffraction grating disposed ... 10/13/05 - 20050224722 - Method and apparatus for reducing charge density on a dielectric coated substrate after exposure to large area electron beam Embodiments in accordance with the present invention relate to a number of techniques, which may be applied alone or in combination, to reduce charge damage of substrates exposed to electron beam radiation. In one embodiment, charge damage is reduced by establishing a robust electrical connection between the exposed substrate and ... 10/06/05 - 20050218342 - Lithographic apparatus and device manufacturing method A lithographic apparatus includes a radiation source configured to provide radiation to an illumination system, the radiation source configured to provide radiation in a first wavelength range and in a second wavelength range, the second wavelength range being different from the first wavelength range. A support is configured to support ... 09/29/05 - 20050211921 - Electron beam exposure system The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of ... 09/29/05 - 20050211920 - Positioning device and method of initializing a positioning device In order to realize initializing sequences with high accuracy and high reproducibility, a positioning device according includes an XY slider movable in directions X and Y, an object position measuring device for measuring the position of the XY slider, an X beam guiding the XY slider in the direction Y ... 09/22/05 - 20050205805 - Scratch repairing processing method and scanning probe microscope (spm) used therefor To provide a technique in which chips generated by a defect portion scraping processing using a scanning probe microscope can be removed completely without being collected at the surface of a sample despite of the surface tension of adsorbed water existing on the sample surface and/or electrostatic charges caused by ... 09/22/05 - 20050205804 - Method for manufacturing light guide plate stamper A preferred method for manufacturing a stamper (15) includes the steps of: providing a stamper substrate (10); converting a desired micro pattern into control signals in a computer; and using the control signals to control a probe (11) to form a corresponding micro pattern of dots on the stamper substrate. ... 09/22/05 - 20050205803 - Light source device and exposure equipment using the same A light source device which has small etendue so that high power can be drawn out and which is subject to less damage by debris. The light source device for generating extreme ultra violet light by irradiating a target with a laser beam, includes a target supply unit for supplying ... 07/28/05 - 20050161617 - Image processing method, apparatus, and program An image processing method for processing radiation image having signal according to the quantity of radiation passing through an object, comprising the steps of: weighting for giving a preset weight to a respective areas of a preset unit in a radiation image; and image processing for processing the radiation image ... 07/21/05 - 20050156121 - Methods and devices for charge management for three-dimensional and color sensing Structures and methods for three-dimensional image sensing using high frequency modulation includes CMOS-implementable sensor structures using differential charge transfer, including such sensors enabling rapid horizontal and slower vertical dimension local charge collection. Wavelength response of such sensors can be altered dynamically by varying gate potentials. Methods for producing such sensor ... 07/21/05 - 20050156120 - Analysis apparatus and method A method for investigating the macromolecular structure of a molecular sample, the method composing irradiating the sample with radiation having a plurality of frequencies in the range of 25 GHz to 20 THz; detecting radiation reflected from and/or transmitted by said sample to obtain a spectra of the sample; and ... 07/14/05 - 20050151095 - Reflection element of exposure light and production method therefor, mask, exposure system, and production method of semiconductor device A reflector for extreme ultraviolet light, its manufacture method, a phase shift mask, an exposure apparatus and a semiconductor manufacture method, capable of making the wavelength dependency of a reflectance via a plurality of reflection surfaces be coincident with an center wavelength of exposure light of exposure light and retaining ... 07/07/05 - 20050145804 - Particle beam irradiation system and method of adjusting irradiation apparatus The present invention provides an increased degree of uniformity of radiation dose distribution for the interior of a diseased part. A particle beam therapy system includes a charged particle beam generation apparatus and an irradiation apparatus. An ion beam is generated by the charged particle beam generation apparatus. The irradiation ... 06/30/05 - 20050139786 - Laser irradiation method and method for manufacturing crystalline semiconductor film In the present invention, an irradiated object formed over a substrate is irradiated with a laser beam having the pulse width that is an order of picosecond (10−12 second) or less. ... 06/30/05 - 20050139785 - Lithographic apparatus and radiation source comprising a debris-mitigation system and method for mitigating debris particles in a lithographic apparatus A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam ... 06/30/05 - 20050139784 - Lithographic apparatus and method of manufacturing a device and method of performing maintenance A lithographic apparatus includes an illumination system for providing a beam of radiation. The lithographic apparatus further includes: a support structure for supporting patterning device, the patterning device serving to impart the beam with a pattern in its cross-section; a substrate table for holding a substrate; and a projection system ... 06/23/05 - 20050133734 - Exposure apparatus, exposure method and semiconductor device production method To provide an exposure apparatus, the exposure method and a semiconductor device production method that rise in temperature of a mask by irradiating a charged particle beam can be controlled, displacement of the position of a pattern accompanying with rise in temperature of the mask and the pattern can be ... 06/09/05 - 20050121625 - Wafer chuck illumination device for use in semiconductor manufacturing equipment A wafer chuck illumination device for illuminating a light source to detect a position of foreign substances polluting a wafer chuck is provided. The device includes a lamp for generating a white light source, and a collimator lens for transforming the white light source into a beam of parallel rays ... 06/09/05 - 20050121624 - Lithographic apparatus, illumination system and method for providing a projection beam of euv radiation A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate ... 06/02/05 - 20050116184 - Measuring method and apparatus, exposure method and apparatus, and device manufacturing method A measuring apparatus for irradiating measuring light and for measuring optical performance of a target optical system includes a barrel for housing the target optical system, the barrel being rotatable around an optical axis of the target optical system, and an illumination optical system for introducing the measuring light into ... 06/02/05 - 20050116183 - Radiation source, lithographic apparatus, and device manufacturing method A radiation source for use in lithography. The radiation source comprising a pn-junction disposed on a substrate that can be reverse-biased to cause avalanche breakdown and emission of UV or DUV radiation by deceleration of electrons accelerated into an n-type region of the pn-junction. The radiation source can have a ... ### FreshPatents.com Support |