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Use of teos oxides in integrated circuit fabrication processesRelated Patent Categories: Active Solid-state Devices (e.g., Transistors, Solid-state Diodes), Integrated Circuit Structure With Electrically Isolated Components, Including Dielectric Isolation MeansUse of teos oxides in integrated circuit fabrication processes description/claimsThe Patent Description & Claims data below is from USPTO Patent Application 20070290292, Use of teos oxides in integrated circuit fabrication processes. Brief Patent Description - Full Patent Description - Patent Application Claims Continue reading about Use of teos oxides in integrated circuit fabrication processes... Full patent description for Use of teos oxides in integrated circuit fabrication processes Brief Patent Description - Full Patent Description - Patent Application Claims Click on the above for other options relating to this Use of teos oxides in integrated circuit fabrication processes patent application. ###  How KEYWORD MONITOR works... a FREE service from FreshPatents1. Sign up (takes 30 seconds). 2. Fill in the keywords to be monitored. 3. Each week you receive an email with patent applications related to your keywords. Start now! - Receive info on patent apps like Use of teos oxides in integrated circuit fabrication processes or other areas of interest. ### Previous Patent Application: Liner for shallow trench isolation Next Patent Application: Trench insulation structures and methods Industry Class: Active solid-state devices (e.g., transistors, solid-state diodes) ### FreshPatents.com Support Thank you for viewing the Use of teos oxides in integrated circuit fabrication processes patent info. IP-related news and info Results in 0.11265 seconds Other interesting Feshpatents.com categories: Accenture , Agouron Pharmaceuticals , Amgen , AT&T , Bausch & Lomb , Callaway Golf 174 |
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