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Cleaning And Liquid Contact With Solids > Liquid Treating Forms And Mandrels > Including Use Of Vacuum, Suction, Or Inert Atmosphere

Including Use Of Vacuum, Suction, Or Inert Atmosphere

Including Use Of Vacuum, Suction, Or Inert Atmosphere patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.

01/31/08 - 20080023036 - Vacuum cleaner with removable dust collector, and methods of operating the same
A vacuum cleaner includes a dust collector that compresses dust stored inside a dust container to minimize the volume of the dust. The dust collector would include one or more pressing plates that are used to compress the dust stored in dust collector. Various methods are used to control movements ...

01/17/08 - 20080011326 - Method for removing stains from textiles
A stain removing composition having a mixture of N-methyl pyrrolidinone and at least one solvent from the group consisting of 1-methyl-2-butanol, dipropylene glycol monomethyl ether, propylene glycol n-propyl ether, and diethylene glycol monobutyl ether. Preferably, the stain removing composition comprises, in percent by weight about 70-90%, N-methyl pyrrolidinone and about ...

11/22/07 - 20070267044 - Blower system and method of using same
A blower system for use with a cleaning machine includes a flexible elastic stretch-hose assembly. The assembly includes a length of flexible elastic stretch hose that has an elongation stretch ratio of at least about two to one. The length is fluidly connectable to the working-air outlet of a vacuum ...

10/25/07 - 20070246074 - Load lock system for supercritical fluid cleaning
A substrate is transferred from an environment at about vacuum into a load lock through a first door. The substrate is then sealed within the load lock. The pressure within the load lock is raised to a high pressure above vacuum. A second door coupling the load lock to a ...

09/13/07 - 20070209683 - Method for cleaning reactor and method for manufacturing a chip thereof
A method for cleaning a reactor and a method for manufacturing a chip thereof are provided. The reactor at least includes a reaction cavity and an inner tube. The inner tube is disposed inside the reaction cavity. The wall of the inner tube has a foreign particle. In the cleaning ...

09/06/07 - 20070204883 - System for removal of stains
An apparatus for removing stains from a fabric includes a device configured to draw a stain removal liquid through the fabric. The stain removal liquid may be drawn through the liquid through the use of suction directed by a nozzle. The nozzle may be placed over the fabric, which is ...

05/24/07 - 20070113871 - Method and apparatus for waste evacuation
A method and apparatus for waste evacuation using an extendible and retractable hose for transferring the waste have been described. ...

05/17/07 - 20070107752 - Dry type cleaning apparatus and dry type cleaning method
A dry type cleaning technology is disclosed. Dust adhering to a cleaning object is removed with a cleaning medium caused to flow by a high-speed airflow. The removed dust is separated from the cleaning medium with a porous member including holes through which air, dust, and granular material can pass ...

03/29/07 - 20070068556 - Ash and dust removal system
A system for removing dust, dirt and like from the surface of a flexible paper substrate and accurately positioning same comprises a transport assembly for conveying the paper substrate along a path of travel. The transport assembly includes a rotating vacuum drum having an outer surface over which the paper ...

03/22/07 - 20070062562 - Method of cleaning oil strainer
A method for cleaning an oil strainer in an oil pan of an internal combustion engine from which substantially all lubricant has been drained, the method comprising connecting a first conduit to said oil pan; introducing a cleaning fluid into said oil pan; connecting a second conduit to an opening ...

01/04/07 - 20070000519 - Removal of residues for low-k dielectric materials in wafer processing
A method of removing post-etch residue from a patterned low-k dielectric layer is disclosed. The low-k dielectric layer preferably comprises a porous silicon oxide-based material with the post-etch residue thereon. The post-etch residue is a polymer, a polymer contaminated with an inorganic material, an anti-reflective coating and/or a combination thereof. ...

01/04/07 - 20070000518 - Method for removing material from semiconductor wafer and apparatus for performing the same
A pressure is maintained within a volume within which a semiconductor wafer resides at a pressure that is sufficient to maintain a liquid state of a precursor fluid to a non-Newtonian fluid. The precursor fluid is disposed proximate to a material to be removed from the semiconductor wafer while maintaining ...

12/14/06 - 20060278254 - Method and apparatus for treating a substrate with dense fluid and plasma
The present invention is a method, process and apparatus for selective cleaning, drying, and modifying substrate surfaces and depositing thin films thereon using a dense phase gas solvent and admixtures within a first created supercritical fluid anti-solvent. Dense fluids are used in combination with sub-atmospheric, atmospheric and super-atmospheric plasma adjuncts ...

10/12/06 - 20060225771 - Method and apparatus for cleaning percolation basins
A method and apparatus for cleaning accumulated silt from the floor of a percolation basin are provided. An underwater terrain vehicle (UTV) moves along the basin floor and carries a series of blades that cut and lift the accumulated silt. An eductor driven vacuum head also carried by the UTV ...

10/05/06 - 20060219264 - Substrate processing apparatus and substrate processing method
An on-off valve 81 is opened during rinsing, whereby a part of DIW supplied to a processing liquid supply section 43 is guided into inside a suction pipe 82. After rinsing, a puddle is formed between a lower cleaning nozzle 29 and the bottom surface of a wafer. As the ...

08/24/06 - 20060185690 - Automatic cleaning apparatus
An automatic cleaning apparatus has a cleaner body having at least one driving wheel, and in certain disclosed embodiments, a vapor spray means installed in the cleaner body for generating water vapor during operation, and spraying the generated water vapor toward a lower part of the cleaner body. ...

07/20/06 - 20060157082 - Vacuum ring designs for electrical contacting improvement
Recesses (72), surface contours, contact tip modifications (52, 56), and/or other methods of ensuring pressure between a bottom surface (50) of a test plate (5) and top surfaces (52) of electrical contacts (18) are employed to enhance cleaning of the top surfaces (52) of the electrical contacts (18) to promote ...

05/25/06 - 20060107973 - Endpoint detector and particle monitor
A substrate processing system, which includes a vacuum deposition process chamber having an exhaust outlet configured to discharge one or more particles during a deposition cycle and cleaning gas reactants during a cleaning cycle and an in-situ particle monitor coupled to the exhaust outlet. The in-situ particle monitor is configured ...

05/25/06 - 20060107972 - Extraction methods and apparatus
The present invention relates to hydrocarbon extraction method and apparatus therefor. ...

04/13/06 - 20060076039 - Robot cleaner coordinates compensation method and a robot cleaner system using the same
A coordinates compensation method of a robot cleaner using an angle sensor compensates coordinates of the robot cleaner with reference to absolute coordinates of a recharging station, so as to improve robot cleaner's path following. The robot cleaner is in a standby mode at the recharging station, and moves to ...

03/09/06 - 20060048797 - Cleaner and cleaning method using the same
A cleaner and a cleaning method using the same. A cleaner having a plurality of cleaning modes, includes: a reader reading object identification data stored in an object identification medium attached to an object to be cleaned; and a control unit interpreting the object identification data read by the reader ...

03/09/06 - 20060048796 - Method and apparatus for cleaning a turbofan gas turbine engine
Device for cleaning a gas turbine engine (2), and in particular an engine of turbofan type. The present invention further relates to a method for cleaning such a engine. The device comprises a plurality of nozzles (31, 33, 35) arranged to atomize cleaning liquid in the air stream in an ...

12/22/05 - 20050279386 - Glove bag adapted for use on high temperature piping and method of installing inspection port on asbestos insulated pipe
A glovebag apparatus suitable for use in high temperature environments without permitting any environmental contaminants to escape is disclosed. The bag utilizes a vacuum pump to pull ambient temperature cooling air into the system at a volume sufficient to keep the working temperature inside the apparatus at temperatures low enough ...

10/06/05 - 20050217704 - Device and method for cleaning a powder coating booth
The device according to the invention for cleaning a powder coating booth has a mobile frame, which can be moved along the insides of the booth. The frame includes suction nozzles for sucking off powder residues from the insides of the booth. ...

10/06/05 - 20050217703 - Apparatus and method for utilizing a meniscus in substrate processing
An apparatus for processing a substrate is provided which includes a proximity head proximate to a surface of the substrate when in operation. The apparatus also includes an opening on a surface of the proximity head to a cavity defined in the proximity head where the cavity delivers an active ...

09/29/05 - 20050211273 - Method for operating vacuum installations under pressure changes
Method for operating vacuum installations under pressure changes between operating pressure and ambient pressure, which comprise in a vacuum chamber (V) installed elements (13, 13a) from the group electronic components, transformers, motors, roller bearings and guide rollers, provided with ventilatable coverings, the guide rollers (12) being provided with roller bearings ...

09/15/05 - 20050199269 - Cleaning tanks
A cleaning adapter apparatus comprises a swivel support device adapted to be sealed over a wall aperture in the lower portion of the tank wall. A swiveling body defines a cleaning channel therethrough and is sealed in the swivel support device such that the swiveling body can move horizontally with ...

07/07/05 - 20050145265 - Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer
Among the many embodiment, in one embodiment, a method for processing a substrate is disclosed which includes generating a fluid layer on a surface of the substrate, the fluid layer defining a fluid meniscus. The generating includes moving a head in proximity to the surface, applying a fluid from the ...



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