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Methods

Methods patent applications listed include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.

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Radiant Energy


Inspection Of Solids Or Liquids By Charged Particles > Methods



Enhanced defect detection in electron beam inspection and review
04/02/15 - 20150090877 - One embodiment relates to an electron beam apparatus for inspection and/or review. An electron source generates a primary electron beam, and an electron-optics system shapes and focuses said primary electron beam onto a sample held by a stage. A detection system detects signal-carrying electrons including secondary electrons and back-scattered electrons...

Preparation of cryogenic sample for charged-particle microscopy
04/02/15 - 20150090878 - A corresponding apparatus is also described....

Charged particle multi-beam inspection system and method of operating the same
04/02/15 - 20150090879 - A charged particle multi-beam inspection system comprises a beam generator directing a plurality of primary charged particle beams onto an object to produce an array of beam spots; an array of a first number of detection elements generating detection signals upon incidence of electrons; imaging optics imaging the array of...

Method and device for measuring unoccupied states of solid
03/26/15 - 20150083907 - Intensity of near-ultraviolet light or visible light of 180 to 700 nm emitted from a solid sample, such as an organic semiconductor, irradiated with an electron beam is measured, while kinetic energy (accelerating energy) of the electron beam is changed in a range of 0 to 5 eV so as...

Inspection or observation apparatus and sample inspection or observation method
03/26/15 - 20150083908 - A sample observation method uses a charged particle beam apparatus comprising a charged particle optical column irradiating a charged particle beam, a vacuum chamber, and a sample chamber being capable of storing a sample. The method includes maintaining a pressure of the sample chamber higher than that of the vacuum...

Specimen holder for observing cross section of specimen and method for controlling the same
03/19/15 - 20150076344 - A specimen holder and method for controlling the same, which can mount a specimen to allow observation of the specimen. The specimen holder includes: a body; a specimen mounting part formed at an end of the body; elasticity means located inside the body; and a stand detachably joined with the...

Specimen holder for observing top section of specimen and method for controlling the same
03/19/15 - 20150076345 - A specimen holder and method for controlling the same, which can mount and fasten a specimen to allow observation thereof by joining a body and a stand of the specimen holder together. The specimen holder includes: a body; a specimen mounting part formed at an end of the body for...

System and process for measuring strain in materials at high spatial resolution
03/19/15 - 20150076346 - A process for measuring strain is provided that includes placing a sample of a material into a TEM as a sample. The TEM is energized to create a small electron beam with an incident angle to the sample. Electrical signals are generated that control multiple beam deflection coils and image...

Charged particle beam apparatus
03/19/15 - 20150076347 - Provided is a charged particle beam apparatus or charged particle microscope capable of observing an observation target sample in an air atmosphere or a gas environment without making significant changes to the configuration of a conventional high vacuum charged particle microscope. In a charged particle beam apparatus configured such that...

Method for electron tomography
03/12/15 - 20150069231 - The invention relates to an improved method of electron tomography. Electron tomography is a time consuming process, as a large number of images, typically between 50-100 images, must be acquired to form one tomogram. The invention teaches a method to shorten the time needed to acquire this amount images much...

Hot spot identification, inspection, and review
03/12/15 - 20150069232 - A method for identifying, inspecting, and reviewing all hot spots on a specimen is disclosed by using at least one SORIL e-beam tool. A full die on a semiconductor wafer is scanned by using a first identification recipe to obtain a full die image of that die and then design...

Sparse sampling and reconstruction for electron and scanning probe microscope imaging
03/12/15 - 20150069233 - Systems and methods for conducting electron or scanning probe microscopy are provided herein. In a general embodiment, the systems and methods for conducting electron or scanning probe microscopy with an undersampled data set include: driving an electron beam or probe to scan across a sample and visit a subset of...

Semiconductor circuit
03/05/15 - 20150060661 - An inspection device includes first and second electro-optical systems, a first detector, and a shape calculation unit. The first electro-optical system irradiates an object to be inspected with a first electron beam to cause an irradiation mark to be placed on the object to be inspected. The second electro-optical system...

Apparatus of plural charged particle beams with multi-axis magnetic lens
03/05/15 - 20150060662 - An apparatus of plural charged particle beams with multi-axis magnetic lens is provided to perform multi-functions of observing a specimen surface, such as high-throughput inspection and high-resolution review of interested features thereof and charge-up control for enhancing image contrast and image resolution. In the apparatus, two or more sub-columns are...

Electron source and x-ray fluorescence analyser using an electron source
03/05/15 - 20150060663 - An electron source of an X-ray fluorescence analyser includes a photon source (201) and a photoelectric converter (203, 204) for converting photons into electrons. An electron multiplier (203, 204) multiplies the electrons, and a focusing element (206, 207) focuses them to a beam. A gastight casing (209) encloses the photoelectric...

Cross-section processing-and-observation method and cross-section processing-and-observation apparatus
03/05/15 - 20150060664 - A cross-section processing-and-observation method includes: a cross-section exposure step of irradiating a sample with a focused ion beam to expose a cross-section of the sample; a cross-sectional image acquisition step of irradiating the cross-section with an electron beam to acquire a cross-sectional image of the cross-section; and a step of...

System and method for controlling charge-up in an electron beam apparatus
03/05/15 - 20150060665 - The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from...

Specimen observation method and device using secondary emission electron and mirror electron detection
03/05/15 - 20150060666 - A technique capable of improving the ability to observe a specimen using an electron beam in an energy region which has not been conventionally given attention is provided. This specimen observation method comprises: irradiating the specimen with an electron beam; detecting electrons to be observed which have been generated and...

Charged particle beam apparatus and method of correcting landing angle of charged particle beam
02/26/15 - 20150053855 - A scanning electron microscope (SEM) is configured so that SEM images are acquired while scanning a pyramid pattern on a sample plane from four directions. Landing angle of the electron beam is calculated from these SEM images, which are then averaged, whereby inclination angle of the electron beam that is...

Protein layers and their use in electron microscopy
02/26/15 - 20150053856 - Protein layers (1) repeating regularly in two dimensions comprise protein protomers (2) which each comprise at least two monomers (5), (6) genetically fused together. The monomers (5), (6) are monomers of respective oligomer assemblies (3), (4) into which the monomers are assembled to assembly of the protein layer. The first...

Scanning ion microscope and secondary particle control method
02/19/15 - 20150048247 - The present invention is provided to enable a detailed inspection of a specimen and preventing a distortion of an observation image even when a specimen containing an insulating material is partially charged. For a scanning ion microscope utilizing a gas field ionization ion source, a thin film is disposed between...

Method for processing and/or for observing an object, and particle beam device for carrying out the method
02/19/15 - 20150048248 - A method is provided for processing and/or observing an object using at least one particle beam that is scanned over the object. A scan region on the object is determined, the scan region having scan lines, and the particle beam is moved in a first scanning direction along one of...

Processing apparatus and method using a scanning electron microscope
02/12/15 - 20150041643 - The present invention provides a processing apparatus using a scanning electron microscope, which includes the scanning electron microscope having an electron optical system radiating and scanning a focused electron beam on a sample placed on a stage to image the sample, and an image processing/control section which controls the scanning...

Electronic microscope, setting method of observation condition of electronic microscope, and observation method using electronic microscope
02/12/15 - 20150041644 - An automatic setting method of an observation condition to facilitate analysis of an image and a sample observation method by automatic setting in an observation method of a structure of a sample by the electronic microscope and an electronic microscope having an automatic setting function are provided. The method includes...

Image acquisition apparatus, image acquisition method and defect inspection apparatus
02/12/15 - 20150041645 - According to one embodiment, an image acquisition apparatus includes an electron beam source configured to generate an electron beam to be radiated onto an object to be measured, an image detecting unit configured to detect an electronic image of the object based on the electron beam radiated from the electron...

Inspection system and inspection image data generation method
02/12/15 - 20150041646 - An inspection system includes a TDI sensor that integrates amounts of secondary charged particles or electromagnetic waves along a predetermined direction at every timing at which a transfer clock is inputted and sequentially transfers the amounts of secondary charged particles or electromagnetic waves so integrated, and a deflector which deflects,...

Method of using an environmental transmission electron microscope
02/12/15 - 20150041647 - An environmental transmission electron microscope (ETEM) suffers from gas-induced resolution deterioration. Inventors conclude that the deterioration is due to ionization of gas in the sample chamber of the ETEM, and propose to use an electric field in the sample chamber to remove the ionized gas, thereby diminishing the gas-induced resolution...

Pattern critical dimension measurement equipment and method for measuring pattern critical dimension
02/12/15 - 20150041648 - Pattern critical dimension measurement equipment includes an electron source configured to generate a primary electron beam, a deflector configured to deflect the primary electron beam emitted from the electron source, a focusing lens configured to focus the primary electron beam deflected by the deflector, a decelerator configured to decelerate the...

Position sensitive stem detector
02/05/15 - 20150034822 - A STEM system is disclosed wherein an imaging system is used to image the electron scatter pattern plane of the HAADF detector onto a two-dimensional array detector. A data acquisition system stores and processes the data from the two-dimensional array detector. For each illumination pixel of the STEM, one frame...

Cargo inspection system
02/05/15 - 20150034823 - The present invention is a cargo inspection system, employing a radiation source, capable of scanning vehicles and/or cargo in a wide range of sizes, including conventional imaging areas as well as taller and bulkier enclosures at sufficiently optimal efficacy and overall throughput. In one embodiment, the present invention is a...

Inspection of a lithographic mask that is protected by a pellicle
01/29/15 - 20150028203 - A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass...

Inspection apparatus and inspection method
01/29/15 - 20150028204 - In accordance with an embodiment, an inspection apparatus includes first and second charged particle beam application units to apply charged particle beams to a sample, a detector, an image acquiring unit, and a judgment unit. The sample includes a stack structure in which electrically conductive films and insulating films are...

Automated slice milling for viewing a feature
01/22/15 - 20150021475 - A method and apparatus for performing a slice and view technique with a dual beam system. The feature of interest in an image of a sample is located by machine vision, and the area to be milled and imaged in a subsequent slice and view iteration is determined through analysis...

Method of electron beam transport in an x-ray scanner
01/15/15 - 20150014526 - The present invention provides a multi-view X-ray inspection system. In one embodiment, a beam steering mechanism directs the electron beam from an X-ray source to multiple production targets which generate X-rays for scanning which are subsequently detected by a plurality of detectors to produce multiple image slices (views). The system...

Scanning charged particle microscope, image acquisition method, and electron detection method
01/15/15 - 20150014527 - A scanning charged particle microscope is offered which can selectively detect and image electrons. The scanning charged particle microscope (100) has: a source (1) of a charged particle beam (E1); an objective lens (6) for bringing the charged particle beam (E1) emitted from the source (1) into focus at a...

Method of operating a particle beam microscope and a particle beam microscope
01/15/15 - 20150014528 - A method of operating a particle beam microscope includes: directing a particle beam onto a sample and detecting particles emanating from the sample during a first period for generating an image of the sample; generating electrons having a first distribution of kinetic energies and directing these electrons onto the sample...

Transmission electron diffraction measurement apparatus and method for measuring transmission electron diffraction pattern
01/08/15 - 20150008321 - Provided is a transmission electron diffraction measurement apparatus including an electron gun; a first optical system under the electron gun; a sample chamber under the first optical system; a second optical system under the sample chamber; an observation chamber under the second optical system; a region that emits light by...

Scanning electron microscope
01/08/15 - 20150008322 - An object of the invention is to provide a scanning electron microscope which forms an electric field to lift up, highly efficiently, electrons discharged from a hole bottom or the like even if a sample surface is an electrically conductive material. To achieve the above object, according to the invention,...

Charged particle beam device and inclined observation image display method
01/01/15 - 20150001393 - A control device (50) for a charged particle beam device (100) tilts the irradiation axis of a primary electron beam (4) to the left, straight, or to the right via tilting coils (11, 12) each time the primary electron beam (4) scans the surface of a sample (15) over a...

Detection method for use in charged-particle microscopy
12/25/14 - 20140374593 - A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising...

High performance computing for three dimensional proton computed tomography (hpc-pct)
12/18/14 - 20140367569 - A proton computed tomography (pCT) detector system, including two tracking detectors in sequence on a first side of an object to be imaged, two tracking detectors in sequence on an opposite side of the object to be imaged, a calorimeter, and a computer cluster, wherein the tracking detectors include plastic...

Substrate inspection method and a substrate processing method
12/18/14 - 20140367570 - There is provided a substrate inspection method. The method includes: maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; positioning the substrate on a stage in the inspection chamber; selecting an evaluation parameter according to a kind of said processing apparatus; and determining inspection regions...

Method for imaging a sample in a charged particle apparatus
12/11/14 - 20140361165 - The invention shows how, by biasing the stage with respect to the grounded electrodes closest to the sample, these disadvantages are eliminated, or at least reduced....

Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope
12/11/14 - 20140361166 - An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least...

Transmission electron microscope sample fabrication
12/04/14 - 20140353497 - A method of preparing a transmission electron microscopy (TEM) sample from a semiconductor structure may include milling a region of the semiconductor structure with a focused ion beam and generating the transmission electron microscopy (TEM) sample. The focused ion beam providing the milling may include a rotation angle relative to...

System and method of sem overlay metrology
12/04/14 - 20140353498 - The present disclosure is directed to a method of performing SEM overlay metrology with scan direction substantially aligned with or parallel to feature placement or patterning of overlay target structures. By scanning target structures in the same or similar direction to the feature placement, blurring at the edges of interest...

Sample holder for electron microscope
12/04/14 - 20140353499 - A sample holder for an electron microscope has multiple sample stands, can allow at least one sample stand to move, and enables multiple samples for a transmission electron microscope to be prepared by a focused ion beam apparatus. A holder tip opening is provided in a tip of the sample...

Drawing apparatus, and method of manufacturing article
11/27/14 - 20140346349 - The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, the apparatus comprising an optical system configured to irradiate the substrate with the charged particle beam, a substrate stage configured to hold the substrate, an aperture member provided with the substrate stage,...

Multi-column electron beam inspection that uses custom printing methods
11/27/14 - 20140346350 - A method of testing for photomask print errors includes dividing a photomask print into sub-regions and inspecting each sub-region with a different (e.g., electron) beam column, each sub-region aligned with a beam column axis during a calibration process. The different sub-regions may be inspected on different photomask prints on a...

Orientation imaging using wide angle convergent beam diffraction in transmission electron microscopy
11/27/14 - 20140346351 - Methods of orientation imaging microscopy (OIM) techniques generally performed using transition electron microscopy (TEM) for nanomaterials using dynamical theory is presented. Methods disclosed may use a wide angle convergent beam electron diffraction for performing OIM by generating a diffraction pattern having at least three diffraction discs that may provide additional...

Sample supporting member for observing scanning electron microscopic image and method for observing scanning electron microscopic image
11/27/14 - 20140346352 - When injection of electrons into a sample supporting member causes a potential gradient between an insulative thin film and a conductive thin film at a site of electron beam injection, the potential barrier of the surface of the insulative thin film becomes thin, and an electron emission phenomenon is caused...

Charged particle vortex wave generation
11/27/14 - 20140346353 - A device for imparting an orbital angular momentum to a charged particle wave propagating along a beam axis in a charged particle beam generating apparatus is described. The device comprises a support element having a target region adapted for transmitting a charged particle wave propagating along a beam axis and...

Generation of charged particle vortex waves
11/27/14 - 20140346354 - A device is arranged for imparting an orbital angular momentum to a charged particle wave propagating along an axis in a charged particle beam generating apparatus. The device includes a first conductive element comprising a plurality of angularly spaced electrical conductors arranged around the axis, and a second conductive element....

Electron microscope
11/27/14 - 20140346355 - An electron microscope is provided. In another aspect, an electron microscope employs a radio frequency which acts upon electrons used to assist in imaging a specimen. Furthermore, another aspect provides an electron beam microscope with a time resolution of less than 1 picosecond with more than 105 electrons in a...

Scanning electron beam device and dimension measurement method using same
11/20/14 - 20140339425 - A scanning electron beam device having: a deflector (5) for deflecting an electron beam (17) emitted from an electron source (1); an objective lens (7) for causing the electron beam to converge; a retarding electrode; a stage (9) for placing a wafer (16); and a controller (15); wherein the stage...

Electron beam interference device and electron beam interferometry
11/13/14 - 20140332684 - There is a limit in range and distance in which an electron beam can interfere and electron interference is implemented within a range of a coherence length. Therefore, interference images are consecutively recorded for each interference region width from an interference image of a reference wave and an observation region...

Detecting high atomic number materials with cosmic ray muon tomography
11/13/14 - 20140332685 - A method is proposed herein to detect high atomic number materials, such as Special Nuclear Materials, within a container based on muon tomography. The container is modeled as a plurality of volume elements. Information related to an initial trajectory and a final trajectory of each muon passing through the container...

Method of using a phase plate in a transmission electron microscope
11/06/14 - 20140326876 - The invention relates to a method of using a phase plate, having a thin film, in a transmission electron microscope (TEM), comprising: introducing the phase plate in the TEM; preparing the phase plate by irradiating the film with a focused electron beam; introducing a sample in the TEM; and forming...

Source for selectively providing positively or negatively charged particles for a focusing column
11/06/14 - 20140326877 - A single column charged particle source with user selectable configurations operates in ion-mode for FIB operations or electron mode for SEM operations. Equipped with an x-ray detector, energy dispersive x-ray spectroscopy analysis is possible. A user can selectively configure the source to prepare a sample in the ion-mode or FIB...

Phase shift method for a tem
11/06/14 - 20140326878 - A method of electron microcopy passes an electron beam through a phase plate, specifically a Zernike type phase plate, comprising a central hole, and a thin film causing a phase shift of the electrons passing through said film. This phase shift causes the Contrast Transfer Function (CTF) to change from...

Nanopore fabrication and applications thereof
10/30/14 - 20140319339 - In one aspect, methods of nanopore formation in solid state membranes are described herein, In some embodiments, a method of forming an aperture comprises providing at least one solid state membrane in a chamber, selecting a first dose of ions sufficient to provide a first aperture of predetermined diameter through...

Method and apparatus for detecting buried defects
10/30/14 - 20140319340 - One embodiment relates to a method of detecting a buried defect in a target microscopic metal feature. An imaging apparatus is configured to impinge charged particles with a landing energy such that the charged particles, on average, reach a depth within the target microscopic metal feature. In addition, the imaging...

Charged particle microscope apparatus and image acquisition method of charged particle microscope apparatus
10/30/14 - 20140319341 - A charged particle microscope apparatus includes a radiation optical system that radiates a focused charged particle beam to an upper side of a sample provided with a pattern and scans the sample; a detection optical system that detects charged particles generated from the sample to which the charged particle beam...

Method and system for adaptively scanning a sample during electron beam inspection
10/30/14 - 20140319342 - A system for adaptive electron beam scanning may include an inspection sub-system configured to scan an electron beam across the surface of a sample. The inspection sub-system may include an electron beam source, a sample stage, a set of electron-optic elements, a detector assembly and a controller communicatively coupled to...

Circuit tracing using a focused ion beam
10/30/14 - 20140319343 - Methods and systems for tracing circuitry on integrated circuits using focused ion beam based imaging techniques. A first component or node on an integrated circuit is coupled to a second component or node on the same integrated circuit. After an external bias is applied to the first component or node,...

Multiple image metrology
10/30/14 - 20140319344 - Metrology is performed using multiple registered images derived from one or more charged particle beams. Measurements combine features from one image that may not be visible in a second image to determine relationships that cannot be determined from a single image. In one embodiment, measurements use features from different element...

Pattern inspection method and pattern inspection apparatus
10/23/14 - 20140312224 - A first differential image of a defect observation region including an observation target pattern is generated by a differential value between signals from electron detectors arranged in a direction of edges of the observation target pattern. A three-dimensional shape of a defect is obtained by subjecting the first differential image...

Defect inspection apparatus and defect inspection method
10/23/14 - 20140312225 - There is provided a defect inspection apparatus including: an electron scanning unit configured to scan a surface of a sample with an electron beam; a plurality of detectors arranged around an optical axis of the electron beam and configured to detect electrons emitted from the surface of the sample by...

Charged-particle microscope providing depth-resolved imagery
10/23/14 - 20140312226 - A method of examining a sample using a charged-particle microscope, comprising mounting the sample on a sample holder; using a particle-optical column to direct at least one beam of particulate radiation onto a surface S of the sample, thereby producing an interaction that causes emitted radiation to emanate from the...

Method of collecting and processing electron diffraction data
10/16/14 - 20140306108 - A method of using electron diffraction to obtain PDFs from crystalline, nanocrystalline, and amorphous inorganic, organic, and organometallic compound....

Method for detecting defect of substrate
10/16/14 - 20140306109 - A method for detecting defects includes irradiating at least one electron beam into a first region of a substrate, irradiating at least one electron beam into a second region electrically connected to the first region, and detecting secondary electrons emitted from the second region. The electron beam irradiated into the...