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Cleaning And Liquid Contact With Solids > Liquid Treating Forms And Mandrels > Including Application Of Electrical Radiant Or Wave Energy To Work Including Application Of Electrical Radiant Or Wave Energy To WorkIncluding Application Of Electrical Radiant Or Wave Energy To Work patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.01/24/08 - 20080017219 - Transducer assembly incorporating a transmitter having through holes, and method and system for cleaning a substrate utilizing the same An apparatus, system and method for processing a substrate utilizing sonic energy. In one aspect, the invention utilizes a transmitter having through holes to dampen sonic energy that may damage the substrate. In other aspects, the through holes of the transmitter can be adapted to introduce a liquid solution having ... 01/03/08 - 20080000495 - Apparatus and method for single substrate processing In a method for treating a semiconductor substrate, a single substrate is positioned in a single-substrate process chamber and subjected to wet etching, cleaning and/or drying steps. The single substrate may be exposed to etch or clean chemistry in the single-substrate processing chamber as turbulence is induced in the etch ... 12/13/07 - 20070283979 - Ultrasonic processing method and apparatus with multiple frequency transducers Ultrasonic processing apparatus and methods are disclosed, which includes multiple transducers of at least two different resonant frequencies supplying ultrasonic energy to a liquid filled tank containing components to be cleaned or processed ultrasonically. The transducers are arranged in equilateral triangular patterns along diagonal lines on a wall of the ... 11/08/07 - 20070256704 - Method and apparatus for improved operation of an abatement system In one aspect, an apparatus is provided that includes (1) an interface adapted to analyze information about an electronic device manufacturing system that produces an effluent having an undesirable material, and provide information about the effluent, and (2) an abatement system adapted to receive information about the effluent, receive the ... 11/08/07 - 20070256703 - Method for removing contaminant from surface of glass substrate A method for removing a contaminant from a surface of a glass substrate, which comprises a step of irradiating a portion of the glass substrate surface where the contaminant is present, with at least one type of high energy beams selected from the group consisting of laser beams having a ... 11/01/07 - 20070251543 - Methods to clean a surface, a device manufacturing method, a cleaning assembly, cleaning apparatus, and lithographic apparatus An embodiment of the invention provides a method to clean a surface. The method includes at least partly liberating contaminants from the surface with a contaminant liberating device, and capturing the contaminants that have been at least partly liberated with a contaminant removal device, the contaminant removal device generating at ... 10/18/07 - 20070240736 - Substrate cleaning method, substrate cleaning system and program storage medium The present invention provides a substrate cleaning method capable of removing particles from the entire surface of a substrate to be processed at a high removing efficiency. In the substrate cleaning method according to the present invention, a substrate to be processed W is immersed in a cleaning liquid in ... 10/18/07 - 20070240735 - Aligner and self-cleaning method for aligner When a self-cleaning method for an aligner is carried out, a reflecting plate having a convex lens portion is set in an original plate holder, and exposure light rays are irradiated from a light source. The surface of the lens portion is coated with a reflective film. The light rays ... 10/18/07 - 20070240734 - Method of cleaning post-cmp wafer A post-CMP wafer is loaded into a buffer unit of a cleaning apparatus and is kept moist by adding a chemical. The post-CMP wafer is then loaded into a cleaning unit of the cleaning apparatus for performing the following cleaning process. The chemical added in the buffer unit is used ... 10/18/07 - 20070240733 - Decontamination materials, methods for removing contaminant matter from a porous material, and systems and strippable coatings for decontaminating structures that include porous material Methods of removing contaminant matter from porous materials include applying a polymer material to a contaminated surface, irradiating the contaminated surface to cause redistribution of contaminant matter, and removing at least a portion of the polymer material from the surface. Systems for decontaminating a contaminated structure comprising porous material include ... 10/11/07 - 20070235058 - System and method for removing residue from a wafer processing chamber using sound waves Embodiments of the present technique relate to a system and method of removing residual particles from a wafer processing chamber. Specifically, embodiments of the present technique include performing a cleaning operation on a process chamber of a wafer processing system and utilizing sonic wave emissions to enhance cleansing. The sonic ... 09/20/07 - 20070215172 - Substrate cleaning method, substrate cleaning system and program storage medium The present invention provides a substrate cleaning method capable of removing particles from the entire surface of a substrate to be processed at a high removing efficiency. In the substrate cleaning method according to the present invention, a substrate to be processed W is immersed in a cleaning liquid in ... 09/13/07 - 20070209677 - Self-cleaning catalytic chemical vapor deposition apparatus and cleaning method thereof Provided is a self-cleaning catalytic chemical vapor deposition apparatus which suppresses the corrosion-induced degradation of a catalytic body by a cleaning gas without heating a catalytic body to not less than 2000° C. and permits practical cleaning rates and good cleaning at low cost. With conductors 5a, 5b which supply ... 08/30/07 - 20070199577 - Method and device for removing liquids from the surface of a strip A method for removing liquids from the surface of a strip, characterized in that the liquid is excited in such a way that it oscillates. The invention is based on the recognition that the root of the problem of removing liquids from the surface of a strip lies in the ... 06/28/07 - 20070144556 - Reciprocating megasonic probe A method of cleaning a substrate comprises placing the substrate on a rotating fixture, placing a liquid on at least one side of the substrate, and creating a standing wave of megasonic energy oriented generally parallel to the substrate. The standing wave generates an associated pattern of high-agitation regions in ... 06/28/07 - 20070144554 - Cleaning of electrostatic chucks using ultrasonic agitation and applied electric fields A method of cleaning an ESC comprises immersing a ceramic surface of the ESC in dielectric fluid; spacing the ceramic surface of the ESC apart from a conductive surface such that the dielectric fluid fills a gap between the ceramic surface of the ESC and the conductive surface; and subjecting ... 06/14/07 - 20070131244 - Method and apparatus for removing minute particles from a surface A method and apparatus for removing one or more minute particle(s) from a surface of a sample using laser technology is provided. The laser energy wavelength, the pulse length and shape of the laser energy, the laser energy density, the pulse repetition rate of the laser energy, the laser beam ... 06/14/07 - 20070131243 - Method for cleaning surface of resin layer A method for cleaning a surface of a resin layer capable of sufficiently improving peel strength of a metal film formed by plating on a surface which is roughened by performing a desmear treatment on a resin layer containing a resin added with a large amount of filler is provided. ... 05/24/07 - 20070113866 - Method for cleaning a surface of a photomask A method of cleaning a surface of a photomask includes placing the photomask in a vessel, which is held under an elevated pressure and feeding a supercritical fluid, in particular, CO2 in a supercritical state, to the vessel. As a result, contaminants are efficiently removed from the photomask surface. An ... 05/17/07 - 20070107748 - Vacuum cavitational streaming An enhanced Vacuum Cavitational Streaming (VCS) process focuses on the formation of vapor bubbles and the transfer of a chemical from the solvent to the surface of the object while the chemical is in the vapor state within the bubble, i.e. a chemical mechanism. There is less importance on the ... 05/10/07 - 20070102020 - Ultrasonic cleaning method and device An ultrasonic cleaning device (50) comprises: an ultrasonic oscillation plate (2) having a plurality of ultrasonic oscillators (1); an ultrasonic wave guide chamber (3) for collecting an ultrasonic wave force generated by the ultrasonic oscillation plate; and a cleaning tank (4) in which a cleaning solution (20) is stored, wherein ... 05/03/07 - 20070095362 - Brush and method A method for washing comprising providing an electrical vibrating device having a handle assembly coupled to a detachable head assembly, and dispensing at least one fluid from the head assembly for washing. An electrical vibrating device having a handle assembly coupled to a detachable head assembly. The head assembly includes ... 03/29/07 - 20070068551 - Squirter jet ultrasonic cleaning A method and device for cleaning a hollow article and specifically a turbine blade assembly utilizes a cleaning solution flowed through the turbine blade assembly and a transducer that generates an ultrasonic frequency that is transmitted through the flowing cleaning solution to the internal surfaces of the turbine blade. Ultrasonic ... 03/22/07 - 20070062556 - Device and process for cleaning electrified contact rail insulators for rail rapid transit systems A process for cleaning electrical insulators supporting a contact rail parallel to a rail track comprises moving a vehicle having cleaning stations with cleaning tools (such as water jets) mounted on them, along a rail track adjacent to a parallel contact rail supported by electrical insulators, said cleaning stations being ... 03/22/07 - 20070062555 - Ultrasonic cleaning system and method An ultrasonic cleaning system includes an ultrasonic cleaner and a bubble generator. The bubble generator generates a micro-emulsified liquid containing a plurality of micro-to-nano-sized bubbles. The ultrasonic cleaner communicates with the bubble generator such that the micro-emulsified liquid is able to be outputted into the ultrasonic cleaner for performing an ... 03/15/07 - 20070056604 - Cleansing method of fluid-supply apparutus and cleansing module for the same A cleansing method of fluid-supply apparatus and cleansing module using the same is disclosed. First, a cleansing module is fixed to the fluid-supply apparatus to be cleansed for disposing the nozzles of the fluid-supply apparatus in the cleansing tank of the cleansing module. Second, a liquid used for cleansing is ... 03/01/07 - 20070044816 - High-pressure processing apparatus and high-pressure processing method Infrared light is irradiated whose wavelength corresponds to the absorption band of water contained in a chemical agent of a processing fluid introduced into inside a processing chamber of a pressure container. Only during irradiation with the infrared light, the water content of the processing fluid is selectively heated and ... 02/15/07 - 20070034228 - Method and apparatus for in-line processing and immediately sequential or simultaneous processing of flat and flexible substrates through viscous shear in thin cross section gaps for the manufacture of micro-electronic circuits or displays A method and apparatus for cleaning, drying, coating, baking etching and deposition of surfaces on glass substrate as it transitions thru and between small gaps between hydro-static porous media bearings. Due to the non-contact nature of the device extremely high pressures can be induced upon the work piece through various ... 02/15/07 - 20070034227 - Ultrasonic device for cleaning connectors A method and apparatus for cleaning a connector. The method includes several steps including: positioning a containment structure on an exposed end of a connector, and injecting a cleaning solvent within a chamber defined by the containment structure and the exposed end. Thereafter, the interior of the chamber containing the ... 02/01/07 - 20070023064 - Ultrasonic cleaning method and apparatus An apparatus suitable for ultrasonically cleaning objects is disclosed. The apparatus includes a housing and a cleaning chamber within the housing. The apparatus also includes drainer that can be moved between a cleaning position in a lower region of the apparatus and a draining position in an upper region of ... 01/25/07 - 20070017548 - System and method for cleaning or sanitizing items intended for re-use A system and method for sanitizing an item, such as a grocery store shopping cart or a child stroller, for re-use utilizes a passageway having an entrance and an exit and a source of ozinated water. A pump and an associated piping network are used to direct the water, when ... 01/25/07 - 20070017547 - Method for cleaning disk-shape glass substrate and magnetic disk A method for cleaning a disk-shape glass substrate, which comprises rotating the disk-shape glass substrate on its center with its main surface vertical, and making a cleaning fluid irradiated with ultrasonic waves run down on the outer peripheral edge surface of the rotating glass substrate. ... 01/18/07 - 20070012336 - Photomask cleaning using vacuum ultraviolet (vuv) light cleaning A multi-sub-process cleaning procedure cleans phase shift photomasks and other photomasks and Mo-containing surfaces. In one embodiment, vacuum ultraviolet (VUV) light produced by an Xe2 excimer laser converts oxygen to ozone that is used in a first cleaning operation. The VUV/ozone clean may be followed by a wet SC1 chemical ... 01/18/07 - 20070012335 - Photomask cleaning using vacuum ultraviolet (vuv) light cleaning A multi-step cleaning procedure cleans phase shift photomasks and other photomasks and Mo-containing surfaces. In one embodiment, vacuum ultraviolet (VUV) light produced by an Xe2 excimer laser converts oxygen to ozone that is used in a first cleaning operation. The VUV/ozone clean may be followed by a wet SC1 chemical ... 01/18/07 - 20070012334 - Resonant frequency bottle sanitation A system and method of cleaning an enclosure of a container defined by inner walls, including providing a container, orienting the container so that the opening is lowermost and opens downwardly and generating resonant vibration in the container at a predetermined frequency and at an energy level sufficient to dislodge ... 01/11/07 - 20070006892 - Uniform, far-field megasonic cleaning method and apparatus A method and apparatus for megasonic cleaning of substrates by placing the wafers in the far-field megasonic zone to eliminate sonic-induced damage to highly sensitive small-scale device structures that occurs in the near-field megasonic zone. Folded acoustic beam paths are defined by at least one reflector to achieve sufficient path ... 12/07/06 - 20060272672 - Method of cleaning at least one surface of an optical device disposed in a vacuum chamber A method of cleaning at least one surface of an optical device disposed in a vacuum chamber, which is at least partially contaminated by atoms and/or ions of metalloid and/or metal introduced by a radiation source generating, in particular, extreme ultraviolet radiation and/or 10 soft X-rays is described. In order ... 11/23/06 - 20060260641 - Megasonic cleaning system with buffered cavitation method An acoustic energy cleaning system and method which fosters micro-bubble formation for effective cleaning while buffering micro-bubble growth which would otherwise damage the wafer. In one embodiment, the invention includes combining a first frequency signal and a second frequency signal having a positive amplitude bias component so as to form ... 11/23/06 - 20060260640 - Method of manufacturing external panel of laundry treatment apparatus, and pattern formation apparatus and cleaning apparatus of the external panel The present invention relates to a method of manufacturing an external panel of a laundry treatment apparatus, and a pattern formation apparatus and cleaning apparatus of the external panel. According to an embodiment of the present invention, the method of manufacturing the external panel of the laundry treatment apparatus includes ... 11/23/06 - 20060260639 - Method and system for processing substrates with sonic energy that reduces or eliminates damage to semiconductor devices A system and method for processing and/or cleaning substrates using sonic energy that eliminates or reduces damage to the substrates. In one aspect, the invention utilizes and produces low power density sonic energy to effectively remove particles from a substrate. In another aspect, the invention utilizes and generates a clean ... 11/23/06 - 20060260638 - Method and system for processing substrates with sonic energy that reduces or eliminates damage to semiconductor devices A system and method for processing and/or cleaning substrates using sonic energy that eliminates or reduces damage to the substrates. In one aspect, the invention utilizes and produces low power density sonic energy to effectively remove particles from a substrate. In another aspect, the invention utilizes and generates a clean ... 11/16/06 - 20060254611 - Acid-free cleaning process for substrates, in particular masks and mask blanks The present invention relates to a novel and advantageous process for cleaning substrates, in particular masks and mask blanks. The process according to the invention is characterized by consecutive process steps comprising UV-treatment, fulljet cleaning, megasonic cleaning and DI (deionized) water cleaning. The process does not include an acid cleaning ... 11/09/06 - 20060249175 - High efficiency uv curing system An ultraviolet (UV) cure chamber enables curing a dielectric material disposed on a substrate and in situ cleaning thereof. A tandem process chamber provides two separate and adjacent process regions defined by a body covered with a lid having windows aligned respectively above each process region. One or more UV ... 11/02/06 - 20060243300 - Method for cleaning lithographic apparatus A method is provided for cleaning a photo-mask by placing the photo-mask in an evacuated chamber for a certain period of time. ... 10/26/06 - 20060237029 - Method for treating a body of a polluted porous medium A method for treating a body of a polluted porous medium, includes the steps of: preparing a reactive solution containing nanoparticles; injecting the reactive solution into the body of the polluted porous medium so as to decompose pollutants in the polluted porous medium by reacting the nanoparticles with the pollutants; ... 10/19/06 - 20060231119 - Apparatus and method for cleaning a substrate An apparatus and method for cleaning a wafer are provided. According to various embodiments, deionized water can be activated by forming an electric field in a supply member through which the deionized water is supplied. The activated deionized water preferably contains radicals with excellent reactivity, in addition to ions. The ... 10/19/06 - 20060231118 - Tape cleaning device and tape cleaning method Disclosed is a tape cleaning device and tape cleaning method which can improve tape cleaning efficiency. The tape cleaning device includes a cleaning section structured in such a way so as to hold dipping water in a dipping tank, in which second and third guide rollers are dipped to dip ... 09/21/06 - 20060207629 - Method and apparatus for an in-situ ultraviolet cleaning tool The present invention provides an apparatus and a method for an ultraviolet cleaning tool. The cleaning tool includes ultraviolet source spaced apart from a surface having contaminant particles. The ultraviolet source can create ozone between the surface and the ultraviolet source which breaks the chemical bonds between particles and the ... 09/14/06 - 20060201532 - Semiconductor substrate cleaning system In a first aspect, a method is provided for cleaning a substrate without scrubbing the substrate. Two different megasonic frequencies are applied to the substrate. Preferably two different fluids, each having a different ph, are used to apply the two different megasonic frequencies. Numerous other aspects are provided. ... 09/07/06 - 20060196525 - Method for removing a residue from a chamber A method for removing a residue from a surface is disclosed herein. In one aspect, the method includes: providing a chamber containing the surface coated with the residue; providing in the chamber a cleaning composition of an oxidizing gas and optionally an organic species; and irradiating the cleaning composition with ... 08/17/06 - 20060180173 - System and method for removal of materials from an article The system and method of the present invention removes organic and organometallic materials from an article in reduced pressure atmosphere containing ozone and activated oxygen. A dielectric barrier discharge lamp induces an intermolecular molecule energy transfer to the organic and organometallic material. The dielectric barrier discharge lamp emits vacuum ultraviolet ... 08/17/06 - 20060180172 - Enhanced megasonic based clean using an alternative cleaning chemistry The present invention relates to the use of a C1 to C5 alcohol during the cleaning step. With the use of said alcohol, the surface tension of the solution is reduced which allows the application of reduced megasonic power with increased cleaning efficiency. ... 08/03/06 - 20060169300 - Method of and apparatus for heating liquid used in the manufacturing of semiconductor devices, and method of processing substrates with heated liquid Liquid used in manufacturing a semiconductor device is rapidly heated to a desired temperature at which the liquid is most effective at processing substrates. An apparatus for heating the liquid includes a chemical bath in which the liquid is stored, circulation piping connected to the chemical bath, so that the ... 07/27/06 - 20060162739 - Cleaning chuck in situ Embodiments of the invention provide a method and an apparatus for in situ chuck cleaning, which advantageously reduces downtime to restore flatness. In one embodiment, a method of cleaning a chuck in situ comprises providing a cleaning layer on a substrate, the cleaning layer comprising a deformable material; positioning the ... 07/13/06 - 20060151001 - Wash-target holder, and wash-target holding apparatus, washing apparatus and method for washing wash-target using the same It is to improve the washing efficiency of the wash-target and the cleanness of the washing. There is provided a wash-target holder that is soaked in a wash tank by holding at least one wash-target, which comprises a tray for placing the wash-target, wherein a suction hole is provided at ... 07/13/06 - 20060151000 - Systems and methods for single integrated substrate cleaning and rinsing Inventive methods and systems of cleaning patterned integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: (1) providing the patterned integrated circuit substrate having thereon poly silicon lines adjacent to each other; (2) charging a solution, which contains at least a solute selected to promote ... 06/29/06 - 20060137709 - Film formation apparatus and method of using the same A method of using a film formation apparatus for a semiconductor process includes processing by a cleaning gas a by-product film deposited on an inner surface of a reaction chamber of the film formation apparatus. This step is arranged to supply the cleaning gas into the reaction chamber, and set ... 06/29/06 - 20060137708 - Photocatalytic auto-cleaning process of stains The present invention provides a process for photocatalytically treating stains of chilly and turmeric caused on kitchen tiles and platforms by coating a thin film of photocatalyst made of a semiconductor such as titanium dioxide uniformly dispersed in dilute silica sol thereon and using a light source such as a ... 06/22/06 - 20060130872 - Apparatus and method for performing predetermined processing on substrate with ultrasonic waves A blocking plate 3 is disposed opposing a substrate W which is held by plural chuck pins 17 and a processing liquid is supplied from a processing liquid nozzle 5 to a space SP between the front surface Wf of the substrate and an opposed surface 3a of the blocking ... 06/22/06 - 20060130871 - Megasonic cleaner having double cleaning probe and cleaning method A megasonic cleaner includes a rotatable wafer supporting member for supporting a wafer; a cleaning solution supply member for supplying a cleaning solution to a wafer placed on the wafer supporting member; at least two vibration transfer members for agitating cleaning solutions supplied to different areas of the wafer placed ... 06/22/06 - 20060130870 - Method for sonic cleaning of reactor with reduced acoustic wave cancellation In some embodiments, a method for sonically cleaning a reactor (for example, a fluidized bed reactor useful for the production of polyolefins) using a set of sonic sources, including by varying the operating mode of the set of sources to reduce or prevent cleaning problems that would otherwise result from ... 06/08/06 - 20060118132 - Cleaning with electrically charged aerosols In a method for cleaning a wafer, the wafer is placed a processing chamber. A layer or film of liquid is provided on the wafer. Electrically charged aerosol droplets of a liquid are formed and directed to the workpiece. The charged aerosol particles accumulate on the workpiece. This creates an ... 06/01/06 - 20060112969 - Wet cleaning of electrostatic chucks A non-destructive and simple method for cleaning a new or used electrostatic chuck comprises a wet cleaning process, which removes contaminants deposited on a surface of the electrostatic chuck. ... 05/25/06 - 20060107968 - Apparatus for contactless cleaning of a conveying element and arrangement for transporting and/or storing of rod-shaped articles with an apparatus for contactless cleaning of a conveying element The invention concerns an apparatus for the contactless cleaning of a conveying element which is designed to receive rod-shaped articles in the tobacco-processing industry, including at least one ionising element for removing electrostatic charges on the surfaces of the conveying element to be cleaned, at least one rotating compressed-air nozzle ... 05/18/06 - 20060102195 - Method of cleaning substrate Dirt, particularly of inorganic matter, attached to a substrate, such as a glass substrate for liquid crystal devices, is effectively removed by irradiating the substrate with ultraviolet rays including 184.9 nm and 253.7 nm in an oxygen-containing atmosphere in advance of wet cleaning with pure water. As a result, the ... 05/18/06 - 20060102194 - Method of descaling a mask Provided is a method of descaling a mask that quickly and effectively removes a material attached to the mask. The method includes: directing a laser beam onto a material attached to the mask; and removing the material attached to the mask. ... 05/18/06 - 20060102193 - Ultrasonic cleaning and washing apparatus for fruits and vegetables and a method for the use thereof The invention provides a method and an apparatus for washing and cleaning fruits and vegetables. The apparatus has a degassing means (14); a washing tank (26) which accommodates at least one item for cleaning; an ultrasonic means (28); at least one water pumping means (32); a water jetting means (62) ... 04/27/06 - 20060086371 - Particle remover, exposure apparatus having the same, and device manufacturing method A particle remover includes an irradiation unit for irradiating plural lights onto a target from different directions, and for scanning the lights on the target, and a collector for collecting particles carried as a result of scanning of the lights. ... 03/30/06 - 20060065285 - Rust prevention cleaning process apparatus and method thereof for a continuously variable transmission belt A rust prevention cleaning process apparatus for a Continuously Variable Transmission (CVT) belt comprising an oil tank filled with rust protection cleaning oil suitable for rustproof cleaning of a CVT belt and an ultrasonic excitation module for performing ultrasonic excitation of the rust prevention cleaning oil. Then, rust preventive oil ... 03/30/06 - 20060065284 - Method and device for cleaning welding torches The invention relates to a method for cleaning welding torches (11) and to a device for cleaning welding torches (11), comprising a device for applying cleaning or wetting liquid to the tip of the welding torch (11) and comprising a coil (3) with an opening (4) for inserting the welding ... 03/16/06 - 20060054182 - System and method of powering a sonic energy source and use of the same to process substrates A system and method of supplying power to a sonic energy source that minimizes damage to substrate devices during processing while increasing processing efficiency and/or effectiveness. The system and method utilize the concept of ramping the amplitude and/or varying the frequency of the electrical signal used to drive the sonic ... 03/16/06 - 20060054181 - Cleaning method and solution for cleaning a wafer in a single wafer process The present invention is a method of use of a novel cleaning solution in a single wafer cleaning process. According to the present invention the method involves using a cleaning solution in a single wafer mode and the cleaning solution comprises at least ammonium hydroxide (NH4OH), hydrogen peroxide (H2O2), water ... 03/02/06 - 20060042652 - Wash-target holder and method for washing wash-target using the same An object is to improve the cleanness achieved by washing through effectively suppressing the residual of solvent remained on a wash-target after washing. The present invention is a wash-target holder soaked in a wash tank by holding a wash-target, which comprises a tray for placing the wash-target, a surrounding member, ... 03/02/06 - 20060042651 - Cleaning submicron structures on a semiconductor wafer surface Cleaning solutions and cleaning methods targeted to particular substrates and structures in semiconductor fabrication are described. A method of cleaning fragile structures having a dimension less than 0.15 um with a cleaning solution formed of a solvent having a surface tension less than water while applying acoustic energy to the ... 02/09/06 - 20060027248 - Megasonic cleaning with minimized interference In a first aspect, a first method of cleaning a substrate is provided that includes the steps of (1) forming a layer of cleaning solution on a major surface of a substrate; and (2) cleaning the major surface of the substrate by directing sonic energy substantially parallel to the major ... 01/26/06 - 20060016458 - Reduced pressure irradiation processing method and apparatus A system and method for processing substrates, such as porous low-K semiconductor wafers, using ultraviolet (UV) radiation is disclosed. The substrates are first cleaned in a wet processing module and then dried in a UV module under reduced pressure and at a temperature below 100 C., preferably at or below ... 01/05/06 - 20060000487 - Megasonic cleaning efficiency using auto-tuning of a rf generator at constant maximum efficiency A system and method of cleaning a substrate includes a megasonic chamber that includes a transducer and a substrate. The transducer is being oriented toward the substrate. A variable distance d separates the transducer and the substrate. The system also includes a dynamically adjustable RF generator that has an output ... 12/15/05 - 20050274392 - Cleaning process for photomasks A photomask provided with a light-shielding coating on a surface of a glass substrate is cleaned with O3 gas solved water to eliminate organic substances adhered on a surface of the photomask (S120). Using an alkaline chemical such as alkaline ionized water or hydrogenated water, the photomask is then cleaned ... 12/08/05 - 20050268937 - Scrubber with sonic nozzle An apparatus for cleaning a substrate is provided. The apparatus comprises a plurality of rollers adapted to support a substrate in a vertical orientation, a scrubber brush adapted to contact a substrate supported by the plurality of rollers, and a sonic nozzle positioned at an elevation below the elevation of ... 11/17/05 - 20050252523 - Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in production of low molecular weight organic el device A cleaning solution for a mask used in a vacuum vapor deposition step in the production of a low molecular weight organic EL device is provided, the cleaning solution including one type or two or more types of aprotic polar solvent. There is also provided a cleaning method for a ... 11/17/05 - 20050252522 - Megasonic cleaning with obliquely aligned transducer A method and apparatus for megasonic bath cleaning of wafers employs a megasonic resonator that is directed obliquely toward the front, active surface of the wafer, so that higher acoustic energy levels may be used without causing structural damage to the wafer. In one embodiment four transducers are coupled to ... 11/03/05 - 20050241668 - Microbial biofilm removal methods and systems Methods, kits, and systems for removing microbial biofilms from surfaces of objects (such as, e.g., explanted medical devices) are disclosed. The methods, kits, and systems rely on the use of acoustic energy in the presence of microbubbles to enhance biofilm removal while retaining viability of the microorganisms in the biofilm. ... 11/03/05 - 20050241667 - Ultrasonic cleaning The invention relates to a process of cleaning a substrate, the process comprising a first step of providing a cleaning solution and a hand-held implement, the process further comprising a second step of applying the solution onto the substrate with the implement, characterised in that the implement has an active ... 11/03/05 - 20050241666 - Ultrasonic implement The invention relates to a hand-held having an active part vibrating at a frequency of at least 20 kHz with an amplitude of at least 10 μm and up to 100 μm, characterised in that the implement has at least two configurations, a first configuration where the active part is ... 10/27/05 - 20050236013 - Marine air conditioner decontamination system There is disclosed a marine air conditioning system and a process for cleaning and maintaining the marine air conditioning system. The marine air conditioning system may comprise a marine air conditioner, a bracket and a germicidal lamp. The marine air conditioner may comprise an evaporator coil and a drain pan. ... 10/27/05 - 20050236012 - Apparatus and method for cleaning surfaces A method for cleaning surfaces having the steps of depositing a cleaning fluid onto the surface from a cleaning fluid reservoir on a wet extractor, contacting the surface with a hand-held ultrasonic spot cleaner, applying ultrasonic vibrations to the surface using the hand-held ultrasonic spot cleaner to help release soil ... 10/20/05 - 20050229946 - Substrate treating method and apparatus A substrate treating method for cleaning a substrate by supplying a cleaning solution thereto. The method comprises the steps of supplying the cleaning solution having ozone dissolved therein to the substrate, and irradiating the cleaning solution with ultraviolet light. By irradiating the cleaning solution having ozone dissolved therein with ultraviolet ... 10/13/05 - 20050224092 - Method for treating laser-structured plastic surfaces The present invention relates to a method for treating plastic substrates structured by means of a laser or generation of seed structures on the surface that are suitable for subsequent metallization. The substrates, after the laser structuring, are brought into contact with a process solution that is suitable for removal ... 09/22/05 - 20050205109 - Washing method, method of manufacturing semiconductor device and method of manufacturing active matrix-type display device In an ultrasonic washing method of washing a thing to be washed by supplying ultrasonic-wave-applied cleaning fluid to the thing, the ultrasonic wave is applied to the cleaning fluid in such a manner that the ultrasonic wave is turned on and off repeatedly at specific time intervals. ... 09/22/05 - 20050205108 - Method and system for immersion lithography lens cleaning A method and system for cleaning lens used in an immersion lithography system is disclosed. After positioning a wafer in the immersion lithography system, a light exposing operation is performed on the wafer using an objective lens immersed in a first fluid containing surfactant, wherein the surfactant reduces a likelihood ... 09/15/05 - 20050199261 - Cleaning process which uses ultrasonic waves The present invention generally relates to processes for cleaning, product kits, and devices using ultrasonic waves. ... 09/08/05 - 20050194022 - System for cleaning dental and/or medical appliances and implements utilizing a sonic wave bath A cleaning apparatus and method for cleaning dental and/or medical implements, and in particular to a system for quickly and thoroughly cleaning dental and/or orthodontic retainers, dental/orthodontic aligners, dental appliances, dentures, bridges, and the like. The preferred embodiment of the present invention contemplates a cleaning system utilizing a vibrating sonic ... 08/25/05 - 20050183739 - Transmission of ultrasonic energy into pressurized fluids Ultrasonic probe comprising an elongate body having a first end and a second end, an ultrasonic transducer attached to the probe at or adjacent the first end, and an enlarged support section intermediate the ultrasonic transducer and the second end, wherein the enlarged support section has an equivalent diameter greater ... 07/28/05 - 20050161059 - Megasonic cleaning using supersaturated cleaning solution A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning ... 07/21/05 - 20050155623 - Apparatus and method of cleaning a substrate A cleaning apparatus is provided with a processing bath to be filled with a cleaning chemical, an ultrasonic oscillator, and a retainer for holding a substrate to be immersed into a cleaning chemical. The front surface of the substrate is cleaned while ultrasonic waves are radiated from the ultrasonic oscillator ... 07/21/05 - 20050155622 - Cleaning system and method using ultrasonic vibrations and a fluid stream A preferred embodiment of a system for cleaning a surface a system for cleaning a surface includes a wand comprising a body, a neck mechanically coupled to the body, and a brush mechanically coupled to the neck and comprising a plurality of bristles for contacting the surface. The wand also ... 07/14/05 - 20050150515 - Gas dissolved water producing apparatus and method thereof and ultrasonic cleaning equipment and method thereof A gas dissolved water producing apparatus includes a gas dissolving section, a gas channel for guiding a gas into the dissolving section, a first water channel for guiding water into the dissolving section, a gas dissolved water discharge channel, and a second water channel for guiding the water without passing ... 07/07/05 - 20050145263 - Substrate processing apparatus for processing substrates using dense phase gas and sonic waves Embodiments of the invention are directed to substrate processing apparatuses and methods for processing substrates. In one embodiment, a substrate processing apparatus includes a processing chamber, a substrate holder inside of the processing chamber for holding a substrate, and a sonic box in the processing chamber for supplying sonic waves ... 06/30/05 - 20050139228 - Support system for semiconductor wafers and methods thereof A semiconductor wafer may be secured to a wafer support system by causing a supported surface of the semiconductor wafer to be at a lower gas pressure than an exposed surface of the semiconductor wafer. ... ### FreshPatents.com Support |