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Radiant Energy > Inspection Of Solids Or Liquids By Charged Particles

Inspection Of Solids Or Liquids By Charged Particles

Inspection Of Solids Or Liquids By Charged Particles patent applications listed include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.

01/30/14 - 20140027632 - System and method for measuring angular luminescence in a charged particle microscope
Cathodoluminescence performed in the scanning electron microscope brings the advantage of localized excitation of individual microscopic structures. When luminescent structures are characterized, the intensity, wavelength, polarization and angular emission of the luminescence are all of interest. The invention provides an apparatus for determining the angular distribution of the radiated light,...

01/02/14 - 20140001355 - Charged particle beam device and image display method
According to the present invention, in a charged particle beam device having a charged particle source, an objective lens for focusing a primary-charged particle beam emitted from the charged particle source, a scan deflector for scanning the primary-charged particle beam on a sample, and a detector for detecting signal particles...

10/17/13 - 20130270435 - Electron beam device
The electron beam device includes a source of electrons and an objective deflector. The electron beam device obtains an image on the basis of signals of secondary electrons, etc. which are emitted from a material by an electron beam being projected. The electron beam device further includes a bias chromatic...

09/12/13 - 20130234019 - Global alignment using multiple alignment pattern candidates
In order to provide a technique for performing global alignment (detecting position shift and rotation of a wafer) stably and automatically using an optical microscope, as a pattern for global alignment, multiple alignment pattern candidates are calculated (107), multiple data for matching are created for each alignment pattern (108), matching...

06/13/13 - 20130146763 - Image processing device, charged particle beam device, charged particle beam device adjustment sample, and manufacturing method thereof
An object of the present invention is to provide an image processing apparatus that quickly and precisely measures or evaluates a distortion in a field of view and a charged particle beam apparatus. To attain the object, an image processing apparatus or the like is proposed which acquires a first...

04/11/13 - 20130087702 - Assembly for providing an aligned stack of two or more modules and a lithography system or a microscopy system comprising such an assembly
The invention relates to an assembly, preferably for use in a lithography system or a microscopy system, for providing an accurately aligned stack of two or more modules in a stacking direction. Each of the two or more modules comprises three support members. The assembly comprises a frame comprising three...

04/11/13 - 20130087703 - Electron microscope
In an electron microscope having a magnetic field immersion type cold-FE electron gun, the electron gun and the electron microscope are provided with high observation efficiency and the focal distance of the electron gun does not change during use. The degree of vacuum in the electron gun is improved with...

03/28/13 - 20130075604 - Particle beam system having a hollow light guide
A system includes a particle optical system and a photosensitive detector. The particle optical system includes a charged particle beam source and an objective lens. The charged particle beam source is configured to generate a charged particle beam that travels along a particle beam path, and the objective lens is...

12/20/12 - 20120318975 - High-voltage supply unit for a particle beam device
A high-voltage supply unit is provided for a particle beam device. The high-voltage supply unit includes at least one high-voltage cable for feeding a high voltage, and at least one measuring device for measuring the high voltage. The measuring device has at least one first capacitor, and the first capacitor...

12/13/12 - 20120312985 - Systems for detecting charged particles in object inspection
Techniques, apparatus and systems for detecting particles such as muons. In one implementation, a monitoring system has a cosmic ray-produced charged particle tracker with a plurality of drift cells. The drift cells, which can be for example aluminum drift tubes, can be arranged at least above and below a volume...

10/18/12 - 20120261572 - Inspection system
An inspection system has at least one radiation source and at least one L-shaped radiation detector for radioscopy of an article to be inspected. The radiation detector has a horizontal detector surface and a vertical detector surface and the radiation source is spaced apart from both detector surfaces. The inspection...

08/30/12 - 20120217391 - Charged particle microscope
The charged particle beam microscope is configured of: a gas field ionization ion source (1); a focusing lens (5) which accelerates and focuses ions that have been discharged from the ion source; a movable first aperture (6) which limits the ion beam that has passed through the focusing lens; a...

04/05/12 - 20120080594 - Particle beam device and method for analyzing and/or treating an object
A particle beam device and a method for analyzing and/or treating an object is disclosed. According to the described system, the position of a crossover on an optical axis of a particle beam device can be freely adjusted, even in the case of a fixed extractor potential and a fixed...

03/29/12 - 20120074314 - Structure and method for determining a defect in integrated circuit manufacturing process
The present invention discloses a structure and a method for determining a defect in integrated circuit manufacturing process. Test keys are designed for the structure to be the interlaced arrays of grounded and floating conductive cylinders, and the microscopic image can be predicted to be an interlaced pattern of bright...

02/16/12 - 20120037801 - Pattern measuring apparatus and computer program
Provided are a pattern measuring apparatus and a computer program which determine whether a gap formed in a sample (201) is a core gap (211) or a spacer gap (212). The secondary electron profile of the sample (201) is acquired, the feature quantities of the secondary electron profile at the...

11/10/11 - 20110272576 - Charged particle beam applied apparatus
Provided is a multi-beam type charged particle beam applied apparatus in an implementable configuration, capable of achieving both high detection accuracy of secondary charged particles and high speed of processing characteristically different specimens. An aperture array (111) includes plural aperture patterns. A deflector (109) for selecting an aperture pattern through...

07/14/11 - 20110168887 - Charged particle filter
A charged particle filter comprises a magnetic deflector and an outer shield. The magnetic deflector has a bore along an axis thereof passing through the deflector from a specimen end to a detector end of the deflector and through which charged particles pass when in use. The deflector is formed...

06/02/11 - 20110127426 - Multiple pass cargo inspection system
The present invention is a cargo inspection system, employing a radiation source, capable of scanning vehicles and/or cargo in a wide range of sizes, including conventional imaging areas as well as taller and bulkier enclosures at sufficiently optimal efficacy and overall throughput. In one embodiment, the present invention is a...

03/24/11 - 20110068265 - Electrode unit and charged particle beam device
A high-resolution sample image is acquired by eliminating both of charge over an entire sample (global charge) and charge in a local region irradiated with a primary charged particle beam (local charge). An electrode unit (50) according to the present invention is used in a charged particle beam device. The...

03/03/11 - 20110049361 - Particle beam apparatus having an aperture unit and method for setting a beam current in a particle beam apparatus
A particle beam apparatus includes a first aperture unit having an adjustable aperture opening. The particle beam apparatus may include a first condenser lens having a first pole shoe and a second pole shoe. Both the first pole shoe and the second pole shoe may be adjustable relative to a...

03/03/11 - 20110049362 - Pattern measuring apparatus and pattern measuring method
A pattern measuring apparatus includes: an electron irradiating unit for radiating an electron beam onto a sample while scanning; an image data acquiring unit for acquiring an image of a pattern on the basis of an amount of electrons generated from the sample where the pattern is formed, by the...

01/27/11 - 20110017909 - Electron imaging apparatus with image processing
An image processing method to improve the spatial resolution in magnetic projection electron lenses by deconvolution of the point spread function....

09/02/10 - 20100219339 - Focused ion beam apparatus
The crystal structure of the emitter can be accurately grasped from a FIM image without being influenced by disturbances, such as contamination, and even if the rearrangement of atoms has been performed, whether or not the crystal structure of the emitter has returned to the original state can also be...

08/05/10 - 20100193685 - Miniature neutron generator for active nuclear materials detection
This miniature neutron generator is for active detection of highly enriched uranium using a movable detection system. It is a small size, lightweight, low power consumption neutron generator with ease of operation and maintenance. The detector is based on a simplified ion source and ion transport system....

07/22/10 - 20100181476 - Spectrometer for surface analysis and method therefor
A spectrometer (10) for sample surface analysis by irradiation of the surface by primary particles and a corresponding method of surface analysis spectroscopy. The spectrometer (10) provides sample viewing and secondary charged particle collection substantially normal to the sample surface. A collection chamber (22) comprises a secondary charged particle lens...

07/01/10 - 20100163726 - Device for determining aim position of charged particle beam, method of using the device, and treatment device employing device for determining aim position
The device for determining an aim position of a charged particle beam includes a range adjuster 14 that adjusts an irradiation position, in a depth direction of the eye, of a charged particle beam irradiated from a charged particle beam source, a mirror 18 that transmits or passes the position...

05/27/10 - 20100127169 - Compact, interleaved radiation sources
Compact, dual energy radiation scanning systems are described comprising two particle beam accelerators, each configured to accelerate charged particles to different energies, positioned parallel to a direction of movement of an object to be inspected. The accelerator may be positioned perpendicular to a plane of the conveying system, instead. Bend...

03/04/10 - 20100051802 - Single-channel optical processing system for energetic-beam microscopes
A single-channel optical processing system for an energetic-beam instrument has separate sources for processing radiation and illumination radiation. The processing radiation and the illumination radiation are combined in a single optical path and directed to a sample surface inside the energetic-beam instrument through a self-focusing rod lens. The self-focusing rod...

03/04/10 - 20100051803 - Particle beam system
A particle beam system is offered which can prevent contamination of the inside of the objective lens, the objective lens being located at the front end of the optical column. The particle beam system has an optical column equipped with a particle beam source for emitting a particle beam and...

02/25/10 - 20100044564 - Spin polarized ion beam generation apparatus and scattering spectroscopy apparatus using the spin polarized ion beam and specimen processing apparatus
A spin polarized ion beam generation apparatus (30) can efficiently generate a spin polarized ion by using a pumping light generator (33) to an ion in a high frequency discharge tube (15) to irradiate optical pumping (33,34) by circularly polarized light and linearly polarized light orthogonal to each other to...

12/17/09 - 20090309021 - Ion detection method and apparatus with scanning electron beam
the particle beam is an electron beam....

11/26/09 - 20090289185 - Ultra high precision measurement tool
A focused ion beam device is described comprising a gas field ion source with an analyzer for analyzing and classifying the structure of a specimen, a controller for controlling and/or modifying the structure of the specimen according to the analysis of the analyzer, an emitter tip, the emitter tip has...

10/15/09 - 20090256074 - Apparatus and method for inspection
Method and apparatus capable of observing a liquid sample. An optical image of the sample and an image using a primary beam, such as an electron beam or charged-particle beam, can be obtained at the same time. The apparatus has a film including a first surface on which the liquid...

10/08/09 - 20090250609 - Inspection method and reagent solution
An electron microscope method for inspecting a liquid specimen and a reagent solution therefor. A culture medium and biological cells are put in the sample holder. A plugging agent is mixed into the liquid sample. The cells can be irradiated with a primary beam via a film. An image of...

10/01/09 - 20090242757 - Charged particle beam apparatus and method adjusting axis of aperture
A charged particle beam apparatus 1 includes a charged particle source 9, an aperture 18, an object lens 12, observing means 32, an aperture driving portion 19, and a control portion 30. The control portion 30 includes spot pattern forming means 33 for forming a plurality of spot patterns on...

08/13/09 - 20090200462 - Scanning probe microscope capable of measuring samples having overhang structure
A scanning probe microscope tilts the scanning direction of a z-scanner by a precise amount and with high repeatability using a movable assembly that rotates the scanning direction of the z-scanner with respect to the sample plane. The movable assembly is moved along a curved guide and has grooves that...

07/23/09 - 20090184242 - Optical detection system for micromechanical cantilevers, especially in scanning probe microscopes
The optical detection system typically used in micromechanical cantilever-based instruments, e.g. scanning probe microscopes, chemical or biological sensing probes like “artificial noses”, or molecular force probe instruments, can hardly cope when measuring samples immersed in a fluid, i.e. a gas, gel, or liquid having another refractive index than the environment....

06/18/09 - 20090152459 - System and method for processing an object
A system and a method for processing and inspecting an object are provided, wherein the system comprises a particle beam column, an object holder and a gas supply apparatus. Thereby, the object holder is formed comprising a base, a first table displaceable relative to the base, a second table displaceable...

06/18/09 - 20090152460 - System for processing an object
A processing system comprises a gas supply apparatus with which process gas is supplied to an object. An activation beam activates the gas thereby inducing a chemical reaction between material at the surface of the object and the process gas causing ablation of material from the surface or deposition of...

05/28/09 - 20090134326 - Method and apparatus for flow cytometry linked with elemental analysis
An apparatus (100) for sequentially analyzing particles such as single cells or single beads, by spectrometry. The apparatus, an elemental flow cytometer, includes means (102) for sequential particle introduction, means (104) to vaporize, atomize and excite or ionize the particles, or an elemental tag associated with an analyte on the...

02/19/09 - 20090045335 - Inspection method for semiconductor wafer for reviewing defects
An object of the present invention is to provide a suitable method of observing a wafer edge by using an electron microscope. The electron microscope includes a column which can take an image in being tilted, and thus allows a wafer edge to be observed from an oblique direction....

02/05/09 - 20090032703 - High-bandwidth actuator drive for scanning probe microscopy
An actuator subsystem for use in a scanning probe microscope (SPM) system having a probe for measuring a sample comprises and actuator and an actuator driving circuit. The actuator operates in the SPM system to generate relative motion between the probe and the sample while the SPM system collects data...

02/05/09 - 20090032704 - Method of measuring thin layers using sims
A method for measuring the thickness of a layer is provided, comprising (a) providing a structure (101) comprising a first layer disposed on a second layer; (b) impinging (103) the structure with a first ion beam comprising a first isotope, thereby sputtering off a portion of the first layer which...