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01/17/08 | 49 views | #20080011599 | Prev - Next | USPTO Class 204 | About this Page  204 rss/xml feed  monitor keywords

Sputtering apparatus including novel target mounting and/or control

USPTO Application #: 20080011599
Title: Sputtering apparatus including novel target mounting and/or control
Abstract: A sputtering chamber includes at least two sputtering targets, one of the at least two targets disposed on a first side a substrate conveyor extending within the chamber, and another of the at least two targets disposed on a second side of the conveyor. The at least two targets may be independently operable, and at least one of the targets, if inactivated, may be protected by a shielding apparatus. Both of the at least two targets may be mounted to a first wall of a plurality of walls enclosing the sputtering chamber.
(end of abstract)
Agent: Intellectual Property Group Fredrikson & Byron, P.A. - Minneapolis, MN, US
Inventors: Dennis M. Brabender, Jeffrey L. Kokoshke
USPTO Applicaton #: 20080011599 - Class: 2041921 (USPTO)


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