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Thin-film disposition apparatusUSPTO Application #: 20080017500Title: Thin-film disposition apparatus Abstract: A dividing plate for a thin-film deposition apparatus divides the interior of the vacuum reaction chamber into a plasma discharge space and a film deposition process space, by fixing or connecting a plurality of laminated plates together by securely bonding them over the entire area of their interfacial surfaces, or a large portion thereof. (end of abstract) Agent: Buchanan, Ingersoll & Rooney PC - Alexandria, VA, US Inventors: Masahiko Tanaka, Manabu Ikemoto, Naoaki Yokogawa USPTO Applicaton #: 20080017500 - Class: 204164000 (USPTO) Related Patent Categories: Chemistry: Electrical And Wave Energy, Non-distilling Bottoms Treatment, Electrostatic Field Or Electrical Discharge
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