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Stefan WIESNER patents

Recent bibliographic sampling of Stefan WIESNER patents listed/published in the public domain by the USPTO (USPTO Patent Application #,Title):



01/08/15 - 20150008215 - Method and device for connecting an optical element to a frame
A method and a device for the material-fit connection of an optical element to a frame are disclosed....
Inventors: Armin Schoeppach, Johnannes Rau, Gennady Fedosenko, Leonid Gorkhover, Gerd Klose, Stefan Wiesner, Hans-joachim Trefz, Michael Widmann, Ulrich Bingel, Claudia Ekstein, Guenter Albrecht (Carl Zeiss Smt Gmbh)

04/25/13 - 20130100426 - Method for producing facet mirrors and projection exposure apparatus
The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors....
Inventors: Berndt Warm, Siegfried Rennon, Guenther Dengel, Juergen Baier, Udo Dinger, Stefan Burkart, Christos Kourouklis, Hin Yiu Chung, Stefan Wiesner, Hartmut Enkisch (Carl Zeiss Smt Gmbh)

04/12/12 - 20120086925 - Method for avoiding contamination and euv-lithography-system
A method for preventing contaminating gaseous substances (18) from passing through an opening (17b) in a housing (4a) of an EUV lithography apparatus (1), wherein at least one optical element for guiding EUV radiation (6) is arranged in the housing (4a). The method involves: generating at least one gas flow...
Inventors: Dieter Kraus, Dirk Heinrich Ehm, Stefan-wolfgang Schmidt, Stefan Wiesner, Almut Czap, Stefan Koehler, Hin Yiu Anthony Chung (Carl Zeiss Smt Gmbh)

11/17/11 - 20110279799 - Euv lithography device and method for processing an optical element
An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device has a processing device (15) for processing an optical...
Inventors: Wolfgang Singer, Yim-bun-patrick Kwan, Stefan-wolfgang Schmidt, Dirk Heinrich Ehm, Dieter Kraus, Stefan Wiesner, Stefan Koehler, Almut Czap, Hin Yiu Anthony Chung (Carl Zeiss Smt Gmbh)

03/10/11 - 20110058147 - Cleaning module and euv lithography device with cleaning module
A cleaning module for an EUV lithography device with a supply (206) for molecular hydrogen, a heating filament (210) and a line (212) for atomic and/or molecular hydrogen. The line (212) has at least one bend with a bending angle of less than 120 degrees, and has a material on...
Inventors: Dirk Heinrich Ehm, Julian Kaller, Stefan Schmidt, Dieter Kraus, Stefan Wiesner, Almut Czap, Hin-yiu Anthony Chung, Stefan Koehler (Carl Zeiss Smt Ag)

02/24/11 - 20110043774 - Cleaning module, euv lithography device and method for the cleaning thereof
In order to clean optical components (35) inside an EUV lithography device in a gentle manner, a cleaning module for an EUV lithography device includes a supply line for molecular hydrogen and a heating filament for producing atomic hydrogen and hydrogen ions for cleaning purposes. The cleaning module also has...
Inventors: Stefan Hembacher, Dieter Kraus, Dirk Heinrich Ehm, Stefan-wolfgang Schmidt, Stefan Koehler, Almut Czap, Stefan Wiesner, Hin Yiu Anthony Chung (Carl Zeiss Smt Ag)

03/25/10 - 20100071720 - Method and system for removing contaminants from a surface
Inside a vacuum chamber 200 a cleaning unit 204 provides atomic hydrogen or atomic deuterium for cleaning a surface 202 at a pressure of less than 10−4 Torr or of more than 10−3 Torr. The surface 202 is heated by the heating unit 203 to a temperature of at least...
Inventors: Inventors: Severin Waldis, Florian Bach, Daniel Benz, Armin Werber, Wilfried Noell, Dirk Heinrich Ehm, Stefan Wiesner, Dieter KrausSeverin Waldis, Florian Bach, Daniel Benz, Armin Werber, Wilfried Noell, Dirk Heinrich Ehm, Stefan Wiesner, Dieter Kraus, Dirk Heinrich Ehm, Stefan Schmidt, Dieter Kraus, Stefan Wiesner, Stefan Koehler, Almut Czap, Hin Yiu Anthony Chung (Carl Zeiss Smt Ag)

01/14/10 - 20100007866 - Method for producing facet mirrors and projection exposure apparatus
The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors....
Inventors: Berndt Warm, Siegfried Rennon, Guenther Dengel, Juergen Baier, Udo Dinger, Stefan Burkart, Christos Kourouklis, Hin Yiu Anthony Chung, Stefan Wiesner, Hartmut Enkisch (Carl Zeiss Smt Ag)

10/01/09 - 20090244508 - Method and device for connecting an optical element to a frame
A method and a device for the material-fit connection of an optical element to a frame are disclosed....
Inventors: Armin Schoeppach, Johannes Rau, Gennady Fedosenko, Leonid Gorkhover, Gerd Klose, Stefan Wiesner, Hans-joachim Trefz, Michael Widmann, Ulrich Bingel, Claudia Ekstein, Guenter Albrecht (Carl Zeiss Smt Ag)

Carl Zeiss Smt Gmbh, Carl Zeiss Smt Ag

Archived*
(*May have duplicates - we are upgrading our archive.)

20120086925 - Method for avoiding contamination and euv-lithography-system


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The bibliographic references displayed about Stefan WIESNER's patents are for a recent sample of Stefan WIESNER's publicly published patent applications. The inventor/author may have additional bibliographic citations listed at the USPTO.gov. FreshPatents.com is not associated or affiliated in any way with the author/inventor or the United States Patent/Trademark Office but is providing this non-comprehensive sample listing for educational and research purposes using public bibliographic data published and disseminated from the United States Patent/Trademark Office public datafeed. This information is also available for free on the USPTO.gov website. If Stefan WIESNER filed recent patent applications under another name, spelling or location then those applications could be listed on an alternate page. If no bibliographic references are listed here, it is possible there are no recent filings or there is a technical issue with the listing--in that case, we recommend doing a search on the USPTO.gov website.

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