System and method for high-energy sputtering using return conductors

Abstract: A system and method for sputtering is described. One embodiment includes a sputtering system that includes a vacuum chamber; a gas box secured to the inner surface of the vacuum chamber; a plurality of return conductors engaged with the gas box, the plurality of return conductors extending through the vacuum chamber; and a plurality of seals configured to engage corresponding ones of the plurality of return conductors, the plurality of seal configured to maintain the vacuum inside the vacuum chamber. (end of abstract)

Agent: Cooley Godward Kronish LLP Attn: Patent Group - Washington, DC, US
Inventors: Michael W. Stowell, Manfred Ruske
USPTO Applicaton #: #20080110752 - Class: 20429808 (USPTO)

System and method for high-energy sputtering using return conductors description/claims

The Patent Description & Claims data below is from USPTO Patent Application 20080110752, System and method for high-energy sputtering using return conductors.

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