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  Supercritical fluid-based cleaning compositions and methodsUSPTO Application #: 20070149429Title: Supercritical fluid-based cleaning compositions and methods Abstract: Compositions and methods employing supercritical fluids, e.g., supercritical carbon dioxide, for removal of unwanted material from microelectronic device structures and process equipment. One composition of such type, having utility for removing flux and solder perform surface films, includes supercritical fluid, e.g., supercritical CO2, and organic co-solvent, e.g., xylene. Another composition of such type having utility for removal of metals, metal oxides, metal-containing post-etch residues and, CMP particles from semiconductor substrates includes supercritical fluid and at least one β-diketone. (end of abstract)
USPTO Applicaton #: 20070149429 - Class: 510175000 (USPTO) Related Patent Categories: Cleaning Compositions For Solid Surfaces, Auxiliary Compositions Therefor, Or Processes Of Preparing The Compositions, Cleaning Compositions Or Processes Of Preparing (e.g., Sodium Bisulfate Component, Etc.), For Cleaning A Specific Substrate Or Removing A Specific Contaminant (e.g., For Smoker`s Pipe, Etc.), For Printed Or Integrated Electrical Circuit, Or Semiconductor Device
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