REGISTER now for FREE 
|
FREE patent keyword monitoring and additional FREE benefits. REGISTER now for FREE
|
|
|
Chemistry: Electrical And Wave Energy > Non-distilling Bottoms Treatment > Coating, Forming Or Etching By Sputtering > Ion Beam Sputter Deposition Ion Beam Sputter DepositionIon Beam Sputter Deposition patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.12/06/07 - 20070278091 - Sputtering apparatus, method of operating the same, and method of manufacturing substrate using the same A sputtering apparatus includes a susceptor for receiving a substrate, and a first target device disposed to be opposite to a center region of a substrate and at least second and third target devices disposed to be opposite to peripheral regions of the substrate, wherein the second and third target ... 12/06/07 - 20070278090 - Hard laminated film, method of manufacturing the same and film-forming device Alternatively, Layer A has a specific atomic ratio composition of (Ti1-x-yAlxMy)(BaCbN1-a-b-cOc), and Layer B has one or more specific atomic ratio compositions selected from among the compositions B1-x-yCxNy, Si1-x-yCxNy, C1-xNx, Cu1-y(CxN1-x)y. Alternatively, Layer A has one of the following Compositional Formulae 1 or 2. Formula 1: (Ti1-x-yAlxMy), (BaCbN1-a-b-cOc), Formula 2: ... 07/19/07 - 20070163872 - Heat treatable low-e coated articles and methods of making same by sputtering ag in oxygen inclusive atmosphere A sputter coated article is provided with improved mechanical durability (e.g., pre-HT scratch resistance) and/or thermal stability by sputtering at least one Ag inclusive layer in an atmosphere including at least O2 gas. For instance, in certain example embodiments an Ag inclusive target may be sputtered in an atmosphere including ... 06/28/07 - 20070144890 - Sputtering apparatus A sputtering apparatus comprises a substrate unit that includes a substrate on which a target material is deposited in a chamber and a target unit on which a plurality of target sections formed of the target material are arranged. The sputtering apparatus further comprises a cathode plate that supplies electric ... 11/23/06 - 20060260930 - Multi-layered radiopaque coating on intravascular devices Intravascular devices having a radiopaque layer thereon for visualization are provided. The devices further includes a capping layer on the radiopaque layer to prevent exposure of the radiopaque material to surrounding tissues. A method of coating the device is also provided. The method includes using an unbalanced magnetic field magnetron ... 11/16/06 - 20060254905 - Method for operating a sputter cathode with a target The invention relates to a method for operating a magnetron sputter cathode, in particular a tube cathode or several tube cathodes forming an array. In such cathodes a target passes through a magnetic field, whereby induction currents flow in the target which distort the magnetic field. This results in the ... 11/16/06 - 20060254904 - Ground shield for a pvd chamber Apparatus for processing a substrate in a physical vapor deposition chamber is provided herein. In one embodiment, apparatus for processing a substrate in a physical vapor deposition chamber having a target disposed in a lid assembly and a grounded chamber wall includes a ground frame and a ground shield. The ... 11/16/06 - 20060254903 - Polygonal barrel spattering device, polygonal, barrel spattering method, coated particle formed by the device and method, microcapsule, and method of manufacturing the micro- capsule The present invention relates to a polygonal barrel sputtering device and a polygonal barrel sputtering method for coating surfaces of fine particles with ultra-fine particles having a grain diameter smaller than the particles or thin films, a coated fine particle formed by the device and method, a micro capsule and ... 11/09/06 - 20060249372 - Biased target ion bean deposition (btibd) for the production of combinatorial materials libraries This invention provides gradient deposition methods and systems to form libraries of combinatorial materials. The systems can include a shutter movable between alternate orientations around a substrate for deposition of gradients in different directions. Methods can include deposition of a gradient from targets illuminated by controlling target bias voltage onto ... 10/12/06 - 20060225998 - Direct ion beam deposition method and system Disclosed herein is a direct ion beam deposition method through ion beam sputtering. The method comprises the steps of: a) providing a workpiece on which a certain material is to be deposited with a certain desired thickness; b) providing a deposit material having a certain area from which the deposit ... 09/07/06 - 20060196766 - Plasma deposition apparatus and method The present invention relates to a plasma deposition apparatus and method for forming a thin film on a work piece (41). The deposition apparatus (30) includes a reaction chamber (31), a magnetic device (32,33), a microwave device, two sputtering targets (36), and a substrate holder (40). The reaction chamber includes ... 08/03/06 - 20060169576 - Physical vapor deposition plasma reactor with vhf source power applied through the workpiece A physical vapor deposition plasma reactor includes a vacuum chamber including a sidewall, a ceiling and a wafer support pedestal near a floor of the chamber, and a vacuum pump coupled to the chamber, a process gas inlet coupled to the chamber and a process gas source coupled to the ... 07/06/06 - 20060144694 - Processes for forming electronic devices and electronic devices formed by such processes A process for forming an electronic device includes forming a first layer over a substrate, wherein the first layer includes an organic layer, and depositing a second layer over the substrate after forming the first layer, wherein depositing the second layer is performed using ion beam sputtering. In another embodiment, ... 06/15/06 - 20060124447 - Multilayer composites and manufacture of same The present invention is directed towards a process of depositing multilayer thin films, disk-shaped targets for deposition of multilayer thin films by a pulsed laser or pulsed electron beam deposition process, where the disk-shaped targets include at least two segments with differing compositions, and a multilayer thin film structure having ... 06/15/06 - 20060124446 - Method for the production of a substrate with a magnetron sputter coating and unit for the same According to the invention, the distribution of material amounts deposited on the substrate may be optimized for magnetron sputter coating in which a magnetron magnetic field pattern (9) is cyclically (My) moved along the sputtering surface (7) and a substrate (11) is passed along the sputter surface (7), whereby the ... 01/19/06 - 20060011467 - Method of manufacturing the multi-tip probe, a multi-tip probe, and surface characteristic analysis apparatus In order to establish processing techniques capable of making multi-tip probes with sub-micron intervals and provide such microscopic multi-tip probes, there is provided an outermost surface analysis apparatus for semiconductor devices etc. provided with a function for enabling positioning to be performed in such a manner that there is no ... 01/19/06 - 20060011466 - Method of fabricting indium tin oxide film with well thermal stabilization and low resistivity A method of fabricating an indium tin oxide film (ITO film) with well thermal stabilization and low resistivity has the steps of: a) Provide a silicon dioxide film and a titanium dioxide film on a substrate, wherein the stacked silicon dioxide film and the titanium dioxide form an oxide dielectric ... 10/20/05 - 20050230242 - Large area metallization pretreatment and surface activation system A large area metallization pretreatment and surface activation system that uses an electron beam-produced plasma capable of delivering substantial ion and radical fluxes at low temperatures over large areas of an organic plastic or polymer material. The ion and radical fluxes physically and chemically alter the surface structure of the ... 08/18/05 - 20050178652 - Scratch resistant coated glass article including carbide layer(s) resistant to fluoride-based etchant(s) A scratch resistant coated article is provided which is also resistant to attacks by at least some fluoride-based etchant(s) for at least a period of time. In certain example embodiments, an anti-etch layer(s) is provided on a glass substrate in order to protect the glass substrate from attacks by fluoride-based ... 08/04/05 - 20050167261 - Treatment process for improving the mechanical, catalytic, chemical, and biological activity of surfaces and articles treated therewith A continuous, uninterrupted two-step treatment process capable of forming nanometer scale physical structures on the surface of articles fabricated from metallic, ceramic, glass, or plastic materials, and then depositing a thin conformal coating on the nanostructured surface such that the physical structures previously produced are neither masked nor are the ... ### FreshPatents.com Support |