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Chemistry: Electrical And Wave Energy > Apparatus > Coating, Forming Or Etching By Sputtering > Coating > Specified Power Supply Or Matching Network Specified Power Supply Or Matching NetworkSpecified Power Supply Or Matching Network patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.10/11/07 - 20070235327 - Internal coil with segmented shield and inductively-coupled plasma source and processing system therewith An RF antenna assembly is provided having a segmented, conductive, deposition baffle covering an antenna conductor designed for operation internal to a vacuum processing chamber in presence of metal vapor or ions. The antenna can be placed either above the wafer, or around it. The baffle includes two concentric layers ... 01/11/07 - 20070007128 - Silicon film forming apparatus A silicon film forming apparatus includes a deposition chamber (10), a silicon sputter target (2) arranged in the chamber, a hydrogen gas supply circuit (102 or 102′) supplying a hydrogen gas into the chamber, and a high-frequency power applying device (antenna 1, 1′, power source PW and others) generating inductively ... 07/13/06 - 20060151319 - Plasma processing apparatus and semiconductor device manufactured by the same apparatus A plasma processing apparatus of this invention includes a sealable chamber to be introduced with reactive material gas, a plurality of pairs of cathode-anode bodies arranged in the chamber, for forming a plurality of discharge spaces for performing plasma discharge of the material gas, a power supply for plasma discharge, ... 06/22/06 - 20060131170 - Dual anode ac supply for continuous deposition of a cathode material There is provided by this invention an apparatus for sputter deposition of an insulating material in a continuous mode of operation that utilizes at least two sputtering anodes and a cathode connected to a center tapped conductor to maintain the target cathode at a negative potential with respect to the ... 06/15/06 - 20060124455 - Thin film forming device and thin film forming method A thin film deposition apparatus of the present invention includes a vacuum container for maintaining a vacuum therein, gas introducer for introducing a reactive gas into the vacuum container, and plasma generator for generating a plasma of the reactive gas within the vacuum container. A wall surface within the vacuum ... 01/19/06 - 20060011473 - Discharging power source, sputtering power source, and sputtering device A discharging power supply according to the invention comprises: a direct current power supply unit; a control unit for controlling an output of the direct current power supply unit; and a vibrating current generation unit having a capacitance connected in parallel with a pair of outputs from the direct current ... ### FreshPatents.com Support |