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Coating Apparatus > Control Means Responsive To A Randomly Occurring Sensed Condition > Temperature Responsive Temperature ResponsiveTemperature Responsive patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.09/27/07 - 20070221126 - Chemical liquid supply apparatus As shown in FIG. 3, a primary-side valve 13 and a secondary-side valve 14 are assembled in a nozzle assembly 12 on which a nozzle 11 for dispensing a chemical liquid is formed. The primary-side valve 13 is a valve for opening/closing a secondary-side flow path 14b communicating with the ... 04/26/07 - 20070089673 - Coating and developing apparatus, and coating and developing method A processing block S2 includes unit blocks, a BCT layer B3, COT layer B4 and TCT layer B5, for forming coating films, and further includes DEV layers B1, B2 layered with the unit blocks B3, B4, B5 and used as unit blocks for a developing process. Beside the unit blocks ... 03/15/07 - 20070056512 - Rapid cooling system for rtp chamber A rapid cooling system for a rapid thermal processing chamber is disclosed. In one embodiment, the rapid cooling system includes a rapid thermal processing chamber having a wafer support for supporting a wafer. A tank having a supply of cooling liquid is provided in fluid communication with the chamber. A ... 02/15/07 - 20070034151 - Apparatus for applying chemical coatings A fully temperature controlled apparatus comprising a thermoplastic stage assembly having solids processing components and a finishing stage assembly having liquid processing components and liquid applicator components or finishing assembly. ... 11/30/06 - 20060266286 - Droplet discharge device, method of manufacturing liquid crystal display and liquid crystal display A droplet discharge device includes a droplet discharger that moves above and relative to a plurality of discharge-target regions formed on a substrate and discharges a droplet of a liquid substance on the discharge-target region, a liquid substance heater that heats the liquid substance in the droplet discharger, and a ... 08/17/06 - 20060180081 - Semiconductor manufacturing apparatus having air curtain in door entrance Disclosed is a semiconductor manufacturing apparatus having an air curtain located in a door entrance thereof. The air curtain is generated by an air curtain generator located in the door entrance of the apparatus. The air curtain typically flows into a discharge pipe located in the door entrance opposite the ... 03/23/06 - 20060060136 - Semiconductor producing device using mini-environment system In a semiconductor-fabrication equipment of a minienvironment system, ambient air is prevented from entering a gap between an opening of the semiconductor-fabrication equipment and a wafer gateway of a hermetic container to prevent dust entrained in the ambient air from adhering to wafers in the hermetic container. Clean air is ... 07/28/05 - 20050160979 - Method and apparatus for applying a polycrystalline film to a substrate A film deposition system for depositing a polycrystalline film on a large area substrate. The system includes a chamber formed of a set of walls, the set of walls defining at least three temperature zones within the chamber. Each of the walls is thermally insulated from the other walls forming ... ### FreshPatents.com Support |