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12/27/07 - USPTO Class 356 |  53 views | #20070296968 | Prev - Next | About this Page  356 rss/xml feed  monitor keywords

System and method for monitoring laser shock processing

USPTO Application #: 20070296968
Title: System and method for monitoring laser shock processing
Abstract: A method and system for monitoring laser shock peening of a work piece. A line spectrum is obtained from radiation emitted by a plasma produced by a laser shock peening process. The shape of the line spectrum about its emission peak is compared to a defined line shape to verify proper operation of the laser shock peening process. The line shape may be a Lorentzian line shape corresponding to a desired line shape. The line shape may a Gaussian line shape corresponding to an undesired line shape. The system can also detect the failure mode that occurs when the opaque layer is broken through by detecting the plasma spectral component produced by the work piece material, along with the plasma produced by the opaque layer. (end of abstract)



Agent: General Electric Company (pcpi) C/o Fletcher Yoder - Houston, TX, US
Inventors: Pingfan Peter Wu, Pamela King Benicewicz, Magdi Naim Azer
USPTO Applicaton #: 20070296968 - Class: 356318000 (USPTO)

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The Patent Description & Claims data below is from USPTO Patent Application 20070296968, System and method for monitoring laser shock processing.

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