Sputtering target for titanium sputtering chamber -> Monitor Keywords
Fresh Patents
Monitor Patents Patent Organizer How to File a Provisional Patent Browse Inventors Browse Industry Browse Agents Browse Locations
     new ** File a Provisional Patent ** 
site info Site News  |  monitor Monitor Keywords  |  monitor archive Monitor Archive  |  organizer Organizer  |  account info Account Info  |  
06/07/07 | 64 views | #20070125646 | Prev - Next | USPTO Class 204 | About this Page  204 rss/xml feed  monitor keywords

Sputtering target for titanium sputtering chamber

USPTO Application #: 20070125646
Title: Sputtering target for titanium sputtering chamber
Abstract: A sputtering target for a sputtering chamber comprises a backing plate and titanium sputtering plate mounted on the backing plate. The sputtering plate comprises a central cylindrical mesa having a plane, and a peripheral inclined annular rim surrounding the cylindrical mesa, the annular rim being inclined relative to the plane of the cylindrical mesa by an angle of at least about 8°. (end of abstract)
USPTO Applicaton #: 20070125646 - Class: 204298120 (USPTO)
Related Patent Categories: Chemistry: Electrical And Wave Energy, Apparatus, Coating, Forming Or Etching By Sputtering, Coating, Specified Target Particulars

[The Full Description and Claims for this patents is not available from FreshPatents.com temporarily]

We apologize for the inconvenience:
Normally the full description and claims of the patent you are viewing (20070125646, Sputtering target for titanium sputtering chamber) would be available here (see sample below). However, this information from this patent is currently not available from our database.

Most likely, this is a temporary technical issue. We have logged this message and will attempt to resolve the issue. Please check back again soon.

sample




Click on the above for other options relating to this Sputtering target for titanium sputtering chamber patent application.
###
monitor keywords

How KEYWORD MONITOR works... a FREE service from FreshPatents
1. Sign up (takes 30 seconds). 2. Fill in the keywords to be monitored.
3. Each week you receive an email with patent applications related to your keywords.  
Start now! - Receive info on patent apps like Sputtering target for titanium sputtering chamber or other areas of interest.
###


Previous Patent Application:
Reduction of the loss of zinc by its reaction with oxygen in galvanized steel and batteries
Next Patent Application:
Sputtering target with few surface defects, and surface processing method thereof
Industry Class:
Chemistry: electrical and wave energy

###

Design/code © 2008 FreshContext LLC/Freshpatents.com. Website Terms and Conditions - Also read: About this Page
Patent data source: patents published by the United States Patent and Trademark Office (USPTO)
Information published here is for research/educational purposes only (and in conjunction with our Keyword Monitor) and is not meant to be used in place of the full USPTO patent document/images or a comprehensive patent archive search. Complete official applications are on file at the USPTO and often contain additional data/images (Freshpatents is currently text-only). FreshPatents.com is not affiliated with or endorsed by the USPTO or firms/individuals or products/designs/ideas related to listed patents.
FreshPatents.com Support
Thank you for viewing the Sputtering target for titanium sputtering chamber patent info.
IP-related news and info


Results in 0.12265 seconds


Other interesting Feshpatents.com categories:
Tyco , Unilever , Warner-lambert , 3m