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Radiant Energy > Means To Align Or Position An Object Relative To A Source Or Detector Means To Align Or Position An Object Relative To A Source Or DetectorMeans To Align Or Position An Object Relative To A Source Or Detector patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.12/13/07 - 20070284542 - Charged particle beam apparatus and method for charged particle beam adjustment A charged particle beam apparatus facilitating adjusting the beam center axis of a charged particle beam in a case where optical conditions are modified or in a case where the beam center axis of the charged particle beam is moved due to state variation of the apparatus. When the beam ... 11/15/07 - 20070262267 - Method and apparatus for scanning a workpiece through an ion beam A method and apparatus 300 for better controlling scanning of a workpiece 330 through an ion beam path 306 provide for mounting a workpiece 330 on an elongated member, partially repetitively rotating the elongated member 500 around a point of rotation 368 to make repetitive scans of the workpiece 330 ... 10/25/07 - 20070246664 - Laser apparatus, laser irradiation method, semiconductor manufacturing method, semiconductor device, and electronic equipment Continuous wave laser apparatus with enhanced processing efficiency is provided as well as a method of manufacturing a semiconductor device using the laser apparatus. The laser apparatus has: a laser oscillator; a unit for rotating a process object; a unit for moving the center of the rotation along a straight ... 08/09/07 - 20070181826 - Laser atom probe methods A laser atom probe (100) situates a counter electrode between a specimen mount and a detector (106), and provides a laser (116) having its beam (122) aligned to illuminate the specimen (104) through the aperture (110) of the counter electrode (108). The detector, specimen mount (102), and/or the counter electrode ... 08/09/07 - 20070181825 - Measurement method, transfer characteristic measurement method, adjustment method of exposure apparatus, and device manufacturing method Exposure is performed with a reticle installed in an exposure apparatus, and a measurement mark on the reticle is transferred onto a wafer so as to form a first transferred image of the measurement mark (step 212). Then, the wafer is rotated (step 218), and then the measurement mark is ... 07/26/07 - 20070170373 - Image-based flat panel alignment Some embodiments include determination of a first misalignment between an imaging device and an axis of a radiation beam emitted from a treatment head, determination of a rotational misalignment between the imaging device and the treatment head within a plane normal to the axis of the radiation beam, acquisition of ... 07/19/07 - 20070164234 - Exposure apparatus and device manufacturing method An exposure apparatus is provided in which, even when a projection optical system and substrate are in close proximity, collisions between the projection optical system and the substrate or the substrate stage can be easily avoided. An exposure apparatus EX having a projection optical system (30) which projects and transfers ... 05/24/07 - 20070114450 - Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device A mask blank has a plurality of pattern formation regions in which mask circuit patterns are to be formed, and a supporting region in which any mask circuit pattern is not to be formed. The supporting region is provided for holding the plurality of pattern formation regions while separating the ... 05/24/07 - 20070114449 - Standard component for length measurement calibration, method for manufacturing the same, and calibration method and apparatus using the same There is provided a standard component used in an electron beam system for performing length measurement calibration with high precision. A one-dimensional grating is disposed on a bonding wafer to enable high-precision calibration at the same height as that of a real wafer to be measured and calibration among systems. ... 04/19/07 - 20070085028 - Tilt control method A tilt control method includes a tilt control step for automatic control of the tilt (α) of a tilt device (1) by at least one electronic tilt sensor (2) based on gravitational force (G) and by a tilt control device (5), and a sensor test step which is carried out ... 04/19/07 - 20070085027 - Real-time compensation of mechanical position error in pattern generation or imaging applications Improved systems, apparatus, and methods for detecting positions of moving stages and accurately compensating position error during operation (in “real time”) are provided. For some embodiments, rather than rely on two dimensional position measurements, measurements in at least three dimensions may be taken allowing compensation for pitch and roll and, ... 04/05/07 - 20070075271 - Method of adjusting the operating region of a tool component to a pre-determined element The invention describes a method of positioning an image field of, for example, an electron microscope at a specific structure in a regular grid of nominally identical structures. Such structures can, for example, be memory cells on a chip. Such memory cells nowadays have an area of, for example, less ... 03/29/07 - 20070069155 - Beam re-registration system and method A beam re-registration system and method for error correction of a particle or other beam are disclosed. The beam re-registration system and method may include a particle or other beam, a stage movable in relation to the particle beam, at least two servos for controlling movement of the stage, a ... 03/29/07 - 20070069154 - Method of registering a blank substrate to a pattern generating particle beam apparatus and of correcting alignment during pattern generation We have developed a method of registration of a particle beam to internal alignment targets present within photoresist areas which are to be imaged. The method does not affect the photoresist, so the quality of pattern produced in the resist after imaging is not affected. The method used for registration ... 03/01/07 - 20070045566 - Substrate alignment using linear array sensor The position of a substrate's edge is detected using a substrate alignment system that includes, in part, a light source, an optical module adapted to receive a light emanating from the light source to form a multi-dimensional light beam; and an array sensor positioned at a focal plane of the ... 02/08/07 - 20070029506 - Systems, control subsystems, and methods for projecting an electron beam onto a specimen Systems, control subsystems, and methods for projecting an electron beam onto a specimen are provided. One system includes a stage configured to move the specimen with a non-uniform velocity. The system also includes a projection subsystem configured to project the electron beam onto the specimen while the stage is moving ... 02/01/07 - 20070023689 - Electron beam drift correction method and electron beam writing method A method for correcting drifts of an electron beam, includes periodically correcting drift of the electron beam once per time period while varying the time period in length, and correcting, in addition to the correction per time period, the drift of the electron beam regardless of elapse of said time ... 02/01/07 - 20070023688 - Apparatus for measuring a position of an ion beam profiler and a method for its use In an embodiment, an ion beam profiler center measuring apparatus is releasably mounted to the ion beam profiler and measures a center position of an ion beam profiler using a laser beam. Accurate data for a profiler center position may be obtained without direct contact with a platen. A procedure ... 02/01/07 - 20070023687 - Collapsible irradiation device The invention relates to an irradiation device (1) comprising a base part (2), a support (3) longitudinally extending from the base part (2) and enclosing an angle (a) with a vertical axis V, and a housing (4) comprising a central axis (5), at least one radiation unit (6), and a ... 12/28/06 - 20060289793 - Method and apparatus for simultaneously depositing and observing materials on a target A system for joining at least two beams of charged particles that includes directing a first beam along a first axis into a field. A second beam is directed along a second axis into the field. The first and second beams are turned, by interaction between the field and the ... 12/21/06 - 20060284110 - Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure a A method for measuring a demagnification of a charged particle beam exposure apparatus includes measuring a first stage position of a mask stage in accordance with a mask stage coordinate system, irradiating a first charged particle beam to a first irradiation position on a specimen through the opening portion of ... 11/30/06 - 20060266953 - Method and system for determining a positioning error of an electron beam of a scanning electron microscope A substrate having at least four reference patterns at respective nominal positions on a surface is provided. Using a scanning electron microscope and positioning the wafer stage at respective nominal positions of each reference pattern, each reference pattern is scanned. After determining at least a first and a second intensity ... 11/09/06 - 20060249693 - Lithographic apparatus, device manufacturing method, and device manufactured thereby A lithographic projection apparatus includes conduits which supply utilities to components in a vacuum chamber such as object tables and/or associated motors and/or sensors. The conduits are shielded from exposure to the vacuum by conduit conducts having at least the same number of degrees of freedom as their associated object ... 11/09/06 - 20060249692 - Composite charged particle beam apparatus and an irradiation alignment method in it An irradiation position positioning method of a charged particle beam in a composite charged particle beam apparatus having an ion beam lens barrel, a secondary charged particle and detector, is realized by irradiating a surface of a sample with a first charged particle beam, and irradiating the charged region with ... 10/05/06 - 20060219943 - System and method for identification of a reference integrated circuit for a pick-and-place equipment A method and a system of alignment of an integrated circuit chip pick-and-place equipment with an origin of a wafer supporting these circuits, comprising optically searching on the wafer at least one reference pattern formed, on manufacturing of the integrated circuits, in a reference chip, the reference pattern being different ... 06/29/06 - 20060138347 - Level sensor, lithographic apparatus and device manufacturing method The invention relates to a level sensor for use in a lithographic apparatus that determines a surface height of a substrate. The level sensor includes an emitter and a receiver, wherein the emitter is arranged to emit a signal directed to a predetermined position on the surface of the substrate, ... 06/15/06 - 20060124864 - Air bearing compatible with operation in a vacuum Methods and apparatus for enabling the stroke length of a linear guide that is suitable for use in an environment with high vacuum levels to be substantially independent of a length associated with the linear guide are disclosed. According to one aspect of the present invention, a guide bearing system ... 06/08/06 - 20060118733 - Method of determining processing position in charged particle beam apparatus, and infrared microscope used in the method A laser mark which will be the positioning mark for a secondary charged particle image in the charged particle beam apparatus is applied by moving the sample processing/observation area in the charged particle beam apparatus so as to come into the view field while performing an observation by an infrared ... 05/25/06 - 20060108542 - Electron beam exposure method and electron beam exposure system In an electron beam exposure method in which an article subjected to exposure and an electron beam irradiation spot are moved relative to each other at a continuous speed, the article is exposed at a plurality of irradiation intensities of an electron beam by changing a transmittance of an electron ... 05/25/06 - 20060108541 - Alignment method, alignment substrate, production method for alignment substrate, exposure method, exposure system and mask producing method An alignment method capable of performing alignment without providing alignment marks on a mask and preventing a decline of exposure throughput and latent image contrast, an alignment substrate and the production method, an exposure methods an exposure apparatus and a production method of a mask are provided. An alignment method ... 05/18/06 - 20060102853 - Device and method for imaging a multiple particle beam on a substrate A device and a method for imaging and positioning a multiparticle beam on a substrate is disclosed. The device comprises a particle beam source with a condenser optic that produces a particle beam that illuminates the surface of an aperture plate. A multiplicity of individual beams are produced from the ... 05/04/06 - 20060091321 - Wafer alignment method for dual beam system A gradient charged particle beam apparatus capable of moving highly accurately to a specific position by eliminating influences of warp inside a wafer surface is provided. A portion 46 having a mark 47 for aligning visual field alignment positioned in advance to the same horizontal and the same height as ... 04/13/06 - 20060076508 - System, method and a program for correcting conditions for controlling a charged particle beam for lithography and observation, and a program and method for manufacturing a semiconductor device A system for correcting a charged particle beam lithography condition including: an error calculation unit configured to calculate an error in an illumination position of a charged particle beam, the charged particle beam is controlled by a lithography condition corrected by initial correction parameters; a temporary correction unit configured to ... 12/15/05 - 20050274909 - Level sensor for lithographic apparatus A level sensor for a lithographic projection apparatus includes a light source configured to direct light onto a substrate to be measured, a detector configured to detect light reflected from the substrate, and a processor configured to calculate a difference between measurements made with the filter in the first configuration ... 12/15/05 - 20050274908 - Automatically aligning objective aperture for a scanning electron microscope An automatically aligning objective aperture assembly for a CDSEM includes a plate that is moveable in X and Y directions relative to an electron beam generated by the SEM. The plate defines one or more objective apertures. Encoders and motors are provided for affecting movement of the plate in the ... 12/08/05 - 20050269524 - Spatial-phase locking of energy beams for determining two-dimensional location and beam shape A method or system of spatial-phase locking a beam used in maskless lithography provides a fiducial grid with a single spatial-period, the fiducial grid being rotated at an angle with respect to a direction of scanning the beam; detects a signal generated in response to the beam being incident upon ... 11/17/05 - 20050253089 - Ion implanting apparatus The ion implanting apparatus according to this invention includes: an ion source for producing the ion beam 20 including desired ion species and being shaped in a sheet with a width longer than a narrow width of a substrate 82, a mass separating magnet 36 for selectively deriving the desired ... 11/10/05 - 20050247889 - Movable inclination-angle measuring apparatus for ion beam, and method of use There is provided a movable ion beam inclination-angle measuring apparatus that can measure the inclination angle of either a spot ion beam or a ribbon ion beam. The apparatus is provided in an X-axis direction from an ion supplying unit of an ion implantation device. The apparatus includes an ion ... 11/03/05 - 20050242299 - Diagnostic system for profiling micro-beams An apparatus for characterization of a micro beam comprising a micro modified Faraday cup assembly including a first layer of material, a second layer of material operatively connected to the first layer of material, a third layer of material operatively connected to the second layer of material, and a fourth ... 10/06/05 - 20050218341 - Treatment target positioning system A wireless treatment target positioning system for therapeutic radiation treatment includes a patient positioning system and a treatment target locating system. The treatment target locating system includes a room beam coordinate system and a localizing system. The room beam coordinate system includes devices for generating laser beams intersecting at a ... 09/29/05 - 20050211918 - Alignment apparatus, exposure apparatus using same, and method of manufacturing devices An alignment apparatus for aligning a reflective reticle includes a light source for emitting alignment light, an optical alignment mark provided on the reticle, and a reference mark provided on a reticle stage that holds the reticle. A detecting unit detects the alignment light reflected from the alignment mark and ... 07/28/05 - 20050161616 - Method and apparatus for simultaneously depositing and observing materials on a target A system for joining at least two beams of charged particles that includes directing a first beam along a first axis into a field. A second beam is directed along a second axis into the field. The first and second beams are turned, by interaction between the field and the ... 07/28/05 - 20050161615 - Position detecting method, surface shape estimating method, and exposure apparatus and device manufacturing method using the same A position detecting system including a detecting system for detecting positions, at different points on a surface of a reticle having a predetermined pattern formed thereon, with respect to a direction substantially perpendicular to the reticle surface, wherein the detecting system includes a light projecting portion for directing light from ... 07/07/05 - 20050145803 - Moving lens for immersion optical lithography An apparatus for immersion optical lithography having a lens capable of relative movement in synchrony with a horizontal motion of a semiconductor wafer in a liquid environment where the synchronous motion of the lens apparatus and semiconductor wafer advantageously reduces the turbulence and air bubbles associated with a liquid environment. ... ### FreshPatents.com Support |