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08/24/06 - USPTO Class 422 |  133 views | #20060188412 | Prev - Next | About this Page  422 rss/xml feed  monitor keywords

Substrate treating apparatus and method

USPTO Application #: 20060188412
Title: Substrate treating apparatus and method
Abstract: A substrate treating apparatus for treating substrates with a treating solution having a mixture of a chemical and a diluent. The apparatus includes a treating tank for storing the treating solution, a heating device for heating the treating solution, a supply pipe for supplying a gas at a fixed flow rate, the supply pipe having a detecting end at a predetermined depth in the treating tank, a pressure detecting device for detecting a pressure in the supply pipe, a converting device for converting the pressure detected by the pressure detecting device into a voltage, a storage device for storing, as a reference voltage, a voltage received from the converting device when a reference liquid at a reference temperature is stored in the treating tank, and a computing device for deriving an actual specific gravity of the treating solution from the reference voltage stored in the storage device, and a treatment voltage received from the converting device when the treating solution stored in the treating tank has been heated to a treating temperature by the heating device. (end of abstract)



Agent: Ostrolenk Faber Gerb & Soffen - New York, NY, US
Inventor: Hiroaki Takahashi
USPTO Applicaton #: 20060188412 - Class: 422105000 (USPTO)

Related Patent Categories: Chemical Apparatus And Process Disinfecting, Deodorizing, Preserving, Or Sterilizing, Control Element Responsive To A Sensed Operating Condition

Substrate treating apparatus and method description/claims


The Patent Description & Claims data below is from USPTO Patent Application 20060188412, Substrate treating apparatus and method.

Brief Patent Description - Full Patent Description - Patent Application Claims
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BACKGROUND OF THE INVENTION

[0001] (1) Field of the Invention

[0002] This invention relates to substrate treating apparatus and methods for treating, with a treating solution, substrates such as semiconductor wafers, glass substrates for liquid crystal displays and glass substrates for photomasks (hereinafter simply called "substrates").

[0003] (2) Description of the Related Art

[0004] A conventional apparatus of the type noted above has a nitrogen gas source, a regulator, a supply pipe and a pressure detector (Japanese Unexamined Patent Publication No. 11-219931 (1999), (paragraphs "0040" to "0050" and FIG. 2), for example). This apparatus supplies nitrogen gas at a constant flow rate from the nitrogen gas source into a treating tank, with a detection end of the supply pipe disposed at a predetermined depth in the tank. The pressure detector detects a pressure of the nitrogen gas supplied into the treating tank. The pressure detected in this way is a pressure at the predetermined depth in the treating tank, and has a correlation with the specific gravity of a treating solution. The concentration of the treating solution is controlled based on the detected specific gravity, for example.

[0005] Specifically, the apparatus further includes a voltage converter for converting the pressure detected by the pressure detector into voltage. This voltage is applied to a controller for displaying its value and controlling the pressure.

[0006] The above conventional example has the following drawbacks.

[0007] With the conventional apparatus, the pressure detected is variable even with slight variations in the position of the detection end of the supply pipe. Thus, the pressure varies each time the height of the supply pipe is adjusted. The pressure is variable also among different apparatus of the same construction. The detected pressure serves only as a reference peculiar to the apparatus concerned. This pressure cannot be used for comparison with other apparatus of the same construction. In addition, the detected pressure, i.e. the meaning of voltage, is unintelligible to the user. Further, when adjusting treating conditions of the apparatus, the adjustment must be carried out in a way suited for each individual apparatus, resulting in increased man-hours.

SUMMARY OF THE INVENTION

[0008] This invention has been made having regard to the state of the art noted above, and its object is to provide a substrate treating apparatus and method for obtaining an actual specific gravity of a treating solution as an absolute value by setting a reference, and for reducing man-hours for adjustment work.

[0009] Another object of the invention is to provide a substrate treating apparatus and method for obtaining a reduced concentration as an absolute value by setting a reference, and for reducing man-hours for adjustment work.

[0010] The above objects are fulfilled, according to this invention, by a substrate treating apparatus for treating substrates with a treating solution having a mixture of a chemical and a diluent, comprising a treating tank for storing the treating solution; a heating device for heating the treating solution; a supply pipe for supplying a gas at a fixed flow rate, the supply pipe having a detecting end at a predetermined depth in the treating tank; a pressure detecting device for detecting a pressure in the supply pipe; a converting device for converting the pressure detected by the pressure detecting device into a voltage; a storage device for storing, as a reference voltage, a voltage received from the converting device when a reference liquid at a reference temperature is stored in the treating tank; and a computing device for deriving an actual specific gravity of the treating solution from the reference voltage stored in the storage device, and a treatment voltage received from the converting device when the treating solution stored in the treating tank has been heated to a treating temperature by the heating device.

[0011] The reference liquid at the reference temperature is stored in the treating tank in advance of treatment. In this state, the converting device converts the pressure received from the pressure detecting device into a voltage, which is stored in the storage device as a reference voltage. Next, the treating solution stored in the treating tank is heated to the treating temperature by the heating device. The pressure detected in the state is converted into a treatment voltage. The computing device derives an actual specific gravity of the treating solution from the treatment voltage and the reference voltage stored beforehand. Then, for example, the treating solution is adjusted based on this actual specific gravity. The actual specific gravity expresses a ratio to the reference voltage of this apparatus, and has an absolute meaning. A reference voltage detected from among different apparatus can be used for comparison between the apparatus, and can represent an absolute value readily understood by the user. Such a reference common to different apparatus enables a reduction in man-hours for adjusting the respective apparatus.

[0012] The reference liquid noted above is deionized water or distilled water, for example. The above reference temperature is 25.degree. C. or 25 to 30.degree. C., for example. The treating solution may have phosphoric acid diluted with deionized water, or hydrofluoric acid diluted with deionized water, for example.

[0013] Preferably, the apparatus further comprises a circulating system for supplying the reference liquid and the treating solution drained from the treating tank back to the treating tank, the reference liquid and the treating solution being circulated at the same flow rate through the circulating system when detecting the reference voltage and the treatment voltage.

[0014] Because of the construction of the treating tank, the reference liquid simply filling the tank may have its surface level lowering with time. It is therefore desirable to circulate the reference liquid and treating solution through the circulating system. In this way, the surface level may be maintained constant to maintain the detecting end of the supply pipe at a constant depth. Thus, the same condition is provided for detecting the pressures of the reference liquid and treating solution. By equalizing the conditions for detecting the two pressures, the actual specific gravity is measured with increased accuracy.

[0015] In another aspect of the invention, a substrate treating method is provided for treating substrates with a treating solution having a mixture of a chemical and a diluent. The method comprises a step of storing, as a reference voltage, a voltage obtained by a converting device according to a pressure at a predetermined depth in a treating tank when a reference liquid at a reference temperature is stored in the treating tank in advance of treatment; a step of deriving an actual specific gravity of the treating solution from the reference voltage and a treatment voltage received from the converting device when the treating solution stored in the treating tank has been set to a treating temperature; and a step of adjusting the treating solution based on the actual specific gravity.

[0016] The reference liquid at the reference temperature is stored in the treating tank in advance of treatment. The voltage obtained by the converting device in this state is stored as a reference voltage. Next, the treating solution stored in the treating tank is heated to the treating temperature by the heating device. The voltage obtained by the converting device in the state is regarded as a treatment voltage. An actual specific gravity of the treating solution is derived from the treatment voltage and the reference voltage stored beforehand. The treating solution is adjusted based on this actual specific gravity. The actual specific gravity expresses a ratio to the reference voltage of this apparatus, and has an absolute meaning. The actual specific gravity can be used for comparison between different apparatus, and can represent an absolute value readily understood by the user. A reference common to different apparatus enables a reduction in man-hours for adjusting the respective apparatus.

[0017] In a further aspect of the invention, a substrate treating apparatus for treating substrates with a treating solution having a mixture of a chemical and a diluent, which apparatus comprises a treating tank for storing the treating solution; a heating device for heating the treating solution; a supply pipe for supplying a gas at a fixed flow rate, the supply pipe having a detecting end at a predetermined depth in the treating tank; a pressure detecting device for detecting a pressure in the supply pipe, and outputting a voltage corresponding to the pressure; a storage device for storing, as a reference voltage, a voltage received from the pressure detecting device when a reference liquid at a reference temperature is stored in the treating tank; an actual specific gravity calculating device for deriving an actual specific gravity of the treating solution from the reference voltage stored in the storage device, and a treatment voltage received from the pressure detecting device when the treating solution stored in the treating tank has been heated to a treating temperature by the heating device; a reducing device for determining a reduced actual specific gravity by reducing the actual specific gravity to a specific gravity in time of a measuring temperature when measuring a specific gravity-concentration characteristics of the treating solution; and a computing device for deriving a reduced concentration of the treating solution from the reduced actual specific gravity and the specific gravity-concentration characteristics.

[0018] The reference liquid at the reference temperature is stored in the treating tank in advance of treatment. The voltage outputted from the pressure detecting device in this state is stored as a reference voltage in the storage device as a reference voltage. Next, the treating solution stored in the treating tank is heated by the heating device. The voltage obtained in the state is regarded as a treatment voltage. The actual specific gravity calculating device derives an actual specific gravity of the treating solution from the treatment voltage and the reference voltage. The actual specific gravity expresses a ratio to the reference voltage of this apparatus, and has an absolute meaning. A reference voltage measured of different apparatus can be used for comparison between different apparatus. The reducing device reduces the actual specific gravity to a specific gravity at the measurement temperature to determine a reduced actual specific gravity. The reduced actual specific gravity is a reduced value of the actual specific gravity obtained from the temperature of the treating solution in time of measuring the specific gravity-concentration characteristics. The computing device determines a reduced concentration, assuming that the treating solution has cooled to the measurement temperature, based on the reduced actual specific gravity and specific gravity-concentration characteristics. Thus, the actual specific gravity expresses a ratio to the reference voltage of the apparatus. The reduced concentration obtained by temperature reduction based on the actual specific gravity also has an absolute value. A reduced concentration determined for different apparatus can be used for comparison between the apparatus, and can be an absolute entity readily understood by the user. Such a reference common to different apparatus enables a reduction in man-hours for adjusting the respective apparatus.

[0019] Generally, data of the specific gravity-concentration characteristics of the treating solution is collected only at a certain measurement temperature. Data of the treating solution at the treating temperature does not necessarily exist. It is therefore necessary to reduce the actual specific gravity of the treating solution at the treating temperature to a specific gravity at the measurement temperature.

[0020] The reference liquid noted above is deionized water or distilled water, for example. The above reference temperature is 25.degree. C. or 25 to 30.degree. C., for example. The treating solution may have phosphoric acid diluted with deionized water, or hydrofluoric acid diluted with deionized water, for example.

[0021] Preferably, the reducing device is arranged to determine the reduced actual specific gravity at the treating temperature by multiplying the actual specific gravity obtained by the actual specific gravity calculating device, by a factor set beforehand according to a ratio between the actual specific gravity of the treating solution at the treating temperature and a measured specific gravity obtained by a specific gravity meter from the treating solution at a measurement temperature.

[0022] It has been found through various experiments conducted by Inventor that a substantially fixed ratio exists between the actual specific gravity obtained by measuring the specific gravity of the treating solution at the treating temperature, and a measured specific gravity obtained by a specific gravity meter from the treating solution placed in a sealed container and cooled to the measurement temperature. Thus, a reduced actual specific gravity may be obtained by multiplying the actual specific gravity by a factor set beforehand.

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