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Shuji Koyama patents

Recent patents with Shuji Koyama listed as an inventor - additional entries may be under other spellings.


Shuji Koyama - Related organizations: Canon Kabushiki Kaisha patents

Liquid composition and etching method for etching silicon substrate

01/21/16 - 20160020113 - An etching method includes etching a silicon substrate with a liquid composition containing an alkaline organic compound, water, and a boron compound with a content in the range of 1% by mass to 14% by mass. The boron compound is at least one of boron sesquioxide, sodium tetraborate, metaboric acid,
Inventors: Hirohisa Fujita, Taichi Yonemoto, Shuji Koyama

Etching chamber and method of manufacturing substrate

11/12/15 - 20150325460 - An etching chamber includes a chamber body including a flow channel and an opening mounted the substrate to be etched and the opening communicating with the flow channel and a sealing member provided in the periphery of the opening and configured to close a gap between the substrate and the
Inventors: Kenta Furusawa, Shuji Koyama, Mitsuru Chida, Ryotaro Murakami

Process for producing substrate for liquid ejection head and process for processing silicon substrate

07/31/14 - 20140212997 - A process for producing a substrate for a liquid ejection head in which a depressed portion is formed on a second surface that is a surface opposite to a first surface of a silicon substrate having an element formation region on the first surface with a peripheral side region left,
Inventors: Seiichiro Yaginuma, Hiroyuki Shimoyama, Masaki Ohsumi, Taichi Yonemoto, Shuji Koyama

Manufacturing method of liquid discharging head

06/05/14 - 20140151336 - A manufacturing method of a liquid discharging head includes: preparing a substrate having an energy-generating element and a resin layer on a first face side; irradiating a laser beam on the substrate so as to pass through the resin layer to form a hole serving as a liquid supply port
Inventors: Koji Sasaki, Shuji Koyama, Keiji Matsumoto, Seiichiro Yaginuma

Process for producing liquid ejection head

03/13/14 - 20140068940 - The invention provides a process for producing a liquid ejection head having an ejection orifice forming member in which an ejection orifice for ejecting a liquid has been formed, and a substrate having an energy-generating element for generating energy for ejecting a liquid from the ejection orifice on the side
Inventors: Kazuhiro Asai, Keiji Matsumoto, Kunihito Uohashi, Shuji Koyama

Method of manufacturing substrate of liquid ejection head

01/23/14 - 20140024148 - A method of manufacturing a substrate of a liquid ejection head including: forming a plurality of recesses in a silicon wafer; etching the silicon wafer with etchant to form a depression and a plurality of through holes formed from the plurality of the recesses in the depression; and manufacturing a
Inventors: Hiroyuki Shimoyama, Taichi Yonemoto, Shuji Koyama, Masaki Ohsumi, Keiji Matsumoto, Seiichiro Yaginuma

Method for processing silicon wafer

01/02/14 - 20140004629 - A method for processing a silicon wafer is provided, the method including allowing an etchant to flow along a surface of the silicon wafer to form a line in which a plurality of apertures are arranged in a flow direction of the etchant from an upstream side to a downstream
Inventors: Hirohisa Fujita, Shuji Koyama, Keiji Matsumoto, Kenta Furusawa

Process for producing ejection orifice forming member and liquid ejection head

12/12/13 - 20130330673 - A process for producing an ejection orifice forming member including the steps of forming a laminate including a first negative photosensitive resin layer that contains a first photoacid generator, and a second negative photosensitive resin layer that is formed on the first negative photosensitive resin layer and contains a second
Inventors: Kunihito Uohashi, Shuji Koyama, Kazuhiro Asai, Keiji Matsumoto, Tetsuro Honda, Masaki Ohsumi

Processing method for an ink jet head substrate

06/27/13 - 20130161286 - Provided is a processing method for an ink jet head substrate, including: forming a barrier layer on a substrate and forming a seed layer on the barrier layer; forming a resist film on the seed layer and patterning the resist film so that the patterned resist film corresponds to a
Inventors: Kenta Furusawa, Keiji Matsumoto, Keisuke Kishimoto, Kazuhiro Asai, Shuji Koyama

Method for manufacturing inkjet recording head

04/25/13 - 20130097861 - A method for manufacturing an inkjet recording head includes preparing a substrate having a mold to become an ink flow passage and an orifice layer covering the mold, and immersing the substrate in a solvent, whereby in immersing the substrate in the solvent, the mold at the substrate immersed in
Inventors: Hirohisa Fujita, Shuji Koyama, Hiroyuki Abo

Method for manufacturing recording head

01/17/13 - 20130017496 - A method for manufacturing a recording head including forming a flow-channel side-wall forming layer which contains a photosensitive resin, on a substrate having ejection energy generating elements and wiring thereon; exposing the flow-channel side-wall forming layer to light, and optically determining a flow channel; forming a shape stabilizing layer which
Inventors: Keiji Matsumoto, Kazuhiro Asai, Tetsuro Honda, Kunihito Uohashi, Shuji Koyama, Masaki Ohsumi

Method for producing liquid-discharge-head substrate

12/27/12 - 20120329181 - A method for producing a liquid-discharge-head substrate includes a step of preparing a silicon substrate including, at a front-surface side of the silicon substrate, an energy generating element; a step of forming a first etchant introduction hole on the front-surface side of the silicon substrate; a step of supplying a
Inventors: Ryotaro Murakami, Shuji Koyama, Keisuke Kishimoto, Kenta Furusawa

Liquid composition, method of producing silicon substrate, and method of producing liquid discharge head substrate

11/15/12 - 20120289055 - A liquid composition used to carry out crystal anisotropic etching of a silicon substrate provided with an etching mask formed of a silicon oxide film with the silicon oxide film used as a mask includes cesium hydroxide, an alkaline organic compound, and water.
Inventors: Hiroyuki Abo, Taichi Yonemoto, Shuji Koyama, Kenta Furusawa, Keisuke Kishimoto

Method of manufacturing substrate for liquid discharge head

04/26/12 - 20120097637 - Provided is a method of manufacturing a substrate for a liquid discharge head including a first face, energy generating elements which generate the energy to be used to discharge a liquid to a second face opposite to the first face, and liquid supply ports for supplying the liquid to the
Inventors: Keiji Watanabe, Shuji Koyama, Hiroyuki Abo, Keiji Matsumoto

Processing method of silicon substrate and process for producing liquid ejection head

04/12/12 - 20120088317 - A processing method of a silicon substrate, including forming on a back surface of a silicon substrate an etching mask layer having an opening portion, measuring a thickness of the silicon substrate, irradiating the opening portion in the etching mask layer with laser from the back surface of the silicon
Inventors: Keisuke Kishimoto, Shuji Koyama, Hiroyuki Abo, Taichi Yonemoto

Method of producing liquid ejection head

03/08/12 - 20120055022 - The present invention provides a method of producing a liquid ejection head, the method including the steps of preparing a substrate having a flow-path-wall member; bonding the flow-path-wall member to a resin layer that is composed of a photo-curing resin and serves as an ejection port member such that spaces
Inventors: Keiji Matsumoto, Shuji Koyama, Sakai Yokoyama, Kenji Fujii, Jun Yamamuro

Method of manufacturing liquid discharge head

03/01/12 - 20120047738 - The present invention is a method of manufacturing a liquid discharge head, which includes providing a substrate on which a solid member that becomes a flow path wall member is disposed to surround a region that becomes a flow path, forming a mold made of a metal or a metal
Inventors: Shuji Koyama, Sakai Yokoyama, Kenji Fujii, Jun Yamamuro, Keiji Matsumoto, Tetsuro Honda, Kouji Sasaki, Kenta Furusawa, Keisuke Kishimoto

Liquid composition, method of producing silicon substrate, and method of producing liquid discharge head substrate

07/28/11 - 20110183448 - A liquid composition used to carry out crystal anisotropic etching of a silicon substrate provided with an etching mask formed of a silicon oxide film with the silicon oxide film used as a mask includes cesium hydroxide, an alkaline organic compound, and water.
Inventors: Hiroyuki Abo, Taichi Yonemoto, Shuji Koyama, Kenta Furusawa, Keisuke Kishimoto

Liquid ejection head and method for manufacturing liquid ejection head

05/12/11 - 20110107598 - A liquid ejection head and a method of forming the same. The liquid ejection head includes a substrate, an ejection port, a liquid channel, and a supply port. The substrate has, above one side thereof, an energy generating element configured to generate energy used to eject liquid. The ejection port,
Inventors: Noriyasu Ozaki, Junichi Kobayashi, Shuji Koyama, Tadanobu Nagami, Yoshinori Tagawa, Kenji Fujii, Hiroyuki Murayama, Masaki Ohsumi, Jun Yamamuro, Yoshinobu Urayama, Hiroyuki Abo, Takeshi Terada, Masahisa Watanabe, Taichi Yonemoto

Manufacturing method for ink jet recording head chip, and manufaturing method for ink jet recording head

05/05/11 - 20110102511 - A manufacturing method for a substrate for an ink jet head, including formation of an ink supply port in a silicon substrate, the method includes a step of forming, on one side of the substrate, an etching mask layer having an opening at a position corresponding ink supply port; a
Inventors: Toshiyasu Sakai, Shuji Koyama, Kenji Ono, Jun Yamamuro

Method of manufacturing a substrate for a liquid discharge head

08/26/10 - 20100216264 - A method of manufacturing a substrate for a liquid discharge head, the substrate being a silicon substrate having a first surface opposed to a second surface, the method comprising the steps of providing a layer on the second surface of the silicon substrate, wherein the layer has a lower etch
Inventors: Keiji Matsumoto, Shuji Koyama, Hiroyuki Abo, Keiji Watanabe

Liquid discharge head and manufacturing method thereof

08/26/10 - 20100212159 - An object of the invention is to provide a method of manufacturing a liquid discharge head in which a distance from a discharge opening and an energy generating element is uniform, simply and with good precision.
Inventors: Tsuyoshi Takahashi, Shuji Koyama, Masaki Ohsumi, Masahisa Watanabe

Method for producing liquid discharge head

06/17/10 - 20100147793 - The present invention provides a method for producing a liquid discharge head including a silicon substrate having, on a first surface, energy generating elements, and a supply port penetrating the substrate from the first surface to a second surface, which is a rear surface of the first surface of the
Inventors: Tadanobu Nagami, Junichi Kobayashi, Takeshi Terada, Makoto Watanabe, Hiroyuki Abo, Mitsunori Toshishige, Yoshinori Tagawa, Shuji Koyama, Kenji Fujii, Masaki Ohsumi, Jun Yamamuro, Hiroyuki Murayama, Yoshinobu Urayama, Taichi Yonemoto

Method of manufacturing liquid discharge head

04/29/10 - 20100102473 - A method of manufacturing a liquid discharge head including a flow path member for forming a flow path communicating with a discharge port discharging a liquid forms a mold of the flow path made of a positive photosensitive resin on a substrate; applies a coated layer on the mold for
Inventors: Masahisa Watanabe, Shuji Koyama, Kenji Ono, Kenji Fujii, Shuhei Oya, Seiko Minami

Method of manufacturing ink jet recording head

07/23/09 - 20090183368 - A method of manufacturing an ink jet recording head includes the steps of: forming an adhesive layers and the side walls of a flow path on a substrate; pasting a dry film, which is a part of a flow path forming member, on the side walls; and forming discharge ports
Inventors: Masaki Ohsumi, Shuji Koyama, Yoshinori Tagawa, Hiroyuki Murayama, Kenji Fujii, Yoshinobu Urayama, Jun Yamamuro


### Shuji Koyama patent invention listings

The bibliographic references displayed about Shuji Koyama's patents are for a recent sample of Shuji Koyama's publicly published patent applications. The inventor/author may have additional bibliographic citations listed at the USPTO.gov. FreshPatents.com is not associated or affiliated in any way with the author/inventor or the United States Patent/Trademark Office but is providing this non-comprehensive sample listing for educational and research purposes using public bibliographic data published and disseminated from the United States Patent/Trademark Office public datafeed. This information is also available for free on the USPTO.gov website. If Shuji Koyama filed recent patent applications under another name, spelling or location then those applications could be listed on an alternate page. If no bibliographic references are listed here, it is possible there are no recent filings or there is a technical issue with the listing--in that case, we recommend doing a search on the USPTO.gov website.

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