Electron Probe Type

Electron Probe Type patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.

11/29/07 - 20070272860 - Electron beam inspection apparatus
An electron beam inspection apparatus in which the order of inspection is determined to shorten the inspection time is disclosed. The order of inspection is determined by minimizing the total of the moving time and the inspection time as well as by simply optimizing the covered distance. At the time ...

11/29/07 - 20070272859 - Electron beam apparatus and device production method using the electron beam apparatus
The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc.. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical ...

10/25/07 - 20070246651 - Charged particle beam apparatus
The present invention provides a charged particle beam apparatus capable of preventing the charging-up of the specimen without using a large-scale facility. A scanning electron microscope 100 illuminates a specimen 21 with a charged particle beam via a charged particle optical system arranged in a column. According to the present ...

10/18/07 - 20070241278 - Charged particle beam apparatus
A charged particle beam apparatus obtains an image by detecting a generation signal inclusively indicative of secondary electrons generated from a specimen. The apparatus has an input unit for inputting current and voltage values to be applied to a charged particle optical system through which the charged particle beam travels, ...

10/11/07 - 20070235645 - Charged particle beam device
The charged particle beam device of this invention separately detects secondary signal particles emitted from the surface of a sample, dark field signal particles scattered within and transmitted through the sample, bright field signal particles transmitted through the sample without being scattered within the sample, and thereby allows the operator ...

09/27/07 - 20070221846 - Scanning electron microscope
A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam ...

09/27/07 - 20070221845 - Charged particle beam system
A charged particle beam system wherein the output of the secondary electron detector is detected while the retarding voltage is varied between the values for which the secondary electrons do not reach the sample and the values for which the secondary electrons reach the sample, and the surface potential of ...

09/20/07 - 20070215803 - Method and an apparatus of an inspection system using an electron beam
Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such ...

09/13/07 - 20070210252 - Scanning electron microscope and a method for imaging a specimen using the same
(1) part or all of the number, coordinates and size/shape and imaging sequence of imaging points each for observation, the imaging position change method and imaging conditions can be calculated automatically from CAD data, (2) a combination of input information and output information for imaging recipe creation can be set ...

08/30/07 - 20070200063 - Wafer-level testing of light-emitting resonant structures
A device for testing a light-emitting resonant structure on a wafer includes a vacuum chamber for holding the resonant structure; a source of charged particles; a electromagnetic radiation detector; a positioning mechanism constructed and adapted control the position of the wafer within the vacuum chamber; and a controller operatively connected ...

08/23/07 - 20070194236 - Semiconductor inspection system
An operator-free and fully automated semiconductor inspection system with high throughput is realized. All conditions required for capturing and inspection are generated from design information such as CAD data. In order to perform actual inspection under the conditions, a semiconductor inspection system is composed of a navigation system for generating ...

08/23/07 - 20070194235 - Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a ...

08/23/07 - 20070194234 - Scanning electron microscope
In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the present invention has a function of calculating the accuracy of correction after correction of coordinates and displaying it with vectors 39, a function of ...

08/23/07 - 20070194233 - Pattern inspection method, pattern inspection apparatus, semiconductor device manufacturing method, and program
A pattern inspection method includes: generating a charged particle beam to irradiate the charged particle beam to a sample having a surface on which a pattern to be inspected is formed; detecting at least one of a secondary charged particle, a reflection charged particle and a back scattering charged particle ...

08/23/07 - 20070194232 - Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method
A substrate inspection apparatus includes: an electron gun which generates an electron beam to irradiate the electron beam to a substrate; an electron detection unit which detects at least one of a secondary electron, a reflection electron and a back scattering electron generated from a surface of the substrate by ...

08/23/07 - 20070194229 - Method and apparatus for inspecting pattern defects and mirror electron projection type or multi-beam scanning type electron beam apparatus
The present invention provides a mirror electron projection (MPJ) type (SEPJ type included) scanning electron beam apparatus that is capable of performing condition setup, and a method and apparatus for inspecting pattern defects with the scanning electron beam apparatus. A mirror electron projection type defect inspection apparatus, which comprises a ...

08/16/07 - 20070187601 - Charged particle beam apparatus
An object of this invention is to provide a charged particle beam apparatus that is capable of handling samples without adhering impurities onto the samples. In a scanning electron microscope in which a lubricant was coated on a sliding portion of a movable member that moves inside a vacuum chamber, ...

08/16/07 - 20070187600 - Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device
A substrate inspection apparatus includes: an electron beam irradiation device which emits an electron beam and causes the electron beam to irradiate a substrate to be inspected as a primary beam; an electron beam detector which detects at least one of a secondary electron, a reflected electron and a backscattered ...

08/16/07 - 20070187599 - Charged particle beam apparatus, charged particle beam focusing method, microstructure measuring method, microstructure inspecting method, semiconductor device manufacturing method, and program
A charged particle beam apparatus includes: a charged particle source which generates a charged particle beam and which applies the charged particle beam to a specimen having a microstructure formed on a surface thereof; an objective lens which excites at least one of an electric field and a magnetic field ...

08/16/07 - 20070187598 - Scanning electron microscope and apparatus for detecting defect
A scanning electron microscope, by which an image of unevennesses on the surface of a sample may be obtained in a high-resolution manner and a high contrast one, is provided according to the present invention. A sample image is obtained by use of the scanning electron microscope with a configuration ...

08/09/07 - 20070181805 - Scanning electron microscope having a monochromator
A scanning electron microscope having a monochromator that can automatically adjust an electron beam entering the monochromator and operating conditions of the monochromator. The scanning electron microscope having a monochromator is equipped with, between an electron source and the monochromator, a first focusing lens for adjusting focusing of the electron ...

07/19/07 - 20070164218 - Sem technique for imaging and measuring electronic transport in nanocomposites based on electric field induced contrast
Methods and apparatus are described for SEM imaging and measuring electronic transport in nanocomposites based on electric field induced contrast. A method includes mounting a sample onto a sample holder, the sample including a sample material; wire bonding leads from the sample holder onto the sample; placing the sample holder ...

07/19/07 - 20070164217 - Projection electron microscope, electron microscope, specimen surface observing method and micro device producing method
The illuminating beam 4 emitted from the cathode 1 is incident on a deflector 3. In a state in which a voltage is applied to the deflector 3, the optical path of the illuminating beam 4 is altered by the deflector 3; the illuminating beam 4 then passes through a ...

07/12/07 - 20070158565 - Electron beam apparatus and device manufacturing method using the same
An electron beam apparatus is provided for reliably measuring a potential contrast and the like at a high throughput in a simple structure. The electron beam apparatus for irradiating a sample, such as a wafer, formed with a pattern with an electron beam to evaluate the sample comprises an electron-optical ...

07/12/07 - 20070158564 - Method and apparatus for processing a micro sample
An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In ...

07/12/07 - 20070158562 - Three-dimensional imaging using electron beam activated chemical etch
Methods and apparatus for imaging a structure and a related processor-readable medium are disclosed. A surface of a substrate (or a portion thereof) is exposed to a gas composition. The gas composition includes one or more components that etch the substrate upon activation by interaction with a beam of electrons. ...

07/12/07 - 20070158561 - Single stage charged particle beam energy width reduction system for charged particle beam system
The present invention provides a charged particle beam device. The device comprises a first lens (101; 510) generating a crossover a second lens (102; 512) positioned after the crossover and a element acting in a focusing and dispersive manner in an x-z-plane with a center of the element having essentially ...

06/28/07 - 20070145270 - Method and apparatus of reviewing defects on a semiconductor device
To realize reliable on-film/under-film defect classification (classification into 3 classes of on-film, under-film, and determination-disabled) with determination propriety determination, an on-film/under-film defect classification method and a method of narrowing a range of defect generation timing are given, the methods being robust to 4 variation factors, wherein an edge of a ...

06/28/07 - 20070145269 - Electron anti-fogging baffle used as a detector
Methods and apparatus to facilitate the measurement of the amount of scattered electrons collected by an anti-fogging baffle arrangement are provided. For some embodiments, by affixing a lead to an electrically isolated (floating) portion of the baffle arrangement, the amount of scattered electrons collected thereby may be read out, for ...

06/28/07 - 20070145268 - Ultra-thin liquid control plate and combination of box-like member and the control plate
An ultra-thin liquid control plate and a combination of a box-like member and the control plat include a plate-like member having at least one view hole. The joint surface combined with a sidewall of the view hole and a surface of the plate-like member is provided with at least one ...

06/28/07 - 20070145266 - Electron microscope apparatus using crt-type optics
One embodiment relates to an apparatus which utilizes an electron beam for inspection or metrology of a substrate. The apparatus includes a CRT-type gun and deflectors to generate and scan the electron beam. The CRT-type gun may optionally be in a sealed vacuum. Another embodiment relates to a method of ...

06/28/07 - 20070145265 - Method of scanning
A method of scanning is disclosed comprising, providing a scanning system (10) having a sample holder (14) and a relatively movable scanning device (18), performing a scan of at least a part of an object (22) located on the sample holder (14), establishing orientation of the sample holder and interpreting ...

06/21/07 - 20070138390 - Inspection method and inspection system using charged particle beam
An electron beam system using a scanning electron microscope equipped with a function for controlling a charged state of a sample to be observed includes electron optics for obtaining image data of the scanning electron microscope, and a monitor that displays a relationship between an equation for determining a degree ...

06/07/07 - 20070125948 - Method of measuring a critical dimension of a semiconductor device and a related apparatus
A method and apparatus for measuring a critical dimension (CD) are provided. Image data of a measurement pattern are generated. The measurement pattern may include a first surface and a second surface facing each other. The image data may include a first side and a second side corresponding to the ...

06/07/07 - 20070125947 - Sample enclosure for a scanning electron microscope and methods of use thereof
A SEM sample container having a sample enclosure (100, 102) including an electron beam permeable, fluid permeable membrane (132), and a peripheral enclosure sealed to the membrane, and a sample enclosure closure including a quick-connect attachment (152) for sealing engagement with the sample enclosure. ...

05/31/07 - 20070120056 - Method and apparatus for evaluating pattern shape of a semiconductor device
The present invention provides a semiconductor pattern shape evaluating apparatus using a critical dimension SEM, which eliminates the necessity of data conversion corresponding to each process of semiconductor manufacturing conventionally required; controls possessed data integratedly; can select data effective for use in each process from the possessed data easily; if ...

05/24/07 - 20070114409 - Electron beam apparatus with aberration corrector
An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, ...

05/24/07 - 20070114408 - Charged-particle beam system
There is disclosed a charged-particle beam system equipped with a higher-order aberration corrector capable of correcting fifth-order spherical aberration and third-order chromatic aberration such that the primary trajectory of an electron beam is not affected by the strength of a transfer lens. The corrector is so adjusted that the image ...

05/24/07 - 20070114407 - Particle detection auditing system and method
A system is presented for evaluating the performance of a particle detecting and measuring instrument wherein the instrument receives a specimen and detects the number of particles on the specimen and measures the descriptive parameters of the particles. The system includes a known specimen received by the instrument and wherein ...

05/24/07 - 20070114406 - Scanning probe in pulsed-force mode, digital and in real time
Microscope, in particular a scanning probe microscope, comprising a programmable logic device ...

05/24/07 - 20070114405 - Tool-to-tool matching control method and its system for scanning electron microscope
A system for controlling a tool-to-tool matching between a plurality of scanning electron microscopes for pattern dimension measurement includes a measuring unit for, at regular intervals, measuring a tool-to-tool disparity between scanning electron microscopes based on secondary electron image data, and measuring indicators indicating states of the microscopes, a tool-to-tool-disparity ...

05/24/07 - 20070114404 - Method and system for detecting hidden defects
A method for detecting hidden defects and patterns, the method includes: receiving an object that comprises an opaque layer positioned above an intermediate layer; defining an energy band in response to at least one characteristic of the opaque layer and at least one characteristic of a scanning electron microscope; illuminating ...

05/24/07 - 20070114403 - Electron microscope
An electron microscope has a spherical aberration correction system having transfer optics inserted between a spherical aberration corrector and the objective lens. The transfer optics consists of first and second lenses each of which is made of a magnetic lens. Electrons passing across a point located at distance r0 from ...

04/19/07 - 20070085007 - Charged particle beam device with df-stem image valuation method
There is disclosed a charged particle beam device which judges whether or not an image based on a dark-field signal has an appropriate atomic number contrast. Input reference information, a bright-field image or a back-scattered electron image is compared with a dark-field image, and it is judged whether or not ...

04/19/07 - 20070085006 - Pattern observation apparatus, pattern observation method, method of manufacturing semiconductor device, and program
A pattern observation apparatus includes: a defect position information input unit which downloads defect position information for a pattern, the defect position information having been detected by an external inspection apparatus with regard to a specimen in which the pattern is formed; a moving unit which moves the specimen so ...

04/19/07 - 20070085005 - Pattern defect inspection method and apparatus thereof
In the present invention, the structure of an electrification control electrode is changed from a grid type to a slit type and thereby shadows are not formed when a wafer is irradiated with a beam. Further, a beam forming slit is disposed ahead of an electrification control slit, thus the ...

04/19/07 - 20070085004 - Substrate-examining apparatus
The invention provides a substrate-examining apparatus which is capable of measuring the detailed shape of a contact hole and the state of a hole bottom. A substrate-examining apparatus includes an electron source (21) for generating an electron beam, a deflector (22) for irradiating a surface of a substrate to be ...

04/19/07 - 20070085003 - Electron beam applying apparatus and drawing apparatus
An electron beam applying apparatus includes: a thermal field emission type electron source emitting an electron beam; an electrostatic lens disposed immediately below the electron source and acting as a condensing electrode for condensing the electron beam in a first angular aperture emitted by the electron source in a second ...

03/29/07 - 20070069127 - Apparatus and method for electron beam inspection with projection electron microscopy
An apparatus and method for electron beam inspection with projection electron microscopy, is constructed so as to allow correction of changes in focus offsets due to changes in the electrically charged state particularly during inspection. The apparatus includes: a focus measure sensor unit; a focus measure calculation unit which calculates ...

03/22/07 - 20070063142 - Disk, and counting observation apparatus for counting and observing cells through optical microscope by use of the disk
A disk for storing liquid samples containing cells and for use in counting and observing the cells through an optical microscope includes an upper member formed of a transparent material and having a plurality of liquid inlets arranged radially and adapted to introduce the corresponding liquid samples therethrough, and a ...

03/15/07 - 20070057186 - Inspection system by charged particle beam and method of manufacturing devices using the system
An inspection apparatus and a semiconductor device manufacturing method using the same. The inspection apparatus is used for defect inspection, line width measurement, surface potential measurement or the like of a sample such as a wafer. In the inspection apparatus, a plurality of charged particles is delivered from a primary ...

03/15/07 - 20070057185 - Electron beam device and its control method
An electron beam device includes an electron gun section having an internal space kept at an ultrahigh vacuum level for generating a primary electron beam, a mirror section having an internal space kept at a vacuum level lower than that of the electron gun section for scanning a specimen with ...

03/15/07 - 20070057184 - Method and apparatus for reviewing defects
The invention provides an apparatus and a method each capable of highly accurately reviewing at a high speed very small foreign matters and pattern defects occurring during a device production process for forming a circuit pattern on a substrate of semiconductor devices, etc. An objective lens having high NA is ...

03/15/07 - 20070057183 - Scanning electron microscope
Energy of the charged particle beam to be irradiated onto the sample is set so that generation efficiency of secondary electrons generated from the sample becomes equal to 1 or more. A flat-plate electrode (26) is located in such a manner as to be directly opposed to the sample. Here, ...

03/15/07 - 20070057182 - Apparatus and method for inspecting a sample of a specimen by means of an electron beam
The invention refers to an apparatus (10) for inspecting a sample (12) of a specimen (14) by means of an electron beam (34) comprising a vacuum chamber (18); an ion beam device (20) for generating an ion beam (22) used for etching a sample (12) from the specimen (14) within ...

03/08/07 - 20070051888 - System and method for determining a cross sectional feature of a structural element using a reference structural element
A system and method for determining a cross sectional feature of a measured structural element having a sub-micron cross section, the cross section is defined by an intermediate section that is located between a first and a second traverse sections. The method starts by a first step of scanning, at ...

03/01/07 - 20070045539 - Scanning electron microscope
A scanning electron microscope is disclosed. The primary electron beam is radiated on a reticle (specimen), and an observation image of the reticle is obtained using the electrons secondarily released. The microscope comprises a lamp for radiating the vacuum ultraviolet light having the wavelength of not more than 172 nm ...

03/01/07 - 20070045538 - Image processing apparatus for analysis of pattern matching failure
Information indicating the reason for a failure of template matching is provided. Difference information between a first image, which is referred to as a template, and a third image that is selected by the operator from a second image and that is larger than the template is displayed. ...

03/01/07 - 20070045537 - Microsystem manipulation apparatus
A microsystem manipulation apparatus and an associated kit is described that may be used to facilitate the assembly and testing of Microsystems and microsystem components. The microsystem manipulation apparatus may include a scanning electron microscope imaging system, a stage, and at least one manipulator having an associated tool. The microsystem ...

03/01/07 - 20070045536 - Method for inspecting substrate, substrate inspecting system and electron beam apparatus
The present invention relates to a substrate inspection apparatus for inspecting a pattern formed on a substrate by irradiating a charged particle beam onto the substrate. The substrate inspection apparatus comprises: an electron beam apparatus including a charged particle beam source for emitting a charged particle beam, a primary optical ...

02/22/07 - 20070040118 - Method and apparatus for scanning and measurement by electron beam
A inspecting and measurement method and inspecting and measurement apparatus for semiconductor devices and patterns such as photomasks using an electron beam which can measure the charged potential of a sample with higher precision than in the prior art, and a inspecting and measurement apparatus which can measure charged potential ...

02/15/07 - 20070034797 - Electron beam apparatus, and inspection instrument and inspection process thereof
A beam source of an inspection apparatus discharges a beam, and a stage system holds a specimen and moves in at least one direction. A primary optical system directs the beam to the specimen, and a secondary optical system guides a secondary beam coming from the specimen. A sensor outputs ...

02/08/07 - 20070029479 - Method for sem measurement of features using magnetically filtered low loss electron microscopy
A magnetically focused scanning charged particle microscope having an array detector placed to detect scattered particles, wherein the particles fall substantially non-tangentially to the surface of the array detector. ...

02/08/07 - 20070029478 - Method of forming a sample image and charged particle beam apparatus
An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed. ...

02/01/07 - 20070023658 - Method of inspecting pattern and inspecting instrument
An electron beam apparatus equipped with a review function of a semiconductor wafer includes a scanning electron microscope to obtain image information of a semiconductor wafer, and an information processing apparatus to process the image information. The information processing apparatus includes a data input unit to receive positional information of ...

02/01/07 - 20070023657 - Charged particle beam apparatus
It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above ...

02/01/07 - 20070023656 - Method for inspecting substrate, and method and apparatus for inspecting array substrates
A method for inspecting a substrate comprising a mother substrate, a first array area and a second array area which are formed on the mother substrate and opposed to each other with respect to a line intended for division, and each of which includes scanning lines, signal lines, switching elements ...

02/01/07 - 20070023655 - Sample measuring device
An object of this invention is to make it easy to adjust a position of the energy beam to irradiate and a position of a focal point of a light collecting mirror part, and to prevent displacement of the light collecting part due to vibration with a simple arrangement. A ...

02/01/07 - 20070023654 - Charged particle beam application system
An object of the present invention is to measure a landing angle even in a multi electron beam lithography system in which current amount of each beam is small. Another object thereof is to measure an absolute value of the landing angle and a relative landing angle with the high ...

02/01/07 - 20070023653 - Method and apparatus of pattern inspection and semiconductor inspection system using the same
A pattern inspection apparatus can be provided, for example, in a scanning electron microscope system. When patterns of a plurality of layers are included in a SEM image, the apparatus separates the patterns according to each layer by using design data of the plurality of layers corresponding to the patterns. ...

02/01/07 - 20070023652 - Electron beam detection device and electron tube
An insulating tube has one end and another end. An An avalanche photodiode (APD) is provided outside the one end of the insulating tube. The another end of the insulating tube is air-tightly connected to an outer flange through a stem inner wall. Capacitors electrically connected to the APD are ...

01/25/07 - 20070018101 - Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary ...

01/25/07 - 20070018100 - Charged-particle beam instrument and method of detecting information from specimen using charged-particle beam
A charged-particle beam instrument and method are offered which can inspect side and rear surfaces of the outer periphery of a specimen. The instrument has a source of the charged-particle beam and an objective lens for focusing the beam onto the specimen positioned inside a specimen chamber. The instrument further ...

01/25/07 - 20070018099 - Method of measuring three-dimensional surface roughness of a structure
An improved method of measuring the three-dimensional surface roughness of a structure. A focused ion beam is used to mill a succession of cross-sections or “slices” of the feature of interest at pre-selected intervals over a pre-selected measurement distance. As each cross-section is exposed, a scanning electron microscope is used ...

01/25/07 - 20070018098 - Nanotube probe and method for manufacturing the same
The nanotube probe according to this invention is constructed by fastening a nanotube 8 on the protruded portion 4 of a cantilever by way of at least two partial coating films 12a and 12b. One or more additional partial coating films may be formed in the intermediate area between these ...

12/28/06 - 20060289757 - Electron beam system and electron beam measuring and observing methods
To provide an electron beam system capable of performing three-dimensional measurement of a sample with high precision irrespective of the tilt angle and height of the sample. The electron beam system has a correction factor storing section 32 for storing a correction factor at a reference tilt angle with respect ...

12/28/06 - 20060289756 - Standard reference for metrology and calibration method of electron-beam metrology system using the same
An electron-beam metrology system includes a specimen stage to mount a specimen on which a device pattern is formed, electron optics to radiate the device pattern with an electron-beam, a secondary electron detector to detect a secondary electron generated by the radiation of the electron-beam, and an information processing system ...

12/28/06 - 20060289755 - Electron microscope application apparatus and sample inspection method
A charge control electrode emitting photoelectrons is disposed just above a wafer (sample) in parallel thereto, and the electrode has a through hole so that ultraviolet light can be irradiated to the wafer through the charge control electrode. Specifically, a metal plate which is formed in mesh or includes one ...

12/28/06 - 20060289754 - Charged particle beam apparatus
The charged particle beams is provided, which can analyze contamination of the inner wall of the system without being disassembled and supply information on appropriate maintenance timing. The contamination level of the inner wall of the system is identified by measuring the spectrum of the X-rays emitted from the inner ...

12/28/06 - 20060289753 - Charged particle beam apparatus
The charged particle beams is provided, which can analyze contamination of the inner wall of the system without being disassembled and supply information on appropriate maintenance timing. The contamination level of the inner wall of the system is identified by measuring the spectrum of the X-rays emitted from the inner ...

12/28/06 - 20060289752 - Observing method and its apparatus using electron microscope
The present invention relates to high-speed acquisition of both a perpendicular observation image and a tilt observation image, in observation using a scanning electron microscope. An electron-beam observation apparatus includes: a first electro-optical system which scans a converged electron beam from a substantially perpendicular direction to a defect on a ...

12/28/06 - 20060289751 - Charged particle beam apparatus and automatic astigmatism adjustment method
According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of ...

12/21/06 - 20060284090 - Material processing system and method
A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a surrounding of a location of the work piece to be processed. The radiation is preferably provided by an ...

12/21/06 - 20060284089 - Calibration standard
The invention relates to a calibration standard, especially for the calibration of devices for the non-destructive measurement of the thickness of thin layers, with a carrier layer (12) consisting of a basic material and a standard (17) applied on the carrier layer (12), said standard having the thickness of the ...

12/21/06 - 20060284088 - Focus correction method for inspection of circuit patterns
A charged particle application circuit pattern inspection apparatus and method are disclosed, in which the reduction in the rejection rate attributable to an out-of-focus state due to the change in the charge condition on the sample surface is prevented and the false information is reduced to improve the apparatus reliability. ...

12/14/06 - 20060278826 - Method and apparatus for automated beam optimization in a scanning electron microscope
A method and apparatus according to the present invention define optimal conditions for a scanning electron microscope (SEM), preferably a critical dimension scanning electron microscope (CDSEM). The present invention provides an image quality monitor that utilizes image processing and optimization to maintain image quality at a desired level. Images from ...

11/23/06 - 20060261268 - Pattern measuring system and semiconductor device manufacturing method
A pattern measuring system comprises an image database provided independently of an image obtaining apparatus, which obtains an image of pattern to be evaluated, and storing the image data, which is obtained by the image obtaining apparatus, and the additional information of the image data; and an image measuring computer ...

11/16/06 - 20060255272 - Calibration method for electron-beam system and electron-beam system
There is provided an electron-beam calibration technology whereby deflection calibration used in the electron-beam system can be performed with a high accuracy. A one-dimensional diffraction grating is located such that direction of the grating becomes parallel to an electron-beam scanning direction. Next, the electron-beam scanning is horizontally performed while displacing ...

11/16/06 - 20060255271 - Method of analysis using energy loss spectrometer and transmission electron microscope equipped therewith
A method of analysis using an energy loss spectrometer and a transmission electron microscope equipped with the energy loss spectrometer. The spectrometer has a CCD camera for recording plural spectra as one photoelectric device image and a controller for batch reading in images from the camera, converting the positions of ...

11/16/06 - 20060255270 - Semiconductor processing method and system
A secondary electron image generated by an electron beam is detected by a secondary electron/secondary ion detector while a silicon substrate is etched by a focused ion beam from a back surface of a semiconductor chip. A time point where the electron beam transmits through the silicon substrate, a contrast ...

11/16/06 - 20060255269 - Charged particle beam device
A scanning charged particle microscope which facilitates adjustment, has a deep focal depth, and is provided with an aberration correction means. The state of aberration correction is judged from a SEM image by using a stop having plural openings and the judgment result is fed back to the adjustment of ...

11/16/06 - 20060255268 - Charged particle beam device with detection unit switch and method of operation thereof
The invention provides a charged particle beam device and a method of operation thereof. An emitter (2) emits a primary charged particle beam (12). Depending on the action of a deflection system, which comprises at least three deflection stages (14), it can be switched between at least two detection units ...

11/09/06 - 20060249676 - Apparatus and method for wafer pattern inspection
An electric field for decelerating an electron beam is formed on a surface of a sample semiconductor to be inspected, an electron beam having a specific area (a sheet electron beam) and containing a component having such an energy as not to reach the surface of the sample semiconductor is ...

11/02/06 - 20060243908 - Method of inspecting a circuit pattern and inspecting instrument
An apparatus for inspecting a sample using a scanning electron microscope includes a sample stage, a first electron-optical system to scan an electron beam of a first beam current on the sample, a second electron-optical system to scan an electron beam of a second beam current smaller than the first ...

11/02/06 - 20060243907 - Substrate inspection method, manufacturing method of semiconductor device and substrate inspection apparatus
A substrate inspection method includes: generating a primary charged particle beam; applying the generated primary charged particle beam to an inspection target of a substrate; condensing a first secondary charged particle beam including at least one of secondary charged particles, reflected charged particles and back scattering charged particles which have ...

10/26/06 - 20060237646 - Mapping-projection-type electron beam apparatus for inspecting sample by using electrons reflected from the sample
An apparatus capable of detecting defects of a pattern on a sample with high accuracy and reliability and at a high throughput, and a semiconductor manufacturing method using the same are provided. The electron beam apparatus is a mapping-projection-type electron beam apparatus for observing or evaluating a surface of the ...

10/19/06 - 20060231758 - Inspection system, inspection method, and process management method
The present invention relates to an inspection apparatus comprising: an electron emitting unit for sequentially emitting an electron beam in the direction of the inspection area of a sample; a decelerating means for drawing back the electron beam in the vicinity of the inspection area; an imaging unit for forming ...

10/12/06 - 20060226362 - Scanning electron microscope
A scanning electron microscope for digitally processing an image signal to secure the largest focal depth and the best resolution in accordance with the magnification for observation is disclosed. The angle of aperture of an optical system having a plurality of convergence lenses is changed by changing the convergence lenses ...

10/12/06 - 20060226361 - Analyzing system and charged particle beam device
The present invention relates to an analyzing system with improved detection scheme and a charged particle beam device comprising the same. The analyzing system for analyzing a beam of charged particles has a divider to divide the beam of charged particles according to their energies into a low energy beam ...

10/12/06 - 20060226360 - Charged particle beam device for high spatial resolution and multiple perspective imaging
The present invention relates to a charged particle device with improved detection scheme. The device has a charged particle source providing a beam of primary charged particles; a first unit for providing a potential; a second unit for providing a potential; and a center unit positioned between the first unit ...

10/12/06 - 20060226359 - Method and apparatus for quantitative three-dimensional reconstruction in scanning electron microscopy
A method and an apparatus are for three-dimensional tomographic image generation in a scanning electron microscope system. At least two longitudinal marks are provided on the top surface of the sample which include an angle therebetween. In consecutive image recordings, the positions of these marks are determined and are used ...

10/05/06 - 20060219909 - Detecting apparatus and device manufacturing method
A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wherein the sensor is ...

10/05/06 - 20060219908 - Charged particle beam equipment
Charged particle beam equipment has a processing unit for calibrating dimension values of an enlarged specimen image, and means for changing the amount by which a charged particle beam is scanned. Also, a specimen stand has a mechanism for holding a specimen having a periodical structure or a specimen simultaneously ...

10/05/06 - 20060219907 - Charged particle beam apparatus, method of displaying sample image, and method of measuring image shift sensitivity
A sample image display method and an image shift sensitivity measuring method to be executed in a charged particle beam apparatus are provided for accurately correcting an image drift in any observing and analyzing condition such as an accelerating voltage, a working distance or a raster rotation. When obtaining a ...

10/05/06 - 20060219906 - Technique for cd measurement on the basis of area fraction determination
The present invention provides a technique for estimating critical dimensions of highly scaled circuit features on the basis of scanning electron microscopy, wherein area fractions of a scan area are determined. Preferably, the SEM is operated with high electron beam energies to enhance the overall resolution and to reduce edge ...

10/05/06 - 20060219905 - Method and device enabling capacitive probe-based data storage readout
A method and apparatus for reading data bits stored on a storage medium is provided. The apparatus comprises a data probe structure including a data probe and at least one switch attached to the data probe, a controllable voltage source configured to supply voltage to the data probe structure, and ...

09/14/06 - 20060202119 - Semiconductor device tester
A system and method is disclosed for obtaining information regarding one or more contact and/or via holes on a semiconductor wafer. In one embodiment, the method obtains information regarding one or more holes (for example, via or contact) that are disposed in a semiconductor wafer or disposed in a layer ...

09/07/06 - 20060197017 - Information acquisition apparatus, cross section evaluating apparatus, cross section evaluating method, and cross section working apparatus
The invention provides a cross section evaluating apparatus capable of analyzing the cross sectional structure in a state where the temperature of the specimen is regulated. There is disclosed an information acquisition apparatus comprising a stage for placing the specimen, temperature regulation means for regulating the temperature of the specimen, ...

08/31/06 - 20060192120 - Charged-particle-beam mapping projection-optical systems and methods for adjusting same
Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation ...

08/31/06 - 20060192119 - Method of measurement accuracy improvement by control of pattern shrinkage
A scanning method for a scanning electron microscope is provided which minimizes a degradation in dimension measuring accuracy caused by a shrink of a specimen. A time between the first and the second scan over the same location on the specimen is shortened by changing the scanning order of scan ...

08/31/06 - 20060192118 - Sample height regulating method, sample observing method, sample processing method and charged particle beam apparatus
Calculation means calculates a sample height for focusing an ion beam and an electron beam onto a same observation point, based on magnifications of a secondary electron image obtained by an irradiation with the ion beam and a secondary electron image obtained by an irradiation with the electron beam, and ...

08/31/06 - 20060192117 - Inspection method and apparatus using an electron beam
An inspection method and apparatus irradiates a sample on which a pattern is formed with an electron beam, so that an inspection image and a reference image can be generated on the basis of a secondary electron or a reflected electron emitted by the sample. An abnormal pattern is determined ...

08/31/06 - 20060192116 - Charged particle beam device probe operation
An apparatus including a positioner control device, a measuring device and a control routine. The positioner control device is communicatively coupled to a chamber of a charged particle beam device (CPBD) and is configured to individually manipulate each of a plurality of probes within the CPBD chamber to establish contact ...

08/24/06 - 20060186337 - Scanning electron microscope
A scanning electron microscope includes an irradiation optical system for irradiating an electron beam to a sample; a sample holder for supporting the sample, arranged inside a sample chamber; at least one electric field supply electrode arranged around the sample holder; and an ion current detection electrode. ...

08/10/06 - 20060175548 - Charged particle beam apparatus
A charged particle beam apparatus having an aberration correction capability at high acceleration voltages. The charged particle beam apparatus comprises a charged particle beam source; an extraction electrode to extract charged particles from the charged particle beam source; a charged particle beam gun including a means for converging a charged ...

08/03/06 - 20060169900 - Testing apparatus using charged particles and device manufacturing method using the testing apparatus
A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of ...

08/03/06 - 20060169899 - Detector optics for multiple electron beam test system
A detector optics system for collecting secondary electrons (SEs) and/or backscattered electrons (BSEs) in a multiple charged particle beam test system is disclosed. Aspects of the detector optics system include: the ability to image and/or electrically test a number of locations simultaneously across the full width of a large substrate ...

08/03/06 - 20060169898 - Aberration measuring apparatus for charged particle beam optical system, charged particle beam lithography machine having the aberration measuring apparatus, and device fabrication method using the apparatus
In order to measure an aberration of a charged particle beam optical system, an aberration measuring machine includes a charged particle generating unit adapted to make a plurality of charged particle beams strike the object plane of the charged particle beam optical system at different incident angles, and a detecting ...

08/03/06 - 20060169897 - Microscope system for testing semiconductors
A system that includes an imaging device for effectively positioning a probe for testing a semiconductor wafer. ...

08/03/06 - 20060169896 - Pattern specification method and pattern specification apparatus
A pattern specification method for specifying a drawn microscopic pattern, comprising the step of creating a first pattern in which process shift information is reflected on a pattern expressed by design data, the step of enlarging the drawn pattern, the step of performing pattern matching between the first pattern which ...

08/03/06 - 20060169895 - Method and apparatus for automatically correcting charged-particle beam and method of controlling aberration corrector for charged-particle beam
There is disclosed a method and apparatus for automatically correcting a charged-particle beam with an aberration corrector without the operator performing manual operations. The apparatus has an extraction portion for extracting the profile of the beam from images of a surface of a sample, a calculation unit for calculating the ...

08/03/06 - 20060169894 - Method of forming images in a scanning electron microscope
An imaging device having many detector elements is used to construct multiple images of the surface of a specimen in a scanning electron microscope (SEM) using signals from different elements of the imaging device as the specimen is scanned a single time in the SEM. ...

07/27/06 - 20060163480 - Inspection method and apparatus using charged particle beam
A scanning electron microscope or inspection system includes a sample stage on which a sample such as a wafer is loaded, an electro optical unit to scan an electron beam to the sample, and a charge control electrode to which voltage for controlling a charged state of the sample is ...

07/27/06 - 20060163479 - Energy spectrum measuring apparatus, electron energy loss spectrometer, electron microscope provided therewith, and electron energy loss spectrum measuring method
An electron beam detector detects a peak of a spectrum, and when a peak position is deviated from a reference position on the electron beam detector, a controller for controlling an electron beam position on the electron beam detector is used to correct a deviation. An electron energy loss spectrum ...

07/27/06 - 20060163478 - Detector system for a scanning electron microscope and a scanning electron microscope incorporating said detector system
With a detector system for the specimen chamber of a scanning electron microscope, signals are simultaneously detected in transmission which signals correspond to a light field contrast and a dark field contrast. The detector system (14) includes four detectors (15 to 18) in a plane (25) between which an aperture ...

07/27/06 - 20060163477 - Method and apparatus for inspecting patterns
When the electrode potential of a charge control electrode above a wafer is reduced, image brightness is reduced. A point of change in the image brightness is a switching point between a positively charged state of the image and a negatively charged state of the image, showing the weakly charged ...

07/27/06 - 20060163476 - Method of detecting array of liquid crystal display and apparatus thereof
A detection apparatus for detecting a defect in an array of a liquid crystal display, comprises a main chamber, a stage, a detection device and a main heater. The stage is disposed in the main chamber, and the array is placed on stage. The detection device is disposed in the ...

07/27/06 - 20060163475 - Tft array inspecting apparatus
A TFT array inspecting apparatus inspects a TFT array disposed at either an inclined position and a level position. The TFT array inspecting apparatus includes a vacuum chamber, a stage disposed in the vacuum chamber so that a TFT array to be inspected is disposed on the stage, an electron ...

07/20/06 - 20060157649 - Method for non-destructive trench depth measurement using electron beam source and x-ray detection
A method (and system) for non-destructive measurement of a depth of a feature in a structure, includes using a scanning electron microscope (SEM) image to navigate to find the feature in an X-ray image, using an electron beam to produce a fluorescent emission in the feature, and using an X-ray ...

07/13/06 - 20060151701 - Scanning transmission electron microscope and scanning transmission electron microscopy
A scanning transmission electron microscope which enhances correction accuracy of a de-scanning coil for canceling a transmitted-electron-beam position change on an electron detector. Here, this transmitted-electron-beam position change appears in accompaniment with a primary-electron-beam position change on a specimen caused by a scanning coil. First, control over the scanning coil ...

07/13/06 - 20060151700 - Scanning electron microscope and method for detecting an image using the same
In the present invention, in order to realize both a reduction of an image detecting time and high quality image detection in a scanning electron microscope for measurement, inspection, defect review, or the like of semiconductor wafers, a low-magnification image is taken by using a large beam current; a high-magnification ...

07/13/06 - 20060151699 - Method and an apparatus of an inspection system using an electron beam
Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such ...

07/13/06 - 20060151698 - Charged particle beam apparatus
A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the ...

07/13/06 - 20060151697 - Charged particle beam equipment and charged particle microscopy
On the basis of a displacement of the field of view before and after a deflection of a charged particle beam, extracted from a first specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by a predetermined amount by a ...

07/13/06 - 20060151696 - Electron microscope and a method of imaging objects
An electron microscope and a method of imaging objects. The method including the steps of: generating at least one electron pulse, each electron pulse including a plurality of electrons with the electrons having a kinetic energy spread; demagnifying each electron pulse using one or more lenses, each lens having a ...

07/13/06 - 20060151695 - Process and device for measuring ions
The invention relates to a method and a device for the measurement of ions by coupling different measurement methods/techniques, a first detector being a collector (17) and a second detector being an SEM (18), and the ions to be measured or resulting secondary particles being selectively delivered to the collector ...

07/06/06 - 20060145076 - High-accuracy pattern shape evaluating method and apparatus
A quantity (or dispersion value) of a distribution of edge position due to random noise is expected to be reduced statistically to 1/N when N edge position data items are averaged. Using this property, the single page image is averaged in a vertical direction with various values of parameter S, ...

07/06/06 - 20060145075 - Method and apparatus for evaluating thin films
A method for evaluating thin films comprises the steps of inputting measurement conditions, generating electron beams from an electron source to condense the electron beams to a specimen by a condenser lens, enlarging the electron beams transmitted by the specimen with imaging lenses to image an enlarged image of the ...

06/29/06 - 20060138325 - X-ray detecting devices and apparatus for analyzing a sample using the same
X-ray detecting devices and apparatus for analyzing a sample using the same are disclosed. A disclosed X-ray detecting device has an X-ray detector to detect X-rays emitted from a sample. The X-ray detector includes a collimator to collimate the X-rays, an electron trap to remove electrons included in the collimated ...

06/29/06 - 20060138324 - Scanning electron microscope
The invention provides a liquid injection system (12) for an environmental scanning electron microscope. The liquid injection system comprises a liquid firing device (18) for firing a liquid and a heat transfer system (17, 22, 24). The heat transfer system functions to maintain the liquid below its boiling point at ...

06/15/06 - 20060124850 - Scanning interference electron microscope
The conventional detection technique has the following problems in detecting interference fringes: (1) Setting and adjustment are complex and difficult to conduct; (2) A phase image and an amplitude image cannot be displayed simultaneously; and (3) Detection efficiency of electron beams is low. The invention provides a scanning interference electron ...

06/08/06 - 20060118719 - Electron beam inspection system and inspection method and method of manufacturing devices using the system
An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary ...

06/01/06 - 20060113474 - Scanning electron microscope
A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam ...

06/01/06 - 20060113473 - Method and apparatus for measuring the physical properties of micro region
A method and apparatus for measuring the physical properties of a micro region measures the two-dimensional distribution of stress/strain in real time at high resolution and sensitivity and with a high level of measuring position matching. A sample is scanned and irradiated with a finely focused electron beam (23, 26), ...

06/01/06 - 20060113472 - Scanning probe microscope and scanning method
In order to provide a scanning probe microscope and a scanning method which are capable of accurately approaching or contacting a probe needle and a sample surface irrespective of an irregularities shape of the sample surface, it comprises a probe needle 2 for relatively performing, with respect to a sample ...

06/01/06 - 20060113471 - Contact opening metrology
A method for process monitoring includes receiving a sample having a first layer that is at least partially conductive and a second layer formed over the first layer, following production of contact openings in the second layer by an etch process, the contact openings including a plurality of test openings ...

06/01/06 - 20060113470 - High resolution atom probe
A three dimensional atom probe comprising a sharp specimen (10) coupled to a mounting means (12) where emission of charged particles is caused by application of a potential to the specimen tip (10) such that charged particles are influenced by filtering electrodes (206, 204) before impingement on a detection screen ...

06/01/06 - 20060113469 - Scanning probe microscope and sample observing method using this and semiconductor device production method
A scanning probe microscope capable of measuring accurate 3-D shape information of a sample with high through-put without damaging a sample. In a method for acquiring an accurate 3-D shape of a sample without imparting damage to the sample by bringing a probe into contact at only a measurement point, ...

05/25/06 - 20060108527 - Scanning electron microscope
In a scanning electron microscope, slimming is reduced by reducing a frame count. As the frame count is reduced, the amount of detected secondary electrons decreases, so that a probe current amount is increased to emit an increased amount of detected secondary electrons. A primary electron beam is scanned on ...

05/25/06 - 20060108526 - Apparatus for measuring a three-dimensional shape
Conventionally, there is no method for quantitatively evaluating the three-dimensional shape of an etched pattern in a non-destructive manner and it takes much time and costs to determine etching conditions. With the conventional length measuring method only, it has been impossible to detect an abnormality in the three-dimensional shape and ...

05/25/06 - 20060108525 - Scanning electron microscope and system for inspecting semiconductor device
A scanning electron microscope has an electron source for illuminating a primary electron beam on a specimen wafer, an accelerating electrode, a condenser lens, a deflector, an objective lens, a detector for acquiring a digital image by sampling a signal of emissive electrons generated from the specimen wafer, a digitizing ...

05/25/06 - 20060108524 - dimension measuring sem system, method of evaluating shape of circuit pattern and a system for carrying out the method
The present invention relates to a dimension measuring SEM system and a circuit pattern evaluating system capable of achieving accurate, minute OPC evaluation, the importance of which increase with the progressive miniaturization of design pattern of a circuit pattern for a semiconductor device, and a circuit pattern evaluating method. Design ...

05/18/06 - 20060102840 - Scanning electron microscope
In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the present invention has a function of calculating the accuracy of correction after correction of coordinates and displaying it with vectors 39, a function of ...

05/18/06 - 20060102839 - Apparatus and methods for analyzing defects on a sample
Disclosed are methods and apparatus for facilitating procedures implemented on an analysis tool (e.g., review or metrology tool) are provided herein. In one embodiment, an apparatus for analyzing defects includes an analysis tool arranged for imaging a defect and generating a high resolution image and at least one display device ...

05/11/06 - 20060097166 - Charged particle beam apparatus and sample manufacturing method
It is possible to carry out a highly accurate thin film machining by irradiation of an ion beam to a sample and a high-resolution STEM observation of the sample by irradiating an electron beam with a high throughput almost without moving the sample. The FIB irradiation system has an irradiation ...

05/11/06 - 20060097165 - Electron beam apparatus and method for manufacturing semiconductor device
A sample chamber and a column are connected to each other and comprise a magnetic substance. An exhaust section controls a pressure in the sample chamber and the column. A stage controller controls a stage, above which a sample is placed, in the sample chamber. An electron beam source power ...

05/11/06 - 20060097164 - Method for locally highly resolved, mass-spectroscopic characterisation of surfaces using scanning probe technology
The invention relates to a combined method in which a high-resolution image of a sample surface is recorded by means of scanning force microscopy and the locally high-resolution, chemical nature (which is correlated with this) of the sample surface is measured by means of mass spectroscopy. The surface is chemically ...

05/04/06 - 20060091309 - Scanning electron microscope, method for measuring a dimension of a pattern using the same, and apparatus for correcting difference between scanning electron microscopes
As measurement accuracy required for the scanning electron microscope (SEM) for measuring a pattern width becomes stringent, a technique of reducing the difference in a measured dimension between the SEM's is desired. However, the conventional technique of evaluating the difference in a measured dimension between the SEM's cannot separate the ...

04/13/06 - 20060076491 - Mask inspection apparatus, mask inspection method, and electron beam exposure system
A mask inspection apparatus includes: an electron gun for generating an electron beam; an exposure mask for shaping the electron beam into a predetermined cross-sectional shape; means for scanning the electron beam shaped by the exposure mask; means for selecting and transmitting part of the shaped electron beam, which selecting ...

04/13/06 - 20060076490 - Inspection method and inspection apparatus using electron beam
An inspection method and an inspection apparatus using an electron beam enabling more detailed and quantitative evaluation at a high throughput level. The method comprises the steps of irradiating, based on previously prepared information concerning a defect position on the surface of a sample, the defect and its vicinity with ...

04/13/06 - 20060076489 - Charged particle beam apparatus
A charged particle beam apparatus in which an electrostatic lens is used as a main focusing element to obtain a subminiature high-sensitivity high-resolution SEM, a drift tube for an electron beam is located inside a column between an electron source and a sample, and a detector for secondary electrons is ...

04/06/06 - 20060071167 - Scanning electron microscope
To make it possible to observe the bottom of a contact hole and internal wires, in observation of the contact hole 102, by scanning it at a predetermined acceleration voltage, the positive charge 106 is formed on the surface of the insulator 101, and the secondary electrons 104 are attracted ...

04/06/06 - 20060071166 - Charged particle beam apparatus and dimension measuring method
There is provided a charged particle beam apparatus which allows implementation of a high-reliability and high-accuracy dimension measurement even if height differences exist on the surface of a sample. The charged particle beam apparatus includes the following configuration components: An acquisition unit for acquiring a plurality of SEM images whose ...

03/23/06 - 20060060783 - Scanning particle beam instrument
A scanning particle beam instrument is provided, the instrument including a scanner, a radiation detector and a DC amplifier, the DC amplifier being operable to amplify a signal generated by the radiation detector to produce a video signal, the instrument further including a controller operable to so direct the beam ...

03/23/06 - 20060060782 - Scanning electron microscope
In a scanning electron microscope, an emitted primary electron beam is diverted by an angle of at least about 45 degrees prior to incidence with a specimen. The beam may be bent by a magnetic separator. The separator may also serve to deflect secondary electron and back scattered electrons. As ...

03/23/06 - 20060060781 - Charged-particle beam apparatus and method for automatically correcting astigmatism and for height detection
Charged-particle beam arrangements (e.g., apparatus and methods) for automatically correcting astigmatism and for height detection. ...

03/23/06 - 20060060780 - Apparatus and method for e-beam dark field imaging
One embodiment disclosed relates to a scanning electron beam apparatus including an objective lens, scan deflectors, de-scan deflectors, an energy-filter drift tube, and a segmented detector. The objective lens may be an immersion lens configured with a high extraction field so as to preserve azimuthal angle discrimination of the electrons ...

03/16/06 - 20060054819 - Electron beam apparatus and device manufacturing method using same
An electron beam apparatus is provided for reliably measuring a potential contrast and the like at a high throughput in a simple structure. The electron beam apparatus for irradiating a sample, such as a wafer, formed with a pattern with an electron beam to evaluate the sample comprises an electron-optical ...

03/16/06 - 20060054818 - Scanning apparatus and scanning methods for inspecting a surface of a semiconductor wafer
Scanning apparatus and scanning methods are disclosed for inspecting a surface of a semiconductor wafer. A disclosed example scanning apparatus includes a wafer stage to hold a wafer, a plurality of beam irradiators to respectively irradiate beams toward a plurality of inspection points on the surface of the wafer, a ...

03/16/06 - 20060054817 - Dual detector optics for simultaneous collection of secondary and backscattered electrons
A detector optics system for an electron probe system is disclosed. Aspects of the detector optics system include: the ability to simultaneously detect two electron populations, secondary electrons (SEs) and backscattered electrons (BSEs), wherein both populations are emitted from a substrate due to the impact of the electron probe. The ...

03/16/06 - 20060054816 - System and method for voltage contrast analysis of a wafer
System and a method for electrically testing a semiconductor wafer, the method including: (a) scanning a charged particle beam along at least one scan line while maintaining an electrode located at a vicinity of the wafer at a first voltage that differs from a voltage level of a first scanned ...

03/16/06 - 20060054815 - Method for charging substrate to a potential
A surface of an insulating substrate is charged to a target potential. In one embodiment, the surface is flooded with a higher-energy electron beam such that the electron yield is greater than one. Subsequently, the surface is flooded with a lower-energy electron beam such that the electron yield is less ...

03/16/06 - 20060054814 - Scanning electron microscope having multiple detectors and a method for multiple detector based imaging
A system and method for multi detector detection of electrons, the method includes the steps of directing a primary electron beam, through a column, to interact with an inspected object, directing, by introducing a substantial electrostatic field, electrons reflected or scattered from the inspected objects towards multiple interior detectors, whereas ...

03/09/06 - 20060049349 - Methods and systems for process monitoring using x-ray emission
Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions. Concept as expressed herein. ...

03/02/06 - 20060043294 - Scanning electron microscope
In a scanning electron microscope having the function of observing an attentional object on a specimen, an error in an in-focus position can be corrected at high speeds. When moving the field of view to an object to be observed on a specimen on which an electron beam is scanned, ...

03/02/06 - 20060043293 - Charged particle beam adjustment method and apparatus
A charged particle beam adjustment apparatus for tilting an electron beam by a tilt deflector is disclosed. The tilt angle adjustment of the electron beam and the distortion adjustment for correcting the image distortion generated when the electron beam is tilted are conducted on a specified sample such as a ...

03/02/06 - 20060043292 - Method and apparatus for inspecting semiconductor device
A method and apparatus for inspecting a wafer during a semiconductor device fabrication process. The apparatus performs, only via observation from the wafer's top surface, inspection and quantitative evaluation of a portion that is in the shadow of an incident electron beam and a buried structure in the wafer. To ...

03/02/06 - 20060043291 - Electron spectroscopic metrology system
The present invention discloses a new electron spectroscopic metrology system using an electron beam to measure the periodic feature on a substrate. The present invention provides a measurement system for the geometry parameters of the periodic feature which is only a few repeating small elements in the measurement area. The ...

02/23/06 - 20060038126 - System and method for sample charge control
A system and method for characterizing and charging a sample. The system includes a vacuum chamber, a first apparatus in the vacuum chamber and configured to characterize a sample, and a second apparatus in the vacuum chamber and configured to charge the sample. The second apparatus includes an electron gun ...

02/23/06 - 20060038125 - Electric charged particle beam microscopy, electric charged particle beam microscope, critical dimension measurement and critical dimension measurement system
Magnification errors are reduced in the required range of magnification in electric charged particle beam application apparatuses and critical dimension measurement instruments. To achieve this, a first images whose magnification for the specimen is actually measured, is recorded, a second image, whose magnification for the specimen is unknowns is recorded, ...

02/09/06 - 20060027748 - Secondary electron detector unit for a scanning electron microscope
The secondary electron detector unit for a scanning electron microscope is mounted in a head body (1). In the lower part of the head body (1), a lower throttling aperture (2) is placed. Above the lower throttling aperture (2), the microporous plate (3) is sealed in the head body (1) ...

02/02/06 - 20060022138 - Electron beam apparatus, and inspection instrument and inspection process thereof
A beam source of an inspection apparatus discharges a beam, and a stage system holds a specimen and moves in at least one direction. A primary optical system directs the beam to the specimen, and a secondary optical system guides a secondary beam coming from the specimen. A sensor outputs ...

02/02/06 - 20060022137 - Electron microscope
An electron microscope capable of producing EELS (electron energy-loss spectroscopy) has a spectral position correcting signal supply circuit for supplying a spectral position correcting signal H to a first driver amplifier to project spectra at the center of a CCD camera This correcting signal H corresponds to a beam deflection ...

01/26/06 - 20060016991 - Electron beam apparatus with aberration corrector
An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, ...

01/26/06 - 20060016990 - Charged particle beam apparatus
A charged particle beam apparatus obtains an image by detecting a generation signal inclusively indicative of secondary electrons generated from a specimen. The apparatus has an input unit for inputting current and voltage values to be applied to a charged particle optical system through which the charged particle beam travels, ...

01/26/06 - 20060016989 - Electron beam apparatus and a device manufacturing method using the same apparatus
Disclosed is an electron beam apparatus, in which a plurality of electron beams is formed from electrons emitted from an electron gun 21 and used to irradiate a sample surface via an objective lens 28, said apparatus comprising: a beam separator 27 for separating a secondary electron beams emanating from ...

01/26/06 - 20060016988 - Beam directing system and method for use in a charged particle beam column
A method and system are presented for directing a charged particle beam towards and away from a sample. The system comprises a lens arrangement having an electrode formed with a beam opening for a charged particle beam passage therethrough; and a magnetic deflector. The magnetic deflector has a magnetic circuit ...

01/26/06 - 20060016987 - Method and apparatus for rapid sample preparation in a focused ion beam microscope
A coupon for preparing a TEM sample holder comprises a sheet of material that includes a TEM sample holder form. There is at least one section of the sheet connecting the TEM sample holder form to other portions of the sheet. A TEM sample holder is formed by cutting the ...

01/19/06 - 20060011836 - Element mapping unit, scanning transmission electron microscope, and element mapping method
There is provided an element mapping unit, scanning transmission electron microscope, and element mapping method that enable to acquire an element mapping image very easily. On the scanning transmission electron microscope, the electron beam transmitted through an object to be analyzed enters into the element mapping unit. The electron beam ...

01/19/06 - 20060011835 - Electron microscope and electron beam inspection system
An electron microscope includes an illuminating lens system that illuminates an electron beam that is emitted from an electron source onto a specimen as a planar illuminating electron beam having a two-dimensional spread, an imaging lens system that projects and magnifies the reflecting electron beam emitted from the specimen to ...

01/19/06 - 20060011834 - Low vacuum scanning electron microscope
High resolution observation is achieved at a low acceleration voltage of 5 kV or below under a high pressure condition of a sample chamber. A sample chamber has a double structure and an inner sample chamber for keeping low vacuum is arranged inside an outer sample chamber having high vacuum. ...

01/19/06 - 20060011833 - Projection imaging type electron microscope
It is an object of the present invention to provide an projection imaging type electron microscope in which the imposition of restrictions on the design of the illumination electron optical system by the conditions of the projection electron optical system is alleviated, so that the degree of freedom in the ...

01/19/06 - 20060011832 - Optical zoom system for a light scanning electron microscope
For a confocal scanning electron microscope (1) an optical zoom system (41) with linear scanning is provided, which not only makes a zoom function possible, in that a variable magnification of an image is possible, but rather which additionally produces a pupil image in the illuminating beam path (IB) [BS] ...

01/12/06 - 20060006330 - Sample observing apparatus and sample observing method
There is provided a sample observing apparatus for observing the surface of a sample by irradiating an electron beam thereto, having an electron gun for irradiating the electron beam to the surface of the sample, a potential control section for adjusting electric potential of the surface of the sample to ...

01/12/06 - 20060006329 - Charged particle guide
A charged particle guide adapted to be coupled with a charged particle detector, such as a secondary electron detector. The charged particle guide, in one example, comprising two wires extending from the charged particle detector toward a source of charged particles, such as secondary electrons emitted from an IC upon ...

01/12/06 - 20060006328 - Characterizing resist line shrinkage due to cd-sem inspection
A CD-SEM (critical dimension-scanning electron microscope) system may utilize a technique for characterizing and reducing shrinkage carryover due to CD-SEM measurements. The system may identify the affects of CD-SEM measurements on the resist and adjust the operating parameters for a particular resist to avoid or significantly reduce shrinkage carryover. In ...

12/29/05 - 20050285036 - Charged particle beam emitting device and method for adjusting the optical axis
A charged-particle beam emitting device which includes the following configuration devices so that a lowering in the image resolution will be suppressed even if a primary beam is tilted relative to a sample: A device for causing orbit of the primary beam to pass through off-axes of a plurality of ...

12/29/05 - 20050285035 - Scanning electron microscope and cd measurement calibration standard specimen
A calibration standard specimen is provided to have formed therein calibrating patterns of a lattice shape discontinuously arrayed, and particular alignment patterns respectively disposed near the calibrating patterns so that the positioning of the specimen can be made to match the calibrating patterns to the measurement points. ...

12/29/05 - 20050285034 - Method and apparatus for measuring three-dimensional shape of specimen by using sem
The present invention relates to a method and apparatus for measuring a three-dimensional profile using a SEM, capable of accurately measuring the three-dimensional profile of even a flat surface or a nearly vertical surface based on the inclination angle dependence of the amount of secondary electron image signal detected by ...

12/22/05 - 20050279937 - Scanning electron microscope and similar apparatus
To provide a scanning electron microscope that can detect with high efficiency the secondary electrons generated from the entire surface of a target, in a scanning electron microscope with an objective lens having a retarding electric field near a sample, at least two detectors are arranged with axial symmetry to ...

12/22/05 - 20050279936 - Methods of scanning an object that includes multiple regions of interest using an array of scanning